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1. 发明专利

JP2008041774A Magnetic substance film and method of manufacturing the magnetic substance film 有权
标题翻译：磁性物质膜及制造磁性物质膜的方法
公开(公告)号：JP2008041774A
公开(公告)日：2008-02-21
申请号：JP2006211222
申请日：2006-08-02
申请人： Toshiba Corp , 株式会社東芝
发明人： MATSUI ISAO
IPC分类号： H01F10/14 , G11B5/65 , G11B5/84 , H01F10/28 , H01F41/24
CPC分类号： G11B5/7325 , B82Y25/00 , G11B5/653 , G11B5/8404 , H01F1/009 , H01F10/123 , Y10T428/24752
摘要： PROBLEM TO BE SOLVED: To provide a magnetic substance film, having perpendicular magnetic anisotropy that has high coercive force in a direction perpendicular with respect to the surface of a platinum layer. SOLUTION: A magnetic substance film comprises a platinum layer having a (001) plane orientation, and an island-shaped iron platinum crystal, arranged on the platinum layer and having the (001) plane orientation parallel to the (001) plane orientation of the platinum layer. In the magnetic substance film, the island-shaped iron platinum crystal has a composition region that has 50 atom% for iron and 50 atom% for platinum. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有垂直磁性各向异性的磁性物质膜，其在相对于铂层的表面垂直的方向上具有高的矫顽力。解决方案：磁性物质膜包括具有（001）面取向的铂层和布置在铂层上并具有（001）面取向平行于（001）面的岛状铁铂晶体铂层的取向。在磁性物质膜中，岛状铁铂晶体具有铁原子数为50原子％，铂为50原子％的组成区域。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2004322237A Particle arranging base board and its manufacturing method 审中-公开
公开(公告)号：JP2004322237A
公开(公告)日：2004-11-18
申请号：JP2003117425
申请日：2003-04-22
申请人： Toshiba Corp , 株式会社東芝
发明人： RICHARD DAVID TILLY , SAITO SATOSHI , HIEDA YASUYUKI , MATSUI ISAO , KIKITSU SATORU
IPC分类号： B82B3/00 , G11B5/714 , G11B5/738 , G11B5/84
摘要： PROBLEM TO BE SOLVED: To provide a particle arranging base board, and its method for enhancing a covering rate of particles and easily arranging the nanoparticles over a wide area.
SOLUTION: This particle arranging base board has a base board 1, a hydrophobic layer 2 arranged on the base board 1, and including a silane compound having a fluoroalkyl group, and the nanoparticles 3 arranged on the hydrophobic layer 2.
COPYRIGHT: (C)2005,JPO&NCIPI

