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1. 发明授权

US07858921B2 Guided-mode-resonance transmission color filters for color generation in CMOS image sensors 有权
标题翻译：用于CMOS图像传感器中彩色生成的引导型共振透射滤色器
公开(公告)号：US07858921B2
公开(公告)日：2010-12-28
申请号：US12115045
申请日：2008-05-05
申请人： William A. Stanton , Fei Wang , Zhong Shi
发明人： William A. Stanton , Fei Wang , Zhong Shi
IPC分类号： G02B5/30
CPC分类号： H01L27/14621 , H01L27/14629
摘要： Imager pixel arrays and methods for forming imager pixel arrays. An image sensor pixel includes a photosensor and a waveguide grating resonance filter formed over the photosensor. The waveguide grating resonance filter is configured to pass light to the photosensor in a wavelength band and to block light outside of the wavelength band. The waveguide grating resonance filter includes a grating material having a first refractive index and arranged in a grating pattern with a grating pitch, and has an effective refractive index that is a function of the first refractive index. A combination of the grating pitch and the effective refractive index is selected to correspond to the wavelength band.
摘要翻译：成像器像素阵列和形成成像器像素阵列的方法。图像传感器像素包括光传感器和形成在光传感器上的波导光栅谐振滤波器。波导光栅谐振滤波器被配置为将光传送到波长带中的光电传感器并阻挡波长带外的光。波导光栅谐振滤波器包括具有第一折射率的光栅材料，并且以光栅间距布置成格栅图案，并且具有作为第一折射率的函数的有效折射率。选择光栅间距和有效折射率的组合以对应于波长带。

2. 发明申请

US20090272880A1 GUIDED-MODE-RESONANCE TRANSMISSION COLOR FILTERS FOR COLOR GENERATION IN CMOS IMAGE SENSORS 有权
标题翻译：用于CMOS图像传感器中颜色生成的导向模式共振传输滤色片
公开(公告)号：US20090272880A1
公开(公告)日：2009-11-05
申请号：US12115045
申请日：2008-05-05
申请人： William A. Stanton , Fei Wang , Zhong Shi
发明人： William A. Stanton , Fei Wang , Zhong Shi
IPC分类号： H01L31/0232 , H01L31/18
CPC分类号： H01L27/14621 , H01L27/14629
摘要： Imager pixel arrays and methods for forming imager pixel arrays. An image sensor pixel includes a photosensor and a waveguide grating resonance filter formed over the photosensor. The waveguide grating resonance filter is configured to pass light to the photosensor in a wavelength band and to block light outside of the wavelength band. The waveguide grating resonance filter includes a grating material having a first refractive index and arranged in a grating pattern with a grating pitch, and has an effective refractive index that is a function of the first refractive index. A combination of the grating pitch and the effective refractive index is selected to correspond to the wavelength band.
摘要翻译：成像器像素阵列和形成成像器像素阵列的方法。图像传感器像素包括光传感器和形成在光传感器上的波导光栅谐振滤波器。波导光栅谐振滤波器被配置为将光传送到波长带中的光电传感器并阻挡波长带外的光。波导光栅谐振滤波器包括具有第一折射率的光栅材料，并且以光栅间距布置成格栅图案，并且具有作为第一折射率的函数的有效折射率。选择光栅间距和有效折射率的组合以对应于波长带。

3. 发明申请

US20110010677A1 METHOD AND SYSTEM FOR LITHOGRAPHIC SIMULATION AND VERIFICATION 有权
标题翻译：用于光刻模拟和验证的方法和系统
公开(公告)号：US20110010677A1
公开(公告)日：2011-01-13
申请号：US12878569
申请日：2010-09-09
申请人： Fei Wang , William A. Stanton
发明人： Fei Wang , William A. Stanton
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： Methods and systems for lithographic simulation and verification comprising a process in the frequency domain or in the spatial domain of calculating intensity at a location (x, y) for a number of defocus values. In addition, evaluating the intensity calculation result to determine if the intensity level will result in the mask pattern being written onto a wafer. The verification process may be calculated in the spatial domain or in the frequency domain. The calculations may be done such that full focus window calculations may be obtained by isolating the defocus parameter “z” in the calculations.
摘要翻译：用于光刻仿真和验证的方法和系统包括在多个离焦值的位置（x，y）处计算强度的频域或空间域中的过程。此外，评估强度计算结果以确定强度水平是否会导致掩模图案被写入晶片。验证过程可以在空间域或频域中计算。可以进行计算，使得可以通过在计算中隔离散焦参数“z”来获得全焦点窗口计算。

