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1. 发明授权

US07026091B2 Positive photoresist composition and patterning process using the same 有权
标题翻译：正光致抗蚀剂组合物和使用其的图案化工艺
公开(公告)号：US07026091B2
公开(公告)日：2006-04-11
申请号：US10896536
申请日：2004-07-22
申请人： Wei-Chan Tseng , Tsing-Tang Song , Chih-Shin Chuang , Kuen-Yuan Hwang , An-Pang Tu
发明人： Wei-Chan Tseng , Tsing-Tang Song , Chih-Shin Chuang , Kuen-Yuan Hwang , An-Pang Tu
IPC分类号： G03F7/023
CPC分类号： G03F7/168 , G03F7/0392 , Y10S430/106 , Y10S430/111
摘要： A positive photoresist with uniform reactivity for use in a thick film lithography process, includes thermal curing during soft-baking and photo dissociation through UV exposure. The positive photoresist comprises a phenolic resin, a resin with acid labile groups, a photoacid generator (PAG), and a reactive monomer with vinyl ether or epoxy group. First, the resins react with the reactive monomer to perform a thermal curing step by soft-baking to form network polymers. In the UV lithography process, the exposed network polymers perform both deprotection and depolymerization simultaneously and are rendered alkali-soluble. The resulting photoresist patterns have a high aspect ratio and resolution profile, due to the good alkali dissolution contrast and uniform reactivity.
摘要翻译：在厚膜光刻工艺中使用具有均匀反应性的正性光致抗蚀剂包括在软烘烤期间的热固化和通过UV曝光的光解离。正性光致抗蚀剂包括酚醛树脂，具有酸不稳定基团的树脂，光酸产生剂（PAG）和具有乙烯基醚或环氧基团的反应性单体。首先，树脂与反应性单体反应，通过软烘烤进行热固化步骤以形成网状聚合物。在UV光刻过程中，暴露的网络聚合物同时进行去保护和解聚，并且呈碱溶性。由于良好的碱溶解对比度和均匀的反应性，得到的光致抗蚀剂图案具有高的纵横比和分辨率分布。

2. 发明申请

US20050019691A1 Positive photoresist composition and patterning process using the same 有权
标题翻译：正光致抗蚀剂组合物和使用其的图案化工艺
公开(公告)号：US20050019691A1
公开(公告)日：2005-01-27
申请号：US10896536
申请日：2004-07-22
申请人： Wei-Chan Tseng , Tsing-Tang Song , Chih-Shin Chuang , Kuen-Yuan Hwang , An-Pang Tu
发明人： Wei-Chan Tseng , Tsing-Tang Song , Chih-Shin Chuang , Kuen-Yuan Hwang , An-Pang Tu
IPC分类号： G03F7/039 , G03F7/16 , G03C1/76
CPC分类号： G03F7/168 , G03F7/0392 , Y10S430/106 , Y10S430/111
摘要： A positive photoresist WITHuniform reactivity for use in a thick film lithography process, includes thermal curing during soft-baking and photo dissociation through UV exposure. The positive photoresist comprises a phenolic resin, a resin with acid labile groups, a photoacid generator (PAG), and a reactive monomer with vinyl ether or epoxy group. First, the resins react with the reactive monomer to perform a thermal curing step by soft-baking to form network polymers. In the UV lithography process, the exposed network polymers perform both deprotection and depolymerization simultaneously and are rendered alkali-soluble. The resulting photoresist patterns have a high aspect ratio and resolution profile, due to the good alkali dissolution contrast and uniform reactivity.
摘要翻译：在厚膜光刻工艺中使用的具有不均匀反应性的正性光致抗蚀剂包括在软烘烤期间的热固化和通过UV曝光的光解离。正性光致抗蚀剂包括酚醛树脂，具有酸不稳定基团的树脂，光酸产生剂（PAG）和具有乙烯基醚或环氧基团的反应性单体。首先，树脂与反应性单体反应，通过软烘烤进行热固化步骤以形成网状聚合物。在UV光刻过程中，暴露的网络聚合物同时进行去保护和解聚，并且呈碱溶性。由于良好的碱溶解对比度和均匀的反应性，得到的光致抗蚀剂图案具有高的纵横比和分辨率分布。

