会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 1. 发明授权
    • Integrated circuit layout modification
    • 集成电路布局修改
    • US08856696B2
    • 2014-10-07
    • US13354707
    • 2012-01-20
    • Wen-Hao ChenYuan-Te HouYi-Kan Cheng
    • Wen-Hao ChenYuan-Te HouYi-Kan Cheng
    • G06F17/50
    • G06F17/5068G06F17/5077
    • Methods are disclosed of modifying an integrated circuit (IC) design that utilizes multiple patterning technology (MPT). The methods include configuring a first layout of an integrated circuit, having at least one layer with features to be formed utilizing fabrication by at least two masks. The at least one layer includes a plurality of active cells and a plurality of spare cells. A second layout is configured to re-route the spare cells and active cells, wherein the re-routing utilizes at least a portion of the plurality of spare cells. Fewer than all of the at least two masks are replaced to configure the second layout.
    • 公开了改进利用多重图案化技术(MPT)的集成电路(IC)设计的方法。 所述方法包括配置集成电路的第一布局,其具有至少一层具有通过至少两个掩模的制造而形成的特征的层。 该至少一层包括多个活动单元和多个备用单元。 第二布局被配置为重新路由备用单元和活动单元,其中重新路由使用多个备用单元的至少一部分。 比所有至少两个掩模更少,以配置第二个布局。
    • 3. 发明申请
    • COLORING/GROUPING PATTERNS FOR MULTI-PATTERNING
    • 多种颜色/分组图案
    • US20130205266A1
    • 2013-08-08
    • US13365546
    • 2012-02-03
    • Wen-Hao ChenYuan-Te HouYi-Kan Cheng
    • Wen-Hao ChenYuan-Te HouYi-Kan Cheng
    • G06F17/50
    • G06F17/5077G06F2217/62
    • A method comprises: accessing a persistent, machine readable storage medium containing data representing an integrated circuit (IC) design to be fabricated using multi-patterning; identifying at least one network of conductive patterns configured to transmit signals that substantially impact timing of at least one circuit in the IC; pre-grouping the at least one network of conductive patterns in a first group; and electronically providing data to an electronic design automation (EDA) tool to cause inclusion in a first single photomask of all portions of the patterns within the first group that are to be formed in a single layer of the IC, wherein the single layer is to be multi-patterned using at least two photomasks.
    • 一种方法包括:访问包含表示将使用多图案化制造的集成电路(IC)设计的数据的持久的机器可读存储介质; 识别被配置为传输基本上影响所述IC中的至少一个电路的定时的信号的导电图案的至少一个网络; 将第一组中的至少一个导电图案网络预分组; 以及将电子数据提供给电子设计自动化(EDA)工具,以使所述第一组中将被形成在所述IC的单个层中的所述图案的所有部分的第一单个光掩模包括在其中,所述单层为 使用至少两个光掩模进行多图案化。