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1. 发明授权

US06992764B1 Measuring an alignment target with a single polarization state 有权
标题翻译：用单极化状态测量对准目标
公开(公告)号：US06992764B1
公开(公告)日：2006-01-31
申请号：US10261547
申请日：2002-09-30
申请人： Weidong Yang , Roger R. Lowe-Webb , Silvio J. Rabello , John D. Heaton
发明人： Weidong Yang , Roger R. Lowe-Webb , Silvio J. Rabello , John D. Heaton
IPC分类号： G01J4/00
CPC分类号： G03F7/70633 , B23K26/04 , B23K26/043 , B23K2101/40 , G01N21/21 , G01N2021/213 , G01N2021/4792 , G03F9/7065
摘要： An alignment target includes periodic patterns on two elements. The periodic patterns are aligned when the two elements are properly aligned. By measuring the two periodic patterns with an incident beam having a single polarization state and detecting the intensity of the resulting polarized light, it can be determined if the two elements are aligned. The same polarization state may be detected as is incident or different polarization states may be used. A reference measurement location may be used that includes a third periodic pattern on the first element and a fourth periodic pattern on the second element, which have a designed in offset, i.e., an offset when there is an offset of a known magnitude when the first and second element are properly aligned. The reference measurement location is similarly measured with a single polarization state.
摘要翻译：对齐目标包括两个元素上的周期性图案。当两个元件正确对齐时，周期性图案对准。通过用具有单一偏振态的入射光束测量两个周期性图案并检测所得到的偏振光的强度，可以确定两个元件是否对齐。可以像入射一样检测相同的偏振状态，也可以使用不同的偏振状态。可以使用参考测量位置，其包括第一元件上的第三周期性图案和第二元件上的第四周期性图案，其具有被设计为偏移的偏移，即当第一元件具有已知幅度的偏移时的偏移并且第二元件被正确对准。参考测量位置类似地用单一偏振态测量。

2. 发明授权

US07508976B1 Local process variation correction for overlay measurement 有权
标题翻译：覆盖测量的局部过程变化校正
公开(公告)号：US07508976B1
公开(公告)日：2009-03-24
申请号：US10748829
申请日：2003-12-29
申请人： Weidong Yang , Roger R. Lowe-Webb , Silvio J. Rabello
发明人： Weidong Yang , Roger R. Lowe-Webb , Silvio J. Rabello
IPC分类号： G06K9/00
CPC分类号： G03F7/70633
摘要： A diffraction based overlay metrology system produces the overlay error independent of effects caused by local process variations. Generally, overlay patterns include process variations that provide spectral contributions, along with the overlay shift, to the measured overlay error. The contributions from process variations are removed from the determined overlay error. In one embodiment, the local process variations are removed by measuring the overlay pattern before and after the top diffraction gratings are formed. A plurality of differential spectra from the measurement locations of the completed overlay pattern can then be used with a plurality of ratios of differential spectra from measurement locations of the incomplete overlay pattern can then be used to determine the overlay error by either direct calculation or by fitting techniques. In another embodiment, the local process variations are removed with no premeasurement but with careful construction of the overlay patterns.
摘要翻译：基于衍射的覆盖度量系统产生独立于局部过程变化所引起的影响的覆盖误差。通常，覆盖图案包括提供光谱贡献以及覆盖偏移与所测量的覆盖误差的过程变化。来自过程变化的贡献从确定的覆盖错误中移除。在一个实施例中，通过在顶部衍射光栅形成之前和之后测量覆盖图案来去除局部工艺变化。然后可以使用来自完成的覆盖图案的测量位置的多个差分光谱，然后可以使用来自不完全覆盖图案的测量位置的多个差分光谱比率来通过直接计算或通过拟合来确定覆盖误差技术在另一个实施例中，在没有预测量的情况下移除局部过程变化，但是仔细地构造覆盖图案。

