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1. 发明授权

US5433988A Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray 失效
标题翻译：多层反射镜，用于软X射线至真空紫外线
公开(公告)号：US5433988A
公开(公告)日：1995-07-18
申请号：US323592
申请日：1994-10-17
申请人： Yasuaki Fukuda , Yutaka Watanabe , Shigetaro Ogura , Takashi Iizuka
发明人： Yasuaki Fukuda , Yutaka Watanabe , Shigetaro Ogura , Takashi Iizuka
IPC分类号： B32B15/08 , G02B1/10 , G21K1/06 , G02B5/28
CPC分类号： B32B15/08 , B82Y10/00 , G02B5/0833 , G02B5/0891 , G02B5/26 , G21K1/062 , G21K2201/061 , Y10S428/913 , Y10T428/24355 , Y10T428/30
摘要： A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layers primarily consists of at least one of single elements, such as ruthenium, or of a boride carbide, silicate, nitride oxide of a transition metal. The second layers primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).
摘要翻译：用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。第一层主要由单一元素中的至少一种组成，例如钌，或硼化物碳化物，硅酸盐，过渡金属的氮氧化物。第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和铝（例如碳化物，氮化物和铝的氧化物）。

2. 发明授权

US5310603A Multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray 失效
标题翻译：多层反射镜，用于软X射线至真空紫外线
公开(公告)号：US5310603A
公开(公告)日：1994-05-10
申请号：US75350
申请日：1993-06-14
申请人： Yasuaki Fukuda , Yutaka Watanabe , Shigetaro Ogura , Takashi Iizuka
发明人： Yasuaki Fukuda , Yutaka Watanabe , Shigetaro Ogura , Takashi Iizuka
IPC分类号： B32B15/08 , G02B1/10 , G21K1/06 , G01K1/06 , B32B15/04
CPC分类号： G21K1/062 , B32B15/08 , B82Y10/00 , G02B5/0891 , G02B5/26 , G21K2201/061 , Y10S428/913
摘要： A multi-layer reflection mirror for soft X-ray to vacuum ultraviolet ray, comprises a substrate, a plurality of first layers, and a plurality of second layers formed on the substrate alternately with the first layers. The first layer primarily consists of at least one of single elements, such as ruthenium or of a boride, carbide, silicide, nitride oxide of a transition metal. The second layer primarily consists of at least one of compounds of carbon, silicon (e.g. carbide, nitride and oxide of silicon), boron (e.g. carbide, nitride and oxide of boron), beryllium (e.g. carbide, nitride and oxide of beryllium) and aluminum (e.g. carbide, nitride and oxide of aluminum).
摘要翻译：用于软X射线至真空紫外线的多层反射镜包括与第一层交替地形成在基板上的基板，多个第一层和多个第二层。第一层主要由单一元素，例如钌或硼化物，碳化物，硅化物，过渡金属的氮氧化物中的至少一种组成。第二层主要由碳，硅（例如碳化物，氮化物和硅的氧化物），硼（例如碳化物，氮化物和硼的氧化物），铍（例如碳化物，氮化物和铍氧化物）的化合物中的至少一种和铝（例如碳化物，氮化物和铝的氧化物）。

3. 发明授权

US5052033A Reflection type mask 失效
标题翻译：反射型面具
公开(公告)号：US5052033A
公开(公告)日：1991-09-24
申请号：US633181
申请日：1990-12-28
申请人： Tsutomu Ikeda , Yutaka Watanabe , Masayuki Suzuki , Masami Hayashida , Yasuaki Fukuda , Shigetaro Ogura , Takashi Iizuka , Masahito Niibe
发明人： Tsutomu Ikeda , Yutaka Watanabe , Masayuki Suzuki , Masami Hayashida , Yasuaki Fukuda , Shigetaro Ogura , Takashi Iizuka , Masahito Niibe
IPC分类号： G03F1/24 , G03F1/58 , G03F7/20
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/58 , G03F7/70033 , G03F7/70233 , G03F7/70283 , G03F7/70875 , G03F7/70958
摘要： A reflection type mask usable to print a pattern upon a semiconductor wafer by use of soft X-rays or otherwise is disclosed. A reflective surface is formed by a multilayered film which is formed on a substrate by layering different materials having different refractive indices in consideration of Bragg diffraction and Fresnel reflection. A non-reflective portion is formed on the reflecting surface to provide a desired pattern. Alternatively, a pattern comprising a multilayered structure may be formed upon a non-reflective substrate. The mask of the present invention assures pattern printing of high contrast.
摘要翻译：公开了一种可用于通过使用软X射线在半导体晶片上印刷图案的反射型掩模。考虑到布拉格衍射和菲涅尔反射，通过分层折射率不同的材料形成在基板上的多层膜形成反射表面。在反射表面上形成非反射部分以提供期望的图案。或者，包括多层结构的图案可以形成在非反射基板上。本发明的掩模确保高对比度的图案印刷。

