专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2013048226A Systems and methods for forming time-averaged line image 有权
标题翻译：用于形成时间线图像的系统和方法
公开(公告)号：JP2013048226A
公开(公告)日：2013-03-07
申请号：JP2012161562
申请日：2012-07-20
申请人： Ultratech Inc , ウルトラテックインク
发明人： SERGUEI ANIKITCHEV , JAMES T MCWHIRTER , JOSEPH E GORTYCH
IPC分类号： H01L21/268 , H01L21/265
CPC分类号： H01L21/268 , B23K26/0006 , B23K26/0066 , B23K26/03 , B23K26/0608 , B23K26/067 , B23K26/0732 , B23K26/0738 , B23K26/0853 , B23K2203/50 , B23K2203/56
摘要： PROBLEM TO BE SOLVED: To provide systems and methods for forming a time-average line image.SOLUTION: The method includes forming a line image with a first amount of intensity non-uniformity. The method also includes forming and scanning a secondary image over at least a portion of the line image to form a time-averaged modified line image having a second amount of intensity non-uniformity that is less than the first amount. Wafer emissivity is measured in real time to control the intensity of the secondary image. Temperature is also measured in real time based on the wafer emissivity and reflectivity of the secondary image, and can be used to control the intensity of the secondary image.
摘要翻译：要解决的问题：提供用于形成时间平均线图像的系统和方法。解决方案：该方法包括形成第一强度不均匀的线图像。该方法还包括在线图像的至少一部分上形成和扫描次级图像以形成具有小于第一量的第二强度不均匀量的时间平均修改线图像。实时测量晶片发射率以控制次级图像的强度。也可以基于晶片的发射率和次级图像的反射率实时测量温度，并且可以用于控制次级图像的强度。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2012129500A System and method for forming time averaged line image 有权
标题翻译：用于形成时间平均线图像的系统和方法
公开(公告)号：JP2012129500A
公开(公告)日：2012-07-05
申请号：JP2011226264
申请日：2011-10-13
申请人： Ultratech Inc , ウルトラテックインク
发明人： SERGUEI ANIKITCHEV , JAMES T MCWHIRTER , JOSEPH E GORTYCH
IPC分类号： H01L21/268 , H01L21/265
CPC分类号： H01L21/268 , B23K26/006 , B23K26/0066 , B23K26/0738
摘要： PROBLEM TO BE SOLVED: To provide a system and method for forming a time averaged line image having a relatively high uniformity in intensity of laer light in the length direction.SOLUTION: A line image 36 having nonuniformity in intensity of first quantity in a major axis direction is formed on an image plane, and a secondary image 66 which at least partially overlaps with the line image 36 is formed. The method includes scanning the secondary image 66 at least at a part of the line image in the major axis direction according to a scanning profile to form a time averaged correction line image 36' having the intensity nonuniformity of second quantity in the major axis direction which is less than the first quantity. When performing laser annealing on a semiconductor wafer 40, the line image overlap amount of a scanning route part which adjoins a wafer scanning route is substantially reduced for increased wafer throughput.
摘要翻译：要解决的问题：提供一种用于形成在长度方向上具有较高亮度的均匀度的时间平均线图像的系统和方法。解决方案：在图像平面上形成在长轴方向上具有第一量的强度不均匀的线图像36，并且形成与线图像36至少部分重叠的次级图像66。该方法包括根据扫描轮廓至少在长轴方向上的一部分行图像上扫描二次图像66，以形成具有长轴方向上的第二数量的强度不均匀性的时间平均校正线图像36' 小于第一数量。当在半导体晶片40上进行激光退火时，与晶片扫描路径相邻的扫描路径部分的行图像重叠量大大降低以增加晶片生产量。版权所有（C）2012，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式