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1. 发明授权

US08476361B2 Fine pattern transfer material 失效
标题翻译：精细图案转印材料
公开(公告)号：US08476361B2
公开(公告)日：2013-07-02
申请号：US12523464
申请日：2008-02-07
申请人： Toshio Fujita , Hiroshi Uchida , Katsutoshi Morinaka , Katsumasa Hirose
发明人： Toshio Fujita , Hiroshi Uchida , Katsutoshi Morinaka , Katsumasa Hirose
IPC分类号： C08L83/04
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G11B5/855
摘要： A transfer material that can favorably form a fine pattern by nanoimprinting. The nanoimprinting transfer material is a fine pattern resin composition that includes an organosilicon compound and a metal compound of a metal from groups 3 through 14 of the periodic table.
摘要翻译：可通过纳米压印有利地形成精细图案的转印材料。纳米压印转印材料是包含有机硅化合物和元素周期表第3至14族金属的金属化合物的精细图案树脂组合物。

2. 发明申请

US20100093907A1 Fine Pattern Transfer Material 失效
标题翻译：精细图案转印材料
公开(公告)号：US20100093907A1
公开(公告)日：2010-04-15
申请号：US12523464
申请日：2008-02-07
申请人： Toshio Fujita , Hiroshi Uchida , Katsutoshi Morinaka , Katsumasa Hirose
发明人： Toshio Fujita , Hiroshi Uchida , Katsutoshi Morinaka , Katsumasa Hirose
IPC分类号： C08K5/05
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G11B5/855
摘要： A transfer material that can favorably form a fine pattern by nanoimprinting. The nanoimprinting transfer material is a fine pattern resin composition that includes an organosilicon compound and a metal compound of a metal from groups 3 through 14 of the periodic table.
摘要翻译：可通过纳米压印有利地形成精细图案的转印材料。纳米压印转印材料是包含有机硅化合物和元素周期表第3至14族金属的金属化合物的精细图案树脂组合物。

3. 发明授权

US08604150B2 Epoxy group-containing organosiloxane compound, curable composition for transfer materials and method for forming micropattern using the composition 失效
标题翻译：含有环氧基的有机硅氧烷化合物，转印材料用固化性组合物和使用该组合物形成微图案的方法
公开(公告)号：US08604150B2
公开(公告)日：2013-12-10
申请号：US12741148
申请日：2008-11-05
申请人： Katsutoshi Morinaka , Yoshikazu Arai , Hiroshi Uchida , Toshio Fujita
发明人： Katsutoshi Morinaka , Yoshikazu Arai , Hiroshi Uchida , Toshio Fujita
IPC分类号： C08G77/08
CPC分类号： B82Y40/00 , B82Y10/00 , C07F7/0838 , C07F7/21 , C08G59/306 , C08G59/3281 , C08G59/42 , G03F7/0002 , G03F7/0757
摘要： The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si—H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction.
摘要翻译：本发明的目的是提供一种转印材料用固化性组合物。该可固化组合物可应用于能够形成具有高通量的微图案的UV纳米压印法，在一些情况下可应用于热纳米压印工艺，并且能够形成对氟基气体和氧气本发明的转印材料用固化性组合物含有通过使具有Si-H基的硅化合物（A）和具有固化性官能团的化合物（B）和碳 - 碳双键以外的碳 - 碳双键可固化的官能团进行氢化硅烷化反应。

4. 发明申请

US20100258983A1 EPOXY GROUP-CONTAINING ORGANOSILOXANE COMPOUND, CURABLE COMPOSITION FOR TRANSFER MATERIALS AND METHOD FOR FORMING MICROPATTERN USING THE COMPOSITION 失效
标题翻译：含环氧基团的有机硅氧烷化合物，用于转移材料的可固化组合物和使用组合物形成微波炉的方法
公开(公告)号：US20100258983A1
公开(公告)日：2010-10-14
申请号：US12741148
申请日：2008-11-05
申请人： Katsutoshi Morinaka , Yoshikazu Arai , Hiroshi Uchida , Toshio Fujita
发明人： Katsutoshi Morinaka , Yoshikazu Arai , Hiroshi Uchida , Toshio Fujita
IPC分类号： B29C35/08 , C08G77/14 , C08L63/00 , B29C59/02
CPC分类号： B82Y40/00 , B82Y10/00 , C07F7/0838 , C07F7/21 , C08G59/306 , C08G59/3281 , C08G59/42 , G03F7/0002 , G03F7/0757
摘要： The present invention has an object to provide a curable composition for transfer materials. The curable composition is applicable to a UV nanoimprint process capable of forming micropatterns with high throughput, is applicable to a thermal nanoimprint process in some cases, and is capable of forming a micropattern having high selectivity on etching rates regarding a fluorine-based gas and an oxygen gas. A curable composition for transfer materials of the present invention contains a curable silicon compound produced by subjecting a silicon compound (A) having a Si—H group and a compound (B) having a curable functional group and a carbon-carbon double bond other than the curable functional group to a hydrosilylation reaction.
摘要翻译：本发明的目的是提供一种转印材料用固化性组合物。该可固化组合物可应用于能够形成具有高通量的微图案的UV纳米压印法，在一些情况下可应用于热纳米压印工艺，并且能够形成对氟基气体和氧气本发明的转印材料用固化性组合物含有通过使具有Si-H基的硅化合物（A）和具有固化性官能团的化合物（B）和碳 - 碳双键以外的碳 - 碳双键进行处理而制造的固化性硅化合物可固化的官能团进行氢化硅烷化反应。

