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1. 发明申请

WO2012169144A1 CONNECTOR 审中-公开
标题翻译：连接器
公开(公告)号：WO2012169144A1
公开(公告)日：2012-12-13
申请号：PCT/JP2012/003483
申请日：2012-05-29
申请人： YAZAKI CORPORATION , KOJIMA, Hiroshi , SAWADA, Tsutomu
发明人： KOJIMA, Hiroshi , SAWADA, Tsutomu
IPC分类号： H01R13/436 , H01R13/516 , B60L11/18
CPC分类号： H01R13/516 , B60L11/1818 , H01R13/4361 , H01R2201/26 , Y02T10/7005 , Y02T10/7072 , Y02T90/14
摘要： The connector (1) to be mated with a mating connector has a connector housing (3) receiving a terminal (24) and fixing members (29, 33) for fixing the terminal, (24) a case (2) receiving the connector housing (3), and an abutment member (41) vertically arranged in the case (2) so that the abutment member (41) is positioned at the end portion (3a) of the connector housing (3) away from the mating connector, and abutting on the fixing member (33) received in the end portion (3a) of the connector housing (3) so as to prevent the terminal (24) from moving in a longitudinal direction of the terminal. Thus, the connector (1) can reduce the number of parts and simplify structure thereof. Furthermore, the connector can be assembled and disassembled at short time.
摘要翻译：与配合连接器配合的连接器（1）具有接收端子（24）的连接器壳体（3）和用于固定端子的固定构件（29,33），（24）容纳连接器壳体（3）和垂直布置在所述壳体（2）中的抵接构件（41），使得所述抵接构件（41）位于所述连接器壳体（3）的远离所述配合连接器的端部（3a）处，以及抵靠在容纳在连接器壳体（3）的端部（3a）中的固定构件（33）上，以防止端子（24）在端子的纵向方向上移动。因此，连接器（1）可以减少部件的数量并简化其结构。此外，连接器可以在短时间内组装和拆卸。

2. 发明申请

WO2012160807A1 CONNECTOR 审中-公开
标题翻译：连接器
公开(公告)号：WO2012160807A1
公开(公告)日：2012-11-29
申请号：PCT/JP2012/003330
申请日：2012-05-22
申请人： YAZAKI CORPORATION , KOJIMA, Hiroshi , SAWADA, Tsutomu
发明人： KOJIMA, Hiroshi , SAWADA, Tsutomu
IPC分类号： H01R13/447 , H01R13/533 , H01R13/52
CPC分类号： H01R13/453 , B60L11/1818 , H01R13/447 , H01R13/5213 , H01R13/533 , H01R2201/26 , Y02T10/7005 , Y02T10/7072 , Y02T90/14
摘要： Problem To provide a connector of which cover is easily opened even when the cover is firmly fixed to a housing due to freezing, and cannot be opened by only biasing force of a spring. Means for solving problem A connector 1 includes: a housing 2; a cover 3 pivotally supported by the housing 2, and opening and closing openings 21a, 22a of the housing 2; and a lock 4 pivotally supported by the housing 2 and keeping the cover 3 covering the openings 21a, 22a by hooking on an edge 33 of the cover 3 covering the openings 21a, 22a. The lock 4 is provided with a base 40, a pushing claw 42, and a projection 43. The connector 1 is formed so that the edge 33 of the cover 3 positioned between the pushing claw 42 and the projection 43 is overlapped with a rotation track of the projection 43.
摘要翻译：问题为了提供一种连接器，即使盖子由于冻结被牢固地固定在壳体上也容易打开，并且不能仅通过弹簧的偏压力而被打开。解决问题的手段A连接器1包括：壳体2; 由壳体2枢转地支撑的盖3和壳体2的打开和关闭开口21a，22a; 以及由壳体2枢转地支撑并且通过钩住覆盖开口21a，22a的盖3的边缘33来保持覆盖开口21a，22a的盖3的锁4。锁4设置有基座40，推爪42和突起43.连接器1形成为使得位于推爪42和突起43之间的盖3的边缘33与旋转轨道重叠的突出部43。

