专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5801386A Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using same 失效
标题翻译：用于测量半导体晶片处理系统内的等离子体特性的装置及其制造和使用方法
公开(公告)号：US5801386A
公开(公告)日：1998-09-01
申请号：US653212
申请日：1996-05-28
申请人： Valentin N. Todorov , Yoshi Tanase , Xue-Yu Qian , Arthur H. Sato , Peter Loewenhardt , Yan Ye , Shaoher X. Pan , Dragan Podlesnik
发明人： Valentin N. Todorov , Yoshi Tanase , Xue-Yu Qian , Arthur H. Sato , Peter Loewenhardt , Yan Ye , Shaoher X. Pan , Dragan Podlesnik
IPC分类号： H01J37/32 , H01J37/244
CPC分类号： H01J37/32935
摘要： Apparatus for measuring plasma characteristics within a semiconductor wafer processing system and a method of fabricating and using the apparatus. The apparatus contains a first insulator layer upon which one or more conductive collector pads are formed by patterning and etching a copper laminate. Each collector pad is connected to a conductive lead (e.g., a printed circuit trace) that extends from each collector pad to the edge of the first insulator layer. A second insulator layer is positioned above the first insulator layer such that the collector pad(s) and their respective lead(s) are sandwiched between the two insulator layers. An adhesive is used to affix the second insulator to the first insulator and the collector pads. The collector pads are exposed to the plasma through apertures defined by the second insulator layer.
摘要翻译：用于测量半导体晶片处理系统内的等离子体特性的装置及其制造和使用方法。该装置包含第一绝缘体层，通过图案化和蚀刻铜层压体而形成一个或多个导电集电极焊盘。每个集电极焊盘连接到从每个集电极焊盘延伸到第一绝缘体层的边缘的导电引线（例如印刷电路迹线）。第二绝缘体层位于第一绝缘体层之上，使得集电极焊盘及其相应的引线夹在两个绝缘体层之间。使用粘合剂将第二绝缘体固定到第一绝缘体和集电板。集电极焊盘通过由第二绝缘体层限定的孔暴露于等离子体。

2. 发明授权

US06447636B1 Plasma reactor with dynamic RF inductive and capacitive coupling control 失效
标题翻译：具有动态RF感应和电容耦合控制的等离子体电抗器
公开(公告)号：US06447636B1
公开(公告)日：2002-09-10
申请号：US09505578
申请日：2000-02-16
申请人： Xue-Yu Qian , Zhi-Wen Sun , Maocheng Li , John Holland , Arthur H. Sato , Valentin N. Todorov , Patrick L. Leahey , Robert E. Ryan
发明人： Xue-Yu Qian , Zhi-Wen Sun , Maocheng Li , John Holland , Arthur H. Sato , Valentin N. Todorov , Patrick L. Leahey , Robert E. Ryan
IPC分类号： H05H100
CPC分类号： H01J37/32009 , H01J37/32082 , H01J37/3299 , H05H1/46
摘要： The invention provides a system and a method for dynamic RF inductive and capacitive coupling control to improve plasma substrate processing, as well as for achieving contamination and defect reduction. A plasma reactor includes a substrate support disposed in a chamber. An RF coil is disposed adjacent the chamber for inductively coupling RF energy into the chamber. An electrode is disposed adjacent the chamber and has a voltage for capacitively coupling energy into the chamber. The electrode is spaced from the substrate support and the RF coil. An electrode adjusting member is coupled with the electrode for dynamically adjusting the voltage in the electrode to vary the capacitive coupling for improved plasma ignition and plasma stability. A Faraday shield may be placed between the RF coil and the plasma process region in the chamber to suppress capacitive coupling of the RF coil. Sensors may be provided to monitor the amounts of inductive coupling and capacitive coupling to provide feedback to a controller which is used to adjust the inductive coupling and capacitive coupling in real time to stabilize the plasma and achieve improved processing.
摘要翻译：本发明提供了用于动态RF感应和电容耦合控制以改善等离子体基板处理以及实现污染和缺陷减少的系统和方法。等离子体反应器包括设置在室中的基板支撑件。射频线圈邻近该腔室设置，用于将射频能量感应耦合到腔室中。电极邻近该腔室设置并且具有用于将能量电容耦合到腔室中的电压。电极与衬底支架和RF线圈间隔开。电极调节构件与电极耦合以动态地调节电极中的电压，以改变电容耦合以改善等离子体点火和等离子体稳定性。法拉第屏蔽可以放置在RF线圈和腔室中的等离子体处理区域之间，以抑制RF线圈的电容耦合。可以提供传感器来监测电感耦合和电容耦合的量以向控制器提供反馈，该控制器用于实时调整电感耦合和电容耦合以稳定等离子体并实现改进的处理。

