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    • 4. 发明授权
    • Industrial arc fault circuit interrupter and method of detecting arcing conditions
    • 工业电弧故障电路断路器及电弧条件检测方法
    • US07570465B2
    • 2009-08-04
    • US11959898
    • 2007-12-19
    • William E. Beatty, Jr.Douglas J. CarolanXin Zhou
    • William E. Beatty, Jr.Douglas J. CarolanXin Zhou
    • H02H3/00
    • H02H1/0015H02H9/00
    • A method of detecting arcing conditions includes sensing current and HF signals therefrom; bandpass filtering the HF signals and providing filtered signals; detecting peak signals and envelopes from the filtered signals; counting occurrences of the envelopes exceeding a first value; maintaining temporary values corresponding to the peak signals; determining a trip time as a function of the current; determining if any peak signal is greater than a second value, and responsively increasing a temporary value and, otherwise, decreasing the temporary value; determining if a predetermined function of the temporary values is greater than a fifth value, and adding the temporary values to an accumulator, and otherwise, decreasing the accumulator; and tripping open the power circuit if: a difference between the occurrences of current and immediately previous half cycle having the same polarity is at least two, the accumulator is greater than a seventh value, and the trip time is reached.
    • 检测电弧条件的方法包括从其感测电流和HF信号; 带通滤波HF信号并提供滤波信号; 从滤波信号中检测峰值信号和信封; 计数信封超过第一个值的事件; 保持对应于峰值信号的临时值; 确定作为电流的函数的跳闸时间; 确定任何峰值信号是否大于第二值,并响应地增加临时值,否则减小临时值; 确定临时值的预定函数是否大于第五值,并将临时值加到累加器,否则减少累加器; 并且如果以下情况则跳闸打开电源电路:具有相同极性的电流和紧前的上一个半周期的出现之间的差异至少为二,累加器大于第七值,并且达到跳闸时间。
    • 10. 发明授权
    • Determining calibration parameters for a lithographic process
    • 确定光刻工艺的校准参数
    • US08849008B2
    • 2014-09-30
    • US13608776
    • 2012-09-10
    • Xin ZhouYaogang LianRobert E. Gleason
    • Xin ZhouYaogang LianRobert E. Gleason
    • G06K9/00G03F7/20
    • G03F7/705G03F7/70516G03F7/70641
    • A technique for determining a set of calibration parameters for use in a model of a photo-lithographic process is described. In this calibration technique, images of a test pattern that was produced using the photo-lithographic process are used to determine corresponding sets of calibration parameters. These images are associated with at least three different focal planes in an optical system, such as a photo-lithographic system that implements the photo-lithographic process. Moreover, an interpolation function is determined using the sets of calibration parameters. This interpolation function can be used to determine calibration parameters at an arbitrary focal plane in the photo-lithographic system for use in simulations of the photolithographic process, where the set of calibration parameters are used in a set of transmission cross coefficients in the model of the photo-lithographic process.
    • 描述了用于确定用于光刻工艺的模型中的一组校准参数的技术。 在该校准技术中,使用使用光刻工艺制作的测试图案的图像来确定相应的校准参数组。 这些图像与光学系统中的至少三个不同的焦平面相关联,例如实现光刻工艺的光刻系统。 此外,使用校准参数集来确定内插函数。 该内插函数可以用于确定光刻系统中的任意焦平面处的校准参数,以用于光刻工艺的模拟,其中在一组模拟中的传输交叉系数中使用该组校准参数 光刻工艺。