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1. 发明申请

US20100248145A1 SELF-FORMING TOP ANTI-REFLECTIVE COATING COMPOSITIONS AND, PHOTORESIST MIXTURES AND METHOD OF IMAGING USING SAME 有权
标题翻译：自形成顶部防反射涂料组合物和光刻胶混合物及其成像方法
公开(公告)号：US20100248145A1
公开(公告)日：2010-09-30
申请号：US12409738
申请日：2009-03-24
申请人： Wu-Song Huang , Irene Popova , Pushkara Rao Varanasi , Libor Vyklicky
发明人： Wu-Song Huang , Irene Popova , Pushkara Rao Varanasi , Libor Vyklicky
IPC分类号： G03F7/20 , C08L33/04 , G03F7/039
CPC分类号： C08F212/34 , C08F212/32 , C08F220/22 , C08F220/26 , C08F220/28 , G03F7/0046 , G03F7/0392 , G03F7/091
摘要： A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.
摘要翻译：物质的组成。物质的组成包括具有乙烯主链并包含具有芳族部分的第一单体，具有碱可溶部分的第二单体或酸不稳定保护基可溶部分的第一单体和具有氟代烷基部分的第三单体的聚合物。还包括包含物质组合物的光致抗蚀剂制剂和使用包含物质组成的光致抗蚀剂制剂的成像方法。

2. 发明申请

US20120070782A1 SELF-FORMING TOP ANTI-REFLECTIVE COATING COMPOSITIONS AND, PHOTORESIST MIXTURES AND METHOD OF IMAGING USING SAME 有权
标题翻译：自形成顶部防反射涂料组合物和光刻胶混合物及其成像方法
公开(公告)号：US20120070782A1
公开(公告)日：2012-03-22
申请号：US13301841
申请日：2011-11-22
申请人： Wu-Song Huang , Irene Popova , Pushkara Rao Varanasi , Libor Vyklicky
发明人： Wu-Song Huang , Irene Popova , Pushkara Rao Varanasi , Libor Vyklicky
IPC分类号： G03F7/004 , C08L27/12
CPC分类号： C08F212/34 , C08F212/32 , C08F220/22 , C08F220/26 , C08F220/28 , G03F7/0046 , G03F7/0392 , G03F7/091
摘要： A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.
摘要翻译：物质的组成。物质的组成包括具有乙烯主链并包含具有芳族部分的第一单体，具有碱可溶部分的第二单体或酸不稳定保护基可溶部分的第一单体和具有氟代烷基部分的第三单体的聚合物。还包括包含物质组合物的光致抗蚀剂制剂和使用包含物质组成的光致抗蚀剂制剂的成像方法。

3. 发明授权

US08546062B2 Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same 有权
标题翻译：自形成顶部抗反射涂料组合物和光致抗蚀剂混合物和使用其成像的方法
公开(公告)号：US08546062B2
公开(公告)日：2013-10-01
申请号：US13301841
申请日：2011-11-22
申请人： Wu-Song Huang , Irene Popova , Pushkara Rao Varanasi , Libor Vyklicky
发明人： Wu-Song Huang , Irene Popova , Pushkara Rao Varanasi , Libor Vyklicky
IPC分类号： C07C409/22 , G03F7/039 , G03F7/004
CPC分类号： C08F212/34 , C08F212/32 , C08F220/22 , C08F220/26 , C08F220/28 , G03F7/0046 , G03F7/0392 , G03F7/091
摘要： A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.
摘要翻译：物质的组成。物质的组成包括具有乙烯主链并包含具有芳族部分的第一单体，具有碱可溶部分的第二单体或酸不稳定保护基可溶部分的第一单体和具有氟代烷基部分的第三单体的聚合物。还包括包含物质组合物的光致抗蚀剂制剂和使用包含物质组成的光致抗蚀剂制剂的成像方法。

4. 发明授权

US08097401B2 Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same 有权
标题翻译：自形成顶部抗反射涂料组合物和光致抗蚀剂混合物和使用其成像的方法
公开(公告)号：US08097401B2
公开(公告)日：2012-01-17
申请号：US12409738
申请日：2009-03-24
申请人： Wu-Song Huang , Irene Popova , Pushkara Rao Varanasi , Libor Vyklicky
发明人： Wu-Song Huang , Irene Popova , Pushkara Rao Varanasi , Libor Vyklicky
IPC分类号： G03F7/20 , G03F7/11
CPC分类号： C08F212/34 , C08F212/32 , C08F220/22 , C08F220/26 , C08F220/28 , G03F7/0046 , G03F7/0392 , G03F7/091
摘要： A composition of matter. The composition of matter includes a polymer having an ethylenic backbone and comprising a first monomer having an aromatic moiety, a second monomer having a base soluble moiety or an acid labile protected base soluble moiety, and a third monomer having a fluoroalkyl moiety. Also a photoresist formulation including the composition of matter and a method of imaging using the photoresist formulation including the composition of matter.
摘要翻译：物质的组成。物质的组成包括具有乙烯主链并包含具有芳族部分的第一单体，具有碱可溶部分的第二单体或酸不稳定保护基可溶部分的第一单体和具有氟代烷基部分的第三单体的聚合物。还包括包含物质组合物的光致抗蚀剂制剂和使用包含物质组成的光致抗蚀剂制剂的成像方法。

