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    • 1. 发明专利
    • FINE PARTICLE TRAP FOR EVACUATION SYSTEM
    • JPS63278518A
    • 1988-11-16
    • JP11367087
    • 1987-05-12
    • ULVAC CORP
    • MAEHANE YOSHIYASU
    • F04B39/16B01D49/02
    • PURPOSE:To uniformly maintain performance of the trap by installing wall temp. sensors in the fine particle trap of the evacuation system which detects a temp. difference, and actuates the wall temperature detection apparatus to keep the temp. difference constant. CONSTITUTION:An inlet pipe 3 from a vacuum chamber and an outlet pipe 4 connected with a vacuum pump are installed to a vessel 1. The vessel 1 is a double wall cylinder consisting of an outer casing on which a heater 8 is wound and an inner casing 7 which includes a cooling pipe 9. In each casing, a temp. sensor 21 is installed, the temps. of both wall sides are inputted into an arithmetic unit 22. In the arithmetic unit 22, the temp. difference is comparatively computed; a supply voltage is controlled by a power controller 23 so that the temp. difference is kept constant. Consequently, the temp. difference between the high temp. wall and the low temp. wall can be kept constant, and the performance of the thermal migration trap can uniformly be maintained.
    • 2. 发明专利
    • LASER DUST MONITORING DEVICE
    • JPS63190348A
    • 1988-08-05
    • JP2172387
    • 1987-02-03
    • ULVAC CORP
    • MAEHANE YOSHIYASUNAMIKAWA YASUOYAMAKAWA HIROYUKI
    • H01L21/66G01N15/00G01N15/14G01N21/88G01N21/94G01N21/956
    • PURPOSE:To make it possible to obtain high degree of sensitivity by a method wherein a scanner is formed into uniaxial scanning type, a wafer is brought into the state of rotating type, the scattered light is condensed on the wafer, and a container with which the condensed light will be introduced to a photomultiplier is prepared. CONSTITUTION:The whole surface of a wafer 5 can be scanned by a laser beam 2 by rotating the wafer at the prescribed speed in one direction and by successively repeating the operation in which the laser beam 2 is projected from the side of the internal circumference in radial direction to the outer circumference side for every rotation of the wafer. At that time, the scattered light generated by the presence of dust is caught by the container 10 located on the upper side of the scattered light and detected by a multiplier 6. Accordingly, the position, size and the like of the dust can be recognized by processing each data by a computer. At this time, the scattered light is condensed by the container, 10, and when the stray light generated on the part of a scanner 3 is introduced into a vacuum chamber 4, the introduction into the multiplier 6 of the stray light in the state as it is can be prevented. Consequently, the improvement in sensitivity in entirety can be achieved.
    • 4. 发明专利
    • Optical pumping processor
    • 光学泵浦处理器
    • JPS6112022A
    • 1986-01-20
    • JP13090184
    • 1984-06-27
    • Ulvac Corp
    • HAYASHI TOSHIOMAEHANE YOSHIYASU
    • H01L21/205H01L21/302H01L21/3065H01L21/31
    • PURPOSE: To thin a section (a quartz section) through which beams are transmitted, and to improve transmittance of ultraviolet beams by forming a discharge tube introducing beams into a reaction chamber to a cylindrical shape.
      CONSTITUTION: Cylindrical discharge tubes 6 consisting of quartz are extended while crossing the inside of a reaction chamber 1, and each discharge tube 6 is vacuum-sealed to the wall of the reaction chamber 1 by O rings 7, 8. Microwave cavity resonators 9 are fitted at one ends of the discharge tubes 6, a gas for discharge introduced from the one ends discharges electricity by microwaves from the cavity resonators 9, discharged plasma from the gas extends up to a distance of several dozen cm from the terminals of the cavity resonators 9, and ultraviolet beams are introduced into the reaction chamber 1 through the discharge tubes 6. Accordingly, discharge beams generated by microwaves in several discharge tube 6 are projected effectively to each substrate 3 fitted to a substrate holder 2 in the reaction chamber 1. Since discharge sections are formed in cylindrical tubes, quartz sections through which beams are transmitted can be thinned, and the transmittance of ultravoilet beams can be improved.
      COPYRIGHT: (C)1986,JPO&Japio
    • 目的:通过形成将光束引入反应室至圆柱形状的放电管,来减薄透射束的部分(石英部分),并提高紫外线的透射率。 构成:由石英构成的圆柱形放电管6在穿过反应室1的内部的同时延伸,并且每个放电管6通过O形环7,8真空密封到反应室1的壁。微波谐振器9是 从放电管6的一端嵌入放电管6的一端,从空腔谐振器9向微波输出放电用的放电用气体,来自气体的排出的等离子体从空腔谐振器的端子延伸至几十厘米的距离 如图9所示,并且紫外线束通过放电管6被引入反应室1.因此,由多个放电管6中的微波产生的放电光束有效地投射到安装在反应室1中的基板保持器2上的每个基板3上。由于 放电部分形成在圆柱形管中,通过其透射光束的石英部分可以变薄,并且超薄光束的透射率可以是 改进。
    • 6. 发明专利
    • FINE PARTICLE TRAP FOR VACUUM EVACUATION SYSTEM
    • JPH0342009A
    • 1991-02-22
    • JP17399989
    • 1989-07-07
    • ULVAC CORP
    • MAEHANE YOSHIYASUSHINOMIYA EIICHIROMATSUO HIROSHIHAYASHI TOSHIO
    • B01D49/02
    • PURPOSE:To sufficiently collect the fine particles, such as dust, in a low pressure gas without raising the pressure difference by using an inner cylindrical body of double cylindrical bodies as a high temp. wall and the outer cylindrical body as a low temp. wall, and providing a low temp. shield part along the inside of the low temp. wall of outer cylindrical body. CONSTITUTION:The vessel 1 is constituted of double cylindrical bodies 2, 3 which is provided with the influent pipe 6 connected with a vacuum chamber 7 and with the effluent pipe 10 connected with a vacuum pump 11. The flow passage 4 for flowing gas is formed between the double cylindrical bodies, and the inner cylindrical body 3 of double cylindrical bodies is used as the high temp. wall and the outer cylindrical body 2 is used as the low temp. wall. The low temp. shield part member 18 is provided along the inside of the low temp. wall of the outer cylindrical body 2 so as to be easily detachable. As a result, the fine particles, such as dust, in the low pressure gas is stuck to the low temp. shield part member to be efficiently collected.