3. 发明申请

WO2012144192A1 TERMINAL FITTING 审中-公开
标题翻译：端子接头
公开(公告)号：WO2012144192A1
公开(公告)日：2012-10-26
申请号：PCT/JP2012/002638
申请日：2012-04-17
申请人： YAZAKI CORPORATION , KOJIMA, Hiroshi , TSUKAMOTO, Takashi
发明人： KOJIMA, Hiroshi , TSUKAMOTO, Takashi
IPC分类号： H01R13/11 , H01R43/16
CPC分类号： H01R13/18 , H01R13/111 , H01R43/16
摘要： The present invention provides a terminal fitting that ensures constant contact load of an inserter that is inserted into an electrical contact by making uniform the amounts of displacement among a plurality of resilient pieces constituting the electrical contact. A terminal fitting 1, 1' includes a cylindrical electrical contact portion 2 obtained by making the both ends of the conductive metal plate close to each other and joined to each other. The electrical contact portion 2 includes a plurality of slits 20, 21, 22, 23, and 26 extending in a cylinder-length direction N and provided at intervals in the circumferential direction of the electrical contact portion 2. Out of the slits 20, 21, 22, 23, 26, the slits 23, 26 provided farthest away from the joining portion at the both ends of the metal plate have a size in the cylinder-length direction N larger than those of the other slits 20, 21, and 22.
摘要翻译：本发明提供了一种端子接头，其通过使构成电接触件的多个弹性件之间的位移量均匀地确保插入器插入器的接触负载的恒定。端子接头1,1'包括通过使导电金属板的两端彼此靠近并且彼此接合而获得的圆柱形电接触部分2。电接触部分2包括在气缸长度方向N上延伸并沿着电接触部分2的圆周方向间隔设置的多个缝隙20,21,22,23和26。在狭缝20,21中，22,23,26，在金属板的两端设置在距离接合部最远的狭缝23,26具有比其他狭缝20,21,22的筒体长度方向N大的尺寸。

4. 发明申请

WO2007032504A1 PHOTOMASK, PHOTOMASK MANUFACTURING METHOD, AND PHOTOMASK PROCESSING DEVICE 审中-公开
标题翻译：照相机，照相机制造方法和光电处理装置
公开(公告)号：WO2007032504A1
公开(公告)日：2007-03-22
申请号：PCT/JP2006/318440
申请日：2006-09-11
申请人： ASAHI GLASS COMPANY, LIMITED , IKUTA, Yoshiaki , KOJIMA, Hiroshi , OTSUKA, Kouji
发明人： IKUTA, Yoshiaki , KOJIMA, Hiroshi , OTSUKA, Kouji
IPC分类号： G03F1/14 , G03F7/20
CPC分类号： G03F7/707 , G03F1/60 , G03F7/703 , G03F7/70783
摘要： A photomask is manufactured by a method including providing a substrate having a surface on which a predetermined pattern is to be formed, positioning the substrate in an exposure tool so as to obtain an amount of deformation of the surface due to an external force imposed on the substrate, calculating a target profile of the surface, based on the amount of deformation and a target flatness of the surface, and processing the surface of the substrate so as to make the surface substantially flat when the substrate is positioned in the exposure tool.
摘要翻译：通过包括提供具有要在其上形成预定图案的表面的基板的方法制造光掩模，将基板定位在曝光工具中，以便获得由于施加在其上的外力而导致的表面的变形量基板，基于所述表面的变形量和目标平面度来计算所述表面的目标轮廓，以及当所述基板位于所述曝光工具中时，对所述基板的表面进行处理，以使所述表面基本上平坦。

5. 发明申请

WO2007072890A1 GLASS SUBSTRATE FOR MASK BLANK AND METHOD OF POLISHING FOR PRODUCING THE SAME 审中-公开
标题翻译：用于掩模布的玻璃基板和用于制造其的抛光方法
公开(公告)号：WO2007072890A1
公开(公告)日：2007-06-28
申请号：PCT/JP2006/325453
申请日：2006-12-14
申请人： ASAHI GLASS CO., LTD. , ITO, Masabumi , KOJIMA, Hiroshi
发明人： ITO, Masabumi , KOJIMA, Hiroshi
IPC分类号： B24B37/04 , C03C19/00 , G03F1/14
CPC分类号： B24B37/22 , B82Y10/00 , B82Y40/00 , C03C19/00 , C03C2204/08 , G03F1/24 , G03F1/60
摘要： The present invention aims at providing a glass substrate required to have a surface polished with extremely high accuracy as in glass substrates for reflective masks for use in EUVL; and a polishing method for producing the glass substrate. The present invention provides a glass substrate for mask blank, which is a glass substrate comprising SiO2 as a main component and having a polished main surface, wherein concave defects and convex defects on the main surface have a depth of 2 nm or smaller and a height of 2 nm or smaller, respectively, and have a half-value width of 60 nm or smaller, so that the concave defects and/or the convex defects do not cause phase defects when the glass substrate is used to produce a mask for exposure and the mask is used. Also disclosed are a polishing method for producing the glass substrate, and a mask blank and a mask for exposure using the glass substrate.
摘要翻译：本发明的目的在于提供一种玻璃基板，其具有以非常高的精度抛光的表面，如在用于EUVL的反射掩模的玻璃基板中; 以及用于制造玻璃基板的抛光方法。本发明提供了一种用于掩模坯料的玻璃基板，其是以SiO 2为主要成分并具有抛光主表面的玻璃基板，其中主表面上的凹陷缺陷和凸起缺陷具有2nm或更小的深度，分别为2nm以下，并且半值宽度为60nm以下，使得当使用玻璃基板制造用于曝光的掩模时，凹陷缺陷和/或凸起缺陷不会引起相位缺陷，并且使用面具。还公开了用于制造玻璃基板的抛光方法，以及掩模坯料和使用玻璃基板进行曝光的掩模。

