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1. 发明申请

US20080111983A1 Illumination System for a Microlithographic Projection Exposure Apparatus 审中-公开
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20080111983A1
公开(公告)日：2008-05-15
申请号：US11813529
申请日：2005-12-30
申请人： Wolfgang Singer , Dieter Bader , Johannes Wangler , Markus Deguenther
发明人： Wolfgang Singer , Dieter Bader , Johannes Wangler , Markus Deguenther
IPC分类号： G03B27/72
CPC分类号： G03F7/70066 , G03F7/70075 , G03F7/70083
摘要： An illumination system (12) of a microlithographic exposure system comprises a plurality of light emitting elements (24) that have light exit facets that are positioned in or in close proximity to a field plane (OP) or a pupil plane and are configured to be individually activated. Light collecting elements, for example microlenses of a fly-eye lens or arrays of cylinder lenses, may be used to collect the light bundles emitted by the light emitting elements (24). Homogenizing means, for example a rod integrator or an optical raster element (40), may be provided for improving the intensity uniformity in a reticle plane (RP).
摘要翻译：微光刻曝光系统的照明系统（12）包括多个发光元件（24），该发光元件具有光出射面，其位于或靠近场平面（OP）或光瞳平面，并被配置为单独激活。可以使用光收集元件，例如蝇眼透镜的微透镜或圆柱透镜阵列来收集由发光元件（24）发射的光束。可以提供均匀化装置，例如棒状积分器或光学光栅元件（40），以改善光罩平面（RP）中的强度均匀性。

2. 发明申请

US20050226000A1 Optical apparatus for illuminating an object 审中-公开
标题翻译：用于照明物体的光学装置
公开(公告)号：US20050226000A1
公开(公告)日：2005-10-13
申请号：US11017375
申请日：2004-12-20
申请人： Dieter Bader , Norbert Reng , Johannes Wangler
发明人： Dieter Bader , Norbert Reng , Johannes Wangler
IPC分类号： G02B19/00 , G02B27/00 , G03F7/20 , H01L21/027 , F21V7/04
CPC分类号： G03F7/70141 , G03F7/70116
摘要： An optical apparatus for illuminating an object, for example an illumination system of a microlithographic exposure system, comprises a light source that generates a plurality of individual bundles that constitute an illumination bundle. A control device controls the light source in such a way that a desired form of the illumination bundle is determined by selecting an appropriate set of individual bundles.
摘要翻译：用于照亮物体的光学装置，例如微光刻曝光系统的照明系统，包括产生构成照明束的多个单独的束的光源。控制装置以这样的方式控制光源，即通过选择合适的一组单独的束来确定所需形式的照明束。

3. 发明申请

US20080225387A1 COLLECTOR FOR ILLUMINATION SYSTEMS WITH A WAVELENGTH LESS THAN OR EQUAL TO 193 nm 审中-公开
标题翻译：具有小于或等于193nm波长的照明系统的收集器
公开(公告)号：US20080225387A1
公开(公告)日：2008-09-18
申请号：US12053305
申请日：2008-03-21
申请人： Joachim Hainz , Martin Endres , Wolfgang Singer , Bernd Kleemann , Dieter Bader
发明人： Joachim Hainz , Martin Endres , Wolfgang Singer , Bernd Kleemann , Dieter Bader
IPC分类号： G02B5/08
CPC分类号： G03F7/70233 , B82Y10/00 , G03F7/70166 , G03F7/70175 , G03F7/702
摘要： Collectors are disclosed. The collectors can be for illumination systems with a wavelength ≦193 nm, including ≦126 nm, and the EUV range. The collectors can serve to receive the light rays emitted from a light source and to illuminate an area in a plane. The collectors can include at least a first mirror shell or a first shell segment as well as a second mirror shell or a second shell segment receiving the light and providing a first illumination and a second illumination in a plane which is located in the light path downstream of the collector. An illumination systems are also disclosed. The illumination systems can be equipped with a collector. Projection exposure apparatuses are also disclosed. The projection exposure apparatuses can include an illumination system. Methods for the manufacture of microstructures by photographic exposure are also disclosed.
摘要翻译：收藏家被披露。收集器可以用于波长<= 193nm的照明系统，包括<= 126nm和EUV范围。收集器可以用于接收从光源发射的光线并照亮平面中的区域。收集器可以包括至少第一反射镜壳体或第一壳体部分以及接收光的第二反射镜壳体或第二壳体部分，并且在位于光路下游的平面中提供第一照明和第二照明的收藏家。还公开了照明系统。照明系统可以配备收集器。还公开了投影曝光装置。投影曝光装置可以包括照明系统。还公开了通过照相曝光制造微结构的方法。

