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1. 发明授权

US07397538B2 Radiation system and lithographic apparatus 失效
标题翻译：辐射系统和光刻设备
公开(公告)号：US07397538B2
公开(公告)日：2008-07-08
申请号：US11602475
申请日：2006-11-21
申请人： Wilhelmus Josephus Box , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Niels Machiel Driessen , Hendrikus Gijsbertus Schimmel
发明人： Wilhelmus Josephus Box , Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen , Niels Machiel Driessen , Hendrikus Gijsbertus Schimmel
IPC分类号： G03B27/54 , G03B27/42 , G21G5/00
CPC分类号： G03F7/70916 , G03F7/70858
摘要： The invention relates to a radiation system for generating a beam of radiation. The radiation system includes an extreme ultraviolet source constructed and arranged to generate extreme ultraviolet radiation, a contamination barrier constructed and arranged to trap contamination from the radiation source, and a temperature sensor constructed and arranged to sense a temperature of the contamination barrier.
摘要翻译：本发明涉及一种用于产生辐射束的辐射系统。辐射系统包括构造和布置成产生极紫外辐射的极紫外光源，被构造和布置以捕获来自辐射源的污染物的污染屏障，以及构造和布置成感测污染屏障的温度的温度传感器。

2. 发明申请

US20120075613A1 Lithographic Apparatus Having an Encoder Type Position Sensor System 有权
标题翻译：具有编码器类型位置传感器系统的平版印刷设备
公开(公告)号：US20120075613A1
公开(公告)日：2012-03-29
申请号：US13308388
申请日：2011-11-30
申请人： Peter Paul STEIJAERT , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
发明人： Peter Paul STEIJAERT , Wilhelmus Josephus Box , Emiel Jozef Eussen , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Ruud Antonius Catharina Maria Beerens , Albertus Adrianus Smits
IPC分类号： G03B27/58
CPC分类号： G03F7/70775
摘要： A lithographic apparatus is disclosed that includes an encoder type sensor system configured to measure a position of a substrate table of the lithographic apparatus relative to a reference structure. The encoder type sensor system includes an encoder sensor head and an encoder sensor target and the lithographic apparatus comprises a recess to accommodate the encoder sensor target.
摘要翻译：公开了一种光刻设备，其包括编码器型传感器系统，其被配置为相对于参考结构测量光刻设备的衬底台的位置。编码器型传感器系统包括编码器传感器头和编码器传感器目标，并且光刻设备包括用于容纳编码器传感器目标的凹部。

3. 发明授权

US07804584B2 Integrated circuit manufacturing methods with patterning device position determination 有权
标题翻译：具有图案形成装置位置确定的集成电路制造方法
公开(公告)号：US07804584B2
公开(公告)日：2010-09-28
申请号：US12262647
申请日：2008-10-31
申请人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Dominicus Jacobus Petrus Adrianus Franken , Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Franciscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Marc Johannes Martinus Engels
发明人： Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Dominicus Jacobus Petrus Adrianus Franken , Bernardus Antonius Johannes Luttikhuis , Engelbertus Antonius Franciscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Marc Johannes Martinus Engels
IPC分类号： G03B27/32 , G03B27/42 , G03F9/00
CPC分类号： G03F7/70716 , G03F7/70775
摘要： Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.
摘要翻译：公开了通过光刻设备制造集成电路的方法。所述方法包括用图案形成装置图案化辐射束，使用投影系统将图案化的光束投射到衬底上，并且确定图案形成装置的位置。在一个示例中，图案形成装置相对于投影系统的位置通过测量图案形成装置的支撑结构的位置来确定。在另一示例中，位置可以通过测量图案形成装置相对于其支撑件的位置并通过测量支撑件的位置来确定。在另一示例中，通过将至少一束辐射引导到位于图案区域外的图案形成装置的一部分来确定图案形成装置的Z位置。这可以通过将一对激光束从投影系统上的传感器引导到图案形成装置上的反射条来实现。

