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    • 1. 发明授权
    • Printed circuit board and manufacturing method of the printed circuit board
    • 印刷电路板和印刷电路板的制造方法
    • US06710260B1
    • 2004-03-23
    • US09537083
    • 2000-03-29
    • Yasuaki SekiTakashi ItoShuji Mochizuki
    • Yasuaki SekiTakashi ItoShuji Mochizuki
    • H05K100
    • H05K3/381H05K3/388H05K3/4644
    • In a manufacturing method of a printed circuit board comprising a process of forming a circuit pattern on the surface of the base substrate (13) of which surface is at least composed of an insulative material, a process of forming the insulative layer (15) composed of mixed composites of more than two kinds of organic resins having a different etching rate by a dry etching process on the surface of the base substrate (13) including the circuit pattern, a process of perforating the hole (17) on the insulative layer (15) by a laser beam, a process of roughing the surface of the insulative layer (15) by a dry etching process, a process of forming the conductive film (19) for a foundation of an electroplating process by a vacuum film forming method and a process of forming the conductive layer (20) on the conductive film (19) by an electroplating process so as to connect the conductive layer (20) with the circuit pattern (14) electrically. Accordingly, a printed circuit board having an extremely small anchor profile and a fine pattern can be manufactured in fewer manufacturing processes by utilizing the dry etching process and a spattering film forming process.
    • 在一种印刷电路板的制造方法中,包括在基底(13)的表面至少由绝缘材料构成的表面上形成电路图案的工艺,形成绝缘层(15)的工艺形成 在包括电路图案的基底基板(13)的表面上通过干法蚀刻工艺对具有不同蚀刻速率的两种以上有机树脂的混合复合材料进行穿孔(17)在绝缘层( 15),通过干蚀刻工艺粗化绝缘层(15)的表面的工艺,通过真空成膜方法形成用于电镀工艺的基础的导电膜(19)的工艺,以及 通过电镀工艺在导电膜(19)上形成导电层(20)以将导电层(20)与电路图案(14)电连接的工艺。 因此,通过利用干式蚀刻工艺和溅射成膜工艺,可以在较少的制造工艺中制造具有极小锚固轮廓和精细图案的印刷电路板。
    • 4. 发明授权
    • Plasma processing method and plasma etching method
    • 等离子体处理方法和等离子体蚀刻方法
    • US5716534A
    • 1998-02-10
    • US564621
    • 1995-11-29
    • Hiroshi TsuchiyaYoshio FukasawaShuji MochizukiYukio NaitoKosuke Imafuku
    • Hiroshi TsuchiyaYoshio FukasawaShuji MochizukiYukio NaitoKosuke Imafuku
    • H01J37/32H01L21/00
    • H01J37/32082H01J37/32165H01J37/3299H01J2237/3343
    • A plasma etching apparatus includes a process chamber that can be set at a reduced pressure. A lower electrode on which a semiconductor wafer is placed and an upper electrode opposing the lower electrode are disposed in the process chamber. The lower and upper electrodes are connected to RF power supplies, respectively. First and second RF powers, the phases and power ratio of which are separately controlled, can be applied to the upper and lower electrodes. Parameters including the frequencies, power values, and relative phases of the first and second RF powers are selected in order to set the etching characteristics, e.g., an etching rate, the planar uniformity of the etching rate, the etching selectivity ratio and the like to predetermined values. During etching, the first and second RF powers are monitored by separate detectors, and are maintained at initial preset values through a controller.
    • 等离子体蚀刻装置包括能够减压设置的处理室。 在其中放置半导体晶片的下电极和与下电极相对的上电极设置在处理室中。 下电极和上电极分别连接到RF电源。 第一和第二RF功率(其相位和功率比被单独控制)可以应用于上电极和下电极。 选择包括第一和第二RF功率的频率,功率值和相对相位的参数,以便将蚀刻特性,例如蚀刻速率,蚀刻速率的平面均匀性,蚀刻选择比等设置为 预定值。 在蚀刻期间,第一和第二RF功率由分离的检测器监测,并通过控制器保持在初始预设值。
    • 6. 发明授权
    • Film handling means for a laser recorder
    • 用于激光记录器的胶片处理装置
    • US4814793A
    • 1989-03-21
    • US41079
    • 1987-04-21
    • Akiyoshi HamadaMitsutoshi YagotoYutaka WatanabeShuji MochizukiMasayuki MinoYutaka TanakaKyoji Tachikawa
    • Akiyoshi HamadaMitsutoshi YagotoYutaka WatanabeShuji MochizukiMasayuki MinoYutaka TanakaKyoji Tachikawa
    • G06K15/12G01D9/42G01D15/24
    • G06K15/1295
    • A laser recorder applicable to computer output microfilm recording apparatus comprises: a housing, a film feed unit having a film cassette loaded with a rolled heat development film; a film take-up unit for taking up the heat development film on a reel or on a tray, including a film storing mechanism for storing cut films sequentially; a main driving unit for driving the heat development film for advancing at a fixed speed for auxiliary scanning for recording image information on the heat development film, including a slackened film relief mechanism for eliminating slackened film around the main driving unit and a stepping motor driving current control circuit for driving the main driving unit at a low and fixed speed; loop detectors for preventing film feed force and film delivery force from working on the main driving unit, an image information recording unit for main scanning, having a laser optical system for scanning the heat development film across the width thereof to record image information recorded on the heat development film thereon; and a heat-development unit for heat-developing the image information recorded on the heat development film, including a delivery driving roller unit and a guide roller unit driven at different speeds respectively for eliminating slackened film around the heat-development unit as well as controlling the heat-development time, a temperature controller for controlling heat-development unit temperature, and a swing roller for separating the film from the heat-development unit when heat-development is not required.
