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1. 发明申请

WO2010141836A3 SILICON PEN NANOLITHOGRAPHY 审中-公开
标题翻译：硅笔笔纳米尺度
公开(公告)号：WO2010141836A3
公开(公告)日：2011-03-03
申请号：PCT/US2010037428
申请日：2010-06-04
申请人： UNIV NORTHWESTERN , MIRKIN CHAD A , SHIM WOOYOUNG , BRAUNSCHWEIG ADAM B , LIAO XING , CHAI JINAN , LIM JONG KUK , ZHENG GENGFENG , ZHENG ZIJIAN
发明人： MIRKIN CHAD A , SHIM WOOYOUNG , BRAUNSCHWEIG ADAM B , LIAO XING , CHAI JINAN , LIM JONG KUK , ZHENG GENGFENG , ZHENG ZIJIAN
IPC分类号： H01L21/027
CPC分类号： G03F7/0002 , B81B2203/0361 , B81B2207/056 , B81C1/00111 , B81C1/0046 , B81C2201/0154 , B81C2201/0185 , B82Y10/00 , B82Y40/00 , Y10S977/732
摘要： Disclosed are methods of lithography using a tip array having a plurality of pens attached to a backing layer, where the tips can comprise a metal, metalloid, and/or semi-conducting material, and the backing layer can comprise an elastomeric polymer. The tip array can be used to perform a lithography process in which the tips are coated with an ink (e.g., a patterning composition) that is deposited onto a substrate upon contact of the tip with the substrate surface. The tips can be easily leveled onto a substrate and the leveling can be monitored optically by a change in light reflection of the backing layer and/or near the vicinity of the tips upon contact of the tip to the substrate surface.
摘要翻译：公开了使用具有连接到背衬层的多个笔的尖端阵列的光刻方法，其中尖端可以包括金属，准金属和/或半导电材料，并且背衬层可以包括弹性体聚合物。尖端阵列可用于执行光刻工艺，其中尖端涂覆有当尖端与衬底表面接触时沉积到衬底上的油墨（例如，图案化组合物）。尖端可以容易地平整到基底上，并且可以通过背衬层的光反射的变化和/或在尖端与基底表面接触时靠近尖端附近来光学地监测流平。

2. 发明申请

WO2011068960A2 BLOCK COPOLYMER-ASSISTED NANOLITHOGRAPHY 审中-公开
标题翻译：嵌段共聚物辅助纳米尺度
公开(公告)号：WO2011068960A2
公开(公告)日：2011-06-09
申请号：PCT/US2010058715
申请日：2010-12-02
申请人： UNIV NORTHWESTERN , MIRKIN CHAD A , CHAI JINAN , HUO FENGWEI , ZHENG ZIJIAN , GIAM LOUISE R
发明人： MIRKIN CHAD A , CHAI JINAN , HUO FENGWEI , ZHENG ZIJIAN , GIAM LOUISE R
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： In accordance with an embodiment of the disclosure, a method for forming sub- micron size nanostructures on a substrate surface includes contacting a substrate with a tip coated with an ink comprising a block copolymer matrix and a nanostructure precursor to form a printed feature comprising the block copolymer matrix and the nanostructure precursor on the substrate, and reducing the nanostructure precursor of the printed feature to form a nanostructure having a diameter (or line width) of less than 1µm.
摘要翻译：根据本公开的实施例，用于在衬底表面上形成亚微米尺寸纳米结构的方法包括使基底与涂覆有包含嵌段共聚物基质和纳米结构前体的油墨的末端接触，以形成包含块的印刷特征共聚物基质和纳米结构前体，并且还原印刷特征的纳米结构前体以形成直径（或线宽）小于1μm的纳米结构。

