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1. 发明申请

US20090026912A1 INTENSITY MODULATED ELECTRON BEAM AND APPLICATION TO ELECTRON BEAM BLANKER 审中-公开
标题翻译：强度调制电子束和应用于电子束保护膜
公开(公告)号：US20090026912A1
公开(公告)日：2009-01-29
申请号：US11829034
申请日：2007-07-26
申请人： Vincenzo Lordi , Kirkwood Rough , Xuefeng Liu , Shem-Tov Levi
发明人： Vincenzo Lordi , Kirkwood Rough , Xuefeng Liu , Shem-Tov Levi
IPC分类号： H01J37/302 , H01J29/51 , H01J37/30
CPC分类号： H01J37/063 , B82Y10/00 , B82Y40/00 , H01J37/045 , H01J37/073 , H01J37/075 , H01J37/3174 , H01J2237/0432
摘要： Method and apparatus for achieving an intensity modulated electron blanker are disclosed. An apparatus includes a cathode exposed to an activation source to generate an electron beam. Cathode control circuitry adjusts a cathode control amplifier to regulate cathode voltage and the potential of the electron beam. In some approaches the electron beam potential is used to control the blanking frequency, switching speeds, and duty cycle. In another approach electron generating beams directed on to the cathode are modulated to control the electron beam.
摘要翻译：公开了用于实现强度调制的电子消除器的方法和装置。一种装置包括暴露于激活源的阴极以产生电子束。阴极控制电路调节阴极控制放大器以调节阴极电压和电子束的电位。在一些方法中，电子束电位用于控制消隐频率，开关速度和占空比。在另一种方法中，调节指向阴极的电子产生光束以控制电子束。

2. 发明申请

US20080145767A1 METHOD OF DATA ENCODING, COMPRESSION, AND TRANSMISSION ENABLING MASKLESS LITHOGRAPHY 有权
标题翻译：数据编码，压缩和传输方法启用MASKLESS LITHOGRAPHY
公开(公告)号：US20080145767A1
公开(公告)日：2008-06-19
申请号：US11624652
申请日：2007-01-18
申请人： Vincenzo Lordi , Shem-Tov Levi , Harald F. Hess
发明人： Vincenzo Lordi , Shem-Tov Levi , Harald F. Hess
IPC分类号： G03F1/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/68 , H01J2237/31762 , Y10S430/143
摘要： A method and tool for conducting charged-particle beam direct write lithography is disclosed. A disclosed method involves condensing an initial design file down to a set of profiles and a pattern of relative locations to form a formatted pattern file. The formatted pattern file is adjusted to accommodate desired pattern corrections. Portions of the formatted pattern records are extracted to form data strips that have a plurality of channels with a pattern of profiles and spatial indicators. Data strips are sequentially read to construct a printable pattern of profiles and spatial indicators that specify the locations of the profiles. Additionally, the pattern of profiles are sequentially printed from each data strip onto a substrate to form the desired pattern on the substrate.
摘要翻译：公开了一种用于进行带电粒子束直写光刻的方法和工具。所公开的方法包括将初始设计文件缩小到一组简档和相对位置的图案以形成格式化的图案文件。格式化的图案文件被调整以适应所需的图案校正。提取格式化图案记录的部分以形成具有多个具有轮廓和空间指示符的图形的通道的数据条。依次读取数据条以构成可指定轮廓位置的可打印模式和指定轮廓位置的空间指示器。此外，轮廓的图案从每个数据带顺序地印刷到基底上以在基底上形成期望的图案。

