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1. 发明申请

US20090012428A1 REUSABLE PIERCING AID AND METHOD FOR CARRYING OUT A PIERCING MOVEMENT BY MEANS OF A REUSABLE PIERCING AID 审中-公开
标题翻译：可重复使用的打桩助手和方法，用于通过可重复使用的刺激助手进行踩踏运动
公开(公告)号：US20090012428A1
公开(公告)日：2009-01-08
申请号：US12132372
申请日：2008-06-03
申请人： Uwe Kramer , Joachim Hoenes , Karl Miltner , Hans List , Michael Keil
发明人： Uwe Kramer , Joachim Hoenes , Karl Miltner , Hans List , Michael Keil
IPC分类号： A61B5/151 , A61B17/32
CPC分类号： A61B5/15194 , A61B5/14532 , A61B5/150022 , A61B5/150358 , A61B5/150412 , A61B5/150503 , A61B5/15111 , A61B5/15117 , A61B5/15125 , A61B5/15128 , A61B5/15146 , A61B5/1519
摘要： The invention relates to a reusable piercing aid, containing a lancet, an energy store for transmission of energy stored in the energy store to the lancet in order to carry out a piercing movement, a charging device for charging the energy store, and a control unit, wherein the control unit is designed in such a way that, following the piercing movement, it controls the charging device such that, following the piercing movement, the energy store is automatically charged with energy for the next piercing movement of the lancet.
摘要翻译：本发明涉及一种可重复使用的刺穿辅助装置，其包括柳叶刀，用于将存储在能量储存器中的能量传输到刺血针以便进行刺穿运动的能量储存器，用于对能量储存器充电的充电装置，以及控制单元其特征在于，所述控制单元被设计成使得在所述穿孔运动之后，所述控制单元控制所述充电装置，使得在所述穿孔运动之后，所述能量存储器自动地为所述刺血针的下一次穿刺运动而充满能量。

2. 发明申请

US20120051983A1 CONSUMABLE ELEMENT MAGAZINE FOR A MEASURING SYSTEM FOR DETERMINING AN ANALYTE CONCENTRATION 有权
标题翻译：用于确定分析仪浓度的测量系统的消耗元素杂志
公开(公告)号：US20120051983A1
公开(公告)日：2012-03-01
申请号：US13218215
申请日：2011-08-25
申请人： Joachim Hoenes , Uwe Kramer
发明人： Joachim Hoenes , Uwe Kramer
IPC分类号： G01N33/48 , G07F11/00
CPC分类号： G01N35/00732 , A61B5/1411 , A61B5/14532 , A61B5/150022 , A61B5/150358 , A61B5/150793 , A61B5/15146 , A61B5/157 , A61B2562/0295 , B01L99/00 , B01L2300/022 , B01L2300/024 , B01L2300/0825 , G01N33/4875 , G01N35/00663 , G01N2035/00089 , G01N2035/00801 , G01N2035/00851
摘要： The invention relates to a magazine for a device of a measuring system for determining an analyte concentration in a body fluid sample, wherein the magazine contains consumable analytical elements in a plurality of chambers. According to the invention, a data carrier, on which information is stored, is fastened to the magazine, the information indicating which magazine chambers are not intended for removal of a consumable element due to manufacturing defects. The invention further relates to a device, the control unit of which suppresses access by the removal unit to predefined magazine chambers, to a measuring system comprising such a device and a magazine, and to a method for controlling the removal unit of the device.
摘要翻译：本发明涉及一种用于测定体液样品中分析物浓度的测量系统的装置的盒子，其中该盒子包含多个腔室中的消耗性分析元件。根据本发明，存储有信息的数据载体被固定到盒体上，该信息指示由于制造缺陷而不用于去除可消耗元件的哪些盒室。本发明还涉及一种装置，其控制单元抑制由去除单元到预定义的仓库室的访问到包括这种装置和仓库的测量系统以及用于控制装置的去除单元的方法。

