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1. 发明申请

US20100297564A1 POLYMERIZABLE FLUORINE-CONTAINING MONOMER, FLUORINE-CONTAINING POLYMER AND METHOD OF FORMING RESIST PATTERN 审中-公开
标题翻译：含氟聚合物单体，含氟聚合物及形成电阻图案的方法
公开(公告)号：US20100297564A1
公开(公告)日：2010-11-25
申请号：US12810076
申请日：2008-12-22
申请人： Tsuneo Yamashita , Yosuke Kishikawa , Yoshito Tanaka , Masamichi Morita
发明人： Tsuneo Yamashita , Yosuke Kishikawa , Yoshito Tanaka , Masamichi Morita
IPC分类号： G03F7/20 , C07C69/65 , C08F120/22
CPC分类号： G03F7/0397 , C08F220/22 , G03F7/0046 , G03F7/11 , G03F7/2041
摘要： A polymerizable fluorine-containing monomer and a fluorine-containing polymer which are suitable for a resist layer and a protective layer of a laminated resist for forming a fine pattern in production of semiconductor devices, and further are useful especially in immersion lithography using water as a liquid medium, and a method of forming a resist pattern are provided. The polymerizable fluorine-containing monomer is represented by the formula (1): wherein R1 is hydrogen atom or a monovalent saturated or unsaturated hydrocarbon group of 1 to 15 carbon atoms, and the hydrocarbon group may be chain or cyclic structure and may have oxygen atom, nitrogen atom, sulfur atom or halogen atom, the polymer is a homopolymer or copolymer of the monomer, and the method of forming a resist pattern using such a homopolymer or copolymer is carried out by immersion lithography.
摘要翻译：一种可聚合的含氟单体和含氟聚合物，其适用于半导体器件生产中用于形成精细图案的抗蚀剂层和层压抗蚀剂的保护层，并且还特别适用于使用水作为液体介质和形成抗蚀剂图案的方法。可聚合的含氟单体由式（1）表示：其中R1是氢原子或1〜15个碳原子的一价饱和或不饱和烃基，烃基可以是链或环状结构，并且可以具有氧原子，氮原子，硫原子或卤素原子，该聚合物是单体的均聚物或共聚物，使用这种均聚物或共聚物形成抗蚀剂图案的方法通过浸渍光刻法进行。

2. 发明申请

US20050265685A1 Optical material containing photocurable fluoropolymer and photocurable fluororesin composition 审中-公开
公开(公告)号：US20050265685A1
公开(公告)日：2005-12-01
申请号：US10524259
申请日：2003-08-07
申请人： Mihoko Ohashi , Yosuke Kishikawa , Kazuyuki Sato , Takayuki Araki
发明人： Mihoko Ohashi , Yosuke Kishikawa , Kazuyuki Sato , Takayuki Araki
IPC分类号： C08F20/22 , C09D127/12 , G02B1/04 , G02B6/12 , G02B6/122 , G02B6/138 , G03F7/004 , G03F7/038 , G02B6/00
CPC分类号： G02B1/045 , C08F20/22 , C08K5/0025 , C09D127/12 , G02B6/1221 , G02B6/138 , G02B2006/12069 , G02B2006/1219 , G03F7/0046 , G03F7/038 , C08L27/12
摘要： There are provided various optical materials which contain a curable fluorine-containing polymer (I) having a number average molecular weight of from 500 to 1,000,000 and represented by the formula (1): MA (1) in which the structural unit M is a structural unit derived from a fluorine-containing organic group having crosslinkable cyclic ether structures in its side chain, the structural unit A is a structural unit derived from a monomer copolymerizable with the fluorine-containing ethylenic monomer for the structural unit represented by the formula (M), and the structural unit M and the structural unit A are contained in amounts of from 0.1 to 100% by mole and from 0 to 99.9% by mole, respectively, and further contain a photoacid generator (II). Those optical materials are suitable as materials for optical devices such as an optical waveguide and a sealing member and also as materials for display devices such as an antireflection film and are excellent in transparency in a near infrared region, resistance to moisture, heat resistance, etc. Also there are provided various members obtained by curing the optical materials.

3. 发明申请

US20070196763A1 Method of forming laminated resist 审中-公开
标题翻译：形成层压抗蚀剂的方法
公开(公告)号：US20070196763A1
公开(公告)日：2007-08-23
申请号：US10579855
申请日：2004-11-15
申请人： Takayuki Araki , Meiten Koh , Kazuyuki Sato , Mihoko Ohashi , Yosuke Kishikawa
发明人： Takayuki Araki , Meiten Koh , Kazuyuki Sato , Mihoko Ohashi , Yosuke Kishikawa
IPC分类号： G03C11/12
CPC分类号： G03F7/0046 , C09D133/16 , G03F7/091
摘要： There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L1) on a substrate and (II) a step for forming the antireflection layer (L2) on the photoresist layer (L1) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50% by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.
摘要翻译：形成层叠抗蚀剂，其在使用真空紫外线区域的光的光刻工艺中表现出足够的反射降低效果，并且在显影过程中也具有足够的显影特性。形成层叠光致抗蚀剂的方法包括：（I）在基板上形成光致抗蚀剂层（L1）的工序，（II）在光致抗蚀剂层（L1）上形成抗反射层（L 2）的工序，含有具有亲水基团Y的含氟聚合物（A）的涂料组合物。含氟聚合物（A）含有由具有亲水性基团Y的含氟乙烯性单体衍生的结构单元，其特征在于，（i）亲水性基团Y含有pKa值不大于11的酸性OH基，（ii）氟含量不小于50质量％，和（iii）100g的亲水基Y的摩尔数含氟聚合物（A）不低于0.14。

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