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1. 发明申请

US20050233083A1 Method for reducing boundary surface reflection of plastic substrates and substrate modified in such a manner and use thereof 审中-公开
标题翻译：减少塑料基板和基板的边界面反射的方法和方法
公开(公告)号：US20050233083A1
公开(公告)日：2005-10-20
申请号：US10525444
申请日：2003-07-14
申请人： Ulrike Schulz , Norbert Kaiser , Peter Munzert , Michael Scheler , Hein Uhlig
发明人： Ulrike Schulz , Norbert Kaiser , Peter Munzert , Michael Scheler , Hein Uhlig
IPC分类号： B29C59/14 , G02B1/12 , B05D3/04 , B05D3/10
CPC分类号： G02B1/12 , B29C59/14 , B29K2033/12 , B29K2995/0018 , B29L2011/005 , C08J7/123 , C08J2333/12 , C08J2369/00
摘要： The present invention relates to a process for reducing the surface reflectance of polymer substrates by means of ion bombardment, in which at least one substrate surface is modified by means of an argon/oxygen plasma with formation of a refractive index gradient layer.
摘要翻译：本发明涉及通过离子轰击降低聚合物基板的表面反射率的方法，其中通过形成折射率梯度层的氩/氧等离子体修饰至少一个基板表面。

2. 发明授权

US08021560B2 Method for producing a radiation-absorbing optical element and corresponding radiation absorbing optical element 有权
标题翻译：辐射吸收光学元件和相应的辐射吸收光学元件的制造方法
公开(公告)号：US08021560B2
公开(公告)日：2011-09-20
申请号：US11662550
申请日：2005-09-08
申请人： Norbert Kaiser , Antje Kaless , Peter Munzert , Michael Scheler , Ulrike Schulz
发明人： Norbert Kaiser , Antje Kaless , Peter Munzert , Michael Scheler , Ulrike Schulz
IPC分类号： B44C1/22
CPC分类号： G02B5/003 , B29C59/14 , B29K2033/12 , B29K2995/0031 , B29L2011/00 , Y10T428/31678
摘要： In a process for the fabrication of a radiation-absorbing optical element that contains a substrate (1) of plastic, a layer with a graduated refractive index (4) is fabricated on at least one surface (2) of the substrate (1) using a plasma etching process, after which a metal layer (7) is applied on top of the layer with a graduated refractive index (4).
摘要翻译：在制造含有塑料基片（1）的辐射吸收光学元件的方法中，在基片（1）的至少一个表面（2）上制造具有渐变折射率（4）的层，其中使用等离子体蚀刻工艺，之后将金属层（7）施加在具有渐变折射率（4）的层的顶部上。

3. 发明申请

US20090261063A1 Method for Producing a Nanostructure on a Plastic Surface 审中-公开
标题翻译：在塑料表面上生产纳米结构的方法
公开(公告)号：US20090261063A1
公开(公告)日：2009-10-22
申请号：US12474008
申请日：2009-05-28
申请人： Peter Munzert , Michael Scheler , Ulrike Schulz , Norbert Kaiser
发明人： Peter Munzert , Michael Scheler , Ulrike Schulz , Norbert Kaiser
IPC分类号： B44C1/22
CPC分类号： B29C59/14 , C08J7/12 , C23C14/0652 , C23C14/083 , C23C14/10 , C23C14/5873 , G02B1/12
摘要： A nanostructure is produced at a surface of a substrate composed of a plastic by means of a plasma etching process. A thin layer is applied to the plastic substrate and the plasma etching process is subsequently carried out.
摘要翻译：通过等离子体蚀刻工艺在由塑料构成的基板的表面上产生纳米结构。将薄层施加到塑料基板上，随后进行等离子体蚀刻工艺。

4. 发明申请

US20080118760A1 Method For Producing A Radiation-Absorbing Optical Element And Corresponding Radiation Absorbing Optical Element 有权
标题翻译：一种辐射吸收光学元件的生产方法及相应的辐射吸收光学元件
公开(公告)号：US20080118760A1
公开(公告)日：2008-05-22
申请号：US11662550
申请日：2005-09-08
申请人： Norbert Kaiser , Antje Kaless , Peter Munzert , Michael Scheler , Ulrike Schulz
发明人： Norbert Kaiser , Antje Kaless , Peter Munzert , Michael Scheler , Ulrike Schulz
IPC分类号： B05D5/06 , B32B15/08
CPC分类号： G02B5/003 , B29C59/14 , B29K2033/12 , B29K2995/0031 , B29L2011/00 , Y10T428/31678
摘要： In a process for the fabrication of a radiation-absorbing optical element that contains a substrate (1) of plastic, a layer with a graduated refractive index (4) is fabricated on at least one surface (2) of the substrate (1) using a plasma etching process, after which a metal layer (7) is applied on top of the layer with a graduated refractive index (4).
摘要翻译：在制造含有塑料基片（1）的辐射吸收光学元件的方法中，在基片（1）的至少一个表面（2）上制造具有渐变折射率（4）的层，其中使用等离子体蚀刻工艺，之后将金属层（7）施加在具有渐变折射率（4）的层的顶部上。

