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1. 发明授权

US06733930B2 Photomask blank, photomask and method of manufacture 有权
标题翻译：光掩模坯料，光掩模和制造方法
公开(公告)号：US06733930B2
公开(公告)日：2004-05-11
申请号：US10073415
申请日：2002-02-13
申请人： Tsutomu Shinagawa , Tamotsu Maruyama , Hideo Kaneko , Mikio Kojima , Yukio Inazuki , Satoshi Okazaki
发明人： Tsutomu Shinagawa , Tamotsu Maruyama , Hideo Kaneko , Mikio Kojima , Yukio Inazuki , Satoshi Okazaki
IPC分类号： G03F900
CPC分类号： G03F1/50 , G03F1/46 , G03F1/80
摘要： In a photomask blank comprising a light-shielding film and an antireflective film on a transparent substrate, the light-shielding film and the antireflective film are formed of a chromium base material containing oxygen, nitrogen and carbon such that the content of carbon decreases stepwise or continuously from a surface side toward the substrate. The photomask blank can be etched at a controlled rate to produce perpendicular walls. A photomask is manufactured by lithographically patterning the photomask blank. The photomask blank and photomask have uniform film properties and contribute to the microfabrication of semiconductor ICs of greater density and finer feature size.
摘要翻译：在透明基板上包括遮光膜和抗反射膜的光掩模坯料中，遮光膜和抗反射膜由含有氧，氮和碳的铬基材料形成，使得碳含量逐步降低或从表面侧连续地朝向基板。可以以受控的速率蚀刻光掩模坯料以产生垂直的壁。通过光刻图案化光掩模坯料制造光掩模。光掩模坯料和光掩模具有均匀的膜性质，并且有助于具有更大密度和更精细特征尺寸的半导体IC的微细加工。

2. 发明授权

US06641958B2 Phase shift mask blank, phase shift mask, and methods of manufacture 有权
公开(公告)号：US06641958B2
公开(公告)日：2003-11-04
申请号：US09902645
申请日：2001-07-12
申请人： Yukio Inazuki , Tamotsu Maruyama , Mikio Kojima , Hideo Kaneko , Masataka Watanabe , Satoshi Okazaki
发明人： Yukio Inazuki , Tamotsu Maruyama , Mikio Kojima , Hideo Kaneko , Masataka Watanabe , Satoshi Okazaki
IPC分类号： G03F900
CPC分类号： G03F1/32
摘要： A phase shift mask blank includes a transparent substrate and a phase shift film composed primarily of a metal and silicon. The substrate has an etch rate A and the phase shift film has an etch rate B when the blank is patterned by reactive ion etching, such that the etch selectivity B/A is at least 5.0. When a phase shift mask is manufactured from the blank, the substrate is less prone to overetching, providing good controllability and in-plane uniformity of the phase shift in patterned areas. The phase shift mask can be used to fabricate semiconductor integrated circuits to a smaller minimum feature size and a higher level of integration.

