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1. 发明申请

US20120034845A1 TECHNIQUES FOR MATCHING MEASURED SPECTRA TO REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING 审中-公开
标题翻译：将测量光谱匹配到用于现场光学监测的参考光谱的技术
公开(公告)号：US20120034845A1
公开(公告)日：2012-02-09
申请号：US13198635
申请日：2011-08-04
申请人： Xiaoyuan Hu , Zhihong Wang , Harry Q. Lee , Zhize Zhu , Jeffrey Drue David , Dominic J. Benvegnu , Jimin Zhang , Wen-Chiang Tu
发明人： Xiaoyuan Hu , Zhihong Wang , Harry Q. Lee , Zhize Zhu , Jeffrey Drue David , Dominic J. Benvegnu , Jimin Zhang , Wen-Chiang Tu
IPC分类号： B24B49/00 , B24B51/00
CPC分类号： B24B37/013 , B24B37/042 , B24B37/107 , B24B37/205 , B24B49/045 , B24B49/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum using a matching technique other than sum of squared differences to generate a sequence of best matching reference spectra, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of best matching reference spectra. Finding a best matching reference spectrum may include performing a cross-correlation of the measured spectrum with each of two or more of the plurality of reference spectra from the library and selecting a reference spectrum with the greatest correlation to the measured spectrum as a best matching reference spectrum.
摘要翻译：控制抛光的方法包括：存储具有多个参考光谱的库，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，对于光谱序列的每个测量光谱，使用除了平方差的和以产生最佳匹配参考光谱的序列之外的匹配技术，以及基于最佳匹配参考光谱的序列来确定抛光终点或抛光速率的调整中的至少一个。找到最佳匹配的参考光谱可以包括执行所测量的光谱与来自文库的多个参考光谱中的两个或更多个的互相关，并且选择与所测量的光谱具有最大相关性的参考光谱作为最佳匹配参考光谱。

2. 发明授权

US08755928B2 Automatic selection of reference spectra library 有权
标题翻译：自动选择参考光谱库
公开(公告)号：US08755928B2
公开(公告)日：2014-06-17
申请号：US13095802
申请日：2011-04-27
申请人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
发明人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
IPC分类号： G06F19/24
CPC分类号： B24B37/013 , B24B37/042 , B24B49/05 , B24B49/12 , G01J3/28
摘要： A computer-implemented method of generating reference spectra includes polishing a plurality of set-up substrates, the plurality of set-up substrates comprising at least three set-up substrates, measuring a sequence of spectra from each of the plurality of set-up substrates during polishing with an in-situ optical monitoring system to provide a plurality of sequences of spectra, generating a plurality of sequences of potential reference spectra from the plurality of sequences of spectra, determining which sequence of potential reference spectra of the plurality of sequences provides a best match to remaining sequences of the plurality of sequences, and storing the sequence of potential reference spectra determined to provide the best match as reference spectra, and selecting and storing the sequence of potential reference spectra.
摘要翻译：计算机实现的产生参考光谱的方法包括抛光多个设置基板，所述多个设置基板包括至少三个设置基板，测量来自多个设置基板中的每一个的光谱序列在用原位光学监测系统进行抛光时提供多个光谱序列，从多个光谱序列产生多个潜在参考光谱序列，确定多个序列中的哪个潜在参考光谱序列提供一个最佳匹配多个序列的剩余序列，并存储确定为提供最佳匹配的参考光谱序列作为参考光谱，以及选择和存储潜在参考光谱序列。

3. 发明申请

US20120276814A1 AUTOMATIC SELECTION OF REFERENCE SPECTRA LIBRARY 有权
标题翻译：自动选择参考光谱库
公开(公告)号：US20120276814A1
公开(公告)日：2012-11-01
申请号：US13095802
申请日：2011-04-27
申请人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
发明人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Jeffrey Drue David , Boguslaw A. Swedek , Dominic J. Benvegnu
IPC分类号： B24B51/00
CPC分类号： B24B37/013 , B24B37/042 , B24B49/05 , B24B49/12 , G01J3/28
摘要： A computer-implemented method of generating reference spectra includes polishing a plurality of set-up substrates, the plurality of set-up substrates comprising at least three set-up substrates, measuring a sequence of spectra from each of the plurality of set-up substrates during polishing with an in-situ optical monitoring system to provide a plurality of sequences of spectra, generating a plurality of sequences of potential reference spectra from the plurality of sequences of spectra, determining which sequence of potential reference spectra of the plurality of sequences provides a best match to remaining sequences of the plurality of sequences, and storing the sequence of potential reference spectra determined to provide the best match as reference spectra, and selecting and storing the sequence of potential reference spectra.
摘要翻译：产生参考光谱的计算机实现的方法包括抛光多个设置基板，所述多个设置基板包括至少三个设置基板，测量来自多个设置基板中的每一个的光谱序列在用原位光学监测系统进行抛光时提供多个光谱序列，从多个光谱序列产生多个潜在参考光谱序列，确定多个序列中的哪个潜在参考光谱序列提供一个最佳匹配多个序列的剩余序列，并存储确定为提供最佳匹配的参考光谱序列作为参考光谱，以及选择和存储潜在参考光谱序列。

