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    • 1. 发明授权
    • Device for coupling loading and unloading devices with semiconductor
processing machines
    • 用于使用半导体加工机器耦合加载和卸载装置的装置
    • US5655869A
    • 1997-08-12
    • US430816
    • 1995-04-28
    • Werner SchelerBerndt LahneAndreas MagesUwe MichlEberhard GemkowAlfred Schulz
    • Werner SchelerBerndt LahneAndreas MagesUwe MichlEberhard GemkowAlfred Schulz
    • B65G49/07H01L21/02H01L21/673H01L21/677
    • H01L21/67775Y10S414/14
    • The object of a device for coupling loading and unloading devices with semiconductor machines is to couple devices required for the use of SMIF technology with semiconductor processing machines in which subsequent integration of SMIF technology is not possible, wherein the charging to be carried out after coupling is highly flexible and capable of managing increasing dimensions of semiconductor wafers. An adjustable receiving element for the loading and unloading device is provided inside a movable enclosure, this receiving element being displaceable between at least two planes situated one above the other, one plane serving for charging the loading and unloading device and every other plane being used for the charging of the semiconductor machine carried out by the loading and unloading device. The enclosure has aligning and holding elements for fastening to a coupling element which is aligned with the semiconductor processing machine. The device enables retrofitting of semiconductor processing planes with SMIF technology while taking into account ergonomic requirements.
    • 用于将加载和卸载装置与半导体机器耦合的装置的目的是将SMIF技术所需的设备与半导体加工机器耦合,其中SMIF技术的后续集成是不可能的,其中在耦合之后执行的充电是 高度灵活且能够管理半导体晶片的尺寸增加。 用于装载和卸载装置的可调节接收元件设置在可移动外壳的内部,该接收元件可在位于另一个之上的至少两个平面之间移动,一个用于对装载和卸载装置充电的平面以及用于 由装卸装置对半导体机器进行充电。 外壳具有用于紧固到与半导体加工机对准的联接元件的对准和保持元件。 该设备可以使用SMIF技术对半导体加工平面进行改造,同时考虑到人体工程学的要求。
    • 2. 发明授权
    • Manipulation device for precision adjustments including a double
microscope having adjustable optical axes
    • 用于精密调节的操作装置,包括具有可调光轴的双显微镜
    • US4126376A
    • 1978-11-21
    • US768669
    • 1977-02-24
    • Karl-Werner GommelUwe MichlHans Radtke
    • Karl-Werner GommelUwe MichlHans Radtke
    • G02B21/32G03F9/00
    • G03F9/70G02B21/32
    • The invention relates to a manipulation device for precision adjustment of plane pattern bearing substrates being provided with two adjustment marks which are at different distances relative to a reference mark, which is, for example, a graduation plate. Such a substrate can be, for example, an intermediate negative or the like which is required in the course of a photolithographic mask production of integrated circuits. The manipulation device is constructed in such a manner that the pattern bearing substrate is substantially aligned relative to a reference mark by two orthogonal displacements and one rotation. This is accomplished by three displacement members which act upon a slide. Said slide, upon which the pattern bearing substrate is disposed, permits displacements parallel to the plane of the latter. Said displacement members are so arranged that the vectors of the orthogonal displacement actions pass one of the two adjustment marks.Therefore, one of the two displacement members is, according to the distance between the adjustment marks on the pattern bearing substrate, seated for definite displacement steps, at right angles to the displacement direction of the substrate.
    • 本发明涉及一种用于对平面图案承载基板进行精密调整的操作装置,该操作装置具有相对于参考标记(例如刻度盘)不同距离的两个调节标记。 这样的基板可以是例如在集成电路的光刻掩模生产过程中所需的中间负片等。 操作装置构造成使得图案承载衬底通过两个正交位移和一个旋转相对于参考标记基本上对准。 这是通过作用于幻灯片的三个位移构件来实现的。 所述滑块,其上布置有图案承载基底,允许平行于后者的平面的位移。 所述位移构件被布置成使得正交位移动作的矢量通过两个调节标记中的一个。