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1. 发明专利

AU2002254276A1 Miniaturized microscope array digital slide scanner 未知
公开(公告)号：AU2002254276A1
公开(公告)日：2002-10-03
申请号：AU2002254276
申请日：2002-03-19
申请人： WEINSTEIN RONALD S , BARTELS PETER H , SHACK RONALD V , LIANG CHEN , DESCOUR MICHAEL R
发明人： SHACK RONALD V , LIANG CHEN , BARTELS PETER H , DESCOUR MICHAEL R , WEINSTEIN RONALD S
IPC分类号： G02B21/00 , G02B21/36 , G06K9/00

2. 发明申请

WO02075370B1 MINIATURIZED MICROSCOPE ARRAY DIGITAL SLIDE SCANNER 审中-公开
标题翻译：微型显微镜阵列数字幻灯片扫描仪
公开(公告)号：WO02075370B1
公开(公告)日：2004-05-21
申请号：PCT/US0208286
申请日：2002-03-19
申请人： WEINSTEIN RONALD S , DESCOUR MICHAEL R , LIANG CHEN , BARTELS PETER H , SHACK RONALD V
发明人： WEINSTEIN RONALD S , DESCOUR MICHAEL R , LIANG CHEN , BARTELS PETER H , SHACK RONALD V
IPC分类号： G02B21/00 , G02B21/36 , G06K9/00
CPC分类号： G02B21/002 , G02B21/367
摘要： An array of microscopes (10) and a method of imaging an object with the array of microscopes. The array includes a plurality of optical elements (12,16) being individually disposed with respect to a corresponding image plane and configured to image respective sections of an object, and includes a plurality of image sensors (18) corresponding to respective optical elements and configured to capture corresponding representations of the respective sections of the object. The method includes imaging respective sections of an object with a plurality of optical elements and capturing corresponding representations of sections of the object from a plurality of image sensors.
摘要翻译：显微镜阵列（10）和使用显微镜阵列成像物体的方法。该阵列包括相对于对应的图像平面单独设置的多个光学元件（12,16），并被配置为对对象的各个部分进行成像，并且包括对应于各个光学元件的多个图像传感器（18），并且被配置以捕获对象的各个部分的对应表示。该方法包括用多个光学元件成像对象的各个部分，并从多个图像传感器捕获对象的部分的对应表示。

3. 发明申请

WO2004034121A2 MULTI-MODE SCANNING IMAGING SYSTEM 审中-公开
标题翻译：多模式扫描成像系统
公开(公告)号：WO2004034121A2
公开(公告)日：2004-04-22
申请号：PCT/US0329784
申请日：2003-09-19
申请人： DMETRIX INC , OLSZAK ARTUR G , LIANG CHEN , DESCOUR MICHAEL R
发明人： OLSZAK ARTUR G , LIANG CHEN , DESCOUR MICHAEL R
IPC分类号： G02B21/00 , G02B21/36
CPC分类号： G02B21/002 , G02B21/367
摘要： A multi-mode scanning imaging system. The system includes a plurality of sets of optical elements and a scanning mechanism. Each set is disposed with respect to a corresponding image plane and configured to image respective portions of an object. A scanning mechanism produces relative translation between the sets and the object so as to scan the object. Sets of image sensors corresponding to the sets of optical elements are adapted to capture image data representative of the respective portions of the object. A mode implementation system coordinates the image data according to one or more desired modes of operation of the imaging system.
摘要翻译：多模扫描成像系统。该系统包括多组光学元件和扫描机构。每个组相对于对应的图像平面布置并且被配置为对对象的各个部分进行成像。扫描机制产生组和对象之间的相对平移，以扫描对象。对应于这些光学元件组的图像传感器的组适于捕获表示对象的各个部分的图像数据。模式实现系统根据成像系统的一个或多个期望的操作模式来协调图像数据。

4. 发明申请

WO2004027521A3 A MULTI-AXIS PROJECTION IMAGING SYSTEM 审中-公开
标题翻译：多轴投影成像系统
公开(公告)号：WO2004027521A3
公开(公告)日：2004-04-22
申请号：PCT/US0329785
申请日：2003-09-19
申请人： DMETRIX INC , OLSZAK ARTUR G , DESCOUR MICHAEL R
发明人： OLSZAK ARTUR G , DESCOUR MICHAEL R
IPC分类号： G02B3/00 , G03F7/20 , G02B21/02 , G02B21/18
CPC分类号： G02B3/0056 , G02B21/002 , G02B21/367 , G03F7/7005 , G03F7/70275 , G03F7/70291 , G03F7/70391
摘要： A multi-axis projection imaging system. Such a system includes a plurality of objectives (134a) defining respective object fields of view and corresponding image fields of view. An object (0) is adapted for controllably illuminating the object fields of view with light that varies spatially in one or more selected characteristics, for creating respective images within the image fields of view. A preferred use of the present invention is in standard photolithographic manufacturing of an integrated circuit, where a semiconductor wafer device Ob includes a layer 136 of photoresist. Light produced by the object 128 is imaged onto the photoresist to expose the photoresist according to a defined pattern of circuit features known as a "mask" in the art of integrated circuit manufacture. However, it should be understood that the light may be imaged onto any device for any purpose without departing from the principles of the invention.
摘要翻译：多轴投影成像系统。这样的系统包括限定相应的对象视场和对应的图像视场的多个目标（134a）。物体（0）适于用在一个或多个所选特征中空间变化的光来可控地照亮物体视野，以在图像视场内创建各自的图像。本发明的优选用途是集成电路的标准光刻制造，其中半导体晶片装置Ob包括光刻胶层136。由物体128产生的光被成像到光致抗蚀剂上以根据集成电路制造领域中被称为“掩模”的已定义的电路特征图案曝光光致抗蚀剂。然而，应当理解，在不脱离本发明的原理的情况下，光可以成像到任何设备上用于任何目的。

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