4. 发明授权

US5012500A X-ray mask support member, X-ray mask, and X-ray exposure process using the X-ray mask 失效
标题翻译： X射线掩模支撑构件，X射线掩模和使用X射线掩模的X射线曝光处理
公开(公告)号：US5012500A
公开(公告)日：1991-04-30
申请号：US290624
申请日：1988-12-27
申请人： Yutaka Watanabe , Yasuaki Fukuda , Shigetaro Ogura
发明人： Yutaka Watanabe , Yasuaki Fukuda , Shigetaro Ogura
IPC分类号： G03F1/22
CPC分类号： G03F1/22
摘要： An X-ray mask support member comprises a support frame, and a support membrane which is held thereon and comprises X-ray-transmissive membranes laminated in multiple layers. The support membrane comprises and holds between the multi-layers at least one layer of a transmissive membrane T having an electrical resistivity of 1.times.10.sup.-4 .OMEGA..multidot.cm or less.

5. 发明授权

US5153898A X-ray reduction projection exposure system of reflection type 失效
标题翻译：反射型X射线折射投影曝光系统
公开(公告)号：US5153898A
公开(公告)日：1992-10-06
申请号：US841298
申请日：1992-02-28
申请人： Masayuki Suzuki , Noritaka Mochizuki , Setsuo Minami , Shigetaro Ogura , Yasuaki Fukuda , Yutaka Watanabe , Yasuo Kawai , Takao Kariya
发明人： Masayuki Suzuki , Noritaka Mochizuki , Setsuo Minami , Shigetaro Ogura , Yasuaki Fukuda , Yutaka Watanabe , Yasuo Kawai , Takao Kariya
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： B82Y10/00 , G02B17/0636 , G03F7/2039 , G03F7/70033 , G03F7/70233 , G03F7/7025 , G03F7/70691 , G03F7/70866 , G03F7/70875 , G03F7/70883 , G03F7/70891
摘要： An X-ray exposure apparatus includes a stage for holding a mask having a pattern for circuit manufacturing, a stage for holding a wafer to be exposed to the pattern of the mask with X-rays, and a reflection reduction imaging system, disposed between the mask stage and the wafer stage, including a reflecting mirror arrangement, containing at least three, but not more than five, reflecting mirrors coated with multi-layer films for receiving X-rays from the mask and directing them to the wafer to expose the wafer to the pattern of the mask with the X-ray in a reduced scale.
摘要翻译： X射线曝光装置包括：用于保持具有用于电路制造的图案的掩模的台，用于将要暴露于掩模的图案的晶片用X射线保持的晶片的台，以及设置在该掩模之间的反射减少成像系统掩模台和晶片台，包括反射镜装置，其包含涂覆有多层膜的至少三个但不多于五个的反射镜，用于从掩模接收X射线并将其引导到晶片以暴露晶片以减小的X射线的掩模图案。

6. 发明授权

US4856861A Light waveguide lens 失效
标题翻译：光波导透镜
公开(公告)号：US4856861A
公开(公告)日：1989-08-15
申请号：US058603
申请日：1987-06-04
申请人： Mamoru Miyawaki , Shigetaro Ogura , Kazuya Matsumoto
发明人： Mamoru Miyawaki , Shigetaro Ogura , Kazuya Matsumoto
IPC分类号： G02B6/124 , G02F1/01 , G02F1/015 , G02F1/025 , G02F1/035 , G02F1/055 , G02F1/295
CPC分类号： G02B6/1245 , G02F1/295 , G02F1/0147 , G02F1/025 , G02F1/035 , G02F1/055 , G02F2001/0154 , G02F2203/28
摘要： In a light waveguide lens comprises a light waveguide and a lens portion provided in a portion of the light waveguide, the refractive index of the light waveguide and/or the lens portion is variable to vary the focal length of the lens portion, thereby causing the waveguide light to be accurately converged at a predetermined position.
摘要翻译：在光波导透镜中包括光波导和设置在光波导的一部分中的透镜部分，光波导和/或透镜部分的折射率是可变的，以改变透镜部分的焦距，从而导致波导光准确地会聚到预定位置。

7. 发明授权

US06328865B2 Method for forming a thin film of a composite metal compound and apparatus for carrying out the method 有权
公开(公告)号：US06328865B2
公开(公告)日：2001-12-11
申请号：US09730564
申请日：2000-12-07
申请人： Shigeharu Matsumoto , Kazuo Kikuchi , Masafumi Yamasaki , Qi Tang , Shigetaro Ogura
发明人： Shigeharu Matsumoto , Kazuo Kikuchi , Masafumi Yamasaki , Qi Tang , Shigetaro Ogura
IPC分类号： C23C1400
CPC分类号： G02B1/12 , C23C14/0078 , C23C14/08 , C23C14/568 , Y10S118/90
摘要： There is disclosed a method and apparatus for forming a thin film of a composite metal compound. Independent targets formed of at least two different metals are sputtered so as to form on a substrate an ultra-thin film of a composite metal or an incompletely-reacted composite metal. The ultra-thin film is irradiated with the electrically neutral, activated species of a reactive gas so as to convert the composite metal or the incompletely-reacted composite metal to a composite metal compound through the reaction of the ultra-thin film with the activated species of the reactive gas. The formation of the ultra-thin film and the conversion to the composite metal compound are sequentially repeated so as to form on the substrate a thin film of the composite metal compound having a desired thickness.