5. 发明授权

US07790354B2 Photosensitive resin composition, cured product thereof and production method of printed circuit board using the same 有权
标题翻译：光敏树脂组合物，其固化产物和使用其的印刷电路板的制备方法
公开(公告)号：US07790354B2
公开(公告)日：2010-09-07
申请号：US11587162
申请日：2005-04-21
申请人： Satoru Ishigaki , Hiroshi Uchida , Yoshio Miyajima , Katsutoshi Morinaka
发明人： Satoru Ishigaki , Hiroshi Uchida , Yoshio Miyajima , Katsutoshi Morinaka
IPC分类号： G03F7/00 , G03F7/004 , G03F7/035
CPC分类号： G03F7/027 , C08G18/0823 , C08G18/4854 , C08G18/672 , C08G18/755 , C09D175/16 , G03F7/032 , G03F7/033 , G03F7/035 , G03F7/038 , G03F7/0388 , H05K3/287 , Y10T428/31855 , C08G18/6692
摘要： There are provided a novel photosensitive resin composition, a cured film of which has ample flexibility, and which yields an insulating protective coating having superior soldering heat resistance, thermal degradation resistance and electroless gold plating resistance. The photosensitive resin composition as claimed in the present invention comprises: a photopolymerizable component containing a urethane acrylate compound (A) and a compound (B) having an ethylenic unsaturated group other than said urethane acrylate compound (A), a thermosetting resin (C), a photopolymerization initiator (D) and a thermal polymerization catalyst (E); wherein, said urethane acrylate compound (A) is the reaction product of an isocyanate compound (a-1) of the following general formula (1): CH2═CH—COO—R—NCO (1) (wherein, R represents a hydrocarbon group having 1 to 30 carbon atoms) with a polyhydroxy compound (a-2).
摘要翻译：提供了一种新颖的感光性树脂组合物，其固化膜具有充分的柔软性，并且产生具有优异的耐焊接耐热性，耐热劣化性和无电镀金电镀性的绝缘保护涂层。本发明的感光性树脂组合物包含：含有氨基甲酸酯丙烯酸酯化合物（A）和除所述氨基甲酸酯丙烯酸酯化合物（A）以外具有乙烯性不饱和基团的化合物（B）的光聚合性成分，热固性树脂（C），光聚合引发剂（D）和热聚合催化剂（E）; 其中，所述氨基甲酸酯丙烯酸酯化合物（A）是以下通式（1）的异氰酸酯化合物（a-1）：CH 2 = CH-COO-R-NCO（1）（其中，R表示烃具有1至30个碳原子的基团）与多羟基化合物（a-2）反应。