3. 发明授权

US06369349B2 Plasma reactor with coil antenna of interleaved conductors 有权
标题翻译：等离子电抗器与交错导线的线圈天线
公开(公告)号：US06369349B2
公开(公告)日：2002-04-09
申请号：US09742988
申请日：2000-12-20
申请人： Xue-Yu Qian , Arthur H. Sato
发明人： Xue-Yu Qian , Arthur H. Sato
IPC分类号： B23K1000
CPC分类号： H01J37/321 , H05H1/46
摘要： The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber, the coil antenna including plural helical conductors each having a first end and a second end, the first ends being adapted for connection to a first common RF potential, the second ends being adapted for connection to a second common RF potential, each of the plural conductors being wound about a common axis of helical symmetry, each of the second ends being spaced substantially equally from the axis and from each other.
摘要翻译：本发明体现在用于将由RF源提供的RF功率辐射到真空室中的线圈天线，线圈天线包括多个螺旋导体，每个螺旋导体具有第一端和第二端，第一端适于连接到第一共同 RF电位，所述第二端适于连接到第二公共RF电位，所述多个导体中的每一个缠绕在共同的螺旋对称轴上，每个所述第二端基本上与所述轴线彼此间隔开。

4. 发明授权

US06291793B1 Inductively coupled plasma reactor with symmetrical parallel multiple coils having a common RF terminal 失效
公开(公告)号：US06291793B1
公开(公告)日：2001-09-18
申请号：US09389152
申请日：1999-09-02
申请人： Xue-Yu Qian , Arthur H. Sato
发明人： Xue-Yu Qian , Arthur H. Sato
IPC分类号： B23K1000
CPC分类号： H01J37/32082 , H01J37/321 , H05H1/46
摘要： The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber of an inductively coupled plasma reactor which processes a semiconductor wafer in the vacuum chamber, the reactor having a gas supply inlet for supplying processing gases into the vacuum chamber, the coil antenna including plural concentric spiral conductive windings, each of the windings having an interior end near an apex of a spiral of the winding and an outer end at a periphery of the spiral of the winding, and a common terminal connected to the interior ends of the plural concentric spiral windings, the RF power source being connected across the terminal and the outer end of each one of the windings.

5. 发明授权

US06369348B2 Plasma reactor with coil antenna of plural helical conductors with equally spaced ends 有权
标题翻译：等离子体反应器，其具有多个具有等间距端部的螺旋导体的线圈天线
公开(公告)号：US06369348B2
公开(公告)日：2002-04-09
申请号：US09742051
申请日：2000-12-20
申请人： Xue-Yu Qian , Arthur H. Sato
发明人： Xue-Yu Qian , Arthur H. Sato
IPC分类号： B23K900
CPC分类号： H01J37/321 , H05H1/46
摘要： The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber, the coil antenna including plural helical conductors each having a first end and a second end, the first ends being adapted for connection to a first common RF potential, the second ends being adapted for connection to a second common RF potential, each of the plural conductors being wound about a common axis of helical symmetry, each of the second ends being spaced substantially equally from the axis and from each other.
摘要翻译：本发明体现在用于将由RF源提供的RF功率辐射到真空室中的线圈天线，线圈天线包括多个螺旋导体，每个螺旋导体具有第一端和第二端，第一端适于连接到第一共同 RF电位，所述第二端适于连接到第二公共RF电位，所述多个导体中的每一个缠绕在共同的螺旋对称轴上，每个所述第二端基本上与所述轴线彼此间隔开。

6. 发明授权

US6016131A Inductively coupled plasma reactor with an inductive coil antenna having independent loops 有权
标题翻译：具有独立回路的感应线圈天线的感应耦合等离子体反应器
公开(公告)号：US6016131A
公开(公告)日：2000-01-18
申请号：US305091
申请日：1999-05-03
申请人： Arthur H. Sato , Xue-Yu Qian
发明人： Arthur H. Sato , Xue-Yu Qian
IPC分类号： H01J37/32 , H01Q1/36
CPC分类号： H01J37/321
摘要： An inductively coupled plasma reactor for processing a substrate has an inductively coupled coil antenna including plural inductive antenna loops which are electrically separated from one another and independently connected to separately controllable plasma source RF power supplies. The RF power level in each independent antenna loop is separately programmed and instantly changeable to provide a perfectly uniform plasma ion density distribution across the entire substrate surface under a large range of plasma processing conditions, such as different process gases or gas mixtures. In a preferred embodiment, there are as many separately controllable RF power supplies as there are independent antenna loops, and all the separately controllable power supplies receive their RF power from a commonly shared RF generator.
摘要翻译：用于处理衬底的电感耦合等离子体反应器具有电感耦合线圈天线，其包括彼此电分离并独立地连接到单独可控的等离子体源RF电源的多个感应天线回路。每个独立天线回路中的RF功率电平被单独编程并且立即可变，以在大范围的等离子体处理条件（例如不同的工艺气体或气体混合物）下在整个衬底表面上提供完全均匀的等离子体离子密度分布。在优选实施例中，存在与独立天线回路一样多的可单独控制的RF电源，并且所有可单独控制的电源从共同共享的RF发生器接收其RF功率。

