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1. 发明授权

US06326326B1 Surface functionalized mesoporous material and method of making same 失效
标题翻译：表面官能化介孔材料及其制备方法
公开(公告)号：US06326326B1
公开(公告)日：2001-12-04
申请号：US09020028
申请日：1998-02-06
申请人： Xiangdong Feng , Jun Liu , Glen E. Fryxell
发明人： Xiangdong Feng , Jun Liu , Glen E. Fryxell
IPC分类号： B01J2904
CPC分类号： B01J20/28021 , B01J20/0211 , B01J20/103 , B01J20/28057 , B01J20/28083 , B01J20/2809 , B01J20/28097 , B01J20/3204 , B01J20/3219 , B01J20/3234 , B01J20/3236 , B01J20/3248 , B01J20/3251 , B01J20/3253 , B01J20/3255 , B01J20/3257 , B01J20/3259 , B01J20/3265 , B01J20/3268 , B01J20/3282 , B01J20/3285 , B01J20/3289 , B01J21/08 , B01J29/035 , B01J31/1633 , B01J31/1805 , B01J31/24 , B01J35/023 , B01J35/1061 , B01J35/1071 , B01J2531/26 , B01J2531/38 , B01J2531/62 , B01J2531/845 , B01J2531/847 , B82Y30/00 , C02F2103/365 , C02F2209/40 , C02F2209/42
摘要： According to the present invention, an organized assembly of functional molecules with specific interfacial functionality (functional group(s)) is attached to available surfaces including within mesopores of a mesoporous material. The method of the present invention avoids the standard base soak that would digest the walls between the mesopores by boiling the mesoporous material in water for surface preparation then removing all but one or two layers of water molecules on the internal surface of a pore. Suitable functional molecule precursor is then applied to permeate the hydrated pores and the precursor then undergoes condensation to form the functional molecules on the interior surface(s) of the pore(s).
摘要翻译：根据本发明，具有特定界面官能团（官能团）的功能分子的有组织的组件附着在包括介孔材料的介孔内的可用表面上。本发明的方法避免了通过在水中沸腾介孔材料进行表面处理而消除孔隙之间的壁的标准基底浸泡，然后除去孔的内表面上除了一层或两层水分子。然后施加合适的功能分子前体以渗透水合孔，然后前体进行缩合以在孔的内表面上形成功能分子。

2. 发明授权

US06846554B2 Self-assembled monolayer and method of making 失效
标题翻译：自组装单层和制作方法
公开(公告)号：US06846554B2
公开(公告)日：2005-01-25
申请号：US10347042
申请日：2003-01-17
申请人： Glen E. Fryxell , Thomas S. Zemanian , Jun Liu , Yongsoon Shin
发明人： Glen E. Fryxell , Thomas S. Zemanian , Jun Liu , Yongsoon Shin
IPC分类号： B01J29/03 , B01J29/06 , B01J29/70 , B01J29/80 , B01J31/02 , B01J35/00 , B01J37/00 , B32B3/06
CPC分类号： B01J35/002 , B01J29/0308 , B01J29/06 , B01J29/70 , B01J29/7007 , B01J29/80 , B01J31/0274 , B01J37/00 , B01J2229/12 , B01J2229/32 , B82Y30/00 , B82Y40/00 , Y10T428/249955 , Y10T428/249956 , Y10T428/249969 , Y10T428/261 , Y10T428/2995 , Y10T428/2996 , Y10T428/31663
摘要： According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.
摘要翻译：根据本发明，在基板上具有自组装单层的先前已知的功能材料具有多个组装分子，每个组装分子具有多个结合位置的组装原子（当硅是组装分子时的四个位置），其中键合完全结合的组装原子（多个与氧原子结合的键合位置）的分数（或分数）在通过液体溶液沉积制备时具有最大值，例如当硅是组装分子时最大为40％，最大表面密度的组装分子是每平方毫米5硅烷。注意，结合分数和表面总体数是独立的参数。本发明的方法是对已知的在基材上制备硅氧烷层的方法的改进，其中代替液相溶液化学，改进是超临界相化学。本发明具有氧键分数更高，组装分子表面密度更大，反应时间缩短约5分钟至约24小时的优点。

