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1. 发明专利

JP2012224888A Sliding member 有权
标题翻译：滑动会员
公开(公告)号：JP2012224888A
公开(公告)日：2012-11-15
申请号：JP2011091450
申请日：2011-04-15
申请人： Toyota Central R&D Labs Inc , Toyota Motor Corp , Kobe Steel Ltd , トヨタ自動車株式会社 , 株式会社神戸製鋼所 , 株式会社豊田中央研究所
发明人： MORI HIROYUKI , MATSUI MUNEHISA , HAYASHI KEIJI , FUWA YOSHIO , ARAYOSHI TAKATOSHI , JINNO TETSUSHI , SHIMODA KENJI , HIROTA SATOSHI , AKARI KOICHIRO , ITO HIROTAKA
IPC分类号： C23C14/06
CPC分类号： F16N1/00 , C10M135/32 , C23C14/0635 , C23C14/3492 , C23C14/352 , C23C14/505 , C23C28/042 , C23C28/044 , C23C28/42 , F02F3/10 , Y10T428/265 , Y10T428/31678
摘要： PROBLEM TO BE SOLVED: To provide a sliding member that exhibits low friction and high wear resistance under a wet condition where lubricating oil is used.SOLUTION: The sliding member includes a substrate having a sliding surface that is slid in the presence of lubricating oil, and a film fixed to at least part of the sliding surface. The film: contains carbon (C), titanium (Ti), and boron (B); is obtained by repeatedly and alternately layering a first layer containing amorphous carbon as the principal component, and a second layer containing carbon and titanium as principal components; and has a hardness of 18 GPa or greater.
摘要翻译：要解决的问题：提供一种在使用润滑油的湿润条件下具有低摩擦和高耐磨性的滑动构件。解决方案：滑动构件包括具有在存在润滑油的情况下滑动的滑动面的基板和固定在滑动面的至少一部分上的膜。该膜含有碳（C），钛（Ti）和硼（B）; 是以含有无定形碳为主要成分的第一层和以碳和钛为主要成分的第二层反复交替地层叠而得到的。并具有18GPa以上的硬度。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2011225995A Method for producing formed article with diamond-like carbon hard multilayer film 有权
标题翻译：用金刚石硬质多层膜生产成型制品的方法
公开(公告)号：JP2011225995A
公开(公告)日：2011-11-10
申请号：JP2011096890
申请日：2011-04-25
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： AKARI KOICHIRO , OTA AKITOSHI
IPC分类号： C23C14/06 , B23B27/14
摘要： PROBLEM TO BE SOLVED: To provide a method for producing a DLC (diamond like carbon) formed article which is provided with excellent adhesiveness to both of a substrate and a DLC film even when a DLC multilayer film including a high hardness DLC film on the uppermost surface side is formed in a thickness of about 3 μm or more on substrates made of a wide range of materials from a high hardness material to a low hardness material, and which also has excellent abrasion resistance.SOLUTION: The method for producing a formed article 10 with a DLC hard multilayer film includes: a step (a) for preparing a substrate 1; a step (b) for forming an intermediate layer 2a on the substrate by a sputtering method; a step (c) for forming a first DLC-based film 3a on the intermediate layer by a sputtering method; and a step (d) for forming a second DLC-based film 3b having a surface hardness higher than that of the first DLC-based film on the first DLC-based film by a cathode discharge type arc ion plating method.
摘要翻译：要解决的问题：为了提供一种制备DLC（类金刚石碳）成型体的方法，即使在包含高硬度DLC膜的DLC多层膜时，其对基材和DLC膜都具有优异的粘着性在由高硬度材料到低硬度材料的各种材料制成的基片上，在最上表面侧形成约3μm以上的厚度，并且也具有优异的耐磨性。解决方案：用DLC硬质多层膜制造成形品10的方法包括：制备基片1的步骤（a）; 用于通过溅射法在所述衬底上形成中间层2a的步骤（b）; 用于通过溅射法在中间层上形成第一DLC基膜3a的步骤（c）; 以及用于通过阴极放电型电弧离子镀法在第一DLC基膜上形成表面硬度高于第一DLC基膜的第二DLC基膜3b的步骤（d）。版权所有（C）2012，JPO＆INPIT

3. 发明专利

DE19939040A1 Magnetron sputtering apparatus with auxiliary magnetic pole 未知
公开(公告)号：DE19939040A1
公开(公告)日：2000-03-02
申请号：DE19939040
申请日：1999-08-18
申请人： KOBE STEEL LTD
发明人： AKARI KOICHIRO , KOHARA TOSHIMITSU
IPC分类号： H01J37/34
摘要： A magnetron sputtering apparatus for forming a thin film on a substrate by adhering metal atoms or ions to the substrate comprises: (1) a number of magnetron evaporation sources for metal atoms or ions; and (2) a number of auxiliary magnetic poles; (3) at least one magnetron evaporation source and at least one auxiliary magnetic pole on the circumference of the substrate to generate magnetic force lines surrounding the substrate.