5. 发明授权

US08557501B2 Developable bottom antireflective coating compositions especially suitable for ion implant applications 失效
标题翻译：可开发的底部抗反射涂料组合物，特别适用于离子注入应用
公开(公告)号：US08557501B2
公开(公告)日：2013-10-15
申请号：US13425903
申请日：2012-03-21
申请人： Wu-Song Huang , Libor Vyklicky , Pushkara Rao Varanasi
发明人： Wu-Song Huang , Libor Vyklicky , Pushkara Rao Varanasi
IPC分类号： G03F7/00 , G03F7/095
CPC分类号： G03F7/091 , G03F7/0392 , G03F7/0397
摘要： Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
摘要翻译：已经发现特征在于具有芳族部分和脂族醇部分的水溶性碱溶性聚合物的存在的组合物，其特别用作193nm平版印刷方法中的可显影底部抗反射涂层。该组合物能够改进光刻过程，其在随后的离子注入或其它类似方法的背景下是特别有用的，其中需要避免侵蚀性抗反射涂层去除技术。

6. 发明申请

US20120178029A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS 失效
标题翻译：可开发的底部抗反射涂料组合物特别适用于离子植入应用
公开(公告)号：US20120178029A1
公开(公告)日：2012-07-12
申请号：US13425903
申请日：2012-03-21
申请人： Wu-Song Huang , Libor Vyklicky , Pushkara Rao Varanasi
发明人： Wu-Song Huang , Libor Vyklicky , Pushkara Rao Varanasi
IPC分类号： G03F7/00
CPC分类号： G03F7/091 , G03F7/0392 , G03F7/0397
摘要： Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
摘要翻译：已经发现特征在于具有芳族部分和脂族醇部分的水溶性碱溶性聚合物的存在的组合物，其特别用作193nm平版印刷方法中的可显影底部抗反射涂层。该组合物能够改进光刻过程，其在随后的离子注入或其它类似方法的背景下是特别有用的，其中需要避免侵蚀性抗反射涂层去除技术。

7. 发明授权

US08182978B2 Developable bottom antireflective coating compositions especially suitable for ion implant applications 失效
标题翻译：可开发的底部抗反射涂料组合物，特别适用于离子注入应用
公开(公告)号：US08182978B2
公开(公告)日：2012-05-22
申请号：US12363913
申请日：2009-02-02
申请人： Wu-Song Huang , Libor Vyklicky , Pushkara Rao Varanasi
发明人： Wu-Song Huang , Libor Vyklicky , Pushkara Rao Varanasi
IPC分类号： G03F7/004 , G03F7/09 , G03F7/039 , G03F7/20
CPC分类号： G03F7/091 , G03F7/0392 , G03F7/0397
摘要： Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
摘要翻译：已经发现特征在于具有芳族部分和脂族醇部分的水溶性碱溶性聚合物的存在的组合物，其特别用作193nm平版印刷方法中的可显影底部抗反射涂层。该组合物能够改进光刻过程，其在随后的离子注入或其它类似方法的背景下是特别有用的，其中需要避免侵蚀性抗反射涂层去除技术。

8. 发明申请

US20100196825A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS 失效
标题翻译：可开发的底部抗反射涂料组合物特别适用于离子植入应用
公开(公告)号：US20100196825A1
公开(公告)日：2010-08-05
申请号：US12363913
申请日：2009-02-02
申请人： Wu-Song Huang , Libor Vyklicky , Pushkara Rao Varanasi
发明人： Wu-Song Huang , Libor Vyklicky , Pushkara Rao Varanasi
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/091 , G03F7/0392 , G03F7/0397
摘要： Compositions characterized by the presence of an aqueous base-soluble polymer having aromatic moieties and aliphatic alcohol moieties have been found which are especially useful as developable bottom antireflective coatings in 193 nm lithographic processes. The compositions enable improved lithographic processes which are especially useful in the context of subsequent ion implantation or other similar processes where avoidance of aggressive antireflective coating removal techniques is desired.
摘要翻译：已经发现特征在于具有芳族部分和脂族醇部分的水溶性基础可溶性聚合物的存在的组合物，其特别用作193nm平版印刷方法中的可显影底部抗反射涂层。该组合物能够改进光刻过程，其在随后的离子注入或其它类似方法的背景下是特别有用的，其中需要避免侵蚀性抗反射涂层去除技术。