3. 发明授权

US5376620A Sulfonamide derivative, process for preparing the same and herbicide using the same 失效
标题翻译：磺酰胺衍生物，其制备方法和使用其的除草剂
公开(公告)号：US5376620A
公开(公告)日：1994-12-27
申请号：US41998
申请日：1993-04-02
申请人： Takaaki Abe , Yuji Akiyoshi , Hiroshi Shiraishi , Ikuo Shiraishi , Mikio Kojima , Takashi Hayama , Takaaki Kuwata
发明人： Takaaki Abe , Yuji Akiyoshi , Hiroshi Shiraishi , Ikuo Shiraishi , Mikio Kojima , Takashi Hayama , Takaaki Kuwata
IPC分类号： A01N43/54 , A01N43/66 , C07D239/60 , C07D251/34 , C07D251/38 , C07D401/12
CPC分类号： C07D401/12 , A01N43/54 , A01N43/66 , C07D239/60 , C07D251/34 , C07D251/38
摘要： Disclosed are a sulfonamide compound represented by the following formula (I): ##STR1## wherein Y represents a lower akyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group, a cyano-lower alkyl group or --C(CH.sub.3).sub.2 (OR.sup.1) where R.sup.1 represents a lower akyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; Q represents a substituted or unsubstituted pyridyl group or --NR.sup.2 R.sup.3 where R.sup.2 represents a hydrogen atom, a lower alkyl group, a lower alkoxy group; and R.sup.3 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a phenyl group or a benzyl group; or R.sup.2 and R.sup.3 may be combined to form a cycloamino group; X represents an oxygen atom or a sulfur atom; and Z represents a nitrogen atom or --CH.dbd. group;processes for preparing the same and a herbicide containing the same as an active ingredient(s).
摘要翻译：公开了由下式（I）表示的磺酰胺化合物：其中Y表示低级烷基，低级烯基，低级炔基，卤代低级烷基，氰基 - 低级烷基基团或-C（CH 3）2（OR 1），其中R 1表示低级烷基，低级烯基，低级炔基，卤代低级烷基或氰基 - 低级烷基; Q表示取代或未取代的吡啶基或-NR2R3，其中R2表示氢原子，低级烷基，低级烷氧基; R3表示低级烷基，低级烯基，低级炔基，苯基或苄基。或者R 2和R 3可以组合形成环氨基; X表示氧原子或硫原子; Z表示氮原子或-CH =基团; 其制备方法和含有其作为活性成分的除草剂。

4. 发明授权

US4450162A Pyrimidine derivatives and a pharmaceutical composition containing them 失效
标题翻译：嘧啶衍生物和含有它们的药物组合物
公开(公告)号：US4450162A
公开(公告)日：1984-05-22
申请号：US384416
申请日：1982-06-02
申请人： Toshiharu Kamioka , Isao Nakayama , Takeo Honda , Takashi Kobayashi , Tokio Obata , Katsutoshi Fujii , Mikio Kojima , Yuji Akiyoshi
发明人： Toshiharu Kamioka , Isao Nakayama , Takeo Honda , Takashi Kobayashi , Tokio Obata , Katsutoshi Fujii , Mikio Kojima , Yuji Akiyoshi
IPC分类号： A61K31/505 , A61K31/517 , A61P25/24 , A61P25/26 , C07D239/42 , C07D239/70 , C07D239/94
CPC分类号： C07D239/42 , C07D239/70
摘要： New 4-anilinopyrimidine derivatives of formula (I): ##STR1## (wherein: R.sup.1 and R.sup.2 are the same or different and each represents a C.sub.1 -C.sub.6 alkyl group or R.sup.1 and R.sup.2 together represent a C.sub.3 -C.sub.5 alkylene group;R.sup.3 represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group;n is 0, 1 or 2; andR.sup.4 represents a C.sub.1 -C.sub.6 alkyl group, a C.sub.1 -C.sub.6 alkoxy group, a C.sub.1 -C.sub.6 haloalkyl group, a halogen atom, a nitro group, a C.sub.1 -C.sub.6 alkanesulphonyl group, a cyano group, a carboxy group or a C.sub.2 -C.sub.7 alkoxycarbonyl group and, when n is 2, the two groups represented by R.sup.4 may be the same or different or they may together represent a methylenedioxy group)and pharmaceutically acceptable acid addition salts thereof have been found to have strong antidepressant activity, with low toxicity and very few side-effects. The compounds may be formulated in conventional pharmaceutical compositions for administration by various routes and may be prepared by reacting a 4-halopyrimidine with aniline or an aniline derivative.
摘要翻译：式（I）的新的4-苯胺基嘧啶衍生物：其中：R 1和R 2相同或不同，各自表示C 1 -C 6烷基或R 1和R 2一起代表C 3 -C 5亚烷基; R3表示氢原子或C1-C6烷基; n为0,1或2; R4表示C1-C6烷基，C1-C6烷氧基，C1-C6卤代烷基，卤素原子，硝基，C1-C6烷磺酰基，氰基，羧基或C2-C7烷氧基羰基，当n为2时，由R4表示的两个基团可以相同或不同，或者它们可以一起代表亚甲二氧基组）及其药学上可接受的酸加成盐被发现具有强的抗抑郁活性，毒性低，副作用非常少。化合物可以配制成用于通过各种途径给药的常规药物组合物，并且可以通过4-卤代嘧啶与苯胺或苯胺衍生物反应来制备。