3. 发明授权

US06383466B1 Method of dehydroxylating a hydroxylated material and method of making a mesoporous film 失效
标题翻译：脱羟基化羟基化材料的方法和制备介孔膜的方法
公开(公告)号：US06383466B1
公开(公告)日：2002-05-07
申请号：US09222569
申请日：1998-12-28
申请人： Karel Domansky , Glen E. Fryxell , Jun Liu , Nathan J. Kohler , Suresh Baskaran
发明人： Karel Domansky , Glen E. Fryxell , Jun Liu , Nathan J. Kohler , Suresh Baskaran
IPC分类号： C01B33159
CPC分类号： C01B37/02 , H01L21/31695
摘要： The present invention is a method of dehydroxylating a silica surface that is hydroxylated having the steps of exposing the silica surface separately to a silicon organic compound and a dehydroxylating gas. Exposure to the silicon organic compound can be in liquid, gas or solution phase, and exposure to a dehydroxylating gas is typically at elevated temperatures. In one embodiment, the improvement of the dehydroxylation procedure is the repetition of the soaking and dehydroxylating gas exposure. In another embodiment, the improvement is the use of an inert gas that is substantially free of hydrogen. In yet another embodiment, the present invention is the combination of the two-step dehydroxylation method with a surfactant templating method of making a mesoporous film.
摘要翻译：本发明是一种将羟基化的二氧化硅表面脱羟基化的方法，其具有将二氧化硅表面分别暴露于硅有机化合物和脱羟基化气体的步骤。暴露于硅有机化合物可以是液体，气体或溶液相，并且暴露于脱羟基化气体通常处于升高的温度。在一个实施方案中，脱羟基化程序的改进是重复浸泡和脱羟基化气体暴露。在另一个实施方案中，改进是使用基本上不含氢的惰性气体。在另一个实施方案中，本发明是两步脱羟基化方法与制备介孔膜的表面活性剂模板法的组合。

4. 发明授权

US06733835B2 Self-assembled monolayer and method of making 有权
标题翻译：自组装单层和制作方法
公开(公告)号：US06733835B2
公开(公告)日：2004-05-11
申请号：US10347040
申请日：2003-01-17
申请人： Glen E. Fryxell , Thomas S. Zemanian , Jun Liu , Yongsoon Shin
发明人： Glen E. Fryxell , Thomas S. Zemanian , Jun Liu , Yongsoon Shin
IPC分类号： B05D300
CPC分类号： B01J35/002 , B01J29/0308 , B01J29/06 , B01J29/70 , B01J29/7007 , B01J29/80 , B01J31/0274 , B01J37/00 , B01J2229/12 , B01J2229/32 , B82Y30/00 , B82Y40/00 , Y10T428/249955 , Y10T428/249956 , Y10T428/249969 , Y10T428/261 , Y10T428/2995 , Y10T428/2996 , Y10T428/31663
摘要： According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.
摘要翻译：根据本发明，在衬底上具有自组装单层的先前已知的功能材料具有多个组装分子，每个组装分子具有多个结合位置的组装原子（当硅是组装分子时的四个位置），其中键合完全结合的组装原子（多个与氧原子结合的键合位置）的分数（或分数）在通过液体溶液沉积制备时具有最大值，例如当硅是组装分子时最大为40％，最大表面密度的组装分子是每平方毫米5硅烷。注意，结合分数和表面总体数是独立的参数。本发明的方法是对已知的在基材上制备硅氧烷层的方法的改进，其中代替液相溶液化学，改进是超临界相化学。本发明具有氧键分数更高，组装分子表面密度更大，反应时间缩短约5分钟至约24小时的优点。

5. 发明授权

US07629028B2 Methods of making monolayers 失效
公开(公告)号：US07629028B2
公开(公告)日：2009-12-08
申请号：US10607870
申请日：2003-06-27
申请人： Kentin L. Alford , Kevin L. Simmons , William D. Samuels , Thomas S. Zemanian , Jun Liu , Yongsoon Shin , Glen E. Fryxell
发明人： Kentin L. Alford , Kevin L. Simmons , William D. Samuels , Thomas S. Zemanian , Jun Liu , Yongsoon Shin , Glen E. Fryxell
IPC分类号： B05D3/04
CPC分类号： B82Y30/00 , B01J29/0308 , B01J29/06 , B01J29/70 , B01J29/7007 , B01J29/80 , B01J31/0274 , B01J37/00 , B01J2229/32 , B05D1/185 , B05D1/60 , B82Y40/00 , Y10T428/249969 , Y10T428/254 , Y10T428/2995
摘要： The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.