3. 发明专利

JP2005013795A Method and apparatus for forming particles 有权
标题翻译：形成颗粒的方法和装置
公开(公告)号：JP2005013795A
公开(公告)日：2005-01-20
申请号：JP2003178913
申请日：2003-06-24
申请人： Toshiba Corp , 株式会社東芝
发明人： MATSUI ISAO
IPC分类号： C01B19/04 , B01J2/00 , B01J2/04 , B01J19/00 , B82Y30/00 , B82Y40/00 , B82Y99/00 , C01B33/027 , C01G23/07 , H01M4/02 , H01M4/36 , H01M4/38 , H01M4/40
CPC分类号： H01M4/134 , B01J2/003 , B01J2/04 , H01M4/366 , H01M4/38 , H01M4/405
摘要： PROBLEM TO BE SOLVED: To provide a particle forming method capable of forming particles, each of which has a core part and a shell part separated clearly from each other, has a predetermined size or a predetermined thickness, at a low cost, and a particle forming apparatus. SOLUTION: This particle forming method comprises a process for forming liquid droplets containing a first material, a process for heating and pyrolyzing the liquid droplets in a reaction vessel to form core parts, and a process for heating and pyrolyzing a raw material gas containing a second material different from the first material in the reaction vessel to form shell parts for coating the core parts. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了提供能够形成颗粒的颗粒形成方法，其中每个颗粒具有彼此清楚分离的芯部分和壳部分，具有预定尺寸或预定厚度，成本低廉，和粒子形成装置。解决方案：该颗粒形成方法包括用于形成含有第一材料的液滴的方法，用于加热和热解反应容器中的液滴以形成芯部的方法，以及用于加热和热解原料气体的方法包含与反应容器中的第一材料不同的第二材料，以形成用于涂覆芯部件的外壳部件。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2004250727A Apparatus and method for forming particle-deposited layer 有权
标题翻译：用于形成颗粒沉积层的装置和方法
公开(公告)号：JP2004250727A
公开(公告)日：2004-09-09
申请号：JP2003039416
申请日：2003-02-18
申请人： Toshiba Corp , 株式会社東芝
发明人： MATSUI ISAO
IPC分类号： H05H1/24 , C23C16/44
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for forming a particle-deposited layer made of particles with a uniform size through a comparatively few steps, and to provide a method for forming the particle-deposited layer. SOLUTION: This apparatus for forming the particle-deposited layer 1 comprises a reaction chamber 22 to which a source gas is supplied, a rear chamber 23 provided with an exhaust port 25, a holder 3 which is arranged in the rear chamber 23 and can hold a substrate 4, a plasma-generating unit 5 for generating plasma in the reaction chamber 22, and a control section 6 for controlling the action of the plasma-generating unit 5 so as to alternately and repeatedly switch the generation and annihilation of the plasma in the state that the substrate 4 is held by the holder 3. The forming method comprises producing particles by reacting the source gas, and depositing the particles on the substrate 4 while keeping the form of the particles to as produced state. COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：提供一种通过相对较少的步骤形成由具有均匀尺寸的颗粒制成的颗粒沉积层的装置，并提供形成颗粒沉积层的方法。＆lt; P＆gt;解决方案：用于形成颗粒沉积层1的装置包括：供给源气体的反应室22，设置有排气口25的后室23，设置在后室23中的保持件3 并且可以容纳基板4，用于在反应室22中产生等离子体的等离子体产生单元5和用于控制等离子体产生单元5的动作的控制部分6，以便交替地和重复地切换等离子体的产生和湮灭在基板4被保持器3保持的状态下的等离子体。成形方法包括通过使源气体反应并将颗粒沉积在基板4上同时将颗粒的形状保持为制造状态来产生颗粒。版权所有（C）2004，JPO＆NCIPI

5. 发明专利

JP2009054872A Manufacturing method for magnetic material film, and the magnetic material film 有权
标题翻译：磁性材料薄膜的制造方法及磁性材料薄膜
公开(公告)号：JP2009054872A
公开(公告)日：2009-03-12
申请号：JP2007221544
申请日：2007-08-28
申请人： Toshiba Corp , 株式会社東芝
发明人： MATSUI ISAO
IPC分类号： H01F41/24
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing a magnetic material film having vertical magnetic anisotropy, which has a high coercive force perpendicular with respect to a surface of a platinum layer or silver layer formed on a base material surface, and the magnetic material film having vertical magnetic anisotropy, formed by the manufacturing method which has high coercive force perpendicular with respect to the surface of the platinum layer or silver layer formed on the base material surface.
SOLUTION: The manufacturing method of the magnetic material film 8 includes a process S1 of forming a coating layer 3, by coating the platinum layer 1 formed on the surface of the base material 9 and having a (001) plane direction with a liquid containing iron-platinum particles 2, containing exceeding 50% by atom of iron components; or a process S1 of forming a coating layer 3 by coating the silver layer 1, formed on the surface of the base material 9 and having a (001) plane direction with a liquid, containing iron-platinum particles 2 containing 40 to 60% by atom of iron components; a process S2 of removing the iron-platinum particles 2 and sticking bodies (5, 6) on the surface of the platinum layer 1; and a process S4 of heating.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种制造具有垂直磁各向异性的磁性材料膜的方法，该磁性材料膜具有相对于在基材表面上形成的铂层或银层的表面垂直的高矫顽力，以及具有垂直磁各向异性的磁性材料膜通过相对于形成在基材表面上的铂层或银层的表面垂直的矫顽力高的制造方法形成。解决方案：磁性材料膜8的制造方法包括通过将形成在基材9的表面上并具有（001）面方向的铂层1涂覆在其上的方法S1，形成涂层3 含有铁含量超过50％的铁组分的铁 - 铂颗粒2的液体; 或通过在基材9的表面上形成具有（001）面方向的银层1形成涂层3的工序S1，该液晶层含有含有40〜60％的铁 - 铂颗粒2的含有铁成分原子; 去除铂层1的表面上的铁 - 铂颗粒2和粘附体（5,6）的工艺S2; 以及加热处理S4。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2005235301A Magnetic structure and its manufacturing method 有权
标题翻译：磁结构及其制造方法
公开(公告)号：JP2005235301A
公开(公告)日：2005-09-02
申请号：JP2004042878
申请日：2004-02-19
申请人： Toshiba Corp , 株式会社東芝
发明人： MATSUI ISAO
IPC分类号： G11B5/65 , G11B5/84 , H01F10/08 , H01F41/24
摘要： PROBLEM TO BE SOLVED: To provide a magnetic structure including a magnetic substance having a vertically aligned crystal axis.
SOLUTION: This magnetic structure is provided with a substrate, and a magnetic layer formed on the substrate. The magnetic layer contains a plurality of magnetic crystals isolated by an isolation phase made of a nonmagnetic material and having a large variance within ±10%, the magnetic crystal axes of the magnetic crystals are within 90±5° with respect to the surface of the substrate, and the wall surface of the isolation phase is rugged.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供包括具有垂直排列的晶轴的磁性物质的磁性结构。解决方案：该磁性结构设置有基板和形成在基板上的磁性层。磁性层包含通过由非磁性材料制成的隔离相隔离并且在±10％以内具有很大变化的多个磁晶体，磁性晶体的磁晶轴相对于表面的90±5° 衬底，并且隔离相的壁表面是坚固的。版权所有（C）2005，JPO＆NCIPI