4. 发明申请

US20120034844A1 SPECTROGRAPHIC MONITORING USING INDEX TRACKING AFTER DETECTION OF LAYER CLEARING 审中-公开
标题翻译：检测层清除后使用索引跟踪进行光谱监测
公开(公告)号：US20120034844A1
公开(公告)日：2012-02-09
申请号：US12851467
申请日：2010-08-05
申请人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
发明人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
IPC分类号： B24B49/12
CPC分类号： B24B37/042 , B24B37/013 , B24B49/12
摘要： A method of controlling polishing includes storing a library having a plurality of reference spectra, each reference spectrum of the plurality of reference spectra having a stored associated index value, polishing a substrate having a second layer overlying a first layer, measuring a sequence of spectra of light from the substrate during polishing, for each measured spectrum of the sequence of spectra, finding a best matching reference spectrum to generate a sequence of best matching reference spectra, determining the associated index value for each best matching spectrum from the sequence of best matching reference spectra to generate a sequence of index values, detecting exposure of the first layer, fitting a function to a portion of the sequence of index values corresponding to spectra measured after detection of exposure of the first layer, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the function.
摘要翻译：控制抛光的方法包括存储具有多个参考光谱的库，多个参考光谱的每个参考光谱具有存储的相关索引值，抛光具有覆盖第一层的第二层的衬底，测量第对于光谱序列的每个测量光谱，找到最佳匹配参考光谱以产生最佳匹配参考光谱序列，从最佳匹配参考序列确定每个最佳匹配光谱的相关索引值光谱以产生索引值序列，检测第一层的曝光，将功能拟合到对应于在检测到第一层的曝光之后测量的光谱的索引值序列的一部分，以及确定抛光终点中的至少一个或基于该功能的抛光速率的调整。

5. 发明授权

US09296084B2 Polishing control using weighting with default sequence 有权
标题翻译：使用默认序列加权抛光控制
公开(公告)号：US09296084B2
公开(公告)日：2016-03-29
申请号：US13553038
申请日：2012-07-19
申请人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
发明人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
IPC分类号： B24B37/013 , B24B37/10 , B24B49/12
CPC分类号： B24B37/013 , B24B37/105 , B24B49/12
摘要： A method of controlling polishing includes storing a sequence of default values, polishing a substrate, monitoring the substrate during polishing with an in-situ monitoring system, generating a sequence of measured values from measurements from the in-situ monitoring system, combining the sequence of measured values with the sequence of default values to generate a sequence of modified values, fitting a function to the sequence of modified values, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the function.
摘要翻译：控制抛光的方法包括存储默认值序列，抛光衬底，用原位监测系统在抛光期间监测衬底，从原位监测系统的测量产生测量值序列，将序列测量值与默认值序列以生成修改值序列，将功能拟合到修改值序列，以及基于该函数确定抛光终点或抛光速率调整中的至少一个。

6. 发明授权

US09248544B2 Endpoint detection during polishing using integrated differential intensity 有权
标题翻译：使用积分差分强度的抛光期间的端点检测
公开(公告)号：US09248544B2
公开(公告)日：2016-02-02
申请号：US13552317
申请日：2012-07-18
申请人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Wen-Chiang Tu
发明人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Wen-Chiang Tu
IPC分类号： B24B37/013 , B24B37/04 , H01L21/66 , B24B49/12 , B24B37/10
CPC分类号： B24B37/013 , B24B37/042 , B24B37/105 , B24B49/12 , H01L22/12 , H01L22/26
摘要： A method of controlling a polishing operation includes polishing a substrate, during polishing obtaining a sequence over time of measured spectra from the substrate with an in-situ optical monitoring system, for each measured spectrum from the sequence of measured spectra determining a difference between the measured spectrum and an immediate previous spectrum from the sequence, accumulating the difference for each measured spectrum to generate a total difference, comparing the total difference to a threshold, and detecting a polishing endpoint based on the comparison of the total difference to the threshold.
摘要翻译：一种控制抛光操作的方法包括：在抛光过程中，利用原位光学监测系统从基板测量的光谱中获得随时间变化的序列，从测量光谱序列测得的每个测量光谱，从而确定基板的测量值频谱和来自序列的立即上一个频谱，累积每个测量频谱的差以产生总差，将总差与阈值进行比较，以及基于总差与阈值的比较来检测抛光端点。

7. 发明申请

US20140024292A1 Polishing Control Using Weighting With Default Sequence 有权
标题翻译：抛光控制使用加权默认序列
公开(公告)号：US20140024292A1
公开(公告)日：2014-01-23
申请号：US13553038
申请日：2012-07-19
申请人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
发明人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
IPC分类号： B24B37/005
CPC分类号： B24B37/013 , B24B37/105 , B24B49/12
摘要： A method of controlling polishing includes storing a sequence of default values, polishing a substrate, monitoring the substrate during polishing with an in-situ monitoring system, generating a sequence of measured values from measurements from the in-situ monitoring system, combining the sequence of measured values with the sequence of default values to generate a sequence of modified values, fitting a function to the sequence of modified values, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the function.
摘要翻译：控制抛光的方法包括存储默认值序列，抛光衬底，用原位监测系统在抛光期间监测衬底，从原位监测系统的测量产生测量值序列，将序列测量值与默认值序列以生成修改值序列，将功能拟合到修改值序列，以及基于该函数确定抛光终点或抛光速率调整中的至少一个。

