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    • 2. 发明授权
    • Disk substrate and manufacturing method therefor, and disk manufactured by the disk substrate
    • 盘状基板及其制造方法以及由盘基板制造的盘
    • US06733957B2
    • 2004-05-11
    • US10026699
    • 2001-12-27
    • Toyohito AsanumaKenichi Shimomai
    • Toyohito AsanumaKenichi Shimomai
    • B44C122
    • G03F7/405G11B7/24079G11B7/24085G11B7/261Y10S430/146
    • A method for manufacturing a disk substrate for mass production of a phase change optical disk, wherein an original disk substrate is having a resist layer (2) applied on a glass substrate (1), composed of the steps of forming a depression (pit “p1” and groove “g1”) having a first and a second depth by cutting laser to be exposed on the surface of the resist layer (2), etching the depression having the first depth and the second depth from the surface of the resist layer (2) of the disk substrate in atmosphere mixed with Argon and Oxygen in ratio of 10 to 90% under gas pressure of 0.1 to 1.5 Pa, wherein the first and the second depth of the depression (pit “p1” and groove “g1”) become predetermined value respectively, and ashing the resist layer (2) from the glass substrate (1).
    • 一种用于批量生产相变光盘的盘基片的制造方法,其中原盘基片具有施加在玻璃基片(1)上的抗蚀剂层(2),包括形成凹陷(凹坑“ p1“和槽”g1“),通过切割要暴露在抗蚀剂层(2)的表面上的激光来具有第一和第二深度,从抗蚀剂层的表面蚀刻具有第一深度和第二深度的凹陷 在凹坑(凹坑“p1”和凹槽“g1”)的第一和第二深度处,与氩气和氧气混合的大气中的磁盘基板(2)的比例为10至90% )分别成为规定值,并且从玻璃基板(1)使抗蚀剂层(2)灰化。
    • 3. 发明授权
    • Optical disk and method of producing the same
    • 光盘及其制造方法
    • US06957444B2
    • 2005-10-18
    • US10396663
    • 2003-03-25
    • Takeo KojimaToyohito Asanuma
    • Takeo KojimaToyohito Asanuma
    • B29C65/00B29C65/48G11B7/253G11B7/2534G11B7/254G11B7/2542G11B7/257G11B7/2575G11B7/258G11B7/26G11B17/03
    • B29C65/1483B29C65/1406B29C65/1435B29C65/4845B29C66/1122B29C66/452B29C66/71B29C66/9141B29C66/91645B29L2017/005G11B7/2534G11B7/2542G11B7/2575G11B7/258G11B7/26B29K2069/00
    • An optical disk includes a reflective layer, a recording layer, an optical-transparent bonding layer and an optical transparent sheet laminated on a substrate in this order. The total thickness of the optical-transparent bonding layer and the optical transparent sheet is 0.1 mm. The peak-to-peak height of wrinkles formed on the sheet is 2.5 μm or lower. The optical disk is produced as follows: A first ultraviolet ray is radiated to an optical transparent sheet at a first energy level in the range from 500 mJ/cm2 to 3000 mJ/cm2, a wavelength of the first ultraviolet ray being in the range from 250 nm to 300 nm. Prepared next is a substrate laminated on which are a reflective layer and a recording layer in this order. Ultraviolet hardened resin is applied on the recording layer to form an optical-transparent bonding layer thereon. An optical transparent sheet is provided on the optical-transparent bonding layer. A second ultraviolet ray is radiated to the optical transparent sheet at a second energy level the same as or lower than the first energy level, to harden the optical-transparent bonding layer, thus the optical transparent sheet being bonded on the substrate via the optical-transparent bonding layer.
    • 光盘包括依次层叠在基板上的反射层,记录层,光透明结合层和光透明片。 光透明结合层和光透明片的总厚度为0.1mm。 在片材上形成的皱纹的峰 - 高高度为2.5μm以下。 光盘的制作方法如下:将第一紫外线以500mJ / cm 2〜3000mJ / cm 2的范围内的第一能级照射到光学透明片材上, 第一紫外线的波长在250nm至300nm的范围内。 接下来制备的是其上层叠有反射层和记录层的基板。 将紫外线硬化树脂施加在记录层上以在其上形成光学透明粘合层。 光学透明片设置在光透明结合层上。 第二紫外线以与第一能量水平相同或更低的第二能级照射到光学透明片材,以使光学透明结合层硬化,由此光学透明片材经由光学透明片材接合在基板上, 透明粘结层。