3. 发明授权

US07704653B2 Method of data encoding, compression, and transmission enabling maskless lithography 有权
标题翻译：可进行无掩模光刻的数据编码，压缩和传输方法
公开(公告)号：US07704653B2
公开(公告)日：2010-04-27
申请号：US11624652
申请日：2007-01-18
申请人： Vincenzo Lordi , Shem-Tov Levi , Harald F. Hess
发明人： Vincenzo Lordi , Shem-Tov Levi , Harald F. Hess
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/68 , H01J2237/31762 , Y10S430/143
摘要： A method and tool for conducting charged-particle beam direct write lithography is disclosed. A disclosed method involves condensing an initial design file down to a set of profiles and a pattern of relative locations to form a formatted pattern file. The formatted pattern file is adjusted to accommodate desired pattern corrections. Portions of the formatted pattern records are extracted to form data strips that have a plurality of channels with a pattern of profiles and spatial indicators. Data strips are sequentially read to construct a printable pattern of profiles and spatial indicators that specify the locations of the profiles. Additionally, the pattern of profiles are sequentially printed from each data strip onto a substrate to form the desired pattern on the substrate.
摘要翻译：公开了一种用于进行带电粒子束直写光刻的方法和工具。所公开的方法包括将初始设计文件缩小到一组简档和相对位置的图案以形成格式化的图案文件。格式化的图案文件被调整以适应所需的图案校正。提取格式化图案记录的部分以形成具有多个具有轮廓和空间指示符的图形的通道的数据条。依次读取数据条以构成可指定轮廓位置的可打印模式和指定轮廓位置的空间指示器。此外，轮廓的图案从每个数据带顺序地印刷到基底上以在基底上形成期望的图案。

4. 发明申请

US20070029506A1 Systems, control subsystems, and methods for projecting an electron beam onto a specimen 失效
标题翻译：系统，控制子系统以及将电子束投射到样品上的方法
公开(公告)号：US20070029506A1
公开(公告)日：2007-02-08
申请号：US11198985
申请日：2005-08-08
申请人： Marek Zywno , Marian Mankos , Harald Hess , Shem-Tov Levi
发明人： Marek Zywno , Marian Mankos , Harald Hess , Shem-Tov Levi
IPC分类号： G01N23/00
CPC分类号： H01J37/304 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/2817 , H01J2237/31766
摘要： Systems, control subsystems, and methods for projecting an electron beam onto a specimen are provided. One system includes a stage configured to move the specimen with a non-uniform velocity. The system also includes a projection subsystem configured to project the electron beam onto the specimen while the stage is moving the specimen at the non-uniform velocity. In addition, the system includes a control subsystem configured to alter one or more characteristics of the electron beam while the projection subsystem is projecting the electron beam onto the specimen based on the non-uniform velocity. One method includes moving the specimen with a non-uniform velocity and projecting the electron beam onto the specimen during movement of the specimen. In addition, the method includes altering one or more characteristics of the electron beam during projection of the electron beam onto the specimen based on the non-uniform velocity.
摘要翻译：提供了将电子束投射到试样上的系统，控制子系统和方法。一个系统包括配置成以不均匀的速度移动样本的台。该系统还包括一个投影子系统，配置成将电子束投射到样本上，同时舞台以不均匀的速度移动样本。另外，该系统包括控制子系统，该控制子系统被配置为改变电子束的一个或多个特性，同时投影子系统基于非均匀速度将电子束投影到样本上。一种方法包括以不均匀的速度移动样品并在样品移动期间将电子束投射到样品上。另外，该方法包括在基于非均匀速度将电子束投影到样本上时改变电子束的一个或多个特性。

