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    • 1. 发明申请
    • Apparatus for Producing Trichlorosilane
    • 三氯硅烷生产设备
    • US20090202404A1
    • 2009-08-13
    • US12226202
    • 2007-10-23
    • Toshiyuki IshiiHideo ItoYuji Shimizu
    • Toshiyuki IshiiHideo ItoYuji Shimizu
    • B01J19/24
    • C01B33/1071B01J12/007B01J19/02B01J19/243B01J2219/00135B01J2219/00155B01J2219/0272
    • An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein a reaction passageway is formed in the interior of the reaction vessel, in which a plurality of small spaces partitioned by a plurality of reaction tubular walls that have different inner diameters and are substantially concentrically disposed communicate by flow penetration sections formed alternately in lower portions and upper portions of the reaction tubular walls in order from the inside, and the gas supply section and the gas discharge section are connected to the reaction passageway.
    • 一种三氯硅烷的制造装置,包括:供给含有四氯化硅和氢气的供给气体的反应容器,生成含有三氯硅烷和氯化氢的反应生成气体; 加热反应容器内部的加热机构; 气体供给部,其供给反应容器内的供给气体; 以及气体排出部,其将反应产物气体从反应容器排出到外部,其中反应通道形成在反应容器的内部,其中多个由多个反应管壁分隔的小空间,其具有 不同的内径并且基本上同心设置,由内部依次形成在反应管壁的下部和上部交替形成的流动穿透部分,气体供应部分和气体排出部分连接到反应通道。
    • 3. 发明授权
    • Apparatus for producing trichlorosilane
    • 三氯硅烷生产设备
    • US07998428B2
    • 2011-08-16
    • US12226201
    • 2007-10-25
    • Toshiyuki IshiiHideo ItoYuji Shimizu
    • Toshiyuki IshiiHideo ItoYuji Shimizu
    • B01J19/00B01J3/00
    • C01B33/1071B01J12/007B01J19/02B01J19/243B01J2219/00135B01J2219/00155B01J2219/0272
    • An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a storage container that stores the reaction vessel and the heating mechanism; a gas supply internal cylinder that supplies the supply gas in the reaction vessel; a gas discharge external cylinder that is substantially concentrically disposed outside the gas supply internal cylinder, forming a discharge passageway of the reaction product gas between an outer circumferential surface of the gas supply internal cylinder and an inner circumferential surface of the gas discharge external cylinder; and a cooling cylinder that supports the gas discharge external cylinder disposed inside thereof and includes a refrigerant passageway formed therein for circulating a refrigerant.
    • 一种三氯硅烷的制造装置,包括:供给含有四氯化硅和氢气的供给气体的反应容器,生成含有三氯硅烷和氯化氢的反应生成气体; 加热反应容器内部的加热机构; 存储反应容器和加热机构的储存容器; 气体供给内筒,其供给反应容器内的供给气体; 大致同心地配置在所述气体供给内筒的外侧的气体排出外筒,在所述气体供给内筒的外周面与所述气体排出外筒的内周面之间形成所述反应产物气体的排出通路; 以及冷却筒,其支撑设置在其内部的排气外筒,并且包括形成在其中的用于循环制冷剂的制冷剂通道。
    • 4. 发明授权
    • Apparatus for producing trichlorosilane
    • 三氯硅烷生产设备
    • US09493359B2
    • 2016-11-15
    • US12226204
    • 2007-10-24
    • Toshiyuki IshiiHideo ItoYuji Shimizu
    • Toshiyuki IshiiHideo ItoYuji Shimizu
    • B01J19/00C01B33/107B01J12/00B01J19/02B01J19/24
    • C01B33/1071B01J12/007B01J19/02B01J19/243B01J2219/00135B01J2219/00155B01J2219/0272C01B33/10757
    • An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to an internal reaction passageway to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein the reaction passageway includes: a supply side passageway which is connected to the gas supply section at a central portion of the reaction vessel and flows the supply gas toward the outside while meandering in the reaction vessel; a return passageway which is connected to a downstream end of the supply side passageway and extends to the central portion of the reaction vessel; and a discharge side passageway that is disposed so as to be connected to a downstream end of the return passageway and to adjoin the supply side passageway of the central portion of the reaction vessel, the discharge side passageway being connected to the gas discharge section.
