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    • 10. 发明申请
    • IMMERSION FLOW FIELD MAINTENANCE SYSTEM FOR IMMERSION LITHOGRAPHY MACHINE
    • 灌注流平面机维护流场维护系统
    • WO2007147304A1
    • 2007-12-27
    • PCT/CN2006/003592
    • 2006-12-25
    • SHANGHAI MICRO ELECTRONICS EQUIPMENT CO., LTD.YANG, Zhiyong
    • YANG, Zhiyong
    • G03F7/20H01L21/027
    • G03F7/70341G03F7/70733
    • An immersion flow field maintenance system is used in an immersion lithography machine which includes a projection objective lens, at least a wafer stage for supporting a wafer, and an immersion supplying system distributed around the projection objective lens for producing an immersion flow field under the projection objective lens. The immersion flow field maintenance system includes a horizontal guideway, a flat board connected with the horizontal guideway through the cantilever, and plural drivers for driving the flat board to move. When the wafer is unloaded and the wafer stage is moved out of the exposure area under the projection objective lens, the flat board connects to and moves synchronously with the wafer stage to transfer the immersion flow field from above the wafer stage to above the flat board. When the wafer is loaded and the wafer stage is moved into the exposure area, the flat board connects to and moves synchronously with the wafer stage to transfer the immersion flow field from above the flat board to above the wafer stage.
    • 浸没式流场维护系统用于浸没式光刻机中,浸没式光刻机包括投影物镜,至少用于支撑晶片的晶片台和分布在投影物镜周围的浸没供应系统,用于在投影下产生浸没流场 物镜。 浸没流场维护系统包括水平导轨,通过悬臂与水平导轨连接的平板以及用于驱动平板移动的多个驱动器。 当晶片卸载并且晶片台从投影物镜下方的曝光区域移出时,平板与晶片台连接并与晶片台同步移动,以将浸没流场从晶片台上方传递到平板上方 。 当晶片被加载并且晶片台移动到曝光区域中时,平板与晶片台连接并与晶片台同步地移动,以将浸没流场从平板上方转移到晶片台上方。