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1. 发明授权

US07267128B2 Substrate treating apparatus 有权
标题翻译：底物处理装置
公开(公告)号：US07267128B2
公开(公告)日：2007-09-11
申请号：US10681450
申请日：2003-10-08
申请人： Toshio Hiroe , Koji Hasegawa , Ichiro Mitsuyoshi , Yoshihiro Nishina
发明人： Toshio Hiroe , Koji Hasegawa , Ichiro Mitsuyoshi , Yoshihiro Nishina
IPC分类号： B08B3/00
CPC分类号： H01L21/67265 , H01L21/67057
摘要： A substrate treating apparatus for treating substrates includes a treating tank for receiving and treating the substrates, a holding device movable, while holding the substrates in a cantilever mode, between a treating position in the treating tank and a transfer position above the treating tank, a transport device for supporting the substrates and transferring the substrates to and from the holding device in the transfer position, a detecting device for detecting a posture variation of the holding device, and a correcting device for correcting a position of the holding device or the transport device. The correcting device performs a correction according to the posture variation of the holding device detected by the detecting device in time of transfer of the substrates between the holding device and the transport device.
摘要翻译：用于处理基板的基板处理装置包括：用于接收和处理基板的处理槽;保持装置，可以在处理槽中的处理位置和处理槽上方的转移位置之间以悬臂模式保持基板; 传送装置，用于支撑基板并在保持装置的传送位置上传送基板;检测装置，用于检测保持装置的姿势变化;以及校正装置，用于校正保持装置或输送装置的位置。校正装置根据在保持装置和输送装置之间的基板的传送时由检测装置检测到的保持装置的姿势变化进行校正。

2. 发明授权

US08033288B2 Substrate treatment apparatus 有权
标题翻译：基板处理装置
公开(公告)号：US08033288B2
公开(公告)日：2011-10-11
申请号：US12043561
申请日：2008-03-06
申请人： Akio Shiomi , Yoshihiro Nishina , Toru Sato , Ryo Muramoto
发明人： Akio Shiomi , Yoshihiro Nishina , Toru Sato , Ryo Muramoto
IPC分类号： B08B3/04
CPC分类号： H01L21/67781 , H01L21/67075 , H01L21/67766 , Y10S134/902
摘要： A substrate treatment apparatus includes a container holder which holds a container for containing multiple substrates vertically stacked in horizontal postures, a substrate treatment section which collectively applies treatment to multiple substrates horizontally stacked in vertical postures, a main conveyance mechanism which conveys multiple substrates horizontally stacked in vertical postures between a substrate delivery position and the substrate treatment section, a carrying in/out mechanism which carries in/out the multiple substrates with respect to the container and changes postures of the multiple substrates between the horizontal postures and the vertical postures, and a sub conveyance mechanism which receives and delivers multiple substrates in vertical postures from and to the carrying in/out mechanism at a transfer position, receives and delivers multiple substrates in vertical postures from and to the main conveyance mechanism at the substrate delivery position, and conveys multiple substrates in vertical postures between the transfer and substrate delivery positions.
摘要翻译：基板处理装置包括：容器保持器，其容纳用于容纳垂直堆叠在水平姿势中的多个基板的容器;基板处理部，其对垂直方向上水平堆叠的多个基板进行处理;主输送机构，其将多个基板水平地堆叠在在基板输送位置和基板处理部之间的垂直姿势，相对于容器进出多个基板的搬入/退出机构，并且在水平姿势和垂直姿势之间改变多个基板的姿势，以及在传送位置从承载/离开机构接收和传送垂直姿势的多个基板的副传送机构，在基板传送位置处从主传送机构接收并传送多个基板至主传送机构的垂直姿势，并且传送在转移和底物递送位置之间的垂直姿势中具有多个基底。

3. 发明申请

US20080216880A1 SUBSTRATE TREATMENT APPARATUS 有权
标题翻译：基板处理设备
公开(公告)号：US20080216880A1
公开(公告)日：2008-09-11
申请号：US12043561
申请日：2008-03-06
申请人： Akio Shiomi , Yoshihiro Nishina , Toru Sato , Ryo Muramoto
发明人： Akio Shiomi , Yoshihiro Nishina , Toru Sato , Ryo Muramoto
IPC分类号： B08B13/00
CPC分类号： H01L21/67781 , H01L21/67075 , H01L21/67766 , Y10S134/902
摘要： A substrate treatment apparatus includes a container holder which holds a container for containing multiple substrates vertically stacked in horizontal postures, a substrate treatment section which collectively applies treatment to multiple substrates horizontally stacked in vertical postures, a main conveyance mechanism which conveys multiple substrates horizontally stacked in vertical postures between a substrate delivery position and the substrate treatment section, a carrying in/out mechanism which carries in/out the multiple substrates with respect to the container and changes postures of the multiple substrates between the horizontal postures and the vertical postures, and a sub conveyance mechanism which receives and delivers multiple substrates in vertical postures from and to the carrying in/out mechanism at a transfer position, receives and delivers multiple substrates in vertical postures from and to the main conveyance mechanism at the substrate delivery position, and conveys multiple substrates in vertical postures between the transfer and substrate delivery positions.
摘要翻译：基板处理装置包括：容器保持器，其容纳用于容纳垂直堆叠在水平姿势中的多个基板的容器;基板处理部，其对垂直方向上水平堆叠的多个基板进行处理;主输送机构，其将多个基板水平地堆叠在在基板输送位置和基板处理部之间的垂直姿势，相对于容器进出多个基板的搬入/退出机构，并且在水平姿势和垂直姿势之间改变多个基板的姿势，以及在传送位置从承载/离开机构接收和传送垂直姿势的多个基板的副传送机构，在基板传送位置处从主传送机构接收并传送多个基板至主传送机构的垂直姿势，并且传送在转移和底物递送位置之间的垂直姿势中具有多个基底。

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