3. 发明申请

US20070217950A1 SYSTEM AND METHOD FOR ANALYZING A SAMPLE LIQUID 有权
标题翻译：用于分析样品液体的系统和方法
公开(公告)号：US20070217950A1
公开(公告)日：2007-09-20
申请号：US11559472
申请日：2006-11-14
申请人： Uwe Kramer , Hans List
发明人： Uwe Kramer , Hans List
IPC分类号： G01N35/00 , G01N21/84
CPC分类号： G01N21/55 , A61B5/14532 , A61B2562/0295 , G01N33/48764 , G01N35/00009 , G01N2021/8488 , G01N2035/00019 , Y10T436/110833 , Y10T436/112499 , Y10T436/12
摘要： The present invention provides a system for analyzing a sample liquid comprising a test tape having a plurality of test elements, a tape transport device which successively transports the test elements to a sample application site while advancing the tape, and a measuring device which scans the test elements loaded with sample liquid at a measuring site. The measuring site is located at a distance from the sample application site in the direction of tape movement. The tape transport is interrupted in order to exactly position a wetted area of the test elements carrying a sample liquid at the measuring site by means of a positioning device that responds to the presence of sample liquid on the test element.
摘要翻译：本发明提供了一种用于分析样品液体的系统，该系统包括具有多个测试元件的测试带，在传送带的同时将测试元件连续传输到样品施加部位的带传送装置，以及扫描测试的测量装置在测量位置装载样品液体的元件。测量位置距胶带移动方向距样品应用场所一定距离。磁带传送被中断，以便通过对测试元件上的样品液体的存在作出响应的定位装置精确定位在测量位置携带样品液体的测试元件的润湿区域。

4. 发明授权

US07930654B2 System and method of correcting errors in SEM-measurements 有权
标题翻译：校正SEM测量误差的系统和方法
公开(公告)号：US07930654B2
公开(公告)日：2011-04-19
申请号：US12112835
申请日：2008-04-30
申请人： Uwe Kramer , Robert Wildfeuer
发明人： Uwe Kramer , Robert Wildfeuer
IPC分类号： G06F17/50
CPC分类号： H01J37/263 , G03F1/36 , G03F1/84 , G03F7/70441 , G03F7/70516 , G03F7/70616 , G03F7/70625 , G06T7/0006 , G06T7/13 , G06T2207/10061 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2826 , H01L22/12
摘要： Embodiments of the invention relate to correcting errors in scanning electron measurements during measuring structural dimensions of an integrated circuit for optical proximity correction by extracting feature edges of a test pattern within an image, calculating at least one scaling error of the image by comparing the extracted feature edges of assist structures with a layout pattern, modifying feature edges of test structures within the test pattern by incorporating the at least one scaling error so as to at least partially compensate the scaling errors, and verifying a model for optical proximity corrections and/or model input data by using the modified feature edges of the test structures.
摘要翻译：本发明的实施例涉及通过提取图像内的测试图案的特征边缘来测量用于光学邻近校正的集成电路的结构尺寸来校正扫描电子测量中的误差，通过将所提取的特征进行比较来计算图像的至少一个缩放误差具有布局图案的辅助结构的边缘，通过结合至少一个缩放误差来修改测试图案内的测试结构的特征边缘，以便至少部分地补偿缩放误差，以及验证光学邻近校正和/或模型的模型通过使用测试结构的修改后的特征边缘输入数据。

5. 发明授权

US5147147A Method for the removal of aqueous liquids from the sump of an underground cavity 失效
标题翻译：从地下洞穴中除去水质液体的方法
公开(公告)号：US5147147A
公开(公告)日：1992-09-15
申请号：US571755
申请日：1990-08-22
申请人： Harald Peterson , Jurgen Martens , Werner Harms , Uwe Kramer
发明人： Harald Peterson , Jurgen Martens , Werner Harms , Uwe Kramer
IPC分类号： B01J19/00 , B65G5/00 , C09K8/86 , E21B43/28 , E21B43/38 , E21F17/16
CPC分类号： C09K8/86 , B01J19/002 , B65G5/00 , E21B43/28 , E21B43/38 , E21F17/16
摘要： A method for the removal of water or aqueous liquids from the sump of an underground cavity, especially a cavern, is based on providing a process in which a water-miscible organic liquid is added to the sump, and then the mixture formed in this way is extracted from the cavity.
摘要翻译：从地下洞穴，特别是洞穴的水槽中除去水或含水液体的方法是基于提供一种将水混溶的有机液体加入到贮槽中的方法，然后以这种方式形成的混合物从空腔中抽出。