    • 7. 发明专利
    • STRAIN MEASURING INSTRUMENT
    • JPS63200006A
    • 1988-08-18
    • JP3156887
    • 1987-02-16
    • ULVAC CORP
    • YUYAMA JUNPEIMAEHANE YOSHIYASU
    • G01B11/24G01B11/16
    • PURPOSE:To enable the amount of strain to be calculated without an assumptive condition even when an object to be measured is deformed by allowing the reflecting directions of two laser beams to change. CONSTITUTION:When strain is produced in an object 4 to be measured, incident positions on the object 4 wherein laser beams 12 and 24 from laser oscillators 5 and 21 are respectively incident change and, according thereto, the light receiving positions of a position detector 8 also change. Two relational expressions indicative of relationship between the incident positions of the laser beams 12 and 24 on the object 4 and the inclinations of incident planes of the laser beams 12 and 24 are set by the receiving positions of the laser beams 12 and 24. When a solution wherein the incident angles and the inclinations of the incident planes are respectively equal to each other is obtained in those expressions by the computation of the computer 10, the solution represents the incident positions and the inclinations of the incident planes. When such solution is not obtained, one of scanners 7 and 23 are operated to change the directions of the beams 12 and 24, two new relational expressions are obtained and calculation is conducted to obtain another solution. When the scanners 7 and 23 are operated, the beams 12 and 24 are incident upon various portions of the surface of the object 4 to be measured and calculation is repeated, the conditions of strains in the various portions of the object 4 can be measured and displayed 11.
    • 8. 发明专利
    • DETECTOR FOR SURFACE FOREIGN MATERIAL
    • JPS6377128A
    • 1988-04-07
    • JP22089086
    • 1986-09-20
    • ULVAC CORP
    • MAEHANE YOSHIYASU
    • H01L21/66G01N21/88G01N21/94G01N21/956G03G15/20
    • PURPOSE:To completely eliminate returning light by obliquely introducing laser light from out a room to a wafer contained in a vacuum chamber, and obliquely disposing the exit window of a cylinder on the emitting side with respect to the axial center of the cylinder in case of obliquely irradiation of light reflected on the wafer to detect foreign material on the wafer. CONSTITUTION:A wafer 2 and a work attached thereto are contained in a vacuum chamber 1, and a cylinder for introducing laser light 4 to the upper surface hole of the chamber 1 and a cylinder for radiating the reflected to laser light respectively disposed obliquely at 45 deg. with respect opposite directions. A random reflection detector 7 is disposed opposite to the wafer 2 between the cylinders to detect dust adhered to the wafer 2. When thus constructed, the light 4 from a laser 3 is irradiated through a scanner 8 and an incident window 5 to the wafer 2, and the reflected light is irradiated from an exit window 9 provided on the cylinder 9a, the window 9 is provided to the oblique surface 9b at 45 deg. with respect to the axial center of the cylinder 9a to eliminate the returning light into the chamber.
    • 10. 发明专利
    • SURFACE FOREIGN SUBSTANCE DETECTOR TO BE USED IN VACUUM
    • JPS6212844A
    • 1987-01-21
    • JP15003385
    • 1985-07-10
    • ULVAC CORP
    • MAEHANE YOSHIYASUYOSHIKAWA HIDEJI
    • G01N21/47G01N21/88G01N21/94G01N21/956H01L21/66
    • PURPOSE:To load a laser beam leading and drawing vacuum windows easily to a vacuum process line by constituting the windows of glasses provided with reflection preventing films. CONSTITUTION:The laser beam leading vacuum window 5 and the laser beam drawing vacuum window 6 are tightly fitted to respective inlet parts 5a, 6a and provided with the glasses 5b, 6b coated with the reflection preventing films. When a laser beam is generated by a laser beam source 7a and a scanner 7b in a laser beam generating and leading device 7 to scan the surface of a base board 4 on a movable table 2 in the X direction through the vacuum window 5. If no foreign substance exists on the base board 4, the laser beam is reflected on the base board like mirror surface and drawn out to the outside of the vacuum container 1 through the vacuum window 6. When a foreign substance exists on the base board 4, the laser beam colliding with the foreign substance is dispersed and the dispersed beam is detected by a detector 8. Since a substance to be tested can be tested while being carried in the Y direction with a proper speed by an in-line carrying system, a series of foreign substance testing operation can be executed during the period that the substance is in the vacuum process line.