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1. 发明专利

JP2003343597A Clutch plate, friction clutch and driving force transmitter 有权
标题翻译：离合器，摩擦离合器和驱动力发射器
公开(公告)号：JP2003343597A
公开(公告)日：2003-12-03
申请号：JP2002151264
申请日：2002-05-24
申请人： Toyoda Mach Works Ltd , Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所 , 豊田工機株式会社
发明人： ANDO JUNJI , SAKAI NAOYUKI , SAKAI TOSHIBUMI , FUKAMI HAJIME , SAITO TOSHIYUKI , NISHI KOJI , NAKANISHI KAZUYUKI , MORI HIROYUKI , TACHIKAWA HIDEO
IPC分类号： F16D13/62 , F16D27/00 , F16D27/115 , F16D69/00 , F16D69/02
CPC分类号： F16D27/115 , F16D27/004 , F16D69/02 , F16D2027/008 , F16D2250/0038
摘要： PROBLEM TO BE SOLVED: To provide a friction clutch equipped with a clutch plate that can hardly generate abrasion and is durable, and further to provide a driving force transmitter. SOLUTION: A DLC-Si thin film D is applied to a sliding surface S2 of an outer clutch plate 34b by publicly known method such as CVD (Chemical Vapor Deposition) method, PVD (Physical Vapor Deposition) method and Ion Deposition method or the like. Thereby, the friction clutch in which an outer clutch plate 34b and an inner clutch plate 34a engage with each other by friction is accomplished. Further, the friction clutch 34 is used for the driving force transmitter. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种配备有几乎不产生磨损并耐用的离合器片的摩擦离合器，并且还提供驱动力传递器。解决方案：通过诸如CVD（化学气相沉积）法，PVD（物理气相沉积）法和离子沉积法等公知的方法将DLC-Si薄膜D施加到外离合片34b的滑动面S2上或类似物。由此，实现了通过摩擦将外离合器板34b和内离合器片34a彼此接合的摩擦离合器。此外，摩擦离合器34用于驱动力传递器。版权所有（C）2004，JPO

2. 发明专利

JP2004263292A Method and apparatus for depositing amorphous carbon film 有权
公开(公告)号：JP2004263292A
公开(公告)日：2004-09-24
申请号：JP2003379077
申请日：2003-11-07
申请人： Nippon Denshi Kogyo Kk , Toyoda Mach Works Ltd , Toyota Central Res & Dev Lab Inc , 日本電子工業株式会社 , 株式会社豊田中央研究所 , 豊田工機株式会社
发明人： ANDO JUNJI , SAKAI NAOYUKI , SAITO TOSHIYUKI , NAKANISHI KAZUYUKI , MORI HIROYUKI , TACHIKAWA HIDEO , ITO KYOJI , FUJIOKA MIKIO , FUNAKI YOSHIYUKI
IPC分类号： F16D13/62 , C23C16/26 , C23C16/50
摘要： PROBLEM TO BE SOLVED: To provide a technique for efficiently forming an amorphous carbon film at a low cost. SOLUTION: This apparatus for forming the amorphous carbon film is characteristically provided with a deposition furnace 11, plurality of work fixing tools 23, which hold plurality of the platy works 22 in a layered state in the vertical direction in the range of 2-30 mm interval between the facing surfaces of the abutted two platy works 22 at parallel in the vertical direction and are disposed like a ring at the equal interval in the furnace chamber of the deposition furnace 11 and energized as a negative electrode, nozzles 31, 32 which are constituted of the plurality pieces disposed in one or more and as the ring-state in the equal interval at a centrifugal direction side at the center of the work fixing tools 23 disposed like the ring, and a plasma electric source 16 connected to at least the work fixing tools 23. The supplied gas pressure, ranges 13-1330 Pa and the plasma electric source is operated so that a sheath width becomes 2-30 mm and thus, the stable discharge can be obtained. COPYRIGHT: (C)2004,JPO&NCIPI

