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1. 发明授权

US08779322B2 Method and apparatus for processing metal bearing gases 失效
标题翻译：处理金属轴承气体的方法和装置
公开(公告)号：US08779322B2
公开(公告)日：2014-07-15
申请号：US13336616
申请日：2011-12-23
申请人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
发明人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
IPC分类号： B23K10/00 , H01H1/34
CPC分类号： H01J37/32174 , H01J37/321
摘要： A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.
摘要翻译：用于处理金属轴承气体的方法和装置涉及在等离子体室中产生环形等离子体。将金属轴承气体引入到等离子体室中以与环形等离子体反应。环形等离子体和金属承载气体之间的相互作用产生金属材料，金属氧化物材料或金属氮化物材料中的至少一种。

2. 发明申请

US20120160059A1 Method and Apparatus for Processing Metal Bearing Gases 失效
标题翻译：金属轴承气体加工方法与装置
公开(公告)号：US20120160059A1
公开(公告)日：2012-06-28
申请号：US13336616
申请日：2011-12-23
申请人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
发明人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
IPC分类号： C22B4/00 , B01J19/08
CPC分类号： H01J37/32174 , H01J37/321
摘要： A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.
摘要翻译：用于处理金属轴承气体的方法和装置涉及在等离子体室中产生环形等离子体。将金属轴承气体引入到等离子体室中以与环形等离子体反应。环形等离子体和金属承载气体之间的相互作用产生金属材料，金属氧化物材料或金属氮化物材料中的至少一种。

3. 发明申请

US20090288772A1 Method and Apparatus for Processing Metal Bearing Gases 有权
标题翻译：金属轴承气体加工方法与装置
公开(公告)号：US20090288772A1
公开(公告)日：2009-11-26
申请号：US12511785
申请日：2009-07-29
申请人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
发明人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
IPC分类号： C23C16/54
CPC分类号： H01J37/32174 , H01J37/321 , H05H1/46 , H05H2001/4667
摘要： A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.
摘要翻译：用于处理金属轴承气体的方法和装置涉及在等离子体室中产生环形等离子体。将金属轴承气体引入到等离子体室中以与环形等离子体反应。环形等离子体和金属承载气体之间的相互作用产生金属材料，金属氧化物材料或金属氮化物材料中的至少一种。

4. 发明授权

US07569790B2 Method and apparatus for processing metal bearing gases 有权
标题翻译：处理金属轴承气体的方法和装置
公开(公告)号：US07569790B2
公开(公告)日：2009-08-04
申请号：US11269917
申请日：2005-11-08
申请人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
发明人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
IPC分类号： B23K10/00
CPC分类号： H01J37/32174 , H01J37/321 , H05H1/46 , H05H2001/4667
摘要： A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.
摘要翻译：用于处理金属轴承气体的方法和装置涉及在等离子体室中产生环形等离子体。将金属轴承气体引入到等离子体室中以与环形等离子体反应。环形等离子体和金属承载气体之间的相互作用产生金属材料，金属氧化物材料或金属氮化物材料中的至少一种。

5. 发明授权

US08658936B2 Method and apparatus for processing metal bearing gases 有权
公开(公告)号：US08658936B2
公开(公告)日：2014-02-25
申请号：US13336616
申请日：2011-12-23
申请人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
发明人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
IPC分类号： B23K10/00 , H01H1/34
摘要： A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.

6. 发明授权

US08124906B2 Method and apparatus for processing metal bearing gases 有权
标题翻译：处理金属轴承气体的方法和装置
公开(公告)号：US08124906B2
公开(公告)日：2012-02-28
申请号：US12511785
申请日：2009-07-29
申请人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
发明人： William M. Holber , John A. Smith , Xing Chen , Donald K. Smith
IPC分类号： B23K10/00
CPC分类号： H01J37/32174 , H01J37/321 , H05H1/46 , H05H2001/4667
摘要： A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material.
摘要翻译：用于处理金属轴承气体的方法和装置涉及在等离子体室中产生环形等离子体。将金属轴承气体引入到等离子体室中以与环形等离子体反应。环形等离子体和金属承载气体之间的相互作用产生金属材料，金属氧化物材料或金属氮化物材料中的至少一种。

7. 发明授权

US06924455B1 Integrated plasma chamber and inductively-coupled toroidal plasma source 有权
标题翻译：集成等离子体室和电感耦合环形等离子体源
公开(公告)号：US06924455B1
公开(公告)日：2005-08-02
申请号：US09774165
申请日：2001-01-26
申请人： Xing Chen , Donald K. Smith , William M. Holber
发明人： Xing Chen , Donald K. Smith , William M. Holber
IPC分类号： H01J27/16 , H01J37/32 , B23K10/00
CPC分类号： H01J37/32009 , H01J27/16 , H01J37/321 , H01J37/32357 , H01J37/32862
摘要： A material processing apparatus having an integrated toroidal plasma source is described. The material processing apparatus includes a plasma chamber that comprises a portion of an outer surface of a process chamber. A transformer having a magnetic core surrounds a portion of the plasma chamber. The transformer has a primary winding. A solid state AC switching power supply comprising one or more switching semiconductor devices is coupled to a voltage supply and has an output that is coupled to the primary winding. The solid state AC switching power supply drives an AC current in the primary winding that induces an AC potential inside the chamber that directly forms a toroidal plasma that completes a secondary circuit of the transformer and dissociates the gas.
摘要翻译：描述了具有集成环形等离子体源的材料处理装置。材料处理装置包括等离子体室，其包括处理室的外表面的一部分。具有磁芯的变压器包围等离子体室的一部分。变压器有一个初级绕组。包括一个或多个开关半导体器件的固态AC开关电源耦合到电压源并具有耦合到初级绕组的输出。固态交流开关电源驱动初级绕组中的交流电流，其在室内引起AC电位，其直接形成环形等离子体，其完成变压器的次级电路并解离气体。