6. 发明申请

US20070218305A1 Photosensitive Resin Composition, Cured Product Thereof and Production Method of Printed Circuit Board Using the Same 有权
标题翻译：感光性树脂组合物及其固化物及使用其的印刷电路板的制造方法
公开(公告)号：US20070218305A1
公开(公告)日：2007-09-20
申请号：US11587162
申请日：2005-04-21
申请人： Satoru Ishigaki , Hiroshi Uchida , Yoshio Miyajima , Katsutoshi Morinaka
发明人： Satoru Ishigaki , Hiroshi Uchida , Yoshio Miyajima , Katsutoshi Morinaka
IPC分类号： G03F7/004
CPC分类号： G03F7/027 , C08G18/0823 , C08G18/4854 , C08G18/672 , C08G18/755 , C09D175/16 , G03F7/032 , G03F7/033 , G03F7/035 , G03F7/038 , G03F7/0388 , H05K3/287 , Y10T428/31855 , C08G18/6692
摘要： There are provided a novel photosensitive resin composition, a cured film of which has ample flexibility, and which yields an insulating protective coating having superior soldering heat resistance, thermal degradation resistance and electroless gold plating resistance. The photosensitive resin composition as claimed in the present invention comprises: a photopolymerizeable component containing a urethane acrylate compound (A) and a compound (B) having an ethylenic unsaturated group other than said urethane acrylate compound (A), a thermosetting resin (C), a photopolymerization initiator (D) and a thermal polymerization catalyst (E); wherein, said urethane acrylate compound (A) is the reaction product of an isocyanate compound (a-1) of the following general formula (1): CH2═CH—COO—R—NCO (1) (wherein, R represents a hydrocarbon group having 1 to 30 carbon atoms) with a polyhydroxy compound (a-2).
摘要翻译：提供了一种新颖的感光性树脂组合物，其固化膜具有充分的柔软性，并且产生具有优异的耐焊接耐热性，耐热劣化性和无电镀金电镀性的绝缘保护涂层。本发明的感光性树脂组合物包含：含有氨基甲酸酯丙烯酸酯化合物（A）和除所述氨基甲酸酯丙烯酸酯化合物（A）以外具有乙烯性不饱和基团的化合物（B）的光聚合性成分，热固性树脂（C），光聚合引发剂（D）和热聚合催化剂（E）; 其中，所述氨基甲酸酯丙烯酸酯化合物（A）是下列通式（1）的异氰酸酯化合物（a-1）的反应产物：<？in-line-formula description =“In-line Formula”end =“lead “ - > CH 2 - -CH-COO-R-NCO（1）<？在线公式描述=”在线式“末端=”尾“→（其中，R表示具有1〜30个碳原子的烃基）与多羟基化合物（a-2）。

7. 发明申请

US20110003176A1 PROCESS FOR FORMING CONCAVO-CONVEX PATTERNS, AND PROCESS FOR MANUFACTURING MAGNETIC RECORDING MEDIA USING THE SAME 审中-公开
标题翻译：形成凹凸图案的方法以及使用该方法制造磁记录介质的方法
公开(公告)号：US20110003176A1
公开(公告)日：2011-01-06
申请号：US12865649
申请日：2009-01-28
申请人： Naoyuki Imai , Katsutoshi Morinaka , Hiroshi Uchida , Akira Sakawaki , Masato Fukushima
发明人： Naoyuki Imai , Katsutoshi Morinaka , Hiroshi Uchida , Akira Sakawaki , Masato Fukushima
IPC分类号： G11B5/84 , B05D5/00 , B29C59/02
CPC分类号： G11B5/855
摘要： An object of the present invention is to provide a process for forming concavo-convex patterns which uses a resist-forming material having excellent oxygen etching resistance and long working life and which enables to carry out the imprinting (mold pressing) with good rectangular shape properties at normal temperature.The process for forming a concavo-convex pattern of the present invention comprises a step (1) of applying a solution containing a silsesquioxane compound of Composition Formula (A) below to a surface of a workpiece to form a thin film, a step (2) of pressing a stamper having a concavo-convex pattern to the thin film; and a step (3) of separating the stamper from the thin film; R1R2Si2O3 (A) wherein R1 and R2 are each independently a specific group.
摘要翻译：本发明的目的是提供一种形成凹凸图案的方法，其使用具有优异的耐氧蚀刻性和长使用寿命的抗蚀剂形成材料，并且能够进行具有良好矩形形状性能的压印（模压）在常温下。形成本发明的凹凸图案的方法包括将含有下述组合式（A）的倍半硅氧烷化合物的溶液施加到工件表面以形成薄膜的步骤（1），步骤（2））将具有凹凸图案的压模按压到所述薄膜上; 以及将压模与薄膜分离的工序（3） R1R2Si2O3（A）其中R1和R2各自独立地为特定基团。

8. 发明授权

US07659413B2 (Meth) acryloyl group-containing oxetane compound and production method thereof 失效
标题翻译：（甲基）丙烯酰基氧杂环丁烷化合物及其制备方法
公开(公告)号：US07659413B2
公开(公告)日：2010-02-09
申请号：US10588072
申请日：2005-02-09
申请人： Hirotoshi Kamata , Katsutoshi Morinaka , Hiroshi Uchida
发明人： Hirotoshi Kamata , Katsutoshi Morinaka , Hiroshi Uchida
IPC分类号： C07D407/00
CPC分类号： C07D305/06
摘要： The present invention relates to an oxetane compound containing a (meth)acryloyl group represented by formula (1) having a high copolymerizability with compounds containing a (meth)acryloyl group, and to a production method of an oxetane compound containing a (meth)acryloyl group which is characterized by reacting an isocyanate compound having a (meth)acryloyl group represented by formula (5) with an oxetane compound containing a hydroxyl group represented by formula (6). (In the formula, R1 represents a hydrogen atom or a methyl group, A represents —OR2— or a bond, R2 represents a divalent hydrocarbon group which may contain an oxygen atom in the main chain, R3 represents a linear or branched alkylene group having 1 to 6 carbon atoms, and R4 represents a linear or branched alkyl group having 1 to 6 carbon atoms.)
摘要翻译：本发明涉及含有与（甲基）丙烯酰基的化合物具有高共聚性的由式（1）表示的（甲基）丙烯酰基的氧杂环丁烷化合物，以及含有（甲基）丙烯酰基其特征在于使由式（5）表示的具有（甲基）丙烯酰基的异氰酸酯化合物与式（6）所示的含有羟基的氧杂环丁烷化合物反应。（式中，R 1表示氢原子或甲基，A表示-OR 2 - 或键，R 2表示可以在主链中含有氧原子的二价烃基，R 3表示直链状或支链状的亚烷基， 1〜6个碳原子，R4表示碳原子数1〜6的直链或支链烷基）