3. 发明专利

JP2008031544A Surface treatment method for sliding member, sliding member, mechanical key and portable tool 有权
标题翻译：用于滑动构件，滑动构件，机械钥匙和便携式工具的表面处理方法
公开(公告)号：JP2008031544A
公开(公告)日：2008-02-14
申请号：JP2006208871
申请日：2006-07-31
申请人： Tokai Rika Co Ltd , Toyota Central Res & Dev Lab Inc , 株式会社東海理化電機製作所 , 株式会社豊田中央研究所
发明人： FUJIOKA NORIE , IZUMI ICHIRO , IGARASHI SHINTARO , TACHIKAWA HIDEO , SUZUKI KENICHI , SHIMIZU FUMIO , KATO YOSHIO
IPC分类号： C23C16/27 , C23C8/24 , C23C8/36 , C23C16/503 , C23C28/04
摘要： PROBLEM TO BE SOLVED: To provide a surface treatment method for a sliding member where, when a diamond like carbon film comprising silicon is formed on the surface of a base material, not only sliding properties such as wear resistance but also corrosion resistance can be suitably secured, to provide a sliding member, to provide a mechanical key, and to provide a portable tool.
SOLUTION: On the surface of a sliding member 10, a nitriding layer 12a for securing the adhesion of a DLC-Si film 13 stacked in the following stage is formed, and thereafter, the DLC-Si film 13 is formed on the surface of the nitriding layer 12a by plasma CVD. Then, treatment temperature at this time is controlled to 350 to 430°C. In this way, the formation of a complex compound of chromium, nitrogen and carbon as a compound to form into an obstacle upon the securance of its corrosion resistance can be suppressed. It is generally known that the formation of the complex compound remarkably reduces its corrosion resistance. Thus, not only sliding properties such as low friction properties and wear resistance but also corrosion resistance can be suitably secured.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种滑动部件的表面处理方法，其中当在基材的表面上形成包含硅的类金刚石碳膜时，不仅具有耐磨性等滑动性能，而且耐腐蚀性可以适当地固定，以提供滑动构件，以提供机械钥匙，并提供便携式工具。解决方案：在滑动构件10的表面上，形成用于确保后续层叠的DLC-Si膜13的粘附的氮化层12a，然后在DLC-Si膜13上形成DLC-Si膜13 通过等离子体CVD形成氮化层12a的表面。此时，此时的处理温度控制在350〜430℃。以这种方式，可以抑制在其耐腐蚀性的保证下形成作为化合物的铬，氮和碳的复合化合物成障碍物。通常已知复合化合物的形成显着地降低了其耐腐蚀性。因此，不仅可以适当地确保滑动性能如低摩擦性能和耐磨性，而且耐腐蚀性。版权所有（C）2008，JPO＆INPIT