7. 发明专利

JP2005231966A Inorganic porous thin film where carbon nanotubes are formed in the pores, laminated body, and manufacturing method for the same 审中-公开
标题翻译：无机多孔薄膜，其中碳纳米管是在多孔，层压体及其制造方法中形成的
公开(公告)号：JP2005231966A
公开(公告)日：2005-09-02
申请号：JP2004045402
申请日：2004-02-20
申请人： Asahi Glass Co Ltd , Toshiba Corp , 旭硝子株式会社 , 株式会社東芝
发明人： SASAKURA HIDEFUMI , YAMAGUCHI YUKIO , MATSUI ISAO , ICHIGE NOBUAKI
IPC分类号： B82B1/00 , C01B31/02 , C01B33/12
摘要： PROBLEM TO BE SOLVED: To prepare an inorganic porous thin film where a large number of pores with a required shape are arranged in a single layer and carbon nanotubes are selectively grown in the pores, a laminated body made of the same, and a method for manufacturing the inorganic porous thin film.
SOLUTION: The inorganic porous thin film 10 has a large number of pores 5 having an opening 1 with a nearly circular shape and an inner peripheral face 3 with a nearly spherical shape and carbon nanotubes 6 are formed in the pores 5. The pores 5 are arranged in the single layer along the flat surface of the thin film 10. The average diameter d1 of the openings 1 is 30-3,000 nm and the average distance between the centers of the neighboring pores d2 is 100-230% of the average diameter d1 of the openings 1. The thickness of the film d3 is 30-100% of the average diameter d1 of the openings 1. The average diameter of the carbon nanotubes 6 is 0.4-50 nm and the average length is 10-1,000 nm.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：为了制备无机多孔薄膜，其中将具有所需形状的大量孔布置在单层中，并且在孔中选择性地生长碳纳米管，由其制成的层压体，以及无机多孔薄膜的制造方法。解决方案：无机多孔薄膜10具有大量具有近似圆形形状的开口1和近似球形的内周面3的孔5，并且在孔5中形成碳纳米管6。孔5沿着薄膜10的平坦表面布置在单层中。开口1的平均直径d1为30-3,000nm，相邻孔d2的中心之间的平均距离为100-230％开口1的平均直径d1。膜d3的厚度为开口1的平均直径d1的30-100％。碳纳米管6的平均直径为0.4-50nm，平均长度为10-1000 纳米。版权所有（C）2005，JPO＆NCIPI