5. 发明申请

US20080096010A1 Rear Surface Mirror 审中-公开
标题翻译：后表面镜
公开(公告)号：US20080096010A1
公开(公告)日：2008-04-24
申请号：US11632444
申请日：2005-05-17
申请人： Michael Scheler , Wieland Stockl , Hein Uhlig , Norbert Kaiser
发明人： Michael Scheler , Wieland Stockl , Hein Uhlig , Norbert Kaiser
IPC分类号： B32B17/06
CPC分类号： C03C17/3663 , C03C17/36 , C03C17/3618 , C03C17/3639 , C03C17/3644 , C03C17/3649 , C03C2218/154 , F21V7/22 , G02B5/0808 , G02B5/085 , Y10T428/26
摘要： The invention relates to a rear surface mirror having a substrate which is transparent for the light to be reflected and having a silver layer which is applied on its rear side, a first intermediate layer being introduced as underlayer between the substrate and the silver layer at least in regions, said underlayer comprising a high-melting oxide or containing the latter and having a higher melting point than silver, and a further cover layer being applied on the side of the silver layer, which is orientated away from the substrate, at least in regions, said cover layer comprising one of the high-melting metals ruthenium, iridium, osmium, palladium, platinum, rhenium and/or rhodium or containing these.
摘要翻译：本发明涉及一种背面反射镜，其具有对被反射的光具有透明性的基板，并且具有施加在其后侧的银层，第一中间层至少在基板和银层之间作为下层引入在区域中，所述底层包含高熔点氧化物或含有高熔点氧化物或含有高熔点氧化物并且具有比银高的熔点，并且另外的覆盖层被施加在银层的远离衬底的方向上，至少在所述覆盖层包含高熔点金属钌，铱，锇，钯，铂，铼和/或铑中的一种或含有这些金属。

6. 发明申请

US20100062175A1 Method for Manufacturing an Optical Waveguide Layer 审中-公开
标题翻译：制造光波导层的方法
公开(公告)号：US20100062175A1
公开(公告)日：2010-03-11
申请号：US12556155
申请日：2009-09-09
申请人： Nancy Bollwahn , Ulrike Schulz , Peter Munzert , Norbert Kaiser
发明人： Nancy Bollwahn , Ulrike Schulz , Peter Munzert , Norbert Kaiser
IPC分类号： C23C14/08 , C23C14/20
CPC分类号： G02B6/132 , C23C14/024 , C23C14/083 , C23C14/48 , G02B6/1221
摘要： A method for manufacturing an optical waveguide layer includes a substrate that is prepared, onto which a first part-layer is first grown. Subsequently, a second part-layer of the waveguide layer, consisting of the same material as the first part-layer, is grown on the first part-layer. The second part-layer is bombarded with ions as it grows. The method permits manufacturing optical waveguide layers on temperature-sensitive polymer substrates.
摘要翻译：制造光波导层的方法包括：准备第一部分层的第一生长基板。随后，在第一部分层上生长由与第一部分层相同的材料构成的波导层的第二部分层。第二部分层随着离子的增长而被轰击。该方法允许在温度敏感的聚合物基底上制造光波导层。