    • 适用于计算机输出微缩胶卷记录装置的激光记录装置包括:外壳,具有装载有滚烫热显影膜的胶片暗盒的胶片馈送单元; 用于将热显影膜卷绕在卷轴或托盘上的薄膜吸收单元,包括用于顺序地存储切割薄膜的薄膜存储机构; 主驱动单元,用于驱动用于辅助扫描的固定速度的热显影膜,用于在显影膜上记录图像信息,包括用于消除主驱动单元周围的松弛膜的松弛膜释放机构和步进电机驱动电流 用于以低和固定速度驱动主驱动单元的控制电路; 用于防止胶片馈送力和胶片传送力在主驱动单元上工作的环路检测器,用于主扫描的图像信息记录单元,具有用于在其宽度上扫描热显影膜的激光光学系统,以记录记录在主驱动单元上的图像信息 热显影膜; 以及热显影单元,用于对记录在热显影膜上的图像信息进行热显影,包括分别驱动辊单元和以不同速度驱动的导辊单元,用于消除热显影单元周围的松弛膜以及控制 热显影时间,用于控制热显影单元温度的温度控制器,以及用于在不需要热显影时将膜与热显影单元分离的摆动辊。
    • 8. 发明申请
    • Direct memory access system
    • 直接内存访问系统
    • US20060161695A1
    • 2006-07-20
    • US11303022
    • 2005-12-16
    • Shuji MochizukiKazushi Hayashi
    • Shuji MochizukiKazushi Hayashi
    • G06F13/28
    • G06F13/28Y02D10/14
    • A direct memory access system has a DMA setting decoding portion 17 and a DMA clock/reset control portion 18. The DMA setting decoding portion 17 acquires various pieces of DMA data transfer control information including a data transfer length and a data transfer target from information set in a DMA controller 2, and determines not-operative circuit portions uninvolved in the DMA data transfer based on the DMA data transfer control information. The DMA clock/reset control portion 18 controls suspension of clock supply to the not-operative circuit portions at the timing of start of the DMA data transfer and resumption of the clock supply at the timing of termination of the DMA data transfer. The DMA setting decoding portion 17 detects the start of the DMA data transfer and calculates the timing of resumption of clock supply during suspension of the clock supply based on the DMA data transfer control information. Thus, the clock supply timing is controlled.
    • 直接存储器访问系统具有DMA设置解码部分17和DMA时钟/复位控制部分18. DMA设置解码部分17从信息集中获取包括数据传送长度和数据传送目标的各种DMA数据传送控制信息 在DMA控制器2中,并基于DMA数据传输控制信息确定不参与DMA数据传输的不工作电路部分。 DMA时钟/复位控制部分18在DMA数据传输开始的定时和在DMA数据传输终止的定时恢复时钟供应的时刻,控制对不工作电路部分的时钟供给的暂停。 DMA设置解码部分17检测DMA数据传输的开始,并且基于DMA数据传送控制信息计算在暂停时钟供应期间恢复时钟供应的定时。 因此,控制时钟供应定时。
    • 9. 发明授权
    • Electron beam excited plasma system
    • 电子束激发等离子体系统
    • US5539274A
    • 1996-07-23
    • US301566
    • 1994-09-07
    • Youichi ArakiKazuya NagasekiShuji Mochizuki
    • Youichi ArakiKazuya NagasekiShuji Mochizuki
    • H01J37/32H05H1/24H05H1/50H05H1/16
    • H01J37/3266H01J37/3233H05H1/24H05H1/50
    • An electron beam excited plasma system is provided with a first auxiliary electrode for initial discharge, an anode having an opening, a cathode, having an opening and located between the anode and the first auxiliary electrode, for producing an initial discharge between the first auxiliary electrode and the cathode, and for producing a plasma-generating discharge between the anode and the cathode, a second auxiliary electrode, having an opening and located between the cathode and the anode, for facilitating the generation of the discharge plasma between the cathode and the anode, a gas supply device for supplying a discharge plasma-generating gas into the region between the cathode and the anode, and magnetic field generator for generating a magnetic field and for applying this magnetic field to the region between the cathode and the anode, such that a cusp magnetic field is generated in the vicinity of the cathode.
    • 电子束激发等离子体系具有用于初始放电的第一辅助电极,具有开口的阳极,具有开口并位于阳极和第一辅助电极之间的阴极,用于在第一辅助电极之间产生初始放电 和阴极,并且用于在阳极和阴极之间产生等离子体产生放电,具有开口并位于阴极和阳极之间的第二辅助电极,以便于在阴极和阳极之间产生放电等离子体 用于将放电等离子体产生气体供应到阴极和阳极之间的区域中的气体供应装置和用于产生磁场并用于将该磁场施加到阴极和阳极之间的区域的磁场发生器,使得 在阴极附近产生尖点磁场。