3. 发明申请

WO2010124210A3 MULTIPLEXED BIOMOLECULE ARRAYS MADE BY POLYMER PEN LITHOGRAPHY 审中-公开
标题翻译：通过聚合物平版印刷制作的多重生物分子阵列
公开(公告)号：WO2010124210A3
公开(公告)日：2011-02-17
申请号：PCT/US2010032244
申请日：2010-04-23
申请人： UNIV NORTHWESTERN , MIRKIN CHAD A , HUO FENGWEI , ZHENG ZIJIAN , GIAM LOUISE R , DANIEL WESTON L
发明人： MIRKIN CHAD A , HUO FENGWEI , ZHENG ZIJIAN , GIAM LOUISE R , DANIEL WESTON L
IPC分类号： G01N33/48
CPC分类号： B01J19/0046 , B01J2219/00387 , B01J2219/00533 , B01J2219/00576 , B01J2219/00585 , B01J2219/00596 , B01J2219/00626 , B01J2219/00637 , B01J2219/00662 , B01J2219/00725 , B81C1/00206
摘要： Methods of patterning multiple biomolecules on a surface are disclosed. The method includes inking a polymer pen array, where tips are inked with selected inks comprising the biomolecules, and transferring the biomolecules to a surface using a polymer pen lithography technique. Methods of using the multiple patterned biomolecules on a surface are also disclosed.
摘要翻译：公开了在表面上构图多个生物分子的方法。该方法包括着墨聚合物笔阵列，其中尖端用包含生物分子的所选择的油墨着墨，并使用聚合物笔光刻技术将生物分子转移到表面。还公开了在表面上使用多个图案化的生物分子的方法。

4. 发明申请

WO2009143378A1 GENERATION OF PHOTOMASKS BY DIP-PEN NANOLITHOGRAPHY 审中-公开
标题翻译：通过DIP-PEN NANOLITHOGRAPHY生成光子
公开(公告)号：WO2009143378A1
公开(公告)日：2009-11-26
申请号：PCT/US2009044903
申请日：2009-05-21
申请人： UNIV NORTHWESTERN , MIRKIN CHAD A , JANG JAE-WON , SANEDRIN RAYMOND G , SENESI ANDREW J , ZHENG ZIJIAN
发明人： MIRKIN CHAD A , JANG JAE-WON , SANEDRIN RAYMOND G , SENESI ANDREW J , ZHENG ZIJIAN
IPC分类号： G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method of forming a photomask using a microtip is disclosed herein. The method can include depositing a sacrificial pattern on a substrate using a microtip, forming a mask layer over the sacrificial pattern, and removing the sacrificial pattern and a portion of the mask layer disposed on the sacrificial pattern to form a photomask.
摘要翻译：本文公开了使用微尖端形成光掩模的方法。该方法可以包括使用微尖端在衬底上沉积牺牲图案，在牺牲图案上形成掩模层，以及去除牺牲图案和设置在牺牲图案上的掩模层的一部分以形成光掩模。

5. 发明公开

EP2438608A4 SILICON PEN NANOLITHOGRAPHY 审中-公开
标题翻译： SILICIUMSTIFT-NANOLITHOGRAPHIE
公开(公告)号：EP2438608A4
公开(公告)日：2015-01-07
申请号：EP10784163
申请日：2010-06-04
申请人： UNIV NORTHWESTERN
发明人： MIRKIN CHAD A , SHIM WOOYOUNG , BRAUNSCHWEIG ADAM B , LIAO XING , CHAI JINAN , LIM JONG KUK , ZHENG GENGFENG , ZHENG ZIJIAN
IPC分类号： G03F7/00 , B81C1/00
CPC分类号： G03F7/0002 , B81B2203/0361 , B81B2207/056 , B81C1/00111 , B81C1/0046 , B81C2201/0154 , B81C2201/0185 , B82Y10/00 , B82Y40/00 , Y10S977/732

6. 发明公开

EP2422197A4 MULTIPLEXED BIOMOLECULE ARRAYS MADE BY POLYMER PEN LITHOGRAPHY 审中-公开
标题翻译： BY聚合物笔平版印刷术生产Multipex，BIOMOLEKÜLARRAYS
公开(公告)号：EP2422197A4
公开(公告)日：2014-05-07
申请号：EP10767839
申请日：2010-04-23
申请人： UNIV NORTHWESTERN
发明人： MIRKIN CHAD A , HUO FENGWEI , ZHENG ZIJIAN , GIAM LOUISE R , DANIEL WESTON L
IPC分类号： G01N33/48 , B01J19/00 , B81C1/00
CPC分类号： B01J19/0046 , B01J2219/00387 , B01J2219/00533 , B01J2219/00576 , B01J2219/00585 , B01J2219/00596 , B01J2219/00626 , B01J2219/00637 , B01J2219/00662 , B01J2219/00725 , B81C1/00206