5. 发明授权

US4323680A 4-Aminoquinazoline compounds useful as agricultural fungicides 失效
标题翻译：用作农药杀菌剂的4-氨基喹唑啉化合物
公开(公告)号：US4323680A
公开(公告)日：1982-04-06
申请号：US134794
申请日：1980-03-28
申请人： Kazuto Nakagami , Shinji Yokoi , Kenji Nishimura , Shigeki Nagai , Takeo Honda , Kiroku Oda , Katsutoshi Fujii , Ryuji Kobayashi , Mikio Kojima
发明人： Kazuto Nakagami , Shinji Yokoi , Kenji Nishimura , Shigeki Nagai , Takeo Honda , Kiroku Oda , Katsutoshi Fujii , Ryuji Kobayashi , Mikio Kojima
IPC分类号： A01N43/54 , A01P3/00 , C07D239/94 , C07D239/95
CPC分类号： A01N43/54 , C07D239/94 , C07D239/95
摘要： Agricultural fungicidal compositions containing as an active ingredient one or more 4-aminoquinazoline derivatives. The amino group is substituted, e.g., with a phenoxyalkylene, and the quinazoline nucleus may be substituted at 2- and or 6-positions.
摘要翻译：含有一种或多种4-氨基喹唑啉衍生物作为活性成分的农药杀真菌组合物。氨基被取代，例如用苯氧亚烷基取代，喹唑啉核可以在2-或6-位取代。

6. 发明授权

US5529977A Triazine derivative, process for preparing the same and herbicide using the same 失效
标题翻译：三嗪衍生物，其制备方法和使用其的除草剂
公开(公告)号：US5529977A
公开(公告)日：1996-06-25
申请号：US326830
申请日：1994-10-21
申请人： Katsumasa Harada , Takaaki Abe , Yuji Akiyoshi , Akio Matsushita , Mikio Kojima , Ikuo Shiraishi , Kaoru Yamamoto , Takashi Hayama
发明人： Katsumasa Harada , Takaaki Abe , Yuji Akiyoshi , Akio Matsushita , Mikio Kojima , Ikuo Shiraishi , Kaoru Yamamoto , Takashi Hayama
IPC分类号： A01N43/54 , A01N43/66 , C07D239/60 , C07D251/30 , C07D251/38 , C07D521/00 , C07D251/34 , C07D251/16 , C07D403/12
CPC分类号： C07D231/12 , A01N43/54 , A01N43/66 , C07D233/56 , C07D239/60 , C07D249/08 , C07D251/30 , C07D251/38
摘要： Disclosed are a pyrimidine or triazine compound represented by the following formula (I): ##STR1## wherein R.sup.1 represents cyano group, a halogen atom, hydroxy group or --O--R.sup.7 where R.sup.7 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; R.sup.2 represents hydrogen atom or a lower alkyl group; R.sup.3 represents hydrogen atom or a lower alkyl group; R.sup.4 represents a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 represents a lower alkyl group or a phenyl group which may have a substituent, hydroxy group, a lower alkoxy group or a benzyloxy group when Z is nitrogen atom; or a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 has the same meaning as defined above, hydroxy group, OK, a lower alkoxy group which may have a substituent, a lower alkenyloxy group, a lower alkynyloxy group, a cycloalkoxy group which may have a substituent, a phenoxy group, a benzyloxy group, a lower alkylthio group, a phenylthio group or an alkylsulfonylamino group when Z is --CH.dbd. group; R.sup.5 represents a lower alkoxy group; R.sup.6 represents a lower alkoxy group or a lower alkyl group; X represents oxygen atom or sulfur atom; and Z represents nitrogen atom or --CH.dbd. group.processes for preparing the same and a herbicide containing the same as an active ingredient(s).
摘要翻译：公开了由下式（I）表示的嘧啶或三嗪化合物：其中R 1表示氰基，卤素原子，羟基或-O-R 7，其中R 7表示低级烷基，低级烯基基，低级炔基，卤代低级烷基或氰基 - 低级烷基; R2表示氢原子或低级烷基; R3表示氢原子或低级烷基; R 4表示当Z为氮原子时，可以具有取代基，羟基，低级烷氧基或苄氧基的低级烷基或苯基，-NHSO 2 -R 8，或1-咪唑基，-NHSO 2 -R 8，其中R8具有与上述相同的含义，羟基，OK，可具有取代基的低级烷氧基，低级链烯氧基，低级炔氧基，环烷氧基当Z为-CH =基团时，可具有取代基，苯氧基，苄氧基，低级烷硫基，苯硫基或烷基磺酰基氨基; R5代表低级烷氧基; R6代表低级烷氧基或低级烷基; X表示氧原子或硫原子; Z表示氮原子或-CH =基团。其制备方法和含有其作为活性成分的除草剂。

