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1. 发明授权

US5407548A Method for coating a substrate of low resistance to corrosion 失效
标题翻译：涂覆耐腐蚀性低的基材的方法
公开(公告)号：US5407548A
公开(公告)日：1995-04-18
申请号：US54690
申请日：1993-04-29
申请人： Uwe Kopacz , Christoph Daube , Andreas Rack , Horst Becker , Uwe Konietzka , Martin Weigert
发明人： Uwe Kopacz , Christoph Daube , Andreas Rack , Horst Becker , Uwe Konietzka , Martin Weigert
IPC分类号： C23C14/00 , C23C14/14 , C23C14/34 , H01J37/34
CPC分类号： H01J37/3426 , C23C14/0036 , C23C14/14 , C23C14/3407 , H01J37/3408 , H01J37/3491 , H01J2237/3321
摘要： The invention concerns a process for coating a substrate 1 of little or no corrosion resistance, especially a metal substrate having an alloy consisting at least of Ni, Cr and Fe, in an evacuable coating chamber 15, 15a. It comprises making an electrode that can be connected to a current supply 10, this electrode being electrically connected to a target 3 which is sputtered and the sputtered particles of which are deposited on the substrate 1. Reactive process gases are, for this purpose, supplied to the coating chamber 15, 15a, so that an amorphously depositing layer 2 is applied onto the substrate.
摘要翻译：本发明涉及一种在可抽真空的涂布室15,15a中涂覆几乎或不具有耐腐蚀性的基材1，特别是具有至少由Ni，Cr和Fe组成的合金的金属基材的方法。它包括制造可以连接到电流源10的电极，该电极电连接到溅射的靶3，并且溅射的颗粒沉积在衬底1上。为此，提供反应性工艺气体到涂覆室15,15a，使得非晶体沉积层2被施加到基底上。

2. 发明授权

US5283435A Apparatus for determining the concentration of a gas in a vacuum chamber 失效
标题翻译：用于确定真空室中的气体浓度的装置
公开(公告)号：US5283435A
公开(公告)日：1994-02-01
申请号：US881618
申请日：1992-05-12
申请人： Christoph Daube , Alfred Belz , Uwe Kopacz
发明人： Christoph Daube , Alfred Belz , Uwe Kopacz
IPC分类号： C23C14/00 , H01L21/203
CPC分类号： C23C14/0036
摘要： An apparatus for determining the concentration of a gas in a vacuum chamber is described. Internal to the vacuum chamber are one or more cathodes. The chamber is fed via a gas inlet and is connected to a separate measurement chamber for accommodating a measuring device via a connecting line between the two chambers. The connecting line in conjunction with a pumping means produces a pressure gradient between the interior of the vacuum chamber and the interior of the measurement chamber. One end of the connecting line, located within the vacuum chamber terminates directly in the central region of a cathode surfaces facing the interior of the chamber, and the length, as well as the cross section of the connecting line being dimensioned so that the pressure gradient between the interior of the vacuum chamber and the interior of the measurement chamber, is precisely that required for measurement.
摘要翻译：描述了一种用于确定真空室中的气体浓度的装置。真空室内部是一个或多个阴极。腔室通过气体入口供给，并连接到单独的测量室，用于通过两个腔室之间的连接线容纳测量装置。连接线与抽吸装置一起产生真空室内部和测量室内部之间的压力梯度。位于真空室内的连接线的一端直接终止于面向腔室内部的阴极表面的中心区域，并且连接线的长度以及横截面被确定为使得压力梯度在真空室的内部和测量室的内部之间，正是测量所需的。

3. 发明授权

US5277778A Method for coating components or shapes by cathode sputtering 失效
标题翻译：通过阴极溅射涂覆部件或形状的方法
公开(公告)号：US5277778A
公开(公告)日：1994-01-11
申请号：US755292
申请日：1991-09-05
申请人： Christoph Daube , Uwe Kopacz , Siegfried Schulz
发明人： Christoph Daube , Uwe Kopacz , Siegfried Schulz
IPC分类号： C23C14/35 , C23C14/34 , H01J37/34
CPC分类号： H01J37/3452 , C23C14/3407 , H01J37/3405
摘要： Coating of components and shapes by cathode sputtering of target material of a first cathode system (6) with concentration of a first discharge space (plasma cloud) in the vicinity of the target surface by a spatially closed magnetic field (plasma trap) opposite the target (12). The field strength is reduced in front of the target surface by an additional magnet associated with a lateral boundary of the target.
摘要翻译：通过与目标表面相对的空间闭合磁场（等离子体阱）在靶表面附近通过阴极溅射阴极溅射第一阴极系统（6）的第一放电空间（等离子体云）浓度的第一放电空间（等离子体云）来涂覆部件和形状（12）。通过与目标的横向边界相关联的附加磁体，在目标表面的前方减小场强。

4. 发明授权

US5022978A Apparatus for coating three dimensional substrates by means of cathode sputtering 失效
标题翻译：用于通过阴极溅射涂覆三维基板的装置
公开(公告)号：US5022978A
公开(公告)日：1991-06-11
申请号：US548299
申请日：1990-07-05
申请人： Bernd Hensel , Uwe Kopacz , Dieter Hofmann , Hans Schussler , Gunter Eckhardt
发明人： Bernd Hensel , Uwe Kopacz , Dieter Hofmann , Hans Schussler , Gunter Eckhardt
IPC分类号： C23C14/35 , C23C14/50 , H01J37/34
CPC分类号： H01J37/3405 , C23C14/35 , C23C14/351 , C23C14/505
摘要： A device for coating substrates has a rectangular magnetron cathode 2 with a target, a substrate holder 16 that can be rotated around a rotating axis 17 which is parallel to the longitudinal edges of the target, a planar wall 20 made of a non-magnetic material and having longitudinal edges 21, 22 also parallel to the rotating axis 17. Behind the wall there is a magnet arrangement and the magnetron cathode 2 and the wall 20 are disposed on opposite sides of the rotating axis. The device further includes a planar anode. In order to intensify and the effect of the plasma and render it more uniform, the distance on the substrate path between the longitudinal edges 12, 13 of the target and the longitudinal edges 21, 22 of the wall parallel thereto is reduced by at least one additional wall 25, 26 with a magnet arrangement 27, 28 disposed therebehind. Further, the poles of all the magnet arrangements 23, 27, 28 alternate on the circumference of the substrate holder 16 such that the entire circumference of the substrate holder is surrounded by an uninterrupted series of magnetic tunnels.
摘要翻译：用于涂布基板的装置具有带靶的矩形磁控管阴极2，可以围绕平行于靶的纵向边缘的旋转轴线17旋转的基板保持器16，由非磁性材料制成的平面壁20 并且具有也平行于旋转轴线17的纵向边缘21,22。在壁之后存在磁体布置，并且磁控管阴极2和壁20设置在旋转轴线的相对侧上。该装置还包括平面阳极。为了加强等离子体的作用并使其更加均匀，靶材的纵向边缘12,13与平行于其的壁的纵向边缘21,22之间的基板路径上的距离减小了至少一个另外的壁25,26具有设置在其上的磁体布置27,28。此外，所有磁体布置23,27,28的磁极在基板保持器16的圆周上交替，使得基板保持器的整个圆周被不间断的一系列磁性通道包围。

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