7. 发明专利

CA2780810A1 BLOCK COPOLYMER-ASSISTED NANOLITHOGRAPHY 未知
公开(公告)号：CA2780810A1
公开(公告)日：2011-06-09
申请号：CA2780810
申请日：2010-12-02
申请人： UNIV NORTHWESTERN
发明人： MIRKIN CHAD A , CHAI JINAN , HUO FENGWEI , ZHENG ZIJIAN , GIAM LOUISE R
IPC分类号： G03F7/00
摘要： In accordance with an embodiment of the disclosure, a method for forming sub- micron size nanostructures on a substrate surface includes contacting a substrate with a tip coated with an ink comprising a block copolymer matrix and a nanostructure precursor to form a printed feature comprising the block copolymer matrix and the nanostructure precursor on the substrate, and reducing the nanostructure precursor of the printed feature to form a nanostructure having a diameter (or line width) of less than 1µm.

8. 发明专利

CA2763907A1 SILICON PEN NANOLITHOGRAPHY 未知
公开(公告)号：CA2763907A1
公开(公告)日：2010-12-09
申请号：CA2763907
申请日：2010-06-04
申请人： UNIV NORTHWESTERN
发明人： MIRKIN CHAD A , SHIM WOOYOUNG , BRAUNSCHWEIG ADAM B , LIAO XING , CHAI JINAN , LIM JONG KUK , ZHENG GENGFENG , ZHENG ZIJIAN
IPC分类号： H01L21/027
摘要： Disclosed are methods of lithography using a tip array having a plurality of pens attached to a backing layer, where the tips can comprise a metal, metalloid, and/or semi-conducting material, and the backing layer can comprise an elastomeric polymer. The tip array can be used to perform a lithography process in which the tips are coated with an ink (e.g., a patterning composition) that is deposited onto a substrate upon contact of the tip with the substrate surface. The tips can be easily leveled onto a substrate and the leveling can be monitored optically by a change in light reflection of the backing layer and/or near the vicinity of the tips upon contact of the tip to the substrate surface.

9. 发明专利

ES2687650T3 Litografía de Plumas de Polímero 未知
公开(公告)号：ES2687650T3
公开(公告)日：2018-10-26
申请号：ES09735282
申请日：2009-04-25
申请人： UNIV NORTHWESTERN
发明人： MIRKIN CHAD , HUO FENGWEI , ZHENG ZIJIAN , ZHENG GENGFENG
IPC分类号： G03F7/00 , B82Y10/00 , B82Y40/00
摘要： Un método para la impresión a escala submicrométrica de signos sobre una superficie de un sustrato, que comprende: revestir una disposición de puntas con una composición para dibujar, comprendiendo la disposición de puntas un polímero elastomérico compresible que comprende una pluralidad de puntas que no están en voladizo que tienen cada una un radio de curvatura menor de aproximadamente 1 μm, y un sustrato común que comprende una capa elastomérica que comprende un polímero elastomérico compresible, estando la disposición de puntas y el sustrato común fijados sobre un soporte rígido y siendo la disposición de puntas, sustrato común y soporte rígido juntos al menos traslúcidos; poner en contacto la superficie del sustrato durante un primer período de tiempo de contacto y una primera presión de contacto con todas o sustancialmente todas las puntas revestidas de la disposición para depositar la composición para dibujar sobre la superficie del sustrato para formar signos sustancialmente uniformes con todas o sustancialmente todas las citadas puntas revestidas, teniendo los signos un tamaño de puntos o anchura de línea de menos de 1 μm.

10. 发明专利

AU2010325999A1 Block copolymer-assisted nanolithography 未知
公开(公告)号：AU2010325999A1
公开(公告)日：2012-05-31
申请号：AU2010325999
申请日：2010-12-02
申请人： UNIV NORTHWESTERN
发明人： MIRKIN CHAD A , CHAI JINAN , HUO FENGWEI , ZHENG ZIJIAN , GIAM LOUISE R
IPC分类号： G03F7/00
摘要： In accordance with an embodiment of the disclosure, a method for forming sub- micron size nanostructures on a substrate surface includes contacting a substrate with a tip coated with an ink comprising a block copolymer matrix and a nanostructure precursor to form a printed feature comprising the block copolymer matrix and the nanostructure precursor on the substrate, and reducing the nanostructure precursor of the printed feature to form a nanostructure having a diameter (or line width) of less than 1μm.

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