4. 发明专利

JP2008031522A Coated member and manufacturing method therefor 有权
标题翻译：涂层成员及其制造方法
公开(公告)号：JP2008031522A
公开(公告)日：2008-02-14
申请号：JP2006206456
申请日：2006-07-28
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： SHIMIZU FUMIO , IGARASHI SHINTARO , SUZUKI KENICHI , TACHIKAWA HIDEO , NAKANISHI KAZUYUKI , KATO YOSHIO
IPC分类号： C23C28/04 , C21D1/06 , C21D6/00 , C22C38/00 , C22C38/40 , C23C8/02 , C23C8/26 , C23C8/38 , C23C8/50 , C23C14/48 , C23C16/26
摘要： PROBLEM TO BE SOLVED: To provide a coating member having a substrate which shows the same level of corrosion resistance as a base metal, even if the base metal of a stainless steel having an austenite structure has been worked and subjected to nitriding treatment, and to provide a manufacturing method therefor. SOLUTION: The coating member comprises the substrate and an inorganic film which covers at least one part of the surface of the surface layer. The substrate is prepared by nitriding the surface of the surface layer of a wrought material which has been obtained by working the base metal of the stainless steel having the austenite structure; and shows an immersion rest potential nobler than -200 mV when measured under a predetermined condition for the immersion rest potential measurement. The substrate is obtained by the steps of: reducing the strain induced martensite existing in the wrought material in which the strain induced martensite has been produced when the base metal has been worked, or warm-working or hot-working the base metal at a temperature higher than the Md30 of the stainless steel by 30°C or more; and subjecting the wrought material to a nitriding treatment to form a nitrided layer thereon. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：为了提供具有与贱金属相同的耐腐蚀性水平的基材的涂层部件，即使具有奥氏体结构的不锈钢的贱金属已经被加工并进行氮化处理并提供其制造方法。解决方案：涂层构件包括基材和覆盖表面层表面的至少一部分的无机膜。通过对具有奥氏体结构的不锈钢的母材进行加工而获得的锻造材料的表面的氮化表面，并且在用于浸没电位测量的预定条件下测量时，显示出超过-200mV的浸没电位。通过以下步骤获得基板：当贱金属加工时，减少存在于其中已经产生应变诱发马氏体的锻造材料中的应变诱发马氏体，或在温度下温热或热加工母材高于不锈钢的Md30 30℃以上; 并对锻造材料进行氮化处理，以在其上形成氮化层。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2007064289A Driving force transmission device 有权
标题翻译：驱动力传动装置
公开(公告)号：JP2007064289A
公开(公告)日：2007-03-15
申请号：JP2005248894
申请日：2005-08-30
申请人： Jtekt Corp , Toyota Central Res & Dev Lab Inc , 株式会社ジェイテクト , 株式会社豊田中央研究所
发明人： ANDO JUNJI , SAKAI NAOYUKI , SAKAI TOSHIBUMI , SAITO TOSHIYUKI , FUKAMI HAJIME , NAKANISHI KAZUYUKI , MORI HIROYUKI , TACHIKAWA HIDEO
IPC分类号： F16D27/115
CPC分类号： F16D13/64 , F16D13/648 , F16D13/74 , F16D27/004 , F16D27/115 , F16D2027/008 , F16D2065/132 , F16D2069/004 , F16D2200/0008 , F16D2200/0039 , F16D2200/0052 , F16D2300/10
摘要： PROBLEM TO BE SOLVED: To provide a driving force transmission device capable of suppressing change of driving force transmission properties with time by reducing friction of sliding surfaces of driving force transmission members which rotate relatively. SOLUTION: A DLC coat (diamond-like carbon coat) is formed on an outer clutch plate which is one of the driving force transmission members and a plurality of fine grooves 42 are formed on a sliding surface 28a of an inner clutch plate 28 side which is the other of the driving force transmission members. The respective fine grooves 42 are formed so that the rate of slide-contacting area of the sliding surface of the inner clutch plate 28 is 55 to 90% in an initial period of using the driving force transmission device. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决的问题：提供一种能够通过减少相对旋转的驱动力传递部件的滑动面的摩擦来抑制驱动力传递特性随时间的变化的驱动力传递装置。解决方案：在作为驱动力传递部件之一的外离合器板上形成DLC涂层（类金刚石碳涂层），并且在内离合器板的滑动表面28a上形成多个细槽42 28侧，其是驱动力传递构件中的另一个。各个细槽42形成为在使用驱动力传递装置的初始期间内部离合器板28的滑动面的滑动接触面积的比率为55〜90％。版权所有（C）2007，JPO＆INPIT

6. 发明专利

JP2005336456A Low-frictional sliding member 有权
标题翻译：低摩擦滑动构件
公开(公告)号：JP2005336456A
公开(公告)日：2005-12-08
申请号：JP2005018209
申请日：2005-01-26
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： MORI HIROYUKI , SHIMIZU FUMIO , TACHIKAWA HIDEO , OMORI SHUNEI , MORIYA KOJI , TOYAMA MAMORU , SHIMURA YOSHIO , HOTTA SHIGERU , IZEKI TAKASHI
IPC分类号： C10M103/02 , B32B9/00 , C10M101/02 , C10M101/04 , C10N20/00 , C10N30/06 , C10N40/02 , C10N40/04 , C10N40/25
CPC分类号： B32B9/00 , Y10T428/24479 , Y10T428/24628 , Y10T428/30
摘要： PROBLEM TO BE SOLVED: To provide a low-frictional sliding member realizing a low coefficient of friction without depending on adsorption and reaction of an additive contained in a lubricating oil. SOLUTION: The low-frictional sliding member is used under wet conditions with the lubricating oil and provided with a substrate and an amorphous rigid carbon film formed on the surface of the substrate and brought into sliding contact with an opposite material. In the member, the Si content of the amorphous rigid carbon film is ≥1 to ≤20 atomic% and the H content is ≥20 to ≤50 atomic%. The surface roughness is ≤0.8 μm Rzjis. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种实现低摩擦系数的低摩擦滑动构件，而不依赖于包含在润滑油中的添加剂的吸附和反应。解决方案：低摩擦滑动构件在湿润条件下与润滑油一起使用，并且在基材表面上形成有基材和无定形刚性碳膜，并与相对材料滑动接触。在该构件中，无定形刚性碳膜的Si含量≥1〜≤20原子％，H含量≥20〜≤50原子％。表面粗糙度≤0.8μmRzjis。版权所有（C）2006，JPO＆NCIPI