3. 发明授权

US08817273B2 Dark field diffraction based overlay 有权
$Dark field diffraction based overlay$
标题翻译：基于暗场衍射的覆盖
公开(公告)号：US08817273B2
公开(公告)日：2014-08-26
申请号：US13454870
申请日：2012-04-24
申请人： Hwan J. Jeong , Silvio J. Rabello , Thomas Andre Casavant
发明人： Hwan J. Jeong , Silvio J. Rabello , Thomas Andre Casavant
IPC分类号： G01B11/14
CPC分类号： G03F7/70633
摘要： A dark field diffraction based overlay metrology device illuminates an overlay target that has at least three pads for an axis, the three pads having different programmed offsets. The overlay target may be illuminated using two obliquely incident beams of light from opposite azimuth angles or using normally incident light. Two dark field images of the overlay target are collected using ±1st diffraction orders to produce at least six independent signals. For example, the +1st diffraction order may be collected from one obliquely incident beam of light and the −1st diffraction order may be collected from the other obliquely incident beam of light. Alternatively, the ±1st diffraction orders may be separately detected from the normally incident light to produce the two dark field images of the overlay target. The six independent signals from the overlay target are used to determine an overlay error for the sample along the axis.
摘要翻译：基于暗场衍射的覆盖测量装置照亮具有用于轴的至少三个焊盘的覆盖目标，所述三个焊盘具有不同的编程偏移。可以使用来自相反方位角的两个倾斜入射光束或使用正常入射的光照亮覆盖目标。使用±1衍射级收集覆盖目标的两个暗场图像以产生至少六个独立信号。例如，可以从一个倾斜入射光束收集+ 1衍射级，并且可以从另一个倾斜入射光束收集第一衍射级。或者，可以从正常入射光单独检测±1衍射级，以产生覆盖目标的两个暗场图像。来自覆盖目标的六个独立信号用于确定沿着轴的样本的覆盖误差。

4. 发明授权

US08525993B2 Scatterometry measurement of asymmetric structures 有权
标题翻译：不对称结构的散射测量
公开(公告)号：US08525993B2
公开(公告)日：2013-09-03
申请号：US12696974
申请日：2010-01-29
申请人： Silvio J. Rabello , William A. McGahan , Jie Li , Yongdong Liu
发明人： Silvio J. Rabello , William A. McGahan , Jie Li , Yongdong Liu
IPC分类号： G01J4/00
CPC分类号： G01N21/211 , G01B11/24 , G01B2210/56 , G01N2021/213 , G01N2021/214 , G03F7/70633
摘要： Asymmetry metrology is performed using at least a portion of Mueller matrix elements, including, e.g., the off-diagonal elements of the Mueller matrix. The Mueller matrix may be generated using, e.g., a spectroscopic or angle resolved ellipsometer that may include a rotating compensator. The Mueller matrix is analyzed by fitting at least a portion of the elements to Mueller matrix elements calculated using a rigorous electromagnetic model of the sample or by fitting the off-diagonal elements to a calibrated linear response. The use of the Mueller matrix elements in the asymmetry measurement permits, e.g., overlay analysis using in-chip devices thereby avoiding the need for special off-chip targets.
摘要翻译：使用Mueller矩阵元素的至少一部分（包括例如Mueller矩阵的非对角线元素）来执行不对称度量。可以使用例如可以包括旋转补偿器的分光镜或角度分辨椭圆偏振器来生成Mueller矩阵。通过将至少一部分元素装配到使用样品的严格电磁模型计算的Mueller矩阵元素或通过将非对角元素拟合到校准的线性响应来分析Mueller矩阵。在不对称测量中使用Mueller矩阵元件允许例如使用片上器件的覆盖分析，从而避免需要特殊的片外目标。

5. 发明授权

US09239523B2 Diffraction based overlay linearity testing 有权
$Diffraction based overlay linearity testing$
标题翻译：基于衍射的覆盖线性度测试
公开(公告)号：US09239523B2
公开(公告)日：2016-01-19
申请号：US13053584
申请日：2011-03-22
申请人： Jie Li , Zhuan Liu , Silvio J. Rabello , Nigel P. Smith
发明人： Jie Li , Zhuan Liu , Silvio J. Rabello , Nigel P. Smith
IPC分类号： G03F7/20
CPC分类号： G03F7/70633
摘要： An empirical diffraction based overlay (eDBO) measurement of an overlay error is produced using diffraction signals from a plurality of diffraction based alignment pads from an alignment target. The linearity of the overlay error is tested using the same diffraction signals or a different set of diffraction signals from diffraction based alignment pads. Wavelengths that do not have a linear response to overlay error may be excluded from the measurement error.
摘要翻译：使用来自对准靶的多个基于衍射的对准焊盘的衍射信号产生覆盖误差的经验衍射叠加（eDBO）测量。使用相同的衍射信号或来自基于衍射的对准焊盘的不同衍射信号集来测试覆盖误差的线性。不会对测量误差排除不具有重叠误差线性响应的波长。