9. 发明申请

US20090155715A1 PHOTORESIST COMPOSITIONS AND METHOD FOR MULTIPLE EXPOSURES WITH MULTIPLE LAYER RESIST SYSTEMS 有权
标题翻译：多层耐蚀系统多光照的组合物和方法
公开(公告)号：US20090155715A1
公开(公告)日：2009-06-18
申请号：US12356187
申请日：2009-01-20
申请人： Kuang-Jung Chen , Wu-Song Huang , Wai-Kin Li , Pushkara Rao Varanasi , Sen Liu
发明人： Kuang-Jung Chen , Wu-Song Huang , Wai-Kin Li , Pushkara Rao Varanasi , Sen Liu
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0045 , G03F7/0035 , G03F7/0397 , G03F7/40
摘要： A method and a resist composition. The resist composition includes a polymer having repeating units having a lactone moiety, a thermal base generator capable of generating a base and a photosensitive acid generator. The polymer has the properties of being substantially soluble in a first solvent and becoming substantially insoluble after heating the polymer. The method includes forming a film of a photoresist including a polymer, a thermal base generator capable of releasing a base, a photosensitive acid generator, and a solvent. The film is patternwise imaged. The imaging includes exposing the film to radiation, resulting in producing an acid catalyst. The film is developed in an aqueous base, resulting in removing base-soluble regions and forming a patterned layer. The patterned layer is baked above the temperature, resulting in the thermal base generator releasing a base within the patterned layer and the patterned layer becoming insoluble in the solvent.
摘要翻译：一种方法和抗蚀剂组合物。抗蚀剂组合物包括具有内酯部分的重复单元的聚合物，能够产生碱的热碱发生剂和感光酸产生剂。聚合物具有基本上可溶于第一溶剂的性质，并且在加热聚合物之后变得基本上不溶。该方法包括形成包含聚合物的光致抗蚀剂膜，能够释放碱的热碱发生器，光敏酸产生剂和溶剂。该影片被图案化成像。成像包括将膜暴露于辐射，导致产生酸催化剂。该膜在水性碱中显影，导致去除碱溶性区域并形成图案层。图案化层被烘烤高于该温度，导致热基发生器释放图案化层内的基底并且图案化层变得不溶于溶剂。

10. 发明授权

US07700262B2 Top coat material and use thereof in lithography processes 失效
标题翻译：面漆材料及其在光刻工艺中的应用
公开(公告)号：US07700262B2
公开(公告)日：2010-04-20
申请号：US12044004
申请日：2008-03-07
申请人： Wenjie Li , Margaret C. Lawson , Pushkara Rao Varanasi
发明人： Wenjie Li , Margaret C. Lawson , Pushkara Rao Varanasi
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/11 , G03F7/0046 , G03F7/2041 , Y10T428/3154
摘要： A top coat material for applying on top of a photoresist material is disclosed. The top coat material includes a polymer, which includes at least one fluorosulfonamide monomer unit having one of the following two structures: wherein: M is a polymerizable backbone moiety; Z is a linking moiety selected from the group consisting of —C(O)O—, —C(O)—, —OC(O)—, and —O—C(O)—C(O)—O—; R1 is selected from the group consisting of an alkylene, an arylene, a semi- or perfluorinated alkylene, and a semi- or perfluorinated arylene; p and q are 0 or 1; R2 is selected from the group consisting of hydrogen, fluorine, an alkyl group of 1 to 6 carbons, and a semi- or perfluorinated alkyl group of 1 to 6 carbons; n is an integer from 1 to 6; and R3 is selected from the group consisting of hydrogen, an alkyl, an aryl, a semi- or perfluorinated alkyl, and a semi- or perfluorinated aryl. The top coat material may be used in lithography processes, wherein the top coat material is applied on a photoresist layer. The top coat material is preferably soluble in aqueous alkaline developer. The top coat material is also preferably insoluble in water, and is therefore particularly useful in immersion lithography techniques using water as the imaging medium.
摘要翻译：公开了一种用于涂覆在光致抗蚀剂材料上的顶涂层材料。面漆材料包括聚合物，其包括至少一种具有以下两种结构之一的氟磺酰胺单体单元：其中：M是可聚合主链部分; Z是选自-C（O）O-，-C（O） - ， - OC（O） - 和-O-C（O）-C（O）-O-的连接部分; R1选自亚烷基，亚芳基，半或全氟亚烷基，以及半或全氟化亚芳基; p和q为0或1; R2选自氢，氟，1至6个碳的烷基和1至6个碳的半或全氟化烷基; n是1至6的整数; 并且R 3选自氢，烷基，芳基，半或全氟烷基和半或全氟芳基。面漆材料可以用在光刻工艺中，其中将顶涂层材料施加在光致抗蚀剂层上。顶涂层材料优选可溶于含水碱性显影剂。面漆材料也优选不溶于水，因此特别适用于使用水作为成像介质的浸渍光刻技术。

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