7. 发明申请

US20070035053A1 Method and mould for producing transparent optical elements consisting of polymer materials 审中-公开
标题翻译：用于生产由聚合物材料组成的透明光学元件的方法和模具
公开(公告)号：US20070035053A1
公开(公告)日：2007-02-15
申请号：US10553284
申请日：2004-04-13
申请人： Ulrike Schulz , Peter Munzert , Norbert Kaiser , Werner Hofmann , Martin Bitzer , Marion Gebhardt
发明人： Ulrike Schulz , Peter Munzert , Norbert Kaiser , Werner Hofmann , Martin Bitzer , Marion Gebhardt
IPC分类号： B29D11/00
CPC分类号： G02B1/118 , B29C59/16 , B29C2035/0872 , B29C2059/023 , B29L2011/00 , G02B1/12
摘要： The invention relates to a method and a mold for producing transparent optical elements from polymeric materials. In this case, the optical elements that can be produced in this way are intended to have at least surface regions which have reduced interfacial reflection. According to the invention, the procedure followed here is that, in the case of a reference element which consists of a polymeric material and corresponds to the respective optical element, the entire surface or a correspondingly selected surface is exposed to the influence of high-energy ions in a vacuum. In this way, an irregular nanostructure with alternately arranged elevations and depressions lying in between is formed on the corresponding surfaces. Subsequently, a thin electrically conducting layer is applied and electrochemical forming is carried out in order to obtain a mold with a negative contour which is superposed by the nanostructure. With such a mold, the optical elements can then be produced in a molding process of the nanostructure reducing the interfacial reflection.
摘要翻译：本发明涉及用于从聚合材料制造透明光学元件的方法和模具。在这种情况下，可以以这种方式制造的光学元件旨在具有至少具有减小的界面反射的表面区域。根据本发明，这里遵循的步骤是，在由聚合材料组成并对应于相应的光学元件的参考元件的情况下，整个表面或相应选择的表面暴露于高能量的影响离子在真空中。以这种方式，在相应的表面上形成具有位于其间的交替布置的高低差的不规则纳米结构。随后，施加薄的导电层，并进行电化学形成以获得具有由纳米结构叠加的负轮廓的模具。利用这种模具，可以在纳米结构的模制过程中制造光学元件，减少界面反射。

8. 发明授权

US08192639B2 Reflection-reducing interference layer system and method for producing it 有权
标题翻译：反射减少干涉层系统及其制造方法
公开(公告)号：US08192639B2
公开(公告)日：2012-06-05
申请号：US12892362
申请日：2010-09-28
申请人： Ulrike Schulz , Peter Munzert , Norbert Kaiser
发明人： Ulrike Schulz , Peter Munzert , Norbert Kaiser
IPC分类号： B29D11/00
CPC分类号： G02B1/111 , G02B1/118 , G02B1/12 , G02B1/14
摘要： A reflection-reducing interference layer system is disclosed, which has at least three alternating layers having different refractive indices. At least one nanostructured layer comprising an organic material or an organic-inorganic hybrid material is applied to the alternating layers. With the interference layer system, it is possible to obtain very low reflection over a wide wavelength and incident angle range.
摘要翻译：公开了一种反射减小干涉层系统，其具有至少三个具有不同折射率的交替层。将包含有机材料或有机 - 无机混合材料的至少一个纳米结构层施加到交替层。利用干涉层系统，可以在宽的波长和入射角度范围内获得非常低的反射。

9. 发明授权

US07914158B2 Optical element with an anti-fog layer and method for its production 有权
标题翻译：具有防雾层的光学元件及其制造方法
公开(公告)号：US07914158B2
公开(公告)日：2011-03-29
申请号：US12548194
申请日：2009-08-26
申请人： Ulrike Schulz , Irmina Wendling , Peter Munzert , Norbert Kaiser
发明人： Ulrike Schulz , Irmina Wendling , Peter Munzert , Norbert Kaiser
IPC分类号： G02B1/00
CPC分类号： G02B1/118 , G02B1/105 , G02B1/14 , G02B1/18
摘要： An optical element is provided with a fog reducing polymer layer. A reflection reducing nanostructure is formed on the surface of the fog reducing polymer layer.
摘要翻译：光学元件设置有降雾聚合物层。在减雾聚合物层的表面上形成反射降低纳米结构。

10. 发明申请

US20110051246A1 Reflection-Reducing Interference Layer System and Method for Producing It 有权
标题翻译：反射减少干涉层系统及其制作方法
公开(公告)号：US20110051246A1
公开(公告)日：2011-03-03
申请号：US12892362
申请日：2010-09-28
申请人： Ulrike Schulz , Peter Munzert , Norbert Kaiser
发明人： Ulrike Schulz , Peter Munzert , Norbert Kaiser
IPC分类号： G02B1/11 , B05D3/10 , B05D5/06 , B82Y20/00 , B82Y40/00
CPC分类号： G02B1/111 , G02B1/118 , G02B1/12 , G02B1/14
摘要： A reflection-reducing interference layer system is disclosed, which has at least three alternating layers having different refractive indices. At least one nanostructured layer comprising an organic material or an organic-inorganic hybrid material is applied to the alternating layers. With the interference layer system, it is possible to obtain very low reflection over a wide wavelength and incident angle range.
摘要翻译：公开了一种反射减小干涉层系统，其具有至少三个具有不同折射率的交替层。将包含有机材料或有机 - 无机混合材料的至少一个纳米结构层施加到交替层。利用干涉层系统，可以在宽的波长和入射角度范围内获得非常低的反射。

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