6. 发明申请

US20110238365A1 Diffraction Based Overlay Linearity Testing 有权
$Diffraction Based Overlay Linearity Testing$
标题翻译：基于衍射的覆盖线性度测试
公开(公告)号：US20110238365A1
公开(公告)日：2011-09-29
申请号：US13053584
申请日：2011-03-22
申请人： Jie Li , Zhuan Liu , Silvio J. Rabello , Nigel P. Smith
发明人： Jie Li , Zhuan Liu , Silvio J. Rabello , Nigel P. Smith
IPC分类号： G06F15/00 , G01B11/00
CPC分类号： G03F7/70633
摘要： An empirical diffraction based overlay (eDBO) measurement of an overlay error is produced using diffraction signals from a plurality of diffraction based alignment pads from an alignment target. The linearity of the overlay error is tested using the same diffraction signals or a different set of diffraction signals from diffraction based alignment pads. Wavelengths that do not have a linear response to overlay error may be excluded from the measurement error.
摘要翻译：使用来自对准靶的多个基于衍射的对准焊盘的衍射信号产生覆盖误差的经验衍射叠加（eDBO）测量。使用相同的衍射信号或来自基于衍射的对准焊盘的不同衍射信号集来测试覆盖误差的线性。不会对测量误差排除不具有重叠误差线性响应的波长。

7. 发明申请

US20110080585A1 Scatterometry Measurement of Asymmetric Structures 有权
标题翻译：不对称结构的散射测量
公开(公告)号：US20110080585A1
公开(公告)日：2011-04-07
申请号：US12696974
申请日：2010-01-29
申请人： Silvio J. Rabello , William A. McGahan , Jie Li , Yongdong Liu
发明人： Silvio J. Rabello , William A. McGahan , Jie Li , Yongdong Liu
IPC分类号： G01J4/00
CPC分类号： G01N21/211 , G01B11/24 , G01B2210/56 , G01N2021/213 , G01N2021/214 , G03F7/70633
摘要： Asymmetry metrology is performed using at least a portion of Mueller matrix elements, including, e.g., the off-diagonal elements of the Mueller matrix. The Mueller matrix may be generated using, e.g., a spectroscopic or angle resolved ellipsometer that may include a rotating compensator. The Mueller matrix is analyzed by fitting at least a portion of the elements to Mueller matrix elements calculated using a rigorous electromagnetic model of the sample or by fitting the off-diagonal elements to a calibrated linear response. The use of the Mueller matrix elements in the asymmetry measurement permits, e.g., overlay analysis using in-chip devices thereby avoiding the need for special off-chip targets.
摘要翻译：使用Mueller矩阵元素的至少一部分（包括例如Mueller矩阵的非对角线元素）来执行不对称度量。可以使用例如可以包括旋转补偿器的分光镜或角度分辨椭圆偏振器来生成Mueller矩阵。通过将至少一部分元素装配到使用样品的严格电磁模型计算的Mueller矩阵元素或通过将非对角元素拟合到校准的线性响应来分析Mueller矩阵。在不对称测量中使用Mueller矩阵元件允许例如使用片上器件的覆盖分析，从而避免需要特殊的片外目标。

