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    • 4. 发明授权
    • Electron beam apparatus having an electrode with high temperature portion
    • 具有高温部分的电极的电子束装置
    • US07795795B2
    • 2010-09-14
    • US12054051
    • 2008-03-24
    • Jun IbaHisanobu Azuma
    • Jun IbaHisanobu Azuma
    • H01J1/62H01J63/04
    • H01J1/316H01J29/04H01J31/127H01J2201/3165H01J2329/0489
    • The invention provides an electron beam apparatus having: a rear plate having a plurality of electron-emitting devices each provided with a device electrode, and a plurality of wirings connected to the device electrodes; and a face plate being provided with an anode electrode, and being arranged in opposition to the rear plate so as to be irradiated with an electron emitted from the electron-emitting device, wherein the device electrode is electrically connected to the wiring through an additional electrode, and the additional electrode is formed from an electroconductive material of which phase transition from a solid phase directly into a vapor phase is caused at a temperature not lower than a melting point of the device electrode within an evacuated atmosphere.
    • 本发明提供了一种电子束装置,其具有:具有多个电子发射器件的后板,每个电子发射器件均设有器件电极,以及多个连接到器件电极的布线; 并且面板设置有阳极电极,并且被布置成与所述后板相对地照射从所述电子发射器件发射的电子,其中所述器件电极通过附加电极电连接到所述布线 并且附加电极由导电材料形成,其中在从抽出的气氛中不低于器件电极的熔点的温度引起从固相直接进入气相的相变。
    • 7. 发明申请
    • Electrifying method and manufacturing method of electron-source substrate
    • 电子源基板的通电方法和制造方法
    • US20050266761A1
    • 2005-12-01
    • US11195671
    • 2005-08-03
    • Hisanobu Azuma
    • Hisanobu Azuma
    • H01J9/02H01J9/00H01J9/44
    • H01J9/24H01J9/027H01J2329/00
    • A method according to the present invention is for electrifying a plurality of electric conductors arranged on a substrate including the step of setting an average temperature difference during electrifying processing between a region S0 in that the plurality of electric conductors on the substrate are arranged and a circumferential region S1 of the region S0 at 15° C. or more, and the substrate satisfies the relational expression: L1/L0>EαΔT/σth−1. where L0[m]: the width of the region S0 L1[m]: the width of the region S1 ΔT[K]: the average temperature difference E[Pa]: the Young's modulus of the substrate α[/K]: the coefficient of linear thermal expansion of the substrate σth[Pa]: the material constant of the substrate
    • 根据本发明的方法是对布置在基板上的多个电导体进行通电,包括在区域S 0之间的通电处理期间设定平均温度差的步骤,因为多个电导体 在15℃或更高的区域上排列有衬底和区域S O 0的圆周区域S 1,并且衬底满足以下关系式:&lt;&lt; line-formula description =“In-line Formulas”end =“lead”?> L <1> EalphaDeltaT / sigmath-1。 <?in-line-formula description =“在线公式”end =“tail”?>其中L <0> [m]:区域S的宽度0 L 1 [m]:区域S 1的宽度ΔT[K]:平均温差E [Pa]:基材的杨氏模量α[/ K]:衬底sigmath的线性热膨胀系数[Pa]:衬底的材料常数
    • 9. 发明申请
    • ELECTRON BEAM APPARATUS
    • 电子束设备
    • US20080238288A1
    • 2008-10-02
    • US12051890
    • 2008-03-20
    • Jun IbaHisanobu Azuma
    • Jun IbaHisanobu Azuma
    • H01J29/86
    • H01J1/316H01J29/04H01J31/127H01J2201/3165H01J2329/0489
    • A three-dimensional structure forming a space in which a wiring-side portion of a device electrode is located is arranged on a rear plate. A surface potential of the three-dimensional structure is defined so that an electric field intensity of the space becomes weaker than an average electric field intensity expressed below, average electric field intensity=Va/d, where Va is application voltage of an anode electrode, and d is an interval between a rear plate and the face plate. The device electrode includes a high-temperature portion where temperature locally rises when current flows through the device electrode. The high-temperature portion is positioned in the space or at a distance of less than or equal to 20 μm from the space.
    • 形成其中装置电极的布线侧部分所在的空间的三维结构布​​置在后板上。 定义三维结构的表面电位,使得空间的电场强度比以下表示的平均电场强度弱,<?in-line-formula description =“In-line Formulas”end =“lead “?>平均电场强度= Va / d,<?在线公式描述=”在线公式“end =”tail“?>其中Va是阳极电极的施加电压,d是 后板和面板。 器件电极包括当电流流过器件电极时温度局部上升的高温部分。 高温部分位于空间中或距离空间小于或等于20μm的距离处。
    • 10. 发明授权
    • Electron beam apparatus
    • 电子束装置
    • US07427826B2
    • 2008-09-23
    • US11331111
    • 2006-01-13
    • Jun IbaYasuo OhashiHisanobu AzumaTakahiro HachisuMasanori Takahashi
    • Jun IbaYasuo OhashiHisanobu AzumaTakahiro HachisuMasanori Takahashi
    • H01J1/00H01J9/02
    • H01J3/026H01J31/127
    • There provided is an electron beam apparatus of preventing surface creeping discharge from newly arising due to discharge that arises between an anode electrode and an electron-emitting device. In an electron-emitting device including a scan signal device electrode and an information signal device electrode, a portion of the scan signal device electrode is covered by an insulating layer of insulating scan signal wiring from information signal wiring, an additional electrode is connected to the scan signal device electrode at an end portion of the insulating layer and the additional electrode is configured so that energy Ee being lost due to melting of the additional electrode is larger than energy Ea of discharge current flowing in to the electron-emitting device.
    • 提供了一种电子束装置,其防止由于在阳极电极和电子发射器件之间产生的放电而新出现的表面蠕变放电。 在包括扫描信号器件电极和信息信号器件电极的电子发射器件中,扫描信号器件电极的一部分被来自信息信号布线的绝缘扫描信号布线的绝缘层覆盖,附加电极连接到 在绝缘层的端部处的扫描信号器件电极和附加电极被配置为使得由于附加电极的熔化而损失的能量Ee大于流入电子发射器件的放电电流的能量Ea。