4. 发明专利

GB2340845A Magnetron sputtering apparatus with auxiliary magnetic pole 未知
公开(公告)号：GB2340845A
公开(公告)日：2000-03-01
申请号：GB9919361
申请日：1999-08-16
申请人： KOBE STEEL LTD
发明人： AKARI KOICHIRO , KOHARA TOSHIMITSU
IPC分类号： H01J37/34 , C23C14/35
摘要： A magnetron sputtering apparatus forms a thin film on a substrate 2 by adhering metal atoms or ions evaporated from a magnetron evaporation source 3 to the substrate 2. The apparatus comprises at least one magnetron evaporation source 3 and at least one auxiliary magnetic pole 9 provided on the circumference of the substrate 2. The auxiliary magnetic pole 9 generates magnetic lines of force 11 surrounding the substrate 2. Only one kind of magnetron magnetic field structure suffices for the magnetron evaporation sources 3, a desired sealing magnetic field can be formed regardless of the number or arrangement of the magnetron evaporating sources 3, and the form of the sealing magnetic field can be easily changed.

5. 发明专利

BR112013026585A2 membro deslizante 未知
公开(公告)号：BR112013026585A2
公开(公告)日：2016-12-27
申请号：BR112013026585
申请日：2012-04-12
申请人： KOBE STEEL LTD
发明人： ITO HIROTAKA , MORI HIROYUKI , HAYASHI KEIJI , SHIMODA KENJI , AKARI KOICHIRO , MATSUI MUNEHISA , HIROTA SATOSHI , JINNO SATOSHI , SHINYOSHI TAKATOSHI , FUWA YOSHIO
IPC分类号： C23C14/06 , F02F3/10
摘要： membro deslizante um membro deslizante inclui: um substrato que tem uma superfície deslizante deslizando sob a presença de óleo lubrificante, e uma película que é fixa a, pelo menos, uma parte da superfície deslizante. a película contém carbono (c), titânio (ti), e boro (b), é obtida por repetidamente e alternadamente estratificar uma primeira camada contendo carbono amorfo como um componente principal e uma segunda camada contendo c e ti como os componentes principais, e possui dureza de 18 gpa ou mais.

6. 发明专利

DE112012001715T5 Gleitbauteil 未知
公开(公告)号：DE112012001715T5
公开(公告)日：2014-01-09
申请号：DE112012001715
申请日：2012-04-12
申请人： KOBE STEEL LTD
发明人： MATSUI MUNEHISA , FUWA YOSHIO , SHINYOSHI TAKATOSHI , JINNO SATOSHI , AKARI KOICHIRO , MORI HIROYUKI , SHIMODA KENJI , HIROTA SATOSHI , ITO HIROTAKA , HAYASHI KEIJI
IPC分类号： C23C28/04 , C23C14/06 , F02F3/10
摘要： Ein Gleitbauteil (10) weist Folgendes auf: ein Substrat (2), das eine Gleitoberfläche hat, die unter dem Vorhandensein von Schmieröl gleitet; und eine Schicht (1), die an zumindest einem Teil der Gleitoberfläche befestigt ist. Die Schicht (1) enthält Kohlenstoff (C), Titan (Ti) und Bor (B), sie wurde durch wiederholtes und abwechselndes Aufschichten einer ersten Lage (11), die amorphen Kohlenstoff als einen Hauptbestandteil enthält, und einer zweiten Lage (12), die C und Ti als Hauptbestandteile enthält, erzielt, und sie hat eine Härte von 18 GPa oder mehr.