    • 一种三氯硅烷的制造装置,其特征在于,包括:向内部反应通道供给含有四氯化硅和氢的供给气体的反应容器,生成含有三氯硅烷和氯化氢的反应产物气体; 加热反应容器内部的加热机构; 气体供给部,其供给反应容器内的供给气体; 以及气体排出部,其将反应产物气体从反应容器排出到外部,其中反应通道包括:供给侧通道,其在反应容器的中心部分处连接到气体供应部分并使供给气体 朝向外面,在反应船上蜿蜒曲折; 返回通道,其连接到供应侧通道的下游端并延伸到反应容器的中心部分; 以及排出侧通道,其设置成连接到所述返回通道的下游端并与所述反应容器的中心部分的供给侧通道相邻,所述排出侧通道连接到所述气体排出部。
    • 6. 发明申请
    • Apparatus for Producing Trichlorosilane
    • 三氯硅烷生产设备
    • US20090269259A1
    • 2009-10-29
    • US12226204
    • 2007-10-24
    • Toshiyuki IshiiHideo ItoYuji Shimizu
    • Toshiyuki IshiiHideo ItoYuji Shimizu
    • B01J19/00
    • C01B33/1071B01J12/007B01J19/02B01J19/243B01J2219/00135B01J2219/00155B01J2219/0272C01B33/10757
    • An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to an internal reaction passageway to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a gas supply section that supplies the supply gas in the reaction vessel; and a gas discharge section that discharges the reaction product gas from the reaction vessel to the outside, wherein the reaction passageway includes: a supply side passageway which is connected to the gas supply section at a central portion of the reaction vessel and flows the supply gas toward the outside while meandering in the reaction vessel; a return passageway which is connected to a downstream end of the supply side passageway and extends to the central portion of the reaction vessel; and a discharge side passageway that is disposed so as to be connected to a downstream end of the return passageway and to adjoin the supply side passageway of the central portion of the reaction vessel, the discharge side passageway being connected to the gas discharge section.
    • 一种三氯硅烷的制造装置,其特征在于,包括:向内部反应通道供给含有四氯化硅和氢的供给气体的反应容器,生成含有三氯硅烷和氯化氢的反应产物气体; 加热反应容器内部的加热机构; 气体供给部,其供给反应容器内的供给气体; 以及气体排出部,其将反应产物气体从反应容器排出到外部,其中反应通道包括:供给侧通道,其在反应容器的中心部分处连接到气体供应部分并使供给气体 朝向外面,在反应船上蜿蜒曲折; 返回通道,其连接到供应侧通道的下游端并延伸到反应容器的中心部分; 以及排出侧通道,其设置成连接到所述返回通道的下游端并与所述反应容器的中心部分的供给侧通道相邻,所述排出侧通道连接到所述气体排出部。
    • 7. 发明申请
    • Apparatus for Producing Trichlorosilane
    • 三氯硅烷生产设备
    • US20090155138A1
    • 2009-06-18
    • US12226201
    • 2007-10-25
    • Toshiyuki IshiiHideo ItoYuji Shimizu
    • Toshiyuki IshiiHideo ItoYuji Shimizu
    • B01J19/00
    • C01B33/1071B01J12/007B01J19/02B01J19/243B01J2219/00135B01J2219/00155B01J2219/0272
    • An apparatus for producing trichlorosilane, including: a reaction vessel in which a supply gas containing silicon tetrachloride and hydrogen is supplied to produce a reaction product gas containing trichlorosilane and hydrogen chloride; a heating mechanism that heats the interior of the reaction vessel; a storage container that stores the reaction vessel and the heating mechanism; a gas supply internal cylinder that supplies the supply gas in the reaction vessel; a gas discharge external cylinder that is substantially concentrically disposed outside the gas supply internal cylinder, forming a discharge passageway of the reaction product gas between an outer circumferential surface of the gas supply internal cylinder and an inner circumferential surface of the gas discharge external cylinder; and a cooling cylinder that supports the gas discharge external cylinder disposed inside thereof and includes a refrigerant passageway formed therein for circulating a refrigerant.
    • 一种三氯硅烷的制造装置,包括:供给含有四氯化硅和氢气的供给气体的反应容器,生成含有三氯硅烷和氯化氢的反应生成气体; 加热反应容器内部的加热机构; 存储反应容器和加热机构的储存容器; 气体供给内筒,其供给反应容器内的供给气体; 大致同心地配置在所述气体供给内筒的外侧的气体排出外筒,在所述气体供给内筒的外周面与所述气体排出外筒的内周面之间形成所述反应产物气体的排出通路; 以及冷却筒,其支撑设置在其内部的排气外筒,并且包括形成在其中的用于循环制冷剂的制冷剂通道。