7. 发明授权

US4435402A Aminopyrimidine derivatives, processes for their preparation, and fungicidal, insecticidal and acaricidal compositions containing them 失效
标题翻译：氨基嘧啶衍生物，其制备方法和含有它们的杀真菌，杀虫和杀螨组合物
公开(公告)号：US4435402A
公开(公告)日：1984-03-06
申请号：US341776
申请日：1982-01-22
申请人： Hideakira Tsuji , Shinjiro Yamamoto , Kazuto Nakagami , Takeo Honda , Katsutoshi Fujii , Takashi Kobayashi , Tokio Obata , Mikio Kojima , Yuji Akiyoshi
发明人： Hideakira Tsuji , Shinjiro Yamamoto , Kazuto Nakagami , Takeo Honda , Katsutoshi Fujii , Takashi Kobayashi , Tokio Obata , Mikio Kojima , Yuji Akiyoshi
IPC分类号： C07D239/32 , A01N43/54 , C07D239/42 , C07D239/70 , C07D239/94
CPC分类号： C07D239/42 , A01N43/54 , C07D239/70 , C07D239/94
摘要： Compounds having the formula (I) ##STR1## [wherein: R.sup.1 and R.sup.2 are each alkyl or halogen, or they are trimethylene or tetramethylene; R.sup.3 is hydrogen or alkyl; A is alkylene; and R.sup.4 is optionally substituted phenyloxy or benzyloxy substituted with at least one alkyl, halogen, alkoxy, alkylthio, alkenyl, trifluoromethyl or nitro; optionally substituted phenyl substituted with one or two halogen atoms, alkyl or alkoxy; furyl or thienyl] and their salts.
摘要翻译：具有式（I）的化合物＆lt; IMAGE＆gt; [其中：R 1和R 2各自是烷基或卤素，或者它们是三亚甲基或四亚甲基; R3是氢或烷基; A是亚烷基; 并且R 4是任选取代的苯氧基或被至少一个烷基，卤素，烷氧基，烷硫基，烯基，三氟甲基或硝基取代的苄氧基; 任选取代的被一个或两个卤素原子取代的苯基，烷基或烷氧基; 呋喃基或噻吩基]及其盐。

