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    • 8. 发明申请
    • APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY
    • 用于使用散射检测来检测重叠错误的装置和方法
    • US20090284744A1
    • 2009-11-19
    • US12505311
    • 2009-07-17
    • Walter D. MieherAdy LevyBoris GolovaneskyMichael FriedmannIan SmithMichael E. AdelAnatoly Fabrikant
    • Walter D. MieherAdy LevyBoris GolovaneskyMichael FriedmannIan SmithMichael E. AdelAnatoly Fabrikant
    • G01B11/00
    • G03F9/7088G01N21/956G01N2021/213G03F7/70625G03F7/70633G03F7/70683G03F9/7049G03F9/7084
    • Disclosed are apparatus and methods for determining overlay between a plurality of first structures in a first layer of a sample and a plurality of second structures in a second layer of the sample. Targets A, B, C and D that each include a portion of the first and second structures are provided. The target A is designed to have an offset Xa between its first and second structures portions; the target B is designed to have an offset Xb between its first and second structures portions; the target C is designed to have an offset Xc between its first and second structures portions; and the target D is designed to have an offset Xd between its first and second structures portions. Each of the offsets Xa, Xb, Xc and Xd is different from zero, and Xa is an opposite sign and differ from Xb. Offset Xc is an opposite sign and differs from Xd. The offsets Xa, Xb, Xc and Xd are selected so that an overlay error, including the respective offset, is within a linear region of overlay values. The targets A, B, C and D are illuminated with electromagnetic radiation to obtain spectra SA, SB, SC, and SD from targets A, B, C, and D, respectively, and any overlay error between the first structures and the second structures is determined using a linear or phase based scatterometry technique based on the obtained spectra SA, SB, SC, and SD.
    • 公开了用于确定样品的第一层中的多个第一结构与样品的第二层中的多个第二结构之间的叠层的装置和方法。 提供了各自包括第一和第二结构的一部分的目标A,B,C和D。 目标A设计成在其第一和第二结构部分之间具有偏移Xa; 目标B被设计成在其第一和第二结构部分之间具有偏移Xb; 目标C被设计成在其第一和第二结构部分之间具有偏移Xc; 并且目标D被设计成在其第一和第二结构部分之间具有偏移Xd。 偏移量Xa,Xb,Xc和Xd中的每一个与零不同,并且Xa是相反的符号,并且与Xb不同。 偏移Xc是相反的符号,不同于Xd。 选择偏移Xa,Xb,Xc和Xd,使得包括相应偏移的重叠误差在叠加值的线性区域内。 目标A,B,C和D被电磁辐射照射,分别从目标A,B,C和D获得光谱SA,SB,SC和SD,第一结构和第二结构之间的任何重叠误差 使用基于获得的光谱SA,SB,SC和SD的基于线性或相位的散射测量技术来确定。