5. 发明授权

US07342238B2 Systems, control subsystems, and methods for projecting an electron beam onto a specimen 失效
标题翻译：系统，控制子系统以及将电子束投射到样品上的方法
公开(公告)号：US07342238B2
公开(公告)日：2008-03-11
申请号：US11198985
申请日：2005-08-08
申请人： Marek Zywno , Marian Mankos , Harald Hess , Shem-Tov Levi
发明人： Marek Zywno , Marian Mankos , Harald Hess , Shem-Tov Levi
IPC分类号： G01N23/00
CPC分类号： H01J37/304 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/2817 , H01J2237/31766
摘要： Systems, control subsystems, and methods for projecting an electron beam onto a specimen are provided. One system includes a stage configured to move the specimen with a non-uniform velocity. The system also includes a projection subsystem configured to project the electron beam onto the specimen while the stage is moving the specimen at the non-uniform velocity. In addition, the system includes a control subsystem configured to alter one or more characteristics of the electron beam while the projection subsystem is projecting the electron beam onto the specimen based on the non-uniform velocity. One method includes moving the specimen with a non-uniform velocity and projecting the electron beam onto the specimen during movement of the specimen. In addition, the method includes altering one or more characteristics of the electron beam during projection of the electron beam onto the specimen based on the non-uniform velocity.
摘要翻译：提供了将电子束投射到试样上的系统，控制子系统和方法。一个系统包括配置成以不均匀的速度移动样本的台。该系统还包括一个投影子系统，配置成将电子束投射到样本上，同时舞台以不均匀的速度移动样本。另外，该系统包括控制子系统，该控制子系统被配置为改变电子束的一个或多个特性，同时投影子系统基于非均匀速度将电子束投影到样本上。一种方法包括以不均匀的速度移动样品并在样品移动期间将电子束投射到样品上。另外，该方法包括在基于非均匀速度将电子束投影到样本上时改变电子束的一个或多个特性。

6. 发明授权

US6121931A Planar dual-frequency array antenna 失效
标题翻译：平面双频阵列天线
公开(公告)号：US6121931A
公开(公告)日：2000-09-19
申请号：US214301
申请日：1999-06-11
申请人： Shem-Tov Levi
发明人： Shem-Tov Levi
IPC分类号： H01Q5/00 , H01Q20060101 , H01Q1/38 , H01Q3/26 , H01Q5/42 , H01Q15/00 , H01Q21/06 , H01Q21/28 , H01Q21/30
CPC分类号： H01Q21/065 , H01Q15/006 , H01Q5/42
摘要： A dual-frequency array antenna having an essentially planar structure with electronic beam steering capability in both a low and high frequency band independently of each other, constructed, in a layered formation, from a top planar array antenna unit operating in the low frequency band and a bottom planar array antenna unit operating in the high frequency band. The top planar array antenna is transparent to frequencies in the high frequency band.
摘要翻译： PCT No.PCT / IL96 / 00037 Sec。 371日期1999年6月11日第 102（e）1999年6月11日PCT PCT 1996年7月4日PCT公布。第WO98 / 01921号公报日期1998年1月15日一种具有基本平面结构的双频阵列天线，其具有彼此独立的低频和高频带中的电子波束操纵能力，以分层形式从从顶部平面阵列天线单元低频带和在高频带中工作的底部平面阵列天线单元。顶部平面阵列天线对于高频带中的频率是透明的。

7. 发明授权

US06498545B1 Phase control device 失效
标题翻译：相控装置
公开(公告)号：US06498545B1
公开(公告)日：2002-12-24
申请号：US09230267
申请日：1999-12-20
申请人： Shem-Tov Levi
发明人： Shem-Tov Levi
IPC分类号： H01P118
CPC分类号： H01Q3/34
摘要： A phase control device, for providing a plurality of phase values, for utilization by any system having a number of input/output ports with signals requiring control of their relative phases. The phase control device is constructed from phase shift elements electrically connected to a system of electrically interconnected switches separated off from the phase shift elements. The result is a reduction in the number of phase shift elements and switches as compared to conventional phase shifters and a simplification of the resulting architecture, a feature of significant importance in chip miniaturization.
摘要翻译：一种用于提供多个相位值的相位控制装置，用于具有多个输入/输出端口的任何系统的利用，该信号需要控制其相对相位的信号。相位控制装置由电连接到从相移元件分离的电互连开关的系统的相移元件构成。结果是与常规移相器相比，相移元件和开关的数量减少，并且最终架构的简化，这在芯片小型化方面具有重要意义。

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