4. 发明申请

US20090226823A1 RETICLES INCLUDING ASSISTANT STRUCTURES, METHODS OF FORMING SUCH RETICLES, AND METHODS OF UTILIZING SUCH RETICLES 审中-公开
标题翻译：包括助理结构在内的申请，形成此类反应的方法，以及使用此类反应物的方法
公开(公告)号：US20090226823A1
公开(公告)日：2009-09-10
申请号：US12043447
申请日：2008-03-06
申请人： William A. Stanton , Fei Wang
发明人： William A. Stanton , Fei Wang
IPC分类号： G03F1/00 , G03F7/00
CPC分类号： G03F1/38 , G03F1/29 , G03F1/32
摘要： Reticles comprising assistant structures in contact with at least sidewalls of a phase shift and transmission control material are disclosed. The assistant structures are formed from an absorptive material, such as chromium. The assistant structures provide reduced scumming defects in features produced using the reticles. Methods of forming the reticles and methods of utilizing the reticles are also disclosed.
摘要翻译：公开了包括与相移和传输控制材料的至少侧壁接触的辅助结构的网状物。辅助结构由诸如铬的吸收材料形成。辅助结构在使用光罩产生的特征中提供减少的浮渣缺陷。还公开了形成掩模版的方法和使用掩模版的方法。

5. 发明申请

US20090012769A1 METHOD AND SYSTEM FOR LITHOGRAPHIC SIMULATION AND VERIFICATION 有权
标题翻译：用于光刻模拟和验证的方法和系统
公开(公告)号：US20090012769A1
公开(公告)日：2009-01-08
申请号：US11773118
申请日：2007-07-03
申请人： Fei Wang , William A. Stanton
发明人： Fei Wang , William A. Stanton
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： Methods and systems for lithographic simulation and verification comprising a process in the frequency domain or in the spatial domain of calculating intensity at a location (x, y) for a number of defocus values. In addition, evaluating the intensity calculation result to determine if the intensity level will result in the mask pattern being written onto a wafer. The verification process may be calculated in the spatial domain or in the frequency domain. The calculations may be done such that full focus window calculations may be obtained by isolating the defocus parameter “z” in the calculations.
摘要翻译：用于光刻仿真和验证的方法和系统包括在多个离焦值的位置（x，y）处计算强度的频域或空间域中的过程。此外，评估强度计算结果以确定强度水平是否会导致掩模图案被写入晶片。验证过程可以在空间域或频域中计算。可以进行计算，使得可以通过在计算中隔离散焦参数“z”来获得全焦点窗口计算。

6. 发明授权

US08595655B2 Method and system for lithographic simulation and verification 有权
标题翻译：光刻仿真与验证方法与系统
公开(公告)号：US08595655B2
公开(公告)日：2013-11-26
申请号：US12878569
申请日：2010-09-09
申请人： Fei Wang , William A. Stanton
发明人： Fei Wang , William A. Stanton
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： Methods and systems for lithographic simulation and verification comprising a process in the frequency domain or in the spatial domain of calculating intensity at a location (x, y) for a number of defocus values. In addition, evaluating the intensity calculation result to determine if the intensity level will result in the mask pattern being written onto a wafer. The verification process may be calculated in the spatial domain or in the frequency domain. The calculations may be done such that full focus window calculations may be obtained by isolating the defocus parameter “z” in the calculations.
摘要翻译：用于光刻仿真和验证的方法和系统包括在多个离焦值的位置（x，y）处计算强度的频域或空间域中的过程。此外，评估强度计算结果以确定强度水平是否会导致掩模图案被写入晶片。验证过程可以在空间域或频域中计算。可以进行计算，使得可以通过在计算中隔离散焦参数“z”来获得全焦点窗口计算。