6. 发明授权

US07588798B2 Methods of making monolayers 失效
标题翻译：制备单层膜的方法
公开(公告)号：US07588798B2
公开(公告)日：2009-09-15
申请号：US11433315
申请日：2006-05-11
申请人： Kentin L. Alford , Kevin L. Simmons , William D. Samuels , Thomas S. Zemanian , Jun Liu , Yongsoon Shin , Glen E. Fryxell
发明人： Kentin L. Alford , Kevin L. Simmons , William D. Samuels , Thomas S. Zemanian , Jun Liu , Yongsoon Shin , Glen E. Fryxell
IPC分类号： B05D3/04
CPC分类号： B82Y30/00 , B01J29/0308 , B01J29/06 , B01J29/70 , B01J29/7007 , B01J29/80 , B01J31/0274 , B01J37/00 , B01J2229/32 , B05D1/185 , B05D1/60 , B82Y40/00 , Y10T428/249969 , Y10T428/254 , Y10T428/2995
摘要： The invention pertains to methods of forming monolayers on various surfaces. The surfaces can be selected from a wide array of materials, including, for example, aluminum dioxide, silicon dioxide, carbon and SiC. The substrates can be planar or porous. The monolayer is formed under enhanced pressure conditions. The monolayer contains functionalized molecules, and accordingly functionalizes a surface of the substrate. The properties of the functionalized substrate can enhance the substrate's applicability for numerous purposes including, for example, utilization in extracting contaminants, or incorporation into a polymeric matrix.
摘要翻译：本发明涉及在各种表面上形成单层的方法。表面可以从广泛的材料中选出，包括例如二氧化铝，二氧化硅，碳和SiC。基底可以是平面的或多孔的。单层在增强的压力条件下形成。单层含有官能化分子，因此功能化了基材的表面。功能化底物的性质可以增强底物适用于许多目的，包括例如在提取污染物中的利用或掺入聚合物基质中。

7. 发明授权

US06531224B1 Self-assembled monolayer and method of making 有权
公开(公告)号：US06531224B1
公开(公告)日：2003-03-11
申请号：US09528345
申请日：2000-03-17
申请人： Glen E. Fryxell , Thomas S. Zemanian , Jun Liu , Yongsoon Shin
发明人： Glen E. Fryxell , Thomas S. Zemanian , Jun Liu , Yongsoon Shin
IPC分类号： B32B516
CPC分类号： B01J35/002 , B01J29/0308 , B01J29/06 , B01J29/70 , B01J29/7007 , B01J29/80 , B01J31/0274 , B01J37/00 , B01J2229/12 , B01J2229/32 , B82Y30/00 , B82Y40/00 , Y10T428/249955 , Y10T428/249956 , Y10T428/249969 , Y10T428/261 , Y10T428/2995 , Y10T428/2996 , Y10T428/31663
摘要： According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.

8. 发明授权

US06753038B2 Self-assembled monolayer and method of making 失效
公开(公告)号：US06753038B2
公开(公告)日：2004-06-22
申请号：US10346866
申请日：2003-01-17
申请人： Glen E. Fryxell , Thomas S. Zemanian , Jun Liu , Yongsoon Shin
发明人： Glen E. Fryxell , Thomas S. Zemanian , Jun Liu , Yongsoon Shin
IPC分类号： B05D310
CPC分类号： B01J35/002 , B01J29/0308 , B01J29/06 , B01J29/70 , B01J29/7007 , B01J29/80 , B01J31/0274 , B01J37/00 , B01J2229/12 , B01J2229/32 , B82Y30/00 , B82Y40/00 , Y10T428/249955 , Y10T428/249956 , Y10T428/249969 , Y10T428/261 , Y10T428/2995 , Y10T428/2996 , Y10T428/31663
摘要： According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry. The present invention has the advantages of greater fraction of oxygen bonds, greater surface density of assembly molecules and reduced time for reaction of about 5 minutes to about 24 hours.