4. 发明授权

US07489388B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07489388B2
公开(公告)日：2009-02-10
申请号：US10740832
申请日：2003-12-22
申请人： Wilhelmus Josephus Box , Hendrik Jan Eggink
发明人： Wilhelmus Josephus Box , Hendrik Jan Eggink
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： G03F7/707 , G03F7/70783 , G03F7/70875 , G03F7/709
摘要： A lithographic apparatus includes an illumination system for projecting a beam of radiation onto a substrate. The lithographic apparatus further has a chuck assembly for supporting at least one of the substrate or a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. A heat transfer system is operable between a first surface and a second surface. The heat transfer system is capable of transferring heat between the first surface and the second surface. The first surface is at least partially formed by at least a part of the chuck assembly. The second surface is at least partially formed by at least a part of a component spaced a distance from the chuck. The second surface is mechanically isolated from and thermally coupled to the first surface.
摘要翻译：光刻设备包括用于将辐射束投射到衬底上的照明系统。光刻设备还具有用于支撑基板或图案形成装置中的至少一个的卡盘组件，图案形成装置用于在其横截面中赋予光束图案。传热系统可在第一表面和第二表面之间操作。传热系统能够在第一表面和第二表面之间传递热量。第一表面至少部分地由卡盘组件的至少一部分形成。第二表面至少部分地由与卡盘间隔一定距离的部件的至少一部分形成。第二表面与第一表面机械隔离并热耦合。

5. 发明授权

US06747730B2 Lithographic apparatus, device manufacturing method, and method of manufacturing an optical element 有权
标题翻译：光刻设备，器件制造方法和光学元件的制造方法
公开(公告)号：US06747730B2
公开(公告)日：2004-06-08
申请号：US10307485
申请日：2002-12-02
申请人： Wilhelmus Josephus Box
发明人： Wilhelmus Josephus Box
IPC分类号： G03B2742
CPC分类号： G03F7/70058 , G03F7/70216 , G03F7/70891 , G03F7/70958
摘要： An optical element in a lithographic apparatus is manufactured using a low coefficient of thermal expansion (CTE) material that has a CTE zero-crossing at a temperature between the temperature at which the element is manufactured and the mean temperature at which it will be operated.
摘要翻译：在光刻设备中的光学元件是使用低的热膨胀系数（CTE）材料制造的，该材料在制造元件的温度与其将被操作的平均温度之间的温度下具有CTE零交叉。

6. 发明授权

US07542127B2 Lithographic apparatus and method for manufacturing a device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：US07542127B2
公开(公告)日：2009-06-02
申请号：US11312660
申请日：2005-12-21
申请人： Timotheus Franciscus Sengers , Nicolaas Antonius Allegondus Johannes Van Asten , Wilhelmus Josephus Box , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Erik Roelof Loopstra , Marcel Johannus Elisabeth Hubertus Muitjens , Luberthus Ouwehand , Leon Joseph Marie Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
发明人： Timotheus Franciscus Sengers , Nicolaas Antonius Allegondus Johannes Van Asten , Wilhelmus Josephus Box , Tjarko Adriaan Rudolf Van Empel , Leon Martin Levasier , Erik Roelof Loopstra , Marcel Johannus Elisabeth Hubertus Muitjens , Luberthus Ouwehand , Leon Joseph Marie Van Den Schoor , Marcel Beckers , Rob Jansen , Elke Van Loenhout
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70883 , G03F7/7075 , G03F7/70858 , G03F9/7011 , G03F9/7034
摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.
摘要翻译：公开了一种光刻设备。该装置包括构造成保持基板的基板台。衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径测量系统的测量光束和/或场来调节路径的一部分。