4. 发明申请

US20050117203A1 Method for producing an optical element from a quartz substrate 审中-公开
标题翻译：从石英基板制造光学元件的方法
公开(公告)号：US20050117203A1
公开(公告)日：2005-06-02
申请号：US10985488
申请日：2004-11-10
申请人： Nils Dieckmann , Kirstin Becker , Dieter Bader
发明人： Nils Dieckmann , Kirstin Becker , Dieter Bader
IPC分类号： G02B5/18 , G03F7/20 , H01L21/027 , G03B27/54 , G02B1/00 , G02B5/02 , G02B13/20 , G02B27/42 , G03B27/72 , G03F7/40
CPC分类号： G03F7/70075 , G02B5/1838 , G02B5/1857 , G03F7/70158 , G03F7/70958
摘要： In a method for producing an optical element from a quartz substrate for illumination systems with illumination sources which emit beams of wavelength 157 nm or shorter, the quartz substrate is joined to a support body on at least one side. Subsequently, from the quartz substrate material is removed to a desired value with a thickness in the μ region. The optical element can be a diffractive optical element or diffusion plate.
摘要翻译：在从具有发射波长为157nm或更短的光束的照明源的照明系统的石英基板制造光学元件的方法中，石英基板在至少一侧与支撑体接合。随后，从石英衬底材料中去除具有μ区域厚度的期望值。光学元件可以是衍射光学元件或扩散板。

5. 发明授权

US06256087B1 Light intensity measurement system 失效
标题翻译：光强测量系统
公开(公告)号：US06256087B1
公开(公告)日：2001-07-03
申请号：US09096400
申请日：1998-06-11
申请人： Dieter Bader
发明人： Dieter Bader
IPC分类号： G03B2742
CPC分类号： G03F7/70075 , G03F7/70058 , G03F7/70066 , G03F7/70558
摘要： A light intensity measurement system in an illumination system of a projection illumination system for microlithography. The light intensity measurement system includes an adjustable diaphragm that reflects light back into a light-mixing glass rod. The light-mixing glass rod includes a deflecting mirror that transmits a fraction of the light intensity and an energy sensor that senses the transmitted fraction of light intensity. An adjustable diaphragm is arranged following the glass rod in the direction of light flow. The reflected light, in part, also reaches the energy sensor. A compensation detector containing a photodetector is arranged at the deflecting mirror in the main direction of the light reflected by the adjustable diaphragm.
摘要翻译：一种用于微光刻的投影照明系统的照明系统中的光强度测量系统。光强测量系统包括将光反射回混合玻璃棒的可调光阑。光混合玻璃棒包括透射光强度的一部分的偏转镜和感测透射的光强度分数的能量传感器。玻璃杆沿光流的方向设置可调隔膜。反射光部分地也到达能量传感器。包含光电检测器的补偿检测器在由可调节光阑反射的光的主方向上设置在偏转镜上。

6. 发明申请

US20120002184A1 ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置的照明系统
公开(公告)号：US20120002184A1
公开(公告)日：2012-01-05
申请号：US13214811
申请日：2011-08-22
申请人： Dieter Bader
发明人： Dieter Bader
IPC分类号： G03B27/54
CPC分类号： G03F7/70116 , G03F7/70108
摘要： An illumination system of a microlithographic projection exposure apparatus includes a light source configured to produce projection light that propagates along a light path. The illumination system also includes a beam deflection array of reflective or transmissive beam deflection elements. Each beam deflection element is configured to deflect an impinging light beam by a deflection angle that is variable in response to a control signal. The beam deflection array is used in a first mode of operation to determine an irradiance distribution in the system pupil surface. The system further includes an optical raster element, in particular a diffractive optical element, which is used in a second mode of operation to determine the irradiance distribution in the system pupil surface. An exchange unit is configured to hold the optical raster element in the second mode of operation such that it is inserted into the light path.
摘要翻译：微光刻投影曝光装置的照明系统包括被配置为产生沿着光路传播的投射光的光源。照明系统还包括反射或透射光束偏转元件的光束偏转阵列。每个光束偏转元件被配置成使入射光束偏转响应于控制信号而变化的偏转角。光束偏转阵列用于第一操作模式以确定系统光瞳表面中的辐照度分布。该系统还包括光栅元件，特别是衍射光学元件，其用于第二操作模式以确定系统光瞳表面中的辐照度分布。交换单元被配置为将光栅元件保持在第二操作模式中，使得其被插入到光路中。

7. 发明授权

US08064040B2 Projection objective, projection exposure apparatus and reflective reticle for microlithography 有权
标题翻译：投影目标，投影曝光装置和微光刻反射掩模版
公开(公告)号：US08064040B2
公开(公告)日：2011-11-22
申请号：US11547085
申请日：2005-03-18
申请人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|
摘要翻译：用于微光刻的投影物镜用于将布置在其物体表面中的掩模的图案成像成具有缩小成像刻度的布置在其图像表面中的图像场。它具有沿着投影物镜的光轴布置的多个光学元件，光学元件被设计和布置成使得投影物镜具有图像数值孔径NA> 0.85和缩小成像刻度，其中| b | 0.05，并且具有适合于大于1mm的微光刻的最小像场直径的平面图像场。