8. 发明申请

US20120100781A1 MULTIPLE MATCHING REFERENCE SPECTRA FOR IN-SITU OPTICAL MONITORING 审中-公开
标题翻译：用于现场光学监测的多重匹配参考光谱
公开(公告)号：US20120100781A1
公开(公告)日：2012-04-26
申请号：US13271023
申请日：2011-10-11
申请人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
发明人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
IPC分类号： B24B49/12
CPC分类号： B24B37/013 , B24B49/12
摘要： A method of controlling polishing includes storing a plurality libraries, each library including a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, and for each measured spectrum of the sequence of spectra, finding a best matching first reference spectrum from a first library from the plurality of libraries and finding a best matching second reference spectrum from a different second library from the plurality of libraries, determining a first value associated with the best matching first reference spectrum and determining a second value from the best matching second reference spectrum, and calculating a third value from the first value and the second value to generate a sequence of calculated third values. At least one of a polishing endpoint or an adjustment for a polishing rate can be determined based on the sequence of calculated third values.
摘要翻译：控制抛光的方法包括存储多个库，每个库包括多个参考光谱，抛光衬底，在抛光期间测量来自衬底的光的光谱序列，以及对于光谱序列的每个测量光谱，找到从来自多个库的第一库中最佳匹配第一参考频谱，并从多个库中找到来自不同第二库的最佳匹配的第二参考频谱，确定与最佳匹配的第一参考频谱相关联的第一值并确定第二值并且从第一值和第二值计算第三值以生成计算出的第三值的序列。可以基于计算的第三值的顺序来确定抛光终点或抛光速率的调整中的至少一个。

9. 发明授权

US08860932B2 Detection of layer clearing using spectral monitoring 有权
标题翻译：使用光谱监测检测层清除
公开(公告)号：US08860932B2
公开(公告)日：2014-10-14
申请号：US13189277
申请日：2011-07-22
申请人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
发明人： Jimin Zhang , Zhihong Wang , Harry Q. Lee , Wen-Chiang Tu
IPC分类号： G01N21/00 , G01J3/00 , B24B37/04 , H01L21/66 , B24B37/013 , G01B11/06 , H01L21/321
CPC分类号： B24B37/013 , B24B37/042 , G01B11/0633 , G01B11/0683 , H01L21/3212 , H01L22/12 , H01L22/26
摘要： A method of polishing includes polishing a substrate having a second layer overlying a first layer, measuring a sequence of groups of spectra of light from the substrate while the substrate is being polished, each group of the groups of spectra including spectra from different locations on the substrate, for each group, calculating a value for a dispersion parameter of the spectra in the group to generate a sequence of dispersion values, and detecting exposure of the first layer based on the sequence of dispersion values.
摘要翻译：抛光方法包括抛光具有覆盖在第一层上的第二层的衬底，在衬底被抛光时测量来自衬底的光的光谱组序列，每组光谱组包括来自不同位置的光谱基板，对于每个组，计算组中的光谱的色散参数的值以产生色散值序列，并且基于色散值序列来检测第一层的曝光。

10. 发明申请

US20140024291A1 Endpoint Detection During Polishing Using Integrated Differential Intensity 有权
标题翻译：使用积分微分强度进行抛光时的端点检测
公开(公告)号：US20140024291A1
公开(公告)日：2014-01-23
申请号：US13552317
申请日：2012-07-18
申请人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Wen-Chiang Tu
发明人： Jimin Zhang , Harry Q. Lee , Zhihong Wang , Wen-Chiang Tu
IPC分类号： B24B49/12 , B24B7/00
CPC分类号： B24B37/013 , B24B37/042 , B24B37/105 , B24B49/12 , H01L22/12 , H01L22/26
摘要： A method of controlling a polishing operation includes polishing a substrate, during polishing obtaining a sequence over time of measured spectra from the substrate with an in-situ optical monitoring system, for each measured spectrum from the sequence of measured spectra determining a difference between the measured spectrum and an immediate previous spectrum from the sequence, accumulating the difference for each measured spectrum to generate a total difference, comparing the total difference to a threshold, and detecting a polishing endpoint based on the comparison of the total difference to the threshold.
摘要翻译：一种控制抛光操作的方法包括：在抛光过程中，利用原位光学监测系统从基板测量的光谱中获得随时间变化的序列，从测量光谱序列测得的每个测量光谱，从而确定基板的测量值频谱和来自序列的立即上一个频谱，累积每个测量频谱的差以产生总差，将总差与阈值进行比较，以及基于总差与阈值的比较来检测抛光端点。

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