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    • 1. 发明申请
    • Very long cylindrical sputtering target and method for manufacturing
    • 非常长的圆柱形溅射靶和制造方法
    • US20070074969A1
    • 2007-04-05
    • US11541984
    • 2006-10-02
    • Wayne SimpsonRyan ScatenaThomas StevensonJaime Guerrero
    • Wayne SimpsonRyan ScatenaThomas StevensonJaime Guerrero
    • C23C14/32C23C14/00
    • C23C14/3407H01J37/342H01J37/3435H01J37/3491
    • The present invention includes a long cylindrical sputtering target assembly and a method for manufacturing the assembly. The long cylindrical sputtering target assembly comprises a cylindrical sputtering target having a length greater than approximately thirty-six inches and being comprised of one or more cylindrical sputtering target sections; a cylindrical backing tube; and an attachment layer, such as indium, positioned between the cylindrical sputtering target and the cylindrical backing tube for attaching the cylindrical sputtering target to the cylindrical backing tube. The method comprises the steps of preparing an outside surface of a cylindrical backing tube and/or an inside surface of one or more cylindrical sputtering target sections for bonding; bringing the cylindrical backing tube and the one or more cylindrical sputtering target sections together so that the outside surface of the cylindrical backing tube and the inside surface of the one or more cylindrical sputtering target sections are adjacent to each other but separated by a space, with the one or more cylindrical sputtering target sections having a total length greater than thirty-six inches; and filling the space with an attachment material comprised of indium while the backing tube is oriented in a vertical direction.
    • 本发明包括长圆柱形溅射靶组件和用于制造组件的方法。 长圆柱形溅射靶组件包括长度大于约36英寸的圆柱形溅射靶,并且由一个或多个圆柱形溅射靶部分组成; 圆柱形背衬管; 以及位于圆柱形溅射靶和圆柱形背衬管之间的附接层,例如铟,用于将圆柱形溅射靶附着到圆柱形背衬管。 该方法包括以下步骤:制备用于接合的一个或多个圆柱形溅射靶部分的圆柱形背衬管和/或内表面的外表面; 使圆柱形背衬管和一个或多个圆柱形溅射靶部分在一起,使得圆柱形背衬管的外表面和一个或多个圆柱形溅射靶部分的内表面彼此相邻但由空间隔开, 所述一个或多个圆柱形溅射靶部分具有大于36英寸的总长度; 并且当背衬管沿垂直方向定向时,用包含铟的附接材料填充该空间。