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    • 10. 发明申请
    • TRANSISTOR, MEOMORY CELL ARRAY AND METHOD OF MANUFACTURING A TRANSISTOR
    • 晶体管,晶体管阵列和制造晶体管的方法
    • US20070096182A1
    • 2007-05-03
    • US11556897
    • 2006-11-06
    • Till SchloesserRolf WeisUlrike Gruening-von Schwerin
    • Till SchloesserRolf WeisUlrike Gruening-von Schwerin
    • H01L29/94H01L27/108H01L29/76H01L31/119
    • G11C11/404H01L27/0207H01L27/10873H01L27/10879H01L29/66795H01L29/66818H01L29/785H01L29/7854
    • A transistor, memory cell array and method of manufacturing a transistor are disclosed. In one embodiment, the invention refers to a transistor, which is formed at least partially in a semiconductor substrate, comprising a first and a second source/drain regions, a channel region connecting said first and second source/drain regions, said channel region being disposed in said semiconductor substrate, and a gate electrode disposed along said channel region and being electrically isolated from said channel region, for controlling an electrical current flowing between said first and second source/drain regions, wherein said channel region comprises a fin-region in which the channel has the shape of a ridge, said ridge comprising a top side and two lateral sides in a cross section perpendicular to a line connecting said first and second source/drain regions, wherein said top side is disposed beneath a surface of said semiconductor substrate and said gate electrode is disposed along said top side and said two lateral sides.
    • 公开了晶体管,存储单元阵列和制造晶体管的方法。 在一个实施例中,本发明涉及至少部分地形成在半导体衬底中的晶体管,包括第一和第二源极/漏极区域,连接所述第一和第二源极/漏极区域的沟道区域,所述沟道区域是 设置在所述半导体衬底中,以及栅电极,沿着所述沟道区设置并与所述沟道区电隔离,用于控制在所述第一和第二源/漏区之间流动的电流,其中所述沟道区包括 所述通道具有脊的形状,所述脊包括垂直于连接所述第一和第二源极/漏极区的线的横截面中的顶侧和两个侧边,其中所述顶侧设置在所述半导体的表面下方 基板和所述栅电极沿着所述顶侧和所述两个横向侧面设置。