6. 发明申请

WO2008152883A1 METHOD OF POLISHING GLASS SUBSTRATE 审中-公开
标题翻译：抛光玻璃基板的方法
公开(公告)号：WO2008152883A1
公开(公告)日：2008-12-18
申请号：PCT/JP2008/059100
申请日：2008-05-13
申请人： ASAHI GLASS CO., LTD. , KOJIMA, Hiroshi , ITO, Masabumi , TAKEMIYA, Satoshi
发明人： KOJIMA, Hiroshi , ITO, Masabumi , TAKEMIYA, Satoshi
IPC分类号： B24B37/04
CPC分类号： B24B37/042
摘要： The present invention is to provide a method of polishing a glass substrate required to have extremely high surface smoothness and surface accuracy like glass substrates for mask blanks. The invention relates to a method of polishing a glass substrate which comprises polishing the glass substrate with a polishing pad while supplying a polishing slurry comprising an abrasive material and water to the polishing pad, wherein the polishing slurry contains at least one member selected from the group consisting of pullulan and water-soluble alcohols which are polyvalent organic compounds having two or more OH groups. The slurry preferably has a pH adjusted to 0.5-4.
摘要翻译：本发明提供一种抛光玻璃基板的方法，该玻璃基板具有非常高的表面平滑度和表面精度，如掩模坯料的玻璃基板。本发明涉及一种抛光玻璃基板的方法，该方法包括在抛光垫上提供包含研磨材料和水的抛光浆料，同时抛光抛光垫玻璃基板，其中抛光浆料含有至少一种选自组由支链淀粉和水溶性醇组成，它们是具有两个或更多个OH基团的多价有机化合物。浆液的pH优选为0.5-4。

7. 发明申请

WO2009004852A1 METHOD FOR REMOVING FOREIGN MATTER FROM GLASS SUBSTRATE SURFACE AND METHOD FOR PROCESSING GLASS SUBSTRATE SURFACE 审中-公开
标题翻译：从玻璃基板表面去除外来物质的方法及处理玻璃基板表面的方法
公开(公告)号：WO2009004852A1
公开(公告)日：2009-01-08
申请号：PCT/JP2008/057553
申请日：2008-04-11
申请人： ASAHI GLASS CO., LTD. , ITO, Masabumi , OKAMURA, Kenji , KOJIMA, Hiroshi
发明人： ITO, Masabumi , OKAMURA, Kenji , KOJIMA, Hiroshi
IPC分类号： C03C15/02 , C03C23/00
CPC分类号： C03C15/02 , B82Y10/00 , B82Y40/00 , C03C23/0025 , C03C23/006 , C03C23/0075 , G03F1/24 , G03F1/82 , H01J2237/0812 , H01J2237/3151
摘要： An object of the invention is to provide a method for removing foreign matter from a glass substrate surface to be finish-processed by a method accompanied with beam irradiation or laser light irradiation on the glass substrate surface. The present invention relates to a method for removing foreign matter from a glass substrate surface, which includes subjecting the glass substrate surface to gas cluster ion beam etching at an accelerating voltage of from 5 to 15 keV.
摘要翻译：本发明的目的是提供一种通过伴随着在玻璃基板表面上的光束照射或激光照射的方法从待处理的玻璃基板表面去除异物的方法。本发明涉及一种从玻璃基板表面除去异物的方法，其包括以5至15keV的加速电压对玻璃基板表面进行气体簇离子束蚀刻。

