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    • 3. 发明申请
    • OPTOELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAME
    • 光电装置及其制造方法
    • US20120138980A1
    • 2012-06-07
    • US13310339
    • 2011-12-02
    • De-Shan KUOTsun-Kai KO
    • De-Shan KUOTsun-Kai KO
    • H01L33/30H01L33/40B82Y20/00
    • H01L33/30H01L31/035227H01L33/0062H01L33/007H01L33/10H01L33/12H01L33/145H01L51/5275H01S2304/12
    • An optoelectronic device, comprising: a substrate; a plurality of the first semiconductor rods formed on the substrate, contacted with the substrate, and exposed partial of the first surface of the substrate; a first protection layer formed on the sidewall of the plurality of the first semiconductor rods and the exposed partial of the first surface of the substrate; a first buffer layer formed on the plurality of the first semiconductor rods wherein the first buffer layer having a first surface and a second surface opposite to the first surface, and the plurality of the first semiconductor rods directly contacted with the first surface; and at least one first hollow component formed among the first semiconductor rods, the first surface of the substrate, and the first surface of the first buffer layer and the ratio of the height and the width of the first hollow component is 1/5-3.
    • 一种光电子器件,包括:衬底; 形成在基板上的多个第一半导体棒,与基板接触,并露出基板的第一表面的部分; 形成在多个第一半导体棒的侧壁上的第一保护层和基板的第一表面的暴露部分; 形成在所述多个所述第一半导体棒上的第一缓冲层,其中所述第一缓冲层具有与所述第一表面相对的第一表面和第二表面,所述多个所述第一半导体棒与所述第一表面直接接触; 并且形成在第一半导体棒,基板的第一表面和第一缓冲层的第一表面之间的第一中空部件和第一中空部件的高度和宽度的比率为1 / 5-3 。