8. 发明授权

US4304778A 4-Aminoquinazoline derivatives having fungicidal, anti-insect and acaricidal properties 失效
标题翻译： 4-氨基喹唑啉衍生物具有杀菌，抗虫，杀螨等特性
公开(公告)号：US4304778A
公开(公告)日：1981-12-08
申请号：US97844
申请日：1979-11-27
申请人： Kazuto Nakagami , Shinji Yokoi , Kenji Nishimura, deceased , Shigeki Nagai , Takeo Honda , Kiroku Oda , Katsutoshi Fujii , Takashi Kobayashi , Mikio Kojima
发明人： Kazuto Nakagami , Shinji Yokoi , Kenji Nishimura, deceased , Shigeki Nagai , Takeo Honda , Kiroku Oda , Katsutoshi Fujii , Takashi Kobayashi , Mikio Kojima
IPC分类号： A01N43/54 , C07D239/94 , C07D239/95
CPC分类号： C07D239/94 , A01N43/54
摘要： 4-Aminoquinazoline derivatives of formula (I): ##STR1## (wherein: R.sup.1 represents an alkyl group, a cycloalkyl group, an alkenyl group or a benzyl group;R.sup.2 and R.sup.3 are the same or different and each represents a hydrogen atom, an alkyl group, an alkoxy group or a halogen atom;X represents a straight or branched chain alkylene group; andn is 0 or 1)and salts and hydrates thereof are valuable fungicidal, anti-insect (insect-repellent and insecticidal) and acaricidal compounds and thus can be used to treat or prevent many diseases affecting agricultural and horticultural plants, while, at the same time, having a much lower toxicity to fish than is exhibited by other known compounds.
摘要翻译：式（I）的4-氨基喹唑啉衍生物：其中：R1表示烷基，环烷基，烯基或苄基; R2和R3相同或不同，表示氢原子，烷基，烷氧基或卤素原子; X表示直链或支链亚烷基; n为0或1），其盐和水合物是有价值的杀真菌剂，抗昆虫（驱虫剂和杀虫剂）和杀螨化合物，因此可用于治疗或预防许多影响农业和园艺植物的疾病，同时对其他已知化合物显示出的毒性低得多。

9. 发明授权

US5387575A Pyrimidine derivatives, process for preparing the same and herbicide using the same 失效
标题翻译：嘧啶衍生物，其制备方法和使用其的除草剂
公开(公告)号：US5387575A
公开(公告)日：1995-02-07
申请号：US894557
申请日：1992-06-05
申请人： Katsumasa Harada , Takaaki Abe , Yuji Akiyoshi , Akio Matsushita , Mikio Kojima , Ikuo Shiraishi , Kaoru Yamamoto , Takashi Hayama , Shohei Fukuda
发明人： Katsumasa Harada , Takaaki Abe , Yuji Akiyoshi , Akio Matsushita , Mikio Kojima , Ikuo Shiraishi , Kaoru Yamamoto , Takashi Hayama , Shohei Fukuda
IPC分类号： A01N43/54 , A01N43/66 , C07D239/60 , C07D251/30 , C07D251/38 , C07D521/00 , C07D239/52 , A01N73/54
CPC分类号： C07D231/12 , A01N43/54 , A01N43/66 , C07D233/56 , C07D239/60 , C07D249/08 , C07D251/30 , C07D251/38
摘要： Disclosed are a pyrimidine or triazine compound represented by the following formula (I): ##STR1## wherein R.sup.1 represents cyano group, a halogen atom, hydroxy group or --O--R.sup.7 where R.sup.7 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; R.sup.2 represents hydrogen atom or a lower alkyl group; R.sup.3 represents hydrogen atom or a lower alkyl group; R.sup.4 represents a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 represents a lower alkyl group or a phenyl group which may have a substituent, hydroxy group, a lower alkoxy group or a benzyloxy group when Z is nitrogen atom; or a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 has the same meaning as defined above, hydroxy group, OK, a lower alkoxy group which may have a substituent, a lower alkenyloxy group, a lower alkynyloxy group, a cycloalkoxy group which may have a substituent, a phenoxy group, a benzyloxy group, a lower alkylthio group, a phenylthio group or an alkylsulfonylamino group when Z is --CH.dbd. group; R.sup.5 represents a lower alkoxy group; R.sup.6 represents a lower alkoxy group or a lower alkyl group; X represents oxygen atom or sulfur atom; and Z represents nitrogen atom or --CH.dbd. group. processes for preparing the same and a herbicide containing the same as an active ingredient(s).
摘要翻译：公开了由下式（I）表示的嘧啶或三嗪化合物：其中R 7表示低级烷基，低级烯基，低级炔基，卤代烷基，低级烷基或氰基 - 低级烷基; R2代表氢原子或低级烷基; R3表示氢原子或低级烷基; R 4表示当Z为氮原子时，可以具有取代基，羟基，低级烷氧基或苄氧基的低级烷基或苯基，-NHSO 2 -R 8，或1-咪唑基，-NHSO 2 -R 8，其中R8具有与上述相同的含义，羟基，OK，可具有取代基的低级烷氧基，低级链烯氧基，低级炔氧基，环烷氧基当Z为-CH =基团时，可具有取代基，苯氧基，苄氧基，低级烷硫基，苯硫基或烷基磺酰基氨基; R5代表低级烷氧基; R6代表低级烷氧基或低级烷基; X表示氧原子或硫原子; Z表示氮原子或-CH =基团。其制备方法和含有其作为活性成分的除草剂。

