会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明授权
    • Method for producing group III nitride semiconductor light-emitting device
    • III族氮化物半导体发光元件的制造方法
    • US08389304B2
    • 2013-03-05
    • US13067142
    • 2011-05-11
    • Toshiya UemuraJun Ito
    • Toshiya UemuraJun Ito
    • H01L21/00
    • H01L33/24H01L21/0237H01L21/02381H01L21/0243H01L21/02458H01L21/02494H01L21/02516H01L21/0254H01L21/02658H01L33/007H01L33/382
    • The present invention provides a method for producing a Group III nitride semiconductor light-emitting device, the device including a light-emitting layer which is formed so as to contour a stripe-pattern embossment and to have a uniform thickness. In the production method, firstly, a stripe-pattern embossment having a serrated cross section is formed on one surface of a substrate. Subsequently, on the surface of the substrate on the side of the stripe-pattern embossment having a serrated cross section, an n-type layer, a light-emitting layer, and a p-type layer are sequentially deposited through reduced-pressure MOCVD so as to contour the embossment. Thus, each of the layers is formed so as to contour the embossment, and to have a stripe pattern with a serrated cross section. In this MOCVD process, the direction of gas flow is parallel with the direction of the stripe of the embossment. Thus, the light-emitting layer has uniform thickness and composition in an in-plane direction.
    • 本发明提供了一种制造III族氮化物半导体发光器件的方法,该器件包括形成为使条状图案压花轮廓化并具有均匀厚度的发光层。 在制造方法中,首先,在基板的一个面上形成具有锯齿形截面的条纹图案压花。 随后,在具有锯齿状横截面的条纹图案压花侧的基板表面上,通过减压MOCVD依次沉积n型层,发光层和p型层,从而 为了轮廓浮雕。 因此,每个层被形成为使得凸起轮廓化,并且具有锯齿状横截面的条纹图案。 在该MOCVD工艺中,气流的方向与压花条的方向平行。 因此,发光层在面内方向上具有均匀的厚度和组成。
    • 4. 发明申请
    • Group III nitride semiconductor light-emitting device
    • III族氮化物半导体发光器件
    • US20110062488A1
    • 2011-03-17
    • US12923318
    • 2010-09-14
    • Toshiya UemuraJun Ito
    • Toshiya UemuraJun Ito
    • H01L33/40
    • H01L33/38H01L33/44H01L2924/0002H01L2924/00
    • A Group III nitride semiconductor light-emitting device includes an electrically conductive support; a p-electrode provided on the support; a p-type layer, an active layer, and an n-type layer, which are formed of a Group III nitride semiconductor and are sequentially provided on the p-electrode; an n-electrode which is connected to the n-type layer; a first trench extending from the surface of the p-type layer on the p-electrode's side to reach the n-type layer; an auxiliary electrode which is in contact with the surface of the n-type layer serving as the bottom of the first trench, but is not in contact with the side walls of the first trench; and an insulating film which exhibits light permeability and covers the auxiliary electrode and the bottom and side walls of the first trench.
    • III族氮化物半导体发光器件包括导电支撑体; 设置在支撑体上的p电极; p型层,有源层和n型层,其由III族氮化物半导体形成,并且依次设置在p电极上; 与n型层连接的n电极; 从p型层的p电极侧的表面延伸到n型层的第一沟槽; 与作为第一沟槽的底部的n型层的表面接触但不与第一沟槽的侧壁接触的辅助电极; 以及表现出透光性并覆盖第一沟槽的辅助电极和底壁和侧壁的绝缘膜。
    • 7. 发明申请
    • Method for producing group III nitride semiconductor light-emitting device
    • III族氮化物半导体发光元件的制造方法
    • US20110281381A1
    • 2011-11-17
    • US13067142
    • 2011-05-11
    • Toshiya UemuraJun Ito
    • Toshiya UemuraJun Ito
    • H01L33/22
    • H01L33/24H01L21/0237H01L21/02381H01L21/0243H01L21/02458H01L21/02494H01L21/02516H01L21/0254H01L21/02658H01L33/007H01L33/382
    • The present invention provides a method for producing a Group III nitride semiconductor light-emitting device, the device including a light-emitting layer which is formed so as to contour a stripe-pattern embossment and to have a uniform thickness. In the production method, firstly, a stripe-pattern embossment having a serrated cross section is formed on one surface of a substrate. Subsequently, on the surface of the substrate on the side of the stripe-pattern embossment having a serrated cross section, an n-type layer, a light-emitting layer, and a p-type layer are sequentially deposited through reduced-pressure MOCVD so as to contour the embossment. Thus, each of the layers is formed so as to contour the embossment, and to have a stripe pattern with a serrated cross section. In this MOCVD process, the direction of gas flow is parallel with the direction of the stripe of the embossment. Thus, the light-emitting layer has uniform thickness and composition in an in-plane direction.
    • 本发明提供了一种制造III族氮化物半导体发光器件的方法,该器件包括形成为使条状图案压花轮廓化并具有均匀厚度的发光层。 在制造方法中,首先,在基板的一个面上形成具有锯齿形截面的条纹图案压花。 随后,在具有锯齿状横截面的条纹图案压花侧的基板表面上,通过减压MOCVD依次沉积n型层,发光层和p型层,从而 为了轮廓浮雕。 因此,每个层被形成为使得凸起轮廓化,并且具有锯齿状横截面的条纹图案。 在该MOCVD工艺中,气流的方向与压花条的方向平行。 因此,发光层在面内方向上具有均匀的厚度和组成。