9. 发明申请

US20070060760A1 (Meth) acryloyl group-containing oxetane compound and production method thereof 失效
标题翻译：（甲基）丙烯酰基氧杂环丁烷化合物及其制备方法
公开(公告)号：US20070060760A1
公开(公告)日：2007-03-15
申请号：US10588072
申请日：2005-02-09
申请人： Hirotoshi Kamata , Katsutoshi Morinaka , Hiroshi Uchida
发明人： Hirotoshi Kamata , Katsutoshi Morinaka , Hiroshi Uchida
IPC分类号： C07D305/02
CPC分类号： C07D305/06
摘要： The present invention relates to an oxetane compound containing a (meth)acryloyl group represented by formula (1) having a high copolymerizability with compounds containing a (meth)acryloyl group, and to a production method of an oxetane compound containing a (meth)acryloyl group which is characterized by reacting an isocyanate compound having a (meth)acryloyl group represented by formula (5) with an oxetane compound containing a hydroxyl group represented by formula (6). (In the formula, R1 represents a hydrogen atom or a methyl group, A represents —OR2— or a bond, R2 represents a divalent hydrocarbon group which may contain an oxygen atom in the main chain, R3 represents a linear or branched alkylene group having 1 to 6 carbon atoms, and R4 represents a linear or branched alkyl group having 1 to 6 carbon atoms.)
摘要翻译：本发明涉及含有与（甲基）丙烯酰基的化合物具有高共聚性的由式（1）表示的（甲基）丙烯酰基的氧杂环丁烷化合物，以及含有（甲基）丙烯酰基其特征在于使由式（5）表示的具有（甲基）丙烯酰基的异氰酸酯化合物与式（6）所示的含有羟基的氧杂环丁烷化合物反应。（式中，R 1表示氢原子或甲基，A表示-OR 2 - 或键，R 2表示可以在主链中含有氧原子的二价烃基R 3表示具有1〜6个碳原子的直链或支链亚烷基，R 4表示具有1至6个碳原子的直链或支链烷基）

10. 发明申请

US20100097715A1 NANOIMPRINTING RESIN COMPOSITION 审中-公开
标题翻译：纳米复合树脂组合物
公开(公告)号：US20100097715A1
公开(公告)日：2010-04-22
申请号：US12528400
申请日：2008-02-21
申请人： Yuko Sakata , Hiroshi Uchida , Katsumasa Hirose
发明人： Yuko Sakata , Hiroshi Uchida , Katsumasa Hirose
IPC分类号： G11B5/02 , C08K3/22 , C08K3/36 , B29C59/02 , B29C35/08 , D06N7/04 , B29C59/00 , G11B5/82
CPC分类号： G11B5/7315 , B82Y10/00 , B82Y25/00 , B82Y40/00 , G03F7/0002 , G03F7/0047 , G11B5/8404 , Y10T428/24355
摘要： Nanoimprinting resin compositions are cured quickly and uniformly, are patterned by transferring evenly without transfer failure, and are suited for UV nanoimprinting methods and thermal nanoimprinting methods. The invention also provides micropatterned films of the compositions and processes for producing such films, magnetic disk media obtained with the films and production processes therefor, and recording/reproducing apparatuses for recording information in the magnetic disk media or for reproducing information from the magnetic disk media.The nanoimprinting resin compositions essentially contain (a) a compound having at least one polymerizable group in the molecule, and (b) organic or inorganic fine particles.
摘要翻译：纳米压印树脂组合物快速且均匀地固化，通过均匀转印而图案化，没有转印失败，并且适用于UV纳米压印方法和热纳米压印方法。本发明还提供了用于制造这种膜的组合物和方法的微图案化膜，用该膜制备的磁盘介质及其制造方法，以及用于在磁盘介质中记录信息或用于从磁盘介质再现信息的记录/再现装置。纳米压印树脂组合物基本上含有（a）在分子中具有至少一个可聚合基团的化合物，和（b）有机或无机细颗粒。

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