10. 发明授权

US4464375A 4-Anilinoquinazoline compounds and pharmaceutical compositions thereof 失效
标题翻译： 4-苯胺基喹唑啉化合物及其药物组合物
公开(公告)号：US4464375A
公开(公告)日：1984-08-07
申请号：US289379
申请日：1981-08-03
申请人： Shinsaku Kobayashi , Katsuo Kamoshita , Shigeki Nagai , Takeo Honda , Kiroku Oda , Katsutoshi Fujii , Takashi Kobayashi , Mikio Kojima
发明人： Shinsaku Kobayashi , Katsuo Kamoshita , Shigeki Nagai , Takeo Honda , Kiroku Oda , Katsutoshi Fujii , Takashi Kobayashi , Mikio Kojima
IPC分类号： A61K31/505 , A61K31/517 , A61P25/04 , A61P29/00 , C07D239/94
CPC分类号： C07D239/94
摘要： 4-Anilinoquinazoline derivatives of formula (I): ##STR1## (in which: R.sup.1 represents a hydrogen atom, a halogen atom, a trifluoromethyl group or a nitro group;R.sup.2 represents a hydrogen atom, a C.sub.1 -C.sub.4 alkyl group, an alkoxy group or a halogen atom; andR.sup.3 represents a hydrogen atom cr a C.sub.1 -C.sub.4 alkyl group)and pharmaceutically acceptable salts thereof are, except where R.sup.1 represents a hydrogen atom or a chlorine atom in the 6- position when R.sup.2 and R.sup.3 both represent hydrogen atoms, new compounds and have been found to possess valuable analgesic and anti-inflammatory activities. These compounds can be prepared by heating the appropriate 4-haloquinazoline with an appropriate aniline or aniline derivative.
摘要翻译：（I）的4-苯胺基喹唑啉衍生物：其中：R1表示氢原子，卤素原子，三氟甲基或硝基; R2表示氢原子，C1-C4烷基，烷氧基或卤原子; R 3表示氢原子，C 1 -C 4烷基）及其药学上可接受的盐，除了当R 1和R 3为R 6表示6-位的氢原子或氯原子时都代表氢原子，新化合物，并被发现具有有价值的镇痛和抗炎活性。这些化合物可以通过用合适的苯胺或苯胺衍生物加热合适的4-卤代喹唑啉来制备。

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