专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07443953B1 Structured anode X-ray source for X-ray microscopy 有权
标题翻译：用于X射线显微镜的结构阳极X射线源
公开(公告)号：US07443953B1
公开(公告)日：2008-10-28
申请号：US11609266
申请日：2006-12-11
申请人： Wenbing Yun , Frederick W. Duewer , Michael Feser , Andrei Tkachuk , Srivatsan Seshadri
发明人： Wenbing Yun , Frederick W. Duewer , Michael Feser , Andrei Tkachuk , Srivatsan Seshadri
IPC分类号： G21K5/04
CPC分类号： G21K7/00 , H01J35/08 , H01J2235/088
摘要： An x-ray source comprises a structured anode that has a thin top layer made of the desired target material and a thick bottom layer made of low atomic number and low density materials with good thermal properties. In one example, the anode comprises a layer of copper with an optimal thickness deposited on a layer of beryllium or diamond substrate. This structured target design allows for the use of efficient high energy electrons for generation of characteristic x-rays per unit energy deposited in the top layer and the use of the bottom layer as a thermal sink. This anode design can be applied to substantially increase the brightness of stationary, rotating anode or other electron bombardment-based sources where brightness is defined as number of x-rays per unit area and unit solid angle emitted by a source and is a key figure of merit parameter for a source.
摘要翻译： X射线源包括具有由所需目标材料制成的薄顶层的结构化阳极和由具有良好热性能的低原子序数和低密度材料制成的厚底层。在一个实例中，阳极包括沉积在铍或金刚石基底层上的最佳厚度的铜层。该结构化目标设计允许使用高效的高能电子来产生沉积在顶层中的每单位能量的特征x射线，以及使用底层作为散热器。该阳极设计可以应用于基本上增加固定的，旋转的阳极或其他基于电子轰击的源的亮度，其中亮度被定义为每单位面积的x射线数量和由源发射的单位立体角的数量，并且是来源的优点参数。

2. 发明授权

US08068579B1 Process for examining mineral samples with X-ray microscope and projection systems 有权
标题翻译：用X射线显微镜和投影系统检查矿物样品的方法
公开(公告)号：US08068579B1
公开(公告)日：2011-11-29
申请号：US12421380
申请日：2009-04-09
申请人： Wenbing Yun , Michael Feser , Andrei Tkachuk , Thomas A. Case , Frederick W. Duewer , Hauyee Chang
发明人： Wenbing Yun , Michael Feser , Andrei Tkachuk , Thomas A. Case , Frederick W. Duewer , Hauyee Chang
IPC分类号： G01N23/00
CPC分类号： G01N23/046 , G01N2223/419
摘要： A process to determine the porosity and/or mineral content of mineral samples with an x-ray CT system is described. Based on the direct-projection techniques that use a spatially-resolved x-ray detector to record the x-ray radiation passing through the sample, 1 micrometer or better resolution is achievable. Furthermore, by using an x-ray objective lens to magnify the x-ray image in a microscope configuration, a higher resolution of up to 50 nanometers or more is achieved with state-of-the-art technology. These x-ray CT techniques directly obtain the 3D structure of the sample with no modifications to the sample being necessary. Furthermore, fluid or gas flow experiments can often be conducted during data acquisition so that one may perform live monitoring of the physical process in 3D.
摘要翻译：描述了使用X射线CT系统确定矿物样品的孔隙率和/或矿物质含量的方法。基于使用空间分辨的X射线检测器记录通过样品的x射线辐射的直接投影技术，可以实现1微米或更好的分辨率。此外，通过使用x射线物镜以显微镜配置放大X射线图像，通过最先进的技术实现高达50纳米或更高的分辨率。这些X射线CT技术直接获得样品的3D结构，而不需要对样品进行修改。此外，流体或气体流动实验通常可以在数据采集期间进行，以便可以对3D中的物理过程进行实时监测。

3. 发明授权

US07406151B1 X-ray microscope with microfocus source and Wolter condenser 有权
标题翻译：具有微焦源和Wolter冷凝器的X射线显微镜
公开(公告)号：US07406151B1
公开(公告)日：2008-07-29
申请号：US11533863
申请日：2006-09-21
申请人： Wenbing Yun , Yuxin Wang , Michael Feser , Frederick W. Duewer
发明人： Wenbing Yun , Yuxin Wang , Michael Feser , Frederick W. Duewer
IPC分类号： G21K7/00
CPC分类号： G21K7/00 , G21K1/06
摘要： An x-ray microscope uses a microfocus x-ray source with a focus spot of less than 10 micrometers and a Wolter condenser having a magnification of about four or more for concentrating x-rays from the source onto a sample. A detector is provided for detecting the x-rays after interaction with the sample, and an x-ray objective is used to form an image of the sample on the detector. The use of the Wolter optic addresses a problem with microfocus sources that arise when the size of the focal spot that must then be imaged onto the sample with the condenser is smaller than the field of view.
摘要翻译： x射线显微镜使用聚焦点小于10微米的微焦点X射线源和具有约四或更大的放大倍数的Wolter冷凝器，用于将来自源的x射线集中到样品上。提供检测器，用于在与样品相互作用之后检测x射线，并且使用x射线物镜在检测器上形成样品的图像。使用Wolter光学器件解决了当聚焦器必须成像到样品上的焦点的尺寸小于视场时产生的微焦点源的问题。

4. 发明授权

US08353628B1 Method and system for tomographic projection correction 有权
标题翻译：断层投影校正的方法和系统
公开(公告)号：US08353628B1
公开(公告)日：2013-01-15
申请号：US12631739
申请日：2009-12-04
申请人： Wenbing Yun , Ying Xu , Frederick W. Duewer , Mason Freed , Chao-chih Hsu
发明人： Wenbing Yun , Ying Xu , Frederick W. Duewer , Mason Freed , Chao-chih Hsu
IPC分类号： G01D18/00 , A61B6/00
CPC分类号： H01J37/252 , H01J37/244 , H01J2237/226 , H01J2237/24415 , H01J2237/2446
摘要： The position of the sample is measured and used to correct for any off-axis motion during tomography using x-ray projection microscope system with a rotation stage system. The position is sensed using a precision-machined, low-CTE gold-coated cylinder or disc and three to five capacitive distance sensors. The correction can then be performed purely as image processing in software, by applying an appropriate shift in X and Y of the captured x-ray projections. A calibration is often necessary for each system (gold disc plus sensors plus sample stage) to account for any machining errors of the gold disc or positioning errors of the capacitive sensors. This calibration should also be repeated whenever any maintenance is performed on the metrology setup.
摘要翻译：使用具有旋转平台系统的X射线投影显微镜系统，测量样品的位置并用于校正层析成像期间的任何离轴运动。使用精密加工的低CTE镀金圆柱或圆盘和三到五个电容式距离传感器感测位置。然后，可以通过在捕获的X射线投影的X和Y中应用适当的偏移来纯化地作为软件中的图像处理执行校正。每个系统（金盘加传感器加样品台）通常需要进行校准，以解决金盘的任何加工误差或电容式传感器的定位误差。每当在计量设置上执行任何维护时，也应重复此校准。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式