7. 发明专利

DE19939040B4 未知
公开(公告)号：DE19939040B4
公开(公告)日：2005-12-29
申请号：DE19939040
申请日：1999-08-18
申请人： KOBE STEEL LTD
发明人： AKARI KOICHIRO , KOHARA TOSHIMITSU
IPC分类号： H01J37/34 , C23C14/34

8. 发明专利

GB2340845B Magnetron sputtering apparatus 未知
公开(公告)号：GB2340845B
公开(公告)日：2001-01-31
申请号：GB9919361
申请日：1999-08-16
申请人： KOBE STEEL LTD
发明人： AKARI KOICHIRO , KOHARA TOSHIMITSU
IPC分类号： H01J37/34 , C23C14/35

9. 发明公开

EP2949776A4 LAMINATED COATING FILM HAVING EXCELLENT ABRASION RESISTANCE 审中-公开
标题翻译： LAMINIERTE BESCHICHTUNGSFOLIE MIT HERVORRAGENDER ABRIEBFESTIGKEIT
公开(公告)号：EP2949776A4
公开(公告)日：2016-08-24
申请号：EP14743313
申请日：2014-01-24
申请人： KOBE STEEL LTD
发明人： ABE MAIKO , YAMAMOTO KENJI , AKARI KOICHIRO
IPC分类号： C23C14/06 , C23C14/34 , C23C28/00 , C23C28/04
CPC分类号： C23C28/044 , C23C14/0641 , C23C14/0647 , C23C14/3464 , C23C28/04 , C23C28/042 , C23C28/42
摘要： A laminated coating film according to the present invention comprises at least one coating film (A) and at least one coating film (B) laminated on each other and has excellent abrasion resistance. [Coating film (A)] The compositional formula is (M 1-a Si a )(B x C y N 1-x-y ) (wherein M represents at least one element selected from the group consisting of a Group-4 element, a Group-5 element, a Group-6 element and Al; and a, x and y respectively represent the atomic ratios of Si, B and C), wherein a, x and y respectively fulfil the formulae: 0.05 ‰¤ a ‰¤ 0.35, 0 ‰¤ x ‰¤ 0.15 and 0 ‰¤ y ‰¤ 0.5. [Coating film (B)] The compositional formula is L(B x C y N 1-x-y ) (wherein L represents at least one element selected from the group consisting of W, Mo and V; and x and y respectively represent the atomic ratios of B and C), wherein x and y respectively fulfil the formulae: 0 ‰¤ x ‰¤ 0.15 and 0 ‰¤ y ‰¤ 0.5.
摘要翻译：根据本发明的层压涂膜包括至少一层涂布膜（A）和至少一层涂布膜（B），并且具有优异的耐磨性。 [涂膜（A）]组成式为（M 1-a Si a）（B x C y N 1-xy）（其中，M表示选自第4族元素，第5族元素，第6族元素和Al; a，x和y分别表示Si，B和C的原子比，其中a，x和y分别满足下列公式：0.05‰¤‰¤0.35 ，0‰¤x‰¤0.15和0‰¤‰¤0.5。 [涂膜（B）]组成式为L（B x C y N 1-xy）（其中L表示选自W，Mo和V中的至少一种元素; x和y分别表示原子 B和C的比率），其中x和y分别满足公式：0‰¤x‰¤0.15和0‰¤‰¤0.5。

10. 发明公开

EP1375698A4 SPUTTER DEVICE 有权
标题翻译： SPUTTERVORRICHTUNG
公开(公告)号：EP1375698A4
公开(公告)日：2006-09-27
申请号：EP02707236
申请日：2002-03-28
申请人： KOBE STEEL LTD
发明人： KOHARA TOSHIMITSU , AKARI KOICHIRO
IPC分类号： B01J19/08 , H01J37/34 , C23C14/35 , H01L21/203
CPC分类号： H01J37/3455 , C23C14/352 , H01J37/3408
摘要： The invention is intended to easily change the shape of a magnetic field when auxiliary poles are to be provided in a sputter device. A sputter device, in which one or more magnetron type sputter evaporation sources (3) and one or more auxiliary poles (9) are disposed in a chamber (1) in such a manner as to surround an evaporation subject (2), comprises an angle changing mechanism for changing the angle of the auxiliary poles (9) with respect to the evaporation subject (2) in order to change the shape of a magnetic field which is formed by cooperation between the magnetron type sputter evaporation sources (3) and the auxiliary poles (9).
摘要翻译：本发明的目的是在辅助磁极的状态下容易地在溅射装置中改变磁场的形状。在根据本发明的溅射装置中，一个或多个磁控溅射蒸发源3和一个或多个辅助磁极9设置在室1中，以围绕要沉积的固体物质2，其中用于改变辅助磁极9相对于待沉积的固体物质2的对准角度以改变由磁控溅射蒸镀源3和辅助磁极9形成的磁场的形状的角度改变机构。

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