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    • 8. 发明申请
    • Wired circuit forming board, wired circuit board, and thin metal layer forming method
    • 有线电路板,布线电路板和薄金属层成型方法
    • US20050280153A1
    • 2005-12-22
    • US11147345
    • 2005-06-08
    • Toshiki NaitoHiroshi Yamazaki
    • Toshiki NaitoHiroshi Yamazaki
    • C23C14/14C23C14/16C23C14/56H01L21/44H01L29/40H05K3/10H05K3/38
    • C23C14/562C23C14/16H01L2924/0002H05K3/108H05K3/388H05K2201/0338H01L2924/00
    • A wired circuit forming board that can provide improved adhesion between an insulating layer and a conductive pattern and can also prevent delamination in a thin metal layer, a wired circuit board for which the same wired circuit forming board is used, and a thin metal layer forming method for forming the thin metal layer. The thin metal layer 2 is formed on the insulating base layer 1 by sputtering the first metal 35 and the second metal 36 in such a condition that a first metal diffusing region 37 for the first metal 35 to be diffused and a second metal diffusing region 38 for the second metal 36 to be diffused are overlapped with each other. This can allow formation of (i) a first unevenly-distributed metal portion 4 in which the first metal 35 is unevenly distributed and which is adjacent to the insulating base layer 1, (ii) a second unevenly-distributed metal portion 5 in which the second metal 36 is unevenly distributed and which is adjacent to the conductive pattern 6, and (iii) a metal coexisting portion 3 which is interposed between the first unevenly-distributed metal portion 4 and the second unevenly-distributed metal portion 5 and in which the first metal 35 and the second metal 36 are coexistent with each other in such a relation as to be continuously present in the thin metal layer 2 without defining any boundaries therebetween.
    • 一种布线电路形成板,其能够提供绝缘层和导电图案之间的改善的粘附性,并且还可以防止薄金属层中的分层,使用相同布线电路形成板的布线电路板和形成金属层的薄金属层 用于形成薄金属层的方法。 薄金属层2通过溅射第一金属35和第二金属36而形成在绝缘基底层1上,使得要扩散的第一金属35的第一金属扩散区37和第二金属扩散区38 因为要扩散的第二金属36彼此重叠。 这可以形成(i)第一不均匀分布的金属部分4,其中第一金属35不均匀地分布并且与绝缘基底层1相邻,(ii)第二不均匀分布的金属部分5,其中 第二金属36不均匀分布并且与导电图案6相邻,以及(iii)介于第一不均匀分布的金属部分4和第二不均匀分布的金属部分5之间的金属共存部分3,其中 第一金属35和第二金属36彼此共存,从而连续地存在于薄金属层2中而不在其间限定任何边界。
    • 10. 发明授权
    • Wired circuit forming board, wired circuit board, and thin metal layer forming method
    • 有线电路板,布线电路板和薄金属层成型方法
    • US07417316B2
    • 2008-08-26
    • US11147345
    • 2005-06-08
    • Toshiki NaitoHiroshi Yamazaki
    • Toshiki NaitoHiroshi Yamazaki
    • H01L23/48H01L23/52H01L29/40
    • C23C14/562C23C14/16H01L2924/0002H05K3/108H05K3/388H05K2201/0338H01L2924/00
    • A wired circuit forming board that can provide improved adhesion between an insulating layer and a conductive pattern and can also prevent delamination in a thin metal layer, a wired circuit board for which the same wired circuit forming board is used, and a thin metal layer forming method for forming the thin metal layer. The thin metal layer 2 is formed on the insulating base layer 1 by sputtering the first metal 35 and the second metal 36 in such a condition that a first metal diffusing region 37 for the first metal 35 to be diffused and a second metal diffusing region 38 for the second metal 36 to be diffused are overlapped with each other. This can allow formation of (i) a first unevenly-distributed metal portion 4 in which the first metal 35 is unevenly distributed and which is adjacent to the insulating base layer 1, (ii) a second unevenly-distributed metal portion 5 in which the second metal 36 is unevenly distributed and which is adjacent to the conductive pattern 6, and (iii) a metal coexisting portion 3 which is interposed between the first unevenly-distributed metal portion 4 and the second unevenly-distributed metal portion 5 and in which the first metal 35 and the second metal 36 are coexistent with each other in such a relation as to be continuously present in the thin metal layer 2 without defining any boundaries therebetween.
    • 一种布线电路形成板,其能够提供绝缘层和导电图案之间的改善的粘附性,并且还可以防止薄金属层中的分层,使用相同布线电路形成板的布线电路板和形成金属层的薄金属层 用于形成薄金属层的方法。 薄金属层2通过溅射第一金属35和第二金属36而形成在绝缘基底层1上,使得要扩散的第一金属35的第一金属扩散区37和第二金属扩散区38 因为要扩散的第二金属36彼此重叠。 这可以形成(i)第一不均匀分布的金属部分4,其中第一金属35不均匀地分布并且与绝缘基底层1相邻,(ii)第二不均匀分布的金属部分5,其中 第二金属36不均匀分布并且与导电图案6相邻,以及(iii)介于第一不均匀分布的金属部分4和第二不均匀分布的金属部分5之间的金属共存部分3,其中 第一金属35和第二金属36彼此共存,从而连续地存在于薄金属层2中而不在其间限定任何边界。