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    • 4. 发明授权
    • Method for dewatering endoscope channels
    • 内窥镜通道脱水方法
    • US07824608B2
    • 2010-11-02
    • US11701846
    • 2007-02-02
    • Hisashi KuroshimaAkio OgawaKojiro KotaniTakayoshi IwanamiHideto Onishi
    • Hisashi KuroshimaAkio OgawaKojiro KotaniTakayoshi IwanamiHideto Onishi
    • A61L2/18
    • A61B1/123A61B1/015A61B1/125A61B90/70A61B2090/701A61L2/18A61L2/24A61L2202/17A61L2202/24
    • An apparatus washes/disinfects, at a time, a plurality of endoscopes having a plurality of channels with different diameters, and dewaters the channels at a time. For the dewatering, the apparatus includes plural ports for receiving air supply, and a plurality of tubes for connecting between each of the plurality of ports and each of the plurality of channels in each of the plurality of endoscopes. The apparatus also includes an on-off valve for intermittently supply air to the ports, and a control unit for opening/closing the valve a plurality of times at a predetermined ratio. Water droplets remaining in a large-diameter channel are mainly moved by wind pressure of continuously flowing air while the valve is open, and discharged. Water droplets in a smaller-diameter channel are mainly moved by hammer effect of high-pressure air caused while the valve is closed, and discharged. The valve opening/closing is repeated for complete dewatering.
    • 一次装置一次洗涤/消毒多个具有不同直径的通道的内窥镜,并一次对通道进行脱水。 为了脱水,该装置包括用于接收空气供应的多个端口和用于在多个端口中的每一个和多个内窥镜中的每一个中的多个通道中的每一个连接的多个管。 该装置还包括用于向端口间歇地供给空气的开关阀和用于以预定比率多次打开/关闭阀的控制单元。 留在大直径通道中的水滴主要是通过持续流动的空气的风压在阀门打开时移动并排出。 较小直径通道中的水滴主要是通过在阀门关闭时引起的高压空气的锤击作用而移动,并排出。 阀门打开/关闭重复进行完全脱水。
    • 7. 发明申请
    • OXIDE CRYSTAL GROWTH APPARATUS AND FABRICATION METHOD USING THE SAME
    • 氧化物晶体生长装置和使用该方法的制造方法
    • US20070034144A1
    • 2007-02-15
    • US11463369
    • 2006-08-09
    • Akio OgawaMichihiro SanoHiroyuki KatoHiroshi Kotani
    • Akio OgawaMichihiro SanoHiroyuki KatoHiroshi Kotani
    • C30B23/00C30B25/00C30B28/12C30B28/14
    • C30B29/16C30B23/005C30B23/02
    • A growth apparatus and a method for making a nitrogen (N)-doped oxide crystal grow can be configured to set a nitrogen concentration to a desired concentration and to make the concentration of nitrogen uniform in a depth direction. A nitrogen source gun configured to supply ammonia (NH3) gas into an ultrahigh vacuum chamber can be arranged on a side of an ultrahigh vacuum chamber that is approximately opposite to a side that includes an exhaust port. A stage can be located between the nitrogen source gun and the exhaust port so as to form a flow path for ammonia that allows ammonia introduced into the ultrahigh vacuum chamber to be quickly exhausted after reaching a ZnO substrate placed on the stage. As a result, accumulation of ammonia in the ultrahigh vacuum chamber can be minimized, so that the nitrogen concentration in a crystal growth layer on the ZnO substrate can be set at a desired concentration and can be made uniform in the depth direction.
    • 可以将生长装置和氮(N)掺杂氧化物晶体生长的方法构成为将氮浓度设定为所需浓度,并使氮浓度在深度方向上均匀。 配置成将氮(NH 3)气体供应到超高真空室中的氮源枪可以布置在与包括排气口的一侧大致相反的超高真空室的一侧。 阶段可以位于氮源枪和排气口之间,以便形成氨的流动通道,允许在达到放置在载物台上的ZnO衬底之后,引入超高真空室的氨被快速排出。 结果,可以使超高真空室中的氨的积累最小化,使得ZnO基板上的晶体生长层中的氮浓度可以设定为期望的浓度并且可以在深度方向上均匀。