8. 发明授权

US06559408B2 Toroidal low-field reactive gas source 有权
公开(公告)号：US06559408B2
公开(公告)日：2003-05-06
申请号：US10143061
申请日：2002-05-10
申请人： Donald K. Smith , Xing Chen , William M. Holber , Eric Georgelis
发明人： Donald K. Smith , Xing Chen , William M. Holber , Eric Georgelis
IPC分类号： B23K1000
CPC分类号： H01J37/32009 , H01J27/16 , H01J37/321 , H01J37/32357 , H01J37/32862
摘要： An apparatus for dissociating gases includes a plasma chamber that may be formed from a metallic material and a transformer having a magnetic core surrounding a portion of the plasma chamber and having a primary winding. The apparatus also includes one or more switching semiconductor devices that are directly coupled to a voltage supply and that have an output coupled to the primary winding of the transformer. The one or more switching semiconductor devices drive current in the primary winding that induces a potential inside the chamber that forms a plasma which completes a secondary circuit of the transformer.

9. 发明授权

US06388226B1 Toroidal low-field reactive gas source 有权
标题翻译：环形低场反应气源
公开(公告)号：US06388226B1
公开(公告)日：2002-05-14
申请号：US09502087
申请日：2000-02-10
申请人： Donald K. Smith , Xing Chen , William M. Holber , Eric Georgelis
发明人： Donald K. Smith , Xing Chen , William M. Holber , Eric Georgelis
IPC分类号： B23K1000
CPC分类号： H01J37/32009 , H01J27/16 , H01J37/321 , H01J37/32357 , H01J37/32862
摘要： An improved toroidal low-field plasma source allows plasma ignition within a wider range of gas conditions than permitted by prior art plasma sources. Power efficiency of the plasma source is improved by automatically adjusting the power delivered to the plasma based on the load to the power supply. The plasma source can be operated over a wider pressure range than allowed by prior art plasma sources. The plasma source can be operated so as to increase the output of atomic species from the source. The plasma source can be operated to increase the etch rate of organic materials. The plasma source can efficiently remove hazardous gas compounds from effluent gas streams by converting them into scrubbable products.
摘要翻译：改进的环形低场等离子体源允许在比现有技术的等离子体源允许的更宽的气体条件范围内等离子体点火。通过根据对电源的负载自动调节输送到等离子体的功率来提高等离子体源的功率效率。等离子体源可以在比现有技术的等离子体源允许的更宽的压力范围内操作。可以操作等离子体源，以便增加来自源的原子物质的输出。可以操作等离子体源以增加有机材料的蚀刻速率。通过将等离子体源转换成可擦洗的产品，等离子体源可以有效地从废气流中去除有害气体化合物。

10. 发明授权

US07541558B2 Inductively-coupled toroidal plasma source 有权
标题翻译：电感耦合环形等离子体源
公开(公告)号：US07541558B2
公开(公告)日：2009-06-02
申请号：US11636891
申请日：2006-12-11
申请人： Donald K. Smith , Xing Chen , William M. Holber , Eric Georgelis
发明人： Donald K. Smith , Xing Chen , William M. Holber , Eric Georgelis
IPC分类号： B23K10/00
CPC分类号： H05H1/46 , H05H2001/4667 , H05H2001/4682
摘要： Apparatus for dissociating gases includes a plasma chamber comprising a gas. A first transformer having a first magnetic core surrounds a first portion of the plasma chamber and has a first primary winding. A second transformer having a second magnetic core surrounds a second portion of the plasma chamber and has a second primary winding. A first solid state AC switching power supply including one or more switching semiconductor devices is coupled to a first voltage supply and has a first output that is coupled to the first primary winding. A second solid state AC switching power supply including one or more switching semiconductor devices is coupled to a second voltage supply and has a second output that is coupled to the second primary winding. The first solid state AC switching power supply drives a first AC current in the first primary winding. The second solid state AC switching power supply drives a second AC current in the second primary winding. The first AC current and the second AC current induce a combined AC potential inside the plasma chamber that directly forms a toroidal plasma that completes a secondary circuit of the transformer and that dissociates the gas.
摘要翻译：用于解离气体的装置包括包含气体的等离子体室。具有第一磁芯的第一变压器包围等离子体室的第一部分并且具有第一初级绕组。具有第二磁芯的第二变压器包围等离子体室的第二部分并且具有第二初级绕组。包括一个或多个切换半导体器件的第一固态AC开关电源耦合到第一电压源并且具有耦合到第一初级绕组的第一输出。包括一个或多个开关半导体器件的第二固态AC开关电源耦合到第二电压源，并且具有耦合到第二初级绕组的第二输出。第一固态交流开关电源驱动第一初级绕组中的第一交流电流。第二固态交流开关电源驱动第二初级绕组中的第二交流电流。第一AC电流和第二AC电流引起等离子体室内的组合AC电位，其直接形成环形等离子体，其完成变压器的次级电路并且解离气体。

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