7. 发明申请

US20080297753A1 APPARATUS AND METHOD FOR DEFECT-FREE MICROLITHOGRAPHY 审中-公开
标题翻译：用于无缺陷微观算法的装置和方法
公开(公告)号：US20080297753A1
公开(公告)日：2008-12-04
申请号：US11756307
申请日：2007-05-31
申请人： Fei Wang , Ezequiel Vidal-Russell , William A. Stanton
发明人： Fei Wang , Ezequiel Vidal-Russell , William A. Stanton
IPC分类号： G03B27/54
CPC分类号： G03F7/701
摘要： An illumination source pupil for microlithography includes a substrate of substantially opaque material having an x-axis and a y-axis defined with respect to the substrate. The substrate has a first arcuate opening therein, and a second arcuate opening therein. The substrate also includes a third opening therein positioned at the intersection of the x-axis and the y-axis.
摘要翻译：用于微光刻的照明源光瞳包括具有相对于衬底限定的x轴和y轴的基本不透明材料的衬底。基板在其中具有第一弧形开口，并且其中具有第二弧形开口。衬底还包括位于x轴和y轴的交叉点处的第三开口。

8. 发明授权

US07818710B2 Method and system for lithographic simulation and verification 有权
标题翻译：光刻仿真与验证方法与系统
公开(公告)号：US07818710B2
公开(公告)日：2010-10-19
申请号：US11773118
申请日：2007-07-03
申请人： Fei Wang , William A. Stanton
发明人： Fei Wang , William A. Stanton
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G06F2217/12 , Y02P90/265
摘要： Methods and systems for lithographic simulation and verification comprising a process in the frequency domain or in the spatial domain of calculating intensity at a location (x, y) for a number of defocus values. In addition, evaluating the intensity calculation result to determine if the intensity level will result in the mask pattern being written onto a wafer. The verification process may be calculated in the spatial domain or in the frequency domain. The calculations may be done such that full focus window calculations may be obtained by isolating the defocus parameter “z” in the calculations.
摘要翻译：用于光刻仿真和验证的方法和系统包括在多个离焦值的位置（x，y）处计算强度的频域或空间域中的过程。此外，评估强度计算结果以确定强度水平是否会导致掩模图案被写入晶片。验证过程可以在空间域或频域中计算。可以进行计算，使得可以通过在计算中隔离散焦参数“z”来获得全焦点窗口计算。

9. 外观设计

USD985928S1 Sandbag 有权
公开(公告)号：USD985928S1
公开(公告)日：2023-05-16
申请号：US29881670
申请日：2023-01-05
申请人： Fei Wang
设计人： Fei Wang
摘要： FIG. 1 is a first perspective view of a sandbag showing my new design;
FIG. 2 is a second perspective view thereof;
FIG. 3 is a front view thereof;
FIG. 4 is a back view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a right side view thereof;
FIG. 7 is a top view thereof;
FIG. 8 is a bottom view thereof;
FIG. 9 is an enlarged view of the selected portion 9 in FIG. 1;
FIG. 10 is an enlarged view of the selected portion 10 in FIG. 2; and,
FIG. 11 is an enlarged view of the selected portion 11 in FIG. 4.
The broken lines shown in the drawings depict portions of the sandbag that form no part of the claimed design.
The dash-dot-dash broken lines depict cut lines of the enlarged portions and form no part of the claimed design.

10. 发明申请

US20220178076A1 Fibrous Structures 有权
公开(公告)号：US20220178076A1
公开(公告)日：2022-06-09
申请号：US17521174
申请日：2021-11-08
申请人： Fei Wang , Douglas Jay Barkey , James Allen Cain , Stephen John DelVecchio , Angela Marie Leimbach , Kun Piao , James Kenneth Comer , Ryan Dominic Maladen
发明人： Fei Wang , Douglas Jay Barkey , James Allen Cain , Stephen John DelVecchio , Angela Marie Leimbach , Kun Piao , James Kenneth Comer , Ryan Dominic Maladen
IPC分类号： D21F11/00 , D21H27/00 , D21H27/02 , D21F1/10 , D21F3/04 , D21F5/04 , D21F5/18 , D21F9/02 , D21H25/00
摘要： A fibrous structure. The structure may include a plurality of continuous or semi-continuous knuckles extending from portions of the surface of the fibrous structure in a parallel path, wherein the plurality of knuckles may be separated by adjacent continuous or semi-continuous pillows. Each knuckle may comprise a plurality of discrete pillows, the plurality of discrete pillows may be arranged in a spaced configuration along the path of each knuckle; alternatively, each pillow may comprise a plurality of discrete knuckles, the plurality of discrete knuckles may be arranged in a spaced configuration along the path of each pillow.

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