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    • 1. 发明申请
    • THIN FILM ELECTRODE CERAMIC SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
    • 薄膜电极陶瓷基板及其制造方法
    • US20130032384A1
    • 2013-02-07
    • US13565249
    • 2012-08-02
    • Won Hee YooByeung Gyu ChangTaek Jung LeeYun Hwi Park
    • Won Hee YooByeung Gyu ChangTaek Jung LeeYun Hwi Park
    • H05K1/03H05K3/22
    • H05K3/243H05K1/0306H05K3/107H05K3/108H05K2201/0338
    • Disclosed herein are a thin film electrode ceramic substrate and a method for manufacturing the same. The thin film electrode ceramic substrate includes: a ceramic substrate; a thin film electrode pattern formed on the ceramic substrate; and a plating layer formed on the thin film electrode pattern, wherein the plating layer is formed above the thin film electrode pattern and on both lateral surfaces of the thin film electrode pattern. According to the present invention, an undercut defect occurring between the surface of the ceramic substrate and the thin film electrode pattern and between the thin film electrode patterns due to an etchant can be prevented, by forming a plating layer above the thin film electrode pattern or on both lateral surfaces of the thin film electrode pattern, or forming an intaglio type anti-etching metal layer in the surface of the ceramic substrate.
    • 本文公开了一种薄膜电极陶瓷基板及其制造方法。 薄膜电极陶瓷基板包括:陶瓷基板; 形成在陶瓷基板上的薄膜电极图案; 以及形成在所述薄膜电极图案上的镀层,其中所述镀层形成在所述薄膜电极图案的上方以及所述薄膜电极图案的两个侧面上。 根据本发明,通过在薄膜电极图案上方形成镀层,可以防止在陶瓷基板的表面与薄膜电极图案之间以及由于蚀刻剂引起的薄膜电极图案之间发生的底切缺陷,或 在薄膜电极图案的两个侧表面上,或在陶瓷基板的表面中形成凹版型的抗蚀刻金属层。