8. 发明申请

US20130278942A1 DARK FIELD DIFFRACTION BASED OVERLAY 有权
标题翻译：基于深度场分散的覆盖
公开(公告)号：US20130278942A1
公开(公告)日：2013-10-24
申请号：US13454870
申请日：2012-04-24
申请人： Hwan J. Jeong , Silvio J. Rabello , Thomas Andre Casavant
发明人： Hwan J. Jeong , Silvio J. Rabello , Thomas Andre Casavant
IPC分类号： G01B11/14
CPC分类号： G03F7/70633
摘要： A dark field diffraction based overlay metrology device illuminates an overlay target that has at least three pads for an axis, the three pads having different programmed offsets. The overlay target may be illuminated using two obliquely incident beams of light from opposite azimuth angles or using normally incident light. Two dark field images of the overlay target are collected using ±1st diffraction orders to produce at least six independent signals. For example, the +1st diffraction order may be collected from one obliquely incident beam of light and the −1st diffraction order may be collected from the other obliquely incident beam of light. Alternatively, the ±1st diffraction orders may be separately detected from the normally incident light to produce the two dark field images of the overlay target. The six independent signals from the overlay target are used to determine an overlay error for the sample along the axis.
摘要翻译：基于暗场衍射的覆盖测量装置照亮具有用于轴的至少三个焊盘的覆盖目标，所述三个焊盘具有不同的编程偏移。可以使用来自相反方位角的两个倾斜入射光束或使用正常入射的光照亮覆盖目标。使用±1衍射级收集覆盖目标的两个暗场图像以产生至少六个独立信号。例如，可以从一个倾斜入射光束收集+ 1衍射级，并且可以从另一个倾斜入射光束收集第一衍射级。或者，可以从正常入射光单独地检测±1衍射级，以产生覆盖目标的两个暗视场图像。来自覆盖目标的六个独立信号用于确定沿着轴的样本的覆盖误差。

9. 发明授权

US08170838B2 Simulating two-dimensional periodic patterns using compressed fourier space 有权
标题翻译：使用压缩傅立叶空间模拟二维周期模式
公开(公告)号：US08170838B2
公开(公告)日：2012-05-01
申请号：US12430805
申请日：2009-04-27
申请人： Silvio J. Rabello , William A. McGahan , Jie Li
发明人： Silvio J. Rabello , William A. McGahan , Jie Li
IPC分类号： H03F1/26 , G06F15/00
CPC分类号： G06F17/5018
摘要： The process of modeling a complex two-dimensional periodic structure is improved by selectively truncating the Fourier expansion used in the calculation of resulting scatter signature from the model. The Fourier expansion is selectively truncated by determining the contribution for each harmonic order in the Fourier transform of the permittivity function and retaining the harmonic orders with a contribution that is above a threshold. The Fourier space may be compressed so that only the selected harmonic orders are used, thereby reducing the required memory and calculation times. The compressed Fourier space may be used in a real-time analysis of a sample or to generate a library that is used in the analysis of a sample.
摘要翻译：通过选择性地截断从模型计算得到的散射特征中使用的傅立叶展开，改善了对复杂二维周期结构进行建模的过程。通过确定介电常数函数的傅立叶变换中的每个谐波阶数的贡献并且保持具有高于阈值的贡献的谐波阶数来选择性地截断傅里叶展开。可以压缩傅里叶空间，使得仅使用所选择的谐波阶数，从而减少所需的存储和计算时间。压缩的傅立叶空间可以用于样本的实时分析或生成用于样本分析的文库。

10. 发明申请

US20100274521A1 Simulating Two-Dimensional Periodic Patterns Using Compressed Fourier Space 有权
标题翻译：使用压缩傅立叶空间模拟二维周期模式
公开(公告)号：US20100274521A1
公开(公告)日：2010-10-28
申请号：US12430805
申请日：2009-04-27
申请人： Silvio J. Rabello , William A. McGahan , Jie Li
发明人： Silvio J. Rabello , William A. McGahan , Jie Li
IPC分类号： G06F15/00
CPC分类号： G06F17/5018
摘要： The process of modeling a complex two-dimensional periodic structure is improved by selectively truncating the Fourier expansion used in the calculation of resulting scatter signature from the model. The Fourier expansion is selectively truncated by determining the contribution for each harmonic order in the Fourier transform of the permittivity function and retaining the harmonic orders with a contribution that is above a threshold. The Fourier space may be compressed so that only the selected harmonic orders are used, thereby reducing the required memory and calculation times. The compressed Fourier space may be used in a real-time analysis of a sample or to generate a library that is used in the analysis of a sample.
摘要翻译：通过选择性地截断从模型计算得到的散射特征中使用的傅立叶展开，改善了对复杂二维周期结构进行建模的过程。通过确定介电常数函数的傅立叶变换中的每个谐波阶数的贡献并且保持具有高于阈值的贡献的谐波阶数来选择性地截断傅里叶展开。可以压缩傅里叶空间，使得仅使用所选择的谐波阶数，从而减少所需的存储和计算时间。压缩的傅立叶空间可以用于样本的实时分析或生成用于样本分析的文库。

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