9. 发明授权

US06329017B1 Mesoporous silica film from a solution containing a surfactant and methods of making same 失效
标题翻译：介孔二氧化硅薄膜由含有表面活性剂的溶液及其制备方法
公开(公告)号：US06329017B1
公开(公告)日：2001-12-11
申请号：US09413062
申请日：1999-10-04
申请人： Jun Liu , Karel Domansky , Xiaohong Li , Glen E. Fryxell , Suresh Baskaran , Nathan J. Kohler , Suntharampillai Thevuthasan , Christopher A. Coyle , Jerome C. Birnbaum
发明人： Jun Liu , Karel Domansky , Xiaohong Li , Glen E. Fryxell , Suresh Baskaran , Nathan J. Kohler , Suntharampillai Thevuthasan , Christopher A. Coyle , Jerome C. Birnbaum
IPC分类号： B05D312
CPC分类号： C01B37/02 , H01L21/31695 , Y10T428/249969 , Y10T428/249972
摘要： The present invention is a mesoporous silica film having a low dielectric constant and method of making having the steps of combining a surfactant in a silica precursor solution, spin-coating a film from this solution mixture, forming a partially hydroxylated mesoporous film, and dehydroxylating the hydroxylated film to obtain the mesoporous film. It is advantageous that the small polyoxyethylene ether surfactants used in spin-coated films as described in the present invention will result in fine pores smaller on average than about 20 nm. The resulting mesoporous film has a dielectric constant less than 3, which is stable in moist air with a specific humidity. The present invention provides a method for superior control of film thickness and thickness uniformity over a coated wafer, and films with low dielectric constant.
摘要翻译：本发明是具有低介电常数的介孔二氧化硅薄膜及其制造方法，其具有以下步骤：在二氧化硅前体溶液中混合表面活性剂，从该溶液混合物中旋涂薄膜，形成部分羟基化介孔薄膜，并使羟基化膜得到介孔膜。在本发明中所述的旋转涂膜中使用的小聚氧乙烯醚表面活性剂的优点是平均产生比20nm小的细孔。得到的介孔膜的介电常数小于3，在湿度相对湿度的空气中稳定。本发明提供了一种用于在涂覆的晶片上优良控制膜厚度和厚度均匀性的方法以及具有低介电常数的膜。

10. 发明授权

US07691637B2 Method and apparatus for ion sequestration and a nanostructured metal phosphate 失效
标题翻译：用于离子螯合的方法和装置以及纳米结构的金属磷酸盐
公开(公告)号：US07691637B2
公开(公告)日：2010-04-06
申请号：US11195394
申请日：2005-08-01
申请人： Shas V. Mattigod , Glen E. Fryxell , Xiaohong Li , Kent E. Parker , Dawn M. Wellman
发明人： Shas V. Mattigod , Glen E. Fryxell , Xiaohong Li , Kent E. Parker , Dawn M. Wellman
IPC分类号： G01N33/20
CPC分类号： C01B25/37 , B01D15/00 , B01J20/0207 , B01J20/0214 , B01J20/0248 , B01J20/0251 , B01J20/0292 , B01J20/28007 , B01J27/1813 , B01J29/84 , B01J35/1061 , B82Y30/00 , C02F1/288 , C02F2305/08 , Y10S977/902
摘要： A nanostructured substance, a process for sequestration of ionic waste, and an ion-sequestration apparatus are disclosed in the specification. The nanostructured substance can comprise a Lewis acid transition metal bound to a phosphate, wherein the phosphate comprises a primary structural component of the substance and the Lewis acid transition metal is a reducing agent. The nanostructured substance has a Brunner-Emmet-Teller (BET) surface area greater than or equal to approximately 100 m2/g, and a distribution coefficient for an analyte, Kd, greater than or equal to approximately 5000 ml/g. The process can comprise contacting a fluid and a nanostructured metal phosphate. The apparatus can comprise a vessel and a nanostructured metal phosphate. The vessel defines a volume wherein a fluid contacts the nanostructured metal phosphate.
摘要翻译：在说明书中公开了纳米结构物质，离子废物的螯合方法和离子螯合装置。纳米结构物质可以包含与磷酸盐结合的路易斯酸过渡金属，其中磷酸盐包括物质的主要结构成分，路易斯酸过渡金属是还原剂。纳米结构物质具有大于或等于约100m 2 / g的Brunner-Emmet-Teller（BET）表面积，分析物的分布系数Kd大于或等于约5000ml / g。该方法可以包括使流体和纳米结构的金属磷酸盐接触。该装置可以包括容器和纳米结构的金属磷酸盐。容器限定了其中流体接触纳米结构的金属磷酸盐的体积。

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