6. 发明申请

US20090276735A1 System and Method of Correcting Errors in SEM-Measurements 有权
标题翻译：校正SEM测量误差的系统和方法
公开(公告)号：US20090276735A1
公开(公告)日：2009-11-05
申请号：US12112835
申请日：2008-04-30
申请人： Uwe Kramer , Robert Wildfeuer
发明人： Uwe Kramer , Robert Wildfeuer
IPC分类号： G06F17/50
CPC分类号： H01J37/263 , G03F1/36 , G03F1/84 , G03F7/70441 , G03F7/70516 , G03F7/70616 , G03F7/70625 , G06T7/0006 , G06T7/13 , G06T2207/10061 , G06T2207/30148 , H01J37/265 , H01J37/28 , H01J2237/2826 , H01L22/12
摘要： Embodiments of the invention relate to correcting errors in scanning electron measurements during measuring structural dimensions of an integrated circuit for optical proximity correction by extracting feature edges of a test pattern within an image, calculating at least one scaling error of the image by comparing the extracted feature edges of assist structures with a layout pattern, modifying feature edges of test structures within the test pattern by incorporating the at least one scaling error so as to at least partially compensate the scaling errors, and verifying a model for optical proximity corrections and/or model input data by using the modified feature edges of the test structures.
摘要翻译：本发明的实施例涉及通过提取图像内的测试图案的特征边缘来测量用于光学邻近校正的集成电路的结构尺寸来校正扫描电子测量中的误差，通过将所提取的特征进行比较来计算图像的至少一个缩放误差具有布局图案的辅助结构的边缘，通过结合至少一个缩放误差来修改测试图案内的测试结构的特征边缘，以便至少部分地补偿缩放误差，以及验证光学邻近校正和/或模型的模型通过使用测试结构的修改后的特征边缘输入数据。

7. 发明申请

US20070268034A1 METHOD AND APPARATUS FOR SETTING OF APPLIANCE-SPECIFIC EVALUATION PARAMETERS 审中-公开
标题翻译：用于设置器具特异性评估参数的方法和装置
公开(公告)号：US20070268034A1
公开(公告)日：2007-11-22
申请号：US11750079
申请日：2007-05-17
申请人： Uwe Kramer , Frank Voss
发明人： Uwe Kramer , Frank Voss
IPC分类号： G01R31/02
CPC分类号： G01N23/225 , G06T7/60 , G06T2207/30148 , H01J2237/221 , H01J2237/24592 , H01J2237/2817
摘要： A method and apparatus for setting appliance-specific evaluation parameters in an instrument is disclosed. In one embodiment, a structure is measured using a reference measurement apparatus or a measurement apparatus, and the recorded measurement data is transmitted to the respective other of the two appliances. The measurement data is contained in the data memory of both the instrument and of the reference instrument. The measurement data items are then evaluated by the evaluation device and the reference evaluation device by determining a determined structure size and a reference structure size. The determined structure size is compared with the reference structure size, and the evaluation parameters of the evaluation device are varied until the difference between the determined structure size and the reference structure size is less than a predetermined value.
摘要翻译：公开了一种用于设定仪器特定评估参数的方法和装置。在一个实施例中，使用参考测量装置或测量装置测量结构，并且将记录的测量数据发送到两个装置中的相应另一个。测量数据包含在仪器和参考仪器的数据存储器中。然后通过确定所确定的结构尺寸和参考结构尺寸，由评估装置和参考评估装置评估测量数据项。将确定的结构尺寸与参考结构尺寸进行比较，并且评估装置的评估参数变化，直到所确定的结构尺寸与参考结构尺寸之间的差小于预定值。

8. 发明申请

US20060266953A1 Method and system for determining a positioning error of an electron beam of a scanning electron microscope 审中-公开
标题翻译：用于确定扫描电子显微镜电子束定位误差的方法和系统
公开(公告)号：US20060266953A1
公开(公告)日：2006-11-30
申请号：US11138673
申请日：2005-05-27
申请人： Uwe Kramer , Christoph Nacke
发明人： Uwe Kramer , Christoph Nacke
IPC分类号： H01J37/28
CPC分类号： H01J37/265 , G03F9/7053 , H01J37/28 , H01J2237/2817 , H01J2237/2826 , H01L23/544 , H01L2924/0002 , H01L2924/00
摘要： A substrate having at least four reference patterns at respective nominal positions on a surface is provided. Using a scanning electron microscope and positioning the wafer stage at respective nominal positions of each reference pattern, each reference pattern is scanned. After determining at least a first and a second intensity profile for each pattern, a reference position offset from each nominal position is calculated. The reference position offsets are used to determine a positioning error of the scanning electron microscope.
摘要翻译：提供了在表面上的相应标称位置处具有至少四个参考图案的基板。使用扫描电子显微镜并将晶片台定位在每个参考图案的相应标称位置，扫描每个参考图案。在确定每个图案的至少第一和第二强度分布之后，计算从每个标称位置偏移的基准位置。参考位置偏移用于确定扫描电子显微镜的定位误差。

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