3. 发明授权

US07338747B2 Photoresist composition and method pattern forming using the same 有权
标题翻译：光刻胶组合物和使用其的方法图案形成
公开(公告)号：US07338747B2
公开(公告)日：2008-03-04
申请号：US10720966
申请日：2003-11-24
申请人： Tsing-Tang Song , Chih-Shin Chuang , Wei-Chan Tseng , Kuen-Yuan Hwang , Tsung-Yu Chen
发明人： Tsing-Tang Song , Chih-Shin Chuang , Wei-Chan Tseng , Kuen-Yuan Hwang , Tsung-Yu Chen
IPC分类号： G03F7/029 , G03F7/031 , G03F7/032 , G03F7/033
CPC分类号： G03F7/038 , G03F7/027
摘要： This invention relates to a negative photoresist composition with multi-reaction models. When the photoresist composition according to the present invention is used in photolithography processes employing UV light to produce cross-link reactions and multi-reactions including radical polymerization and cationic polymerization also occur. The photoresist composition can be used to control light reaction efficiency and increase reaction thoroughness, thus obtaining a high resolution pattern.
摘要翻译：本发明涉及具有多反应模型的负性光致抗蚀剂组合物。当根据本发明的光致抗蚀剂组合物用于使用UV光产生交联反应的光刻方法中时，也发生包括自由基聚合和阳离子聚合的多重反应。光致抗蚀剂组合物可用于控制光反应效率并提高反应的彻底性，从而获得高分辨率图案。

4. 发明授权

US08728366B2 Method and device for making an optical plate formed with a microstructure 有权
标题翻译：用于制造具有微结构的光学板的方法和装置
公开(公告)号：US08728366B2
公开(公告)日：2014-05-20
申请号：US13209049
申请日：2011-08-12
申请人： Hsin-Hung Chen , Wei-Chan Tseng , Chung-Hao Wang , Chun-Liang Kuo
发明人： Hsin-Hung Chen , Wei-Chan Tseng , Chung-Hao Wang , Chun-Liang Kuo
IPC分类号： B29D11/00
CPC分类号： B29D11/00288 , G02B5/0215 , G02B5/0242 , G02B6/0035 , G02B6/0065
摘要： A method for making an optical plate formed with a microstructure includes: extruding a substrate material and advancing the same to pass through a first nip formed between an embossing roller and a first pressing roller, the embossing roller having a micropatterned surface formed with a plurality of protrusions and a plurality of grooves, the protrusions and the grooves cooperatively defining a microstructure-forming space; applying a photosensitive resin to the micropatterned surface and filling the same into the microstructure-forming space upstream of the first nip to form a plurality of microelements respectively in the microstructure-forming space; allowing the photosensitive resin applied to the micropatterned surface to pass through the first nip together with the substrate material, thereby bonding the microelements to the substrate material; and irradiating and curing the photosensitive resin downstream of the first nip to form the optical plate.
摘要翻译：一种用于制造具有微结构的光学板的方法包括：挤压基材并使其前进通过压花辊和第一加压辊之间形成的第一夹层，所述压花辊具有形成有多个突起和多个槽，所述突起和所述槽协同地限定微结构形成空间; 将光敏树脂施加到微图案表面并将其填充到第一辊隙的上游的微结构形成空间中，以在微结构形成空间中分别形成多个微元件; 使得施加到微图案表面的感光性树脂与基材材料一起通过第一辊隙，从而将微量元件粘合到基底材料上; 以及照射和固化第一辊隙下游的感光树脂以形成光学板。

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