8. 发明专利

JP2008050643A Particle deposition apparatus and particle deposition method 有权
标题翻译：颗粒沉积装置和颗粒沉积方法
公开(公告)号：JP2008050643A
公开(公告)日：2008-03-06
申请号：JP2006226734
申请日：2006-08-23
申请人： Toshiba Corp , 株式会社東芝
发明人： MATSUI ISAO , NAGASAWA TSURUMI
IPC分类号： C23C16/44 , C23C16/50 , G11B5/85
CPC分类号： C23C4/134
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for depositing particles with similar diameters on a substrate, and to provide a method therefor. SOLUTION: The particle deposition apparatus is directed at forming particles by reacting raw materials in a source gas and depositing the particles on the substrate. The apparatus comprises: a reaction vessel which has a reaction chamber and a rear room therein, and is provided with a source gas supply port connected with the reaction chamber, an exhaust port connected with the rear room, and a holder that is arranged in the rear room and can hold the substrate; a plasma-generating device which generates plasma in the reaction chamber; and a gas flow control means which exhausts a gas remaining after the reaction from the exhaust port while generating the plasma. The particle deposition method with the use of the apparatus comprises the steps of: reacting the raw materials in the introduced source gas to form and grow the particles; selecting particles only with desired particle diameters by balancing a coulomb force of the plasma with a drag of the gas flow; and depositing the selected particles on the substrate. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于在基板上沉积具有相似直径的颗粒的装置，并提供其方法。解决方案：颗粒沉积装置通过使源气体中的原料反应并将颗粒沉积在基底上来指向形成颗粒。该装置包括：反应容器，其中具有反应室和后室，并且设置有与反应室连接的源气体供给口，与后室连接的排气口和配置在该室中的保持器后房可保持底板; 在反应室中产生等离子体的等离子体产生装置; 以及气体流量控制装置，其在产生等离子体的同时从排气口排出反应后剩余的气体。使用该装置的颗粒沉积方法包括以下步骤：使引入的源气体中的原料反应以形成和生长颗粒; 通过平衡等离子体的库伦力与气流的阻力来选择仅具有期望粒径的颗粒; 并将所选择的颗粒沉积在基底上。版权所有（C）2008，JPO＆INPIT

9. 发明专利

JP2005193368A Particulate arranging method, particulate arranging device, and magnetic recording medium producing method 有权
标题翻译：颗粒装配方法，颗粒装配装置和磁记录介质生产方法
公开(公告)号：JP2005193368A
公开(公告)日：2005-07-21
申请号：JP2004072782
申请日：2004-03-15
申请人： Toshiba Corp , 株式会社東芝
发明人： MATSUI ISAO , NAGASAWA TSURUMI , HIRAOKA TAKAFUMI
IPC分类号： B82B3/00 , G11B5/84
摘要： PROBLEM TO BE SOLVED: To provide a particulate arranging method for arranging particulates on a substrate at high speed and at low cost, and to provide a particulate arranging device.
SOLUTION: The particulate arranging method comprises a step of charging a substrate surface into a first polarity; a step of pressing a pattern surface of a stamp member formed of a material having a permittivity different from that of the substrate and having a predetermined pattern, onto the surface of the substrate, thereafter separating the pattern surface from the substrate surface, and storing a charge of a second polarity in a portion of the substrate surface on which the pattern surface of the stamp abuts; and a step of feeding particulates charged with the first or second polarity to the substrate surface, and depositing the particulates on the portion of the substrate surface, where a charge of a polarity opposite to the particulates is stored.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于以高速和低成本将微粒排列在基板上的颗粒排列方法，并提供颗粒排列装置。解决方案：颗粒排列方法包括将基板表面充电为第一极性的步骤; 将由具有与基板的介电常数不同的介电常数的材料形成的具有预定图案的印模构件的图案表面按压到基板的表面上，之后将图案表面与基板表面分离，并将在印模的图案表面邻接的基板表面的一部分中具有第二极性的电荷; 以及将充有第一或第二极性的微粒供给到基板表面的步骤，以及将微粒沉积在基板表面的与微粒相反极性的电荷的部分上。版权所有（C）2005，JPO＆NCIPI

10. 发明专利

JP2004243253A Particle manufacturing method and apparatus 有权
公开(公告)号：JP2004243253A
公开(公告)日：2004-09-02
申请号：JP2003037587
申请日：2003-02-17
申请人： Toshiba Corp , 株式会社東芝
发明人： MATSUI ISAO
IPC分类号： B01J19/00 , B01J6/00 , B01J12/02 , B01J23/745 , B01J23/75 , B01J23/755 , B01J37/08 , B22F9/30 , C01B32/40
CPC分类号： B82Y30/00 , B01J6/008 , B01J12/02 , B01J23/745 , B01J23/75 , B01J23/755 , B01J37/086 , B01J2219/0009 , B01J2219/00094 , B22F9/305
摘要： PROBLEM TO BE SOLVED: To provide a method of manufacturing particles uniform in a particle diameter in a reaction vessel.
SOLUTION: The particle manufacturing apparatus has a reaction vessel 1, a gas introducing portion 2 introducing a raw material gas and a reaction inhibitor generating gas, an inert gas introducing portion introducing a carrier gas into the reaction vessel 1, a heater 5 provided in the reaction vessel 1, and a discharge portion 6 to control the growth of particles by using the reaction of formation of particles and its reverse reaction.
COPYRIGHT: (C)2004,JPO&NCIPI

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