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    • 7. 发明授权
    • Process for producing a minute-patterned substrate
    • 用于制造微图案基板的方法
    • US5234717A
    • 1993-08-10
    • US963035
    • 1992-10-19
    • Yoshihiro MatsunoAtsunori MatsudaShinya Katayama
    • Yoshihiro MatsunoAtsunori MatsudaShinya Katayama
    • B29C59/02B29D17/00G11B7/253
    • G11B7/253B29C59/026B29D17/005
    • Disclosed herein is a process for producing a minute-patterned substrate required for optical disk substrates for information recording or the like, which process comprises forming a coating film of a solution containing a metal-organic compound and a thickener on a substrate, pressing a mold against the coating film on the substrate under a reduced pressure and heating the coating film to set up the coating film, then removing the mold, and heating the set coating film on the substrate. By the process it is possible to provide the substrate surface with a minute rough pattern, without generation of surface defects arising from the pressing of the mold against the coating film, and to set up the coating film in a short time and with good dimensional accuracy. It is therefore possible to produce a rough surface pattern with high productivity.
    • 本文公开了一种用于制造用于信息记录等的光盘基板所需的微小图案基板的方法,该方法包括在基板上形成含有金属有机化合物和增稠剂的溶液的涂膜,压制模具 在减压下对基材上的涂膜进行反应,加热涂膜以设置涂膜,然后除去模具,并加热基材上的固化涂膜。 通过该过程,可以提供具有微小粗糙图案的基板表面,而不会由于模具对涂膜的压制而产生表面缺陷,并且可以在短时间内以良好的尺寸精度来设置涂膜 。 因此,可以以高生产率制造粗糙的表面图案。