8. 发明授权

US4531138A Liquid jet recording method and apparatus 失效
标题翻译：液体喷射记录方法和装置
公开(公告)号：US4531138A
公开(公告)日：1985-07-23
申请号：US562994
申请日：1983-12-16
申请人： Ichiro Endo , Shigetaro Ogura , Shigeru Ohno
发明人： Ichiro Endo , Shigetaro Ogura , Shigeru Ohno
IPC分类号： B41J2/045 , B41J2/055 , B41J2/14 , B41J2/16 , G01D15/18 , G01D15/10
CPC分类号： B41J2/14
摘要： A liquid jet recording method and apparatus for recording information on a recording medium. A laser beam is irradiated onto an opto-mechanical transducer provided at a position, in a liquid flow path having at its distal end a discharge orifice for ejecting liquid in a predetermined direction and a pressure acting zone, at which a pressure acts on the recording liquid filled in that portion of the flow path, where the pressure as generated is effectively transmitted to the recording liquid filled in the pressure acting zone. This enables the liquid to be ejected from the discharge orifice, by which laser beam irradiation mechanical displacement is caused to deform the wall of the pressure acting zone to thereby bring about abrupt pressure change in the liquid filled in the pressure acting zone to eject the liquid from the discharge orifice in the form of droplets which fly toward the surface of a recording medium, on which the droplets adhere to make a necessary recording.
摘要翻译：一种用于在记录介质上记录信息的液体喷射记录方法和装置。激光束被照射到设置在液体流动通道中的液体流动路径上的光学机械传感器上，该液体流动路径在其远端具有用于沿预定方向喷射液体的排出孔和压力作用区，液体填充在流路的该部分中，其中产生的压力被有效地传递到填充在压力作用区域中的记录液体。这使得液体能够从排出孔喷射，由此使激光束照射机械位移使压力作用区的壁变形，从而在填充在压力作用区域中的液体中引起突然的压力变化以喷射液体从出口孔以液滴的形式飞向记录介质的表面，液滴粘附在其上进行必要的记录。

9. 发明授权

US06207536B1 Method for forming a thin film of a composite metal compound and apparatus for carrying out the method 失效
公开(公告)号：US06207536B1
公开(公告)日：2001-03-27
申请号：US09092645
申请日：1998-06-09
申请人： Shigeharu Matsumoto , Kazuo Kikuchi , Masafumi Yamasaki , Qi Tang , Shigetaro Ogura
发明人： Shigeharu Matsumoto , Kazuo Kikuchi , Masafumi Yamasaki , Qi Tang , Shigetaro Ogura
IPC分类号： H01L2120
CPC分类号： G02B1/12 , C23C14/0078 , C23C14/08 , C23C14/568 , Y10S118/90
摘要： There is disclosed a method and apparatus for forming a thin film of a composite metal compound. Independent targets formed of at least two different metals are sputtered so as to form on a substrate an ultra-thin film of a composite metal or an incompletely-reacted composite metal. The ultra-thin film is irradiated with the electrically neutral, activated species of a reactive gas so as to convert the composite metal or the incompletely-reacted composite metal to a composite metal compound through the reaction of the ultra-thin film with the activated species of the reactive gas. The formation of the ultra-thin film and the conversion to the composite metal compound are sequentially repeated so as to form on the substrate a thin film of the composite metal compound having a desired thickness.

10. 发明授权

US4707059A Integrated optical circuit element and method of making the same 失效
标题翻译：集成光电路元件及其制造方法
公开(公告)号：US4707059A
公开(公告)日：1987-11-17
申请号：US565367
申请日：1983-12-27
申请人： Shigetaro Ogura , Yuichi Handa
发明人： Shigetaro Ogura , Yuichi Handa
IPC分类号： G02B6/13 , G02B6/124 , G02B6/12
CPC分类号： G02B6/124
摘要： This specification discloses an integrated optical circuit element comprising a substrate, a wave guide layer formed on the substrate and having a refractive index higher than that of the substrate, and a photocoupler which is a diffraction grating pattern formed in the wave guide layer and having the same refractive index as that of the substrate. The specification also discloses a method of making an integrated optical circuit element which comprises the steps of forming a mask of diffraction grating pattern on a substrate, forming a layer having a refractive index higher than that of the substrate in a portion of the substrate which is not covered by the mask, and removing the mask.
摘要翻译：本说明书公开了一种集成光电路元件，其包括基板，形成在基板上的折射率高于基板的波导层，以及作为在波导层中形成的衍射光栅图案的光电耦合器，与基板相同的折射率。该说明书还公开了一种制造集成光电路元件的方法，该方法包括以下步骤：在衬底上形成衍射光栅图案掩模，在衬底的一部分中形成折射率高于衬底的折射率层，不被掩模覆盖，并且去除掩模。

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