8. 发明申请

WO2007119860A1 PROCESSING METHOD OF GLASS SUBSTRATE, AND HIGHLY FLAT AND HIGHLY SMOOTH GLASS SUBSTRATE 审中-公开
标题翻译：玻璃基板的加工方法，以及高平板和高平板玻璃基板
公开(公告)号：WO2007119860A1
公开(公告)日：2007-10-25
申请号：PCT/JP2007/058382
申请日：2007-04-11
申请人： ASAHI GLASS CO., LTD. , OTSUKA, Koji , KOJIMA, Hiroshi , ITO, Masabumi
发明人： OTSUKA, Koji , KOJIMA, Hiroshi , ITO, Masabumi
IPC分类号： C03C15/00 , C03C19/00 , C03C23/00
CPC分类号： C03C15/02 , B24B7/242 , B24B37/08 , C03C3/06 , C03C19/00 , C03C23/005 , C03C23/006 , C03C2201/42 , C03C2204/08 , Y10T428/24355
摘要： The present invention is to provide a processing method for manufacturing a highly flat and highly smooth glass substrate with good productivity. A highly flat and highly smooth glass substrate is obtained with good productivity by processing of a glass substrate, which comprises a step of measuring the surface shape of the glass substrate prior to processing, a step of processing the surface of the substrate by changing a processing condition for each site (first processing step), and a step of finish-polishing the surface of the glass substrate that has been subjected to the first processing step (second processing step). At that time, the processing condition for each site within the surface of the substrate in the first processing step is determined from a processing amount that is determined from the concave-convex shape of the surface of the glass substrate prior to processing and the in-plane distribution of a processing amount by the second processing step separately measured by using a similar substrate.
摘要翻译：本发明提供一种以高生产率制造高度平坦且高度光滑的玻璃基板的加工方法。通过处理玻璃基板，通过加工玻璃基板，以高生产率获得高度平坦且高度平滑的玻璃基板，其包括在处理之前测量玻璃基板的表面形状的步骤，通过改变处理来处理基板的表面的步骤（第一处理步骤），以及对经过第一处理步骤（第二处理步骤）的玻璃基板的表面进行精抛光的步骤。此时，根据从处理前的玻璃基板的表面的凹凸形状确定的处理量来确定第一处理工序中的基板的表面内的每个部位的处理条件，通过使用相似的基板分别测量的第二处理步骤的处理量的平面分布。

9. 发明申请

WO2007024016A1 SCHEDULING APPARATUS, SCHEDULING METHOD AND RECORDING MEDIUM 审中-公开
标题翻译：调度设备，调度方法和记录介质
公开(公告)号：WO2007024016A1
公开(公告)日：2007-03-01
申请号：PCT/JP2006/317154
申请日：2006-08-24
申请人： NS SOLUTIONS CORPORATION , KOJIMA, Hiroshi
发明人： KOJIMA, Hiroshi
IPC分类号： G06F19/00 , G06F9/44 , G06Q10/00
CPC分类号： G06Q10/109 , G06Q10/06311 , G06Q10/06313
摘要： Has a resource/period management part (23) for managing resource information relating to resources and period information relating to periods having a plurality of period units associated with each other by using a table, wherein the resource/period management part (23) executes allocation of a set of the resource information and the period information and a task to be processed based on constraint conditions.
摘要翻译：具有资源/周期管理部（23），用于通过使用表来管理与具有多个相关联的多个周期单元的周期有关的资源和周期信息的资源信息，其中，所述资源/周期管理部（23）执行分配一组资源信息和周期信息以及基于约束条件处理的任务。

10. 发明申请

WO2006082751A2 PROCESS FOR POLISHING GLASS SUBSTRATE 审中-公开
标题翻译：抛光玻璃基板的工艺
公开(公告)号：WO2006082751A2
公开(公告)日：2006-08-10
申请号：PCT/JP2006/301257
申请日：2006-01-20
申请人： ASAHI GLASS COMPANY, LIMITED , OTSUKA, Koji , ITO, Masabumi , KOJIMA, Hiroshi
发明人： OTSUKA, Koji , ITO, Masabumi , KOJIMA, Hiroshi
CPC分类号： C03C15/02 , C03C19/00 , C03C2204/08
摘要： A process for polishing a glass substrate, which enables to polish a glass substrate having a large waviness formed by mechanical polishing, to have a surface excellent in flatness, is provided. A process for polishing a glass substrate, comprising a step of measuring the surface profile of a mechanically polished glass substrate to identify the width of waviness present in the glass substrate, and a step of applying dry etching using a beam having a beam size in FWHM (full width of half maximum) value of at most the above size of waviness, to polish the surface of the glass substrate.
摘要翻译：提供了一种用于抛光玻璃基板的方法，该玻璃基板能够研磨通过机械抛光形成的具有大波纹度的玻璃基板以具有优异的平面度的表面。一种用于抛光玻璃基板的方法，包括测量机械抛光的玻璃基板的表面轮廓以识别玻璃基板中存在的波纹宽度的步骤，以及使用在FWHM中具有光束尺寸的光束进行干蚀刻的步骤（全宽半高）值至多为上述大小的波纹，以研磨玻璃基板的表面。

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