7. 发明专利

JP2005314454A Low-friction slide member 审中-公开
标题翻译：低摩擦滑动构件
公开(公告)号：JP2005314454A
公开(公告)日：2005-11-10
申请号：JP2004130768
申请日：2004-04-27
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： MORI HIROYUKI , OMORI SHUNEI , TACHIKAWA HIDEO , HOTTA SHIGERU , MORIYA KOJI , TOYAMA MAMORU , SHIMURA YOSHIO , SHIMIZU FUMIO , IZEKI TAKASHI
IPC分类号： F16C33/16 , C10M103/02 , C10M171/00 , C10N20/00 , C10N30/06 , C10N40/25 , C10N50/08 , C23C16/26 , C23C26/00 , F16N15/00
CPC分类号： Y02T10/865
摘要： PROBLEM TO BE SOLVED: To obtain a low-friction slide member that actualizes a low coefficient of friction without depending upon adsorption and reaction of an additive contained in lubricating oil.
SOLUTION: The low-friction slide member comprises a substrate and an amorphous hard carbon film that is formed on the surface of the substrate, brought into sliding contact with an opposite material and contains ≥1 at% and ≤30 at% of Si. The low-friction slide member is used in a wet conditions using a low-additive lubricating oil having ≤500 ppm of the total content of phosphorus, zinc, calcium, magnesium, sodium, barium, copper and chlorine.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：获得实现低摩擦系数的低摩擦滑动构件，而不依赖于润滑油中所含的添加剂的吸附和反应。解决方案：低摩擦滑动构件包括基板和形成在基板表面上的非晶硬质碳膜，与相对材料滑动接触，并且含有≥1at％和≤30at％的硅。低摩擦滑动构件使用的是使用磷，锌，钙，镁，钠，钡，铜和氯的总含量≤500ppm的低添加剂润滑油。版权所有（C）2006，JPO＆NCIPI

8. 发明专利

JP2007023356A Low friction sliding member 有权
标题翻译：低摩擦滑动构件
公开(公告)号：JP2007023356A
公开(公告)日：2007-02-01
申请号：JP2005209114
申请日：2005-07-19
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： MORI HIROYUKI , SHIMIZU FUMIO , IGARASHI SHINTARO , TACHIKAWA HIDEO , MATSUI MUNEHISA , OSHIMA TADASHI , IZEKI TAKASHI , NAKANISHI KAZUYUKI
IPC分类号： C23C16/27 , C10M103/02 , C10M103/06 , C10N20/00 , C10N30/06 , C10N40/02 , C10N40/25 , C10N50/08 , C23C30/00
摘要： PROBLEM TO BE SOLVED: To provide a low friction sliding member with which the friction between a counterpart member and itself can be lowered even if the surface roughness of a sliding surface is large.
SOLUTION: The low friction sliding member 1 is constituted of a base material 11 and a sliding layer 21 which is formed on the sliding surface side of the base material 11 and brought into contact with the counterpart member formed in a sliding state. The sliding layer 21 is formed from amorphous carbon containing carbon as a main component, >30 to 2 -hybrid orbital is contained in an amount of 40-70 atomic% in the carbon. As the low friction sliding member 1 has a soft sliding layer 21, a sliding surface 21f can be made smooth by sliding even when the surface roughness of the sliding surface 21f is large. A wear resistant layer 22 formed from amorphous carbon containing hydrogen in an amount lower than that of the hydrogen contained in the amorphous carbon of the sliding layer 21 may be provided between the base material 11 and the sliding layer 21. The wear resistant layer 22 imparts a high wear resistance to the soft, low friction sliding member 1.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种低摩擦滑动构件，即使滑动表面的表面粗糙度大，也可以降低对置构件与其本身之间的摩擦。解决方案：低摩擦滑动构件1由基材11和滑动层21构成，滑动层21形成在基材11的滑动表面侧上并与形成为滑动状态的配对构件接触。滑动层21由含有碳为主要成分的无定形碳形成，含有> 30至<50原子％的氢和1.5-20原子％的硅，其中含有sp 2 - 混合轨道的碳其碳含量为40-70原子％。由于低摩擦滑动构件1具有柔软的滑动层21，所以即使当滑动面21f的表面粗糙度大时，滑动面21f也能够滑动。可以在基材11和滑动层21之间设置由非晶碳构成的耐磨层22，该耐磨层22的含量低于滑动层21的无定形碳中含有的氢的量的无定形碳。耐磨层22赋予对柔软，低摩擦滑动构件1具有高耐磨性。版权所有（C）2007，JPO＆INPIT

