专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20100260445A1 METHOD FOR PRODUCING A SLIDING BEARING ELEMENT HAVING A BISMUTH-CONTAINING SLIDING LAYER 审中-公开
标题翻译：用于制造具有双轴包含滑动层的滑动轴承元件的方法
公开(公告)号：US20100260445A1
公开(公告)日：2010-10-14
申请号：US12734081
申请日：2008-10-10
申请人： Walter Gaertner , Johann Kraemer , Erwin Schmidt , Ping Wang
发明人： Walter Gaertner , Johann Kraemer , Erwin Schmidt , Ping Wang
IPC分类号： F16C29/02 , C23C14/34
CPC分类号： C23C14/3414 , B32B15/01 , C22C1/06 , C22C9/01 , C22C9/02 , C22C9/04 , C22C21/003 , C22C21/02 , C22C21/10 , C23C14/165 , F16C9/04 , F16C33/121 , F16C2204/10 , F16C2204/12
摘要： The invention relates to a method of producing a slide bearing element (1) according to which a sliding layer (6) is produced on a support element (4) by vapour-phase deposition, if necessary after the insertion of at least one intermediate layer, wherein the sliding layer (6) comprises an aluminium matrix, which in addition to aluminium contains bismuth as a main component and possibly copper and also impurities of the elements arising during production. By means of the vapour-phase deposition of at least one element, the melting point of which is at least 950° C. higher than that of the bismuth and/or by applying a bias-voltage to the support element the bismuth-nuclear density is increased.
摘要翻译：本发明涉及一种制造滑动轴承元件（1）的方法，根据该方法，通过气相沉积在支撑元件（4）上产生滑动层（6），如果需要，在插入至少一个中间层，其中所述滑动层（6）包括铝基质，所述铝基质除了含有铋作为主要成分，并且可能含有铜以及在生产期间产生的元素的杂质。通过至少一种元素的气相沉积，其熔点比铋的熔点高至少950℃，和/或通过向载体元素施加偏压，铋 - 核密度增加了。

2. 发明授权

US4904362A Bar-shaped magnetron or sputter cathode arrangement 失效
标题翻译：棒形磁控管或溅射阴极装置
公开(公告)号：US4904362A
公开(公告)日：1990-02-27
申请号：US221383
申请日：1988-07-19
申请人： Walter Gaertner , Franz Koroschetz , Alfred Wagendristel , Herwig Bangert
发明人： Walter Gaertner , Franz Koroschetz , Alfred Wagendristel , Herwig Bangert
IPC分类号： C23C14/16 , C23C14/34 , F16C33/12 , H01J23/00 , H01J37/34
CPC分类号： H01J37/3405 , C23C14/16 , C23C14/3414 , F16C33/06 , F16C33/12 , F16C2204/20 , F16C2204/24
摘要： The invention relates to a bar-shaped magnetron-sputter cathode arrangement having an internal, cooled permanent magnet system and a carrier tube for the target. It is provided according to the invention that at least one thermal contact layer (38) is disposed between the carrier tube (36) and the target, which consists of one or more ring(s) (37, 37', 37") shrunk, especially interchangeably, onto the carrier tube (36). During sputtering the cathode (6) and the surface to be sputtered can be subjected to a mutual relative motion in the longitudinal direction of the cathode (6), for which purpose an adjusting element is provided. The magnets (31) are disposed inside the carrier tube (36) with the magnetic fields having alternately opposing directions in the longitudinal direction of the carrier tube (36). They possess cylindrical or polygonal lateral surfaces and end faces (44) which are parallel and slope at an angle (.alpha.) to the longitudinal direction of the electrode (6) or shaft (30).
摘要翻译：本发明涉及一种具有内部冷却永磁体系统和用于目标的载体管的棒状磁控溅射阴极装置。根据本发明提供的是，至少一个热接触层（38）设置在载体管（36）和靶之间，该靶由一个或多个环（37,37'，37“）组成，特别是可互换地收缩到载体管（36）上。在溅射期间，阴极（6）和被溅射的表面可以在阴极（6）的纵向方向上进行相互相对运动，为此，提供了调节元件。磁体（31）设置在载体管（36）的内部，其中磁场在载体管（36）的纵向具有交替相反的方向。它们具有与电极（6）或轴（30）的纵向成角度（α）倾斜的圆柱形或多边形侧表面和端面（44）。

3. 发明申请

US20120251023A1 METHOD FOR PRODUCING A PLAIN BEARING ELEMENT 审中-公开
标题翻译：生产普通轴承元件的方法
公开(公告)号：US20120251023A1
公开(公告)日：2012-10-04
申请号：US13508096
申请日：2010-11-05
申请人： Walter Gaertner
发明人： Walter Gaertner
IPC分类号： C23C14/34 , F16C33/14 , F16C33/06 , C23C14/14
CPC分类号： C23C14/046 , F16C33/12 , F16C33/14 , F16C2204/20 , F16C2223/60
摘要： The invention relates to a method for producing a plain bearing element (1) by means of coating a surface (5) of a substrate with a tribologically effective sliding layer (6) by means of cathode sputtering in a gas atmosphere and using at least one metal target (16), with a substrate having a cylindrical cavity (3) being used, and the target (16) being arranged at least partially in the cavity (3) and furthermore the discharge for sputtering the target (16) is supported or maintained by means of a third electrode (26).
摘要翻译：本发明涉及一种用于通过在气体气氛中通过阴极溅射用摩擦学有效的滑动层（6）涂覆基板的表面（5）并使用至少一个金属靶（16），其中使用具有圆柱形空腔（3）的基板，并且目标（16）至少部分地设置在空腔（3）中，此外用于溅射靶（16）的放电被支撑或通过第三电极（26）保持。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式