8. 发明申请

US20080198353A1 Projection Objective, Projection Exposure Apparatus and Reflective Reticle For Microlithography 有权
标题翻译：投影目标，投影曝光装置和微光刻反射光罩
公开(公告)号：US20080198353A1
公开(公告)日：2008-08-21
申请号：US11547085
申请日：2005-03-18
申请人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
发明人： Aurelian Dodoc , Wilhelm Ulrich , Dieter Bader , Alexander Epple
IPC分类号： G03B27/54 , G02B9/34
CPC分类号： G03F7/70291 , G03F7/70225 , G03F7/70283
摘要： A projection objective for microlithography serves for imaging a pattern of a mask arranged in its object surface into an image field arranged in its image surface with a demagnifying imaging scale. It has a multiplicity of optical elements arranged along the optical axis of the projection objective, the optical elements being designed and arranged in such a way that the projection objective has an imageside numerical aperture NA>0.85 and a demagnifying imaging scale where |b|
摘要翻译：用于微光刻的投影物镜用于将布置在其物体表面中的掩模的图案成像成具有缩小成像刻度的布置在其图像表面中的图像场。它具有沿着投影物镜的光轴布置的多个光学元件，光学元件被设计和布置成使得投影物镜具有图像数值孔径NA> 0.85和缩小成像刻度，其中| b | 0.05，并且具有适合于大于1mm的微光刻的最小像场直径的平面图像场。

9. 发明授权

US07511890B2 Refractive optical imaging system, in particular projection objective for microlithography 有权
$Refractive optical imaging system, in particular projection objective for microlithography$
标题翻译：折射光学成像系统，特别是用于微光刻的投影物镜
公开(公告)号：US07511890B2
公开(公告)日：2009-03-31
申请号：US11347316
申请日：2006-02-06
申请人： Wilhelm Ulrich , David Shafer , Dieter Bader , Alexander Epple
发明人： Wilhelm Ulrich , David Shafer , Dieter Bader , Alexander Epple
IPC分类号： G02B9/00
CPC分类号： G02B13/143 , G02B27/0025 , G03F7/703
摘要： A refractive optical imaging system for imaging an object field arranged in an object surface of the imaging system into an image field arranged in an image surface of the imaging system on a demagnifying imaging scale has a multiplicity of optical elements which are configured and arranged such that a defined finite field curvature of the imaging system is set such that an object surface concavely curved relative to the imaging system is imaged into a flat image surface.
摘要翻译：一种用于将布置在成像系统的物体表面中的物体区域成像为在成像系统的图像表面上布置在缩小成像刻度上的图像场域的折射光学成像系统具有多个光学元件，其被构造和布置成使得将成像系统的限定的有限场曲率设定为使得相对于成像系统凹入弯曲的物体表面成像为平坦的图像表面。

10. 发明授权

US07371430B2 Method for structuring endless belts for presses 有权
标题翻译：用于压力机环形带结构的方法
公开(公告)号：US07371430B2
公开(公告)日：2008-05-13
申请号：US10477744
申请日：2002-05-17
申请人： Dieter Bader
发明人： Dieter Bader
IPC分类号： B05D5/00 , B05D5/02 , B05D3/06 , C08J7/00
CPC分类号： B41C1/182 , B23K26/0846 , B23K26/364 , B23K2101/16 , B30B5/04
摘要： The invention relates to a method for structuring endless belts (1), particularly steel belts, for presses, e.g. double belt presses. According to the invention, a coating is applied to an outer surface of the belt after which metal is removed from and/or applied to the belt. The coating is formed by individual drops, which are projected against the outer surface of the belt and remain thereupon and/or, as done in the prior art, a surface-covering coating is applied, which is degraded and/or removed, e.g. oxidized, in a preferably point-by-point manner by the action of thermally active beams, particularly laser beams, whereupon metal is removed from and/or applied to the uncoated area.
摘要翻译：本发明涉及一种用于构造用于压力机的环形带（1），特别是钢带的方法。双皮带印刷机。根据本发明，将涂层施加到带的外表面，之后将金属从带上移除和/或施加到带上。涂层由单独的液滴形成，该液滴向皮带的外表面突出并保持在其上和/或如现有技术中所做的那样，涂覆表面覆盖涂层，其被降解和/或去除，例如，优选地通过热活性光束，特别是激光束的作用逐点地氧化，从而从未涂覆的区域去除和/或施加金属。

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