9. 发明专利

JP2005187318A Amorphous carbon, amorphous carbon coating film member and method of forming amorphous carbon film 有权
标题翻译：非晶碳，非晶碳涂层薄膜和形成非晶碳膜的方法
公开(公告)号：JP2005187318A
公开(公告)日：2005-07-14
申请号：JP2004340860
申请日：2004-11-25
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： NAKANISHI KAZUYUKI , OSHIMA TADASHI , HASEGAWA HIDEO , MORI HIROYUKI , IZEKI TAKASHI , TACHIKAWA HIDEO , MATSUI MUNEHISA
IPC分类号： C01B31/02 , B32B9/00 , C23C16/26 , H01L21/205 , H05H1/24
CPC分类号： C23C16/26 , Y10T428/30
摘要： PROBLEM TO BE SOLVED: To provide soft amorphous carbon having a low elastic modulus, an amorphous carbon coating film member consisting of the amorphous carbon and a method of forming the amorphous carbon film. SOLUTION: The amorphous carbon consists essentially of carbon, contains >30 at% and ≤60 at% hydrogen and has 40 to 150 GPa elastic modulus. The amorphous carbon coating film member consists of a conductive base material 22, and a coating film fixed at least at part of the surface of the base material 22 and consisting of the amorphous carbon. The method of forming the amorphous carbon film comprises forming the amorphous carbon film on the surface of the conductive base material 22 by the plasma CVD method. A plurality of the base materials 22 are arranged so as to face each other on a base material holding tool 21 which is disposed in a film forming furnace 11 and connected to a negative pole. The pressure of treating gas and a plasm power source are operated so that the negative glows 24 of two adjacent base materials 22 overlap each other. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供具有低弹性模量的软无定形碳，由无定形碳组成的无定形碳涂层膜和形成无定形碳膜的方法。解决方案：无定形碳基本上由碳组成，含有> 30原子％和≤60原子％的氢，并具有40至150GPa的弹性模量。无定形碳涂膜构件由导电基材22和固定在基材22表面的至少一部分上并由无定形碳构成的涂膜构成。形成无定形碳膜的方法包括通过等离子体CVD法在导电性基材22的表面上形成无定形碳膜。多个基材22被布置成在设置在成膜炉11中并连接到负极的基材保持工具21上彼此面对。操作处理气体和等离子体电源的压力被操作，使得两个相邻基底材料22的负发光体24彼此重叠。版权所有（C）2005，JPO＆NCIPI

10. 发明专利

JP2004202592A Tool member having amorphous carbon film containing silicon and its manufacturing method 审中-公开
公开(公告)号：JP2004202592A
公开(公告)日：2004-07-22
申请号：JP2002371576
申请日：2002-12-24
申请人： Toyota Central Res & Dev Lab Inc , 株式会社豊田中央研究所
发明人： IGARASHI SHINTARO , HASEGAWA HIDEO , TACHIKAWA HIDEO , OKURA KAZUTAKA , SUZUKI KENICHI , IZEKI TAKASHI
IPC分类号： B23B51/00 , B21D37/01 , C23C16/30 , C23C16/42 , C23C28/04
摘要： PROBLEM TO BE SOLVED: To provide a tool member for forming a amorphous carbon film containing silicon, and superior in working characteristic.
SOLUTION: This tool member is characterized by forming the silicon-containing amorphous carbon film having an atomic ratio of Si
0.03 to 0.25 C
0.30 to 0.75 H
0.22 to 0.50 on a surface. Such a tool member forms an intermediate layer on a base material surface, and forms the silicon-containing amorphous carbon film having an atomic ratio of Si
0.03 to 0.25 C
0.30 to 0.75 H
0.22 to 0.50 by using a plasma CVD (chemical vapor deposition) after applying activation processing.
COPYRIGHT: (C)2004,JPO&NCIPI

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