7. 发明授权

US5907221A Inductively coupled plasma reactor with an inductive coil antenna having independent loops 失效
公开(公告)号：US5907221A
公开(公告)日：1999-05-25
申请号：US515695
申请日：1995-08-16
申请人： Arthur H. Sato , Xue-Yu Qian
发明人： Arthur H. Sato , Xue-Yu Qian
IPC分类号： H01J37/32 , H01J7/24
CPC分类号： H01J37/321
摘要： An inductively coupled plasma reactor for processing a substrate has an inductively coupled coil antenna including plural inductive antenna loops which are electrically separated from one another and independently connected to separately controllable plasma source RF power supplies. The RF power level in each independent antenna loop is separately programmed and instantly changeable to provide a perfectly uniform plasma ion density distribution across the entire substrate surface under a large range of plasma processing conditions, such as different process gases or gas mixtures. In a preferred embodiment, there are as many separately controllable RF power supplies as there are independent antenna loops, and all the separately controllable power supplies receive their RF power from a commonly shared RF generator.

8. 发明授权

US5683539A Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling 失效
标题翻译：具有浮动线圈天线的电感耦合射频等离子体反应器，用于降低电容耦合
公开(公告)号：US5683539A
公开(公告)日：1997-11-04
申请号：US480174
申请日：1995-06-07
申请人： Xue-Yu Qian , Arthur H. Sato
发明人： Xue-Yu Qian , Arthur H. Sato
IPC分类号： H05H1/46 , C23C16/50 , C23F4/00 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/31 , C23F1/02
CPC分类号： H01J37/32174 , H01J37/321
摘要： In an inductively coupled RF plasma reactor having an inductive coil antenna connected through an RF impedance match network to an RF power source, capacitive coupling from the antenna to the plasma is reduced by isolating the coil antenna from the RF power source by an isolation transformer, so that the potential of the coil antenna is floating. The output of the RF impedance match network is connected across the primary winding of the isolation transformer while the floating coil antenna is connected across the secondary winding of the isolation transformer.
摘要翻译：在具有通过RF阻抗匹配网络连接到RF电源的感应线圈天线的感应耦合射频等离子体反应器中，通过隔离变压器将线圈天线与RF电源隔离，从天线到等离子体的电容耦合得以减小，使得线圈天线的电位是浮动的。射频阻抗匹配网络的输出端连接在隔离变压器的初级绕组上，而浮动线圈天线连接在隔离变压器的次级绕组上。

9. 发明授权

US06504126B2 Plasma reactor with coil antenna of concentrically spiral conductors with ends in common regions 失效
标题翻译：等离子体反应器，具有同轴螺旋导体的线圈天线，端部在公共区域
公开(公告)号：US06504126B2
公开(公告)日：2003-01-07
申请号：US09742951
申请日：2000-12-20
申请人： Xue-Yu Qian , Arthur H. Sato
发明人： Xue-Yu Qian , Arthur H. Sato
IPC分类号： B23K1000
CPC分类号： H01J37/321 , H05H1/46
摘要： The invention is embodied in an antenna for radiating RF power supplied by an RF source into a vacuum chamber, the antenna including plural concentrically spiral conductors, each having a first end located in a first common region and a second end located in a second common region, and each being wound about a common axis passing through both regions, the regions being concentric with the axis, the conductors being substantially the same length, substantially the same shape, and substantially evenly spaced with respect to each other about the common axis.
摘要翻译：本发明体现在用于将由RF源提供的RF功率辐射到真空室中的天线，该天线包括多个同心圆形导体，每个具有位于第一公共区域的第一端和位于第二公共区域中的第二端并且每个绕着通过两个区域的公共轴线缠绕，所述区域与轴线同心，所述导体基本上相同的长度，基本上相同的形状，并且围绕公共轴线彼此基本上均匀间隔开。

10. 发明授权

US06373022B1 Plasma reactor with antenna of coil conductors of concentric helices offset along the axis of symmetry 有权
公开(公告)号：US06373022B1
公开(公告)日：2002-04-16
申请号：US09742558
申请日：2000-12-20
申请人： Xue-Yu Qian , Arthur H. Sato
发明人： Xue-Yu Qian , Arthur H. Sato
IPC分类号： B23K1000
摘要： The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber, the coil antenna including plural helical conductors each having a first end and a second end, the first ends being adapted for connection to a first common RF potential, the second ends being adapted for connection to a second common RF potential, each of the plural conductors being wound about a common axis of helical symmetry, each of the second ends being spaced substantially equally from the axis and from each other.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式