7. 发明授权

US07522258B2 Lithographic apparatus and device manufacturing method utilizing movement of clean air to reduce contamination 有权
标题翻译：利用清洁空气的移动来减少污染的平版印刷设备和设备制造方法
公开(公告)号：US07522258B2
公开(公告)日：2009-04-21
申请号：US11169305
申请日：2005-06-29
申请人： Bernardus Antonius Johannes Luttikhuis , Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Marco Koert Stavenga , Thijs Harink
发明人： Bernardus Antonius Johannes Luttikhuis , Petrus Rutgerus Bartray , Wilhelmus Josephus Box , Marco Koert Stavenga , Thijs Harink
IPC分类号： G03B27/52 , G03B27/58
CPC分类号： G03F7/70916 , G03F7/7075 , G03F7/70791
摘要： A lithographic apparatus comprises a substrate table that supports a substrate and a substrate handler that moves the substrate relative to the substrate table. The substrate handler is adapted to load substrates on to and unload substrates from the substrate table before and after exposure. Also, a clean gas supply system supplies a clean gas to at least one location at which the substrate is located. The clean gas supply system is moveably mounted. A device manufacturing method utilizing the lithographic apparatus can be used to manufacture at least one of a flat panel display and an integrated circuit device.
摘要翻译：光刻设备包括支撑衬底的衬底台和相对于衬底台移动衬底的衬底处理器。衬底处理器适于在曝光之前和之后将衬底加载到衬底台上并从衬底台卸载衬底。此外，清洁气体供应系统将清洁气体提供到至少一个位置，在该位置处衬底被定位。清洁气体供应系统可移动安装。利用光刻设备的器件制造方法可用于制造平板显示器和集成电路器件中的至少一个。

8. 发明申请

US20080212053A1 Device manufacturing method, lithographic apparatus and device manufactured thereby 失效
标题翻译：装置制造方法，由此制造的光刻设备和装置
公开(公告)号：US20080212053A1
公开(公告)日：2008-09-04
申请号：US10962744
申请日：2004-10-13
申请人： Joost Jeroen Ottens , Levinus Pieter Bakker , Wilhelmus Josephus Box , Jan Van Elp , Frank Jeroen Pieter Schuurmans , Jan Evert Van Der Werf
发明人： Joost Jeroen Ottens , Levinus Pieter Bakker , Wilhelmus Josephus Box , Jan Van Elp , Frank Jeroen Pieter Schuurmans , Jan Evert Van Der Werf
IPC分类号： G03B27/42 , G03F7/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/70425 , G03F7/70433 , H01J37/3026 , H01J2237/31764
摘要： A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate.
摘要翻译：公开了一种装置制造方法。该方法包括图案化辐射束，将图案化的辐射束投射到基板的多个外部目标部分上，其中每个后续的外部目标部分与先前的外部目标部分间隔开，并且随后突出所述图案化的辐射束在所述多个外部目标部分上，将所述图案化的辐射束投射到所述衬底的内部目标部分上。

9. 发明授权

US07375794B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07375794B2
公开(公告)日：2008-05-20
申请号：US10910792
申请日：2004-08-04
申请人： Wilhelmus Josephus Box
发明人： Wilhelmus Josephus Box
IPC分类号： G03B27/42
CPC分类号： G03F7/708
摘要： A lithographic apparatus is disclosed. The apparatus includes the following components: an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. At least one of the components that experiences a heat load in use is provided with an integrally mounted heating element arranged to maintain the component at a substantially constant temperature.
摘要翻译：公开了一种光刻设备。该装置包括以下组件：被配置为调节辐射束的照明系统，被构造成支撑图案形成装置的支撑件，被构造成保持衬底的衬底支撑件以及配置成将图案化的辐射束投影到目标部分上的投影系统的基底。图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。在使用中经受热负荷的部件中的至少一个设置有被整体安装的加热元件，其布置成将部件保持在基本恒定的温度。

10. 发明授权

US07106416B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07106416B2
公开(公告)日：2006-09-12
申请号：US10731428
申请日：2003-12-10
申请人： Wilhelmus Josephus Box , Noud Jan Gilissen , Joost Jeroen Ottens
发明人： Wilhelmus Josephus Box , Noud Jan Gilissen , Joost Jeroen Ottens
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/70875
摘要： A lithographic apparatus including an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serving to impart the beam with a pattern in its cross-section. The apparatus also having a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus further having a chuck for supporting an object and a frame which supports the chuck with respect to other parts of the lithographic apparatus. The chuck is thermally isolated from at least the frame.
摘要翻译：一种光刻设备，包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。图案形成装置用于在其横截面中赋予光束图案。该装置还具有用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。光刻设备还具有用于支撑物体的卡盘和相对于光刻设备的其它部分支撑卡盘的框架。卡盘至少与框架隔离。

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