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1. 发明专利

JP2010230405A Automatic focusing mechanism and optical image acquisition apparatus 有权
标题翻译：自动聚焦机制和光学图像采集设备
公开(公告)号：JP2010230405A
公开(公告)日：2010-10-14
申请号：JP2009076753
申请日：2009-03-26
申请人： Advanced Mask Inspection Technology Kk , Toshiba Corp , アドバンスド・マスク・インスペクション・テクノロジー株式会社 , 株式会社東芝
发明人： SHIRATO MASATAKA , MOTOMIYA YOSHINORI , HIRONO MASATOSHI , OGAWA TSUTOMU , SUGIHARA SHINJI
IPC分类号： G01N21/956 , G03F1/84 , H01L21/027 , H01L21/66
CPC分类号： G03B13/00
摘要： PROBLEM TO BE SOLVED: To provide an automatic focusing mechanism capable of reducing the dependency of patterns formed in a samples to be inspected and to provide an optical image acquisition apparatus provided with the same.
SOLUTION: In the automatic focusing mechanism, a sample to be inspected 10 in which a pattern is formed is mounted to a mounting part 12, and a pattern-formed surface of the sample to be inspected 10 is irradiated with a light beam for observation which has passed through a slit 20 formed in a field stop 16. A reflected light beam generated by reflection is branched. Aperture stops 24A and 24B for focus adjustments in which an approximately rhombic opening 26 is formed are each arranged on the optical paths of branched reflected light beams. The quantity of light of each reflected light beam which has passed through the approximately rhombic opening 26 is detected at optical receivers 28A and 28B for focus adjustments. A focusing device 36 controls the position of the mounting part 12 on the basis of the difference between detected quantities of light.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够减少在被检测样品中形成的图案的依赖性的自动聚焦机构，并提供具有该图案的光学图像采集装置。解决方案：在自动对焦机构中，将待检查的样品10（其中形成有图案）安装到安装部分12，并且用待检查的样品的图案形成的表面10照射光束用于通过形成在场停止器16中的狭缝20的观察。由反射产生的反射光束被分支。孔径停止24A和24B用于聚焦调节，其中形成大致菱形的开口26各自布置在分支反射光束的光路上。在光接收器28A和28B处检测通过大致菱形开口26的每个反射光束的光量以进行焦点调节。聚焦装置36基于检测到的光量之差来控制安装部12的位置。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2007134316A Lighting apparatus 有权
标题翻译：照明设备
公开(公告)号：JP2007134316A
公开(公告)日：2007-05-31
申请号：JP2006258632
申请日：2006-09-25
申请人： Toshiba Corp , Toshiba Lighting & Technology Corp , 東芝ライテック株式会社 , 株式会社東芝
发明人： SHIRATO MASATAKA , TODA MASAHIRO , HIRONO MASATOSHI
IPC分类号： F21V5/04 , F21Y101/02 , G02B3/08 , H01L33/50 , H01L33/58 , H01L33/60
CPC分类号： F21V5/04 , F21S43/26 , F21V5/007 , F21V5/008 , F21V5/045 , F21V7/0091 , F21W2131/40 , F21Y2115/10 , G02B3/0025 , G02B3/0031 , G02B3/0056 , G02B3/0062 , G02B3/08 , H01L2224/48091 , H01L2224/48247 , H01L2924/181 , H01L2924/00014 , H01L2924/00012
摘要： PROBLEM TO BE SOLVED: To provide a lighting apparatus in which the maximization of a lighting volume can be obtained by increasing the effective utilization efficiency of light and color spots, and luminous spots can be reduced and a light distribution control lens can be easily manufactured. SOLUTION: The lighting apparatus 1 is provided with a semiconductor luminous element (a first light source) 10, a phosphor ( a second light source) 20, a first lens face 31 which makes light close to parallel light, a second lens face 32 in which a plurality of first reducing lens faces 321 are formed in parallel in the direction of the face, and a third lens face 41 in which a plurality of second reducing lens faces 411 facing the first reducing lens face 321 are formed in parallel in the direction of the face. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过提高光和色斑的有效利用效率可以获得照明体积最大化的照明装置，并且可以减少发光点，并且配光控制透镜可以容易制造。解决方案：照明装置1设置有半导体发光元件（第一光源）10，荧光体（第二光源）20，使光接近平行光的第一透镜面31，第二透镜其中多个第一减少透镜面321沿着面的方向平行地形成在其中，第三透镜面41，其中面对第一缩小透镜面321的多个第二缩小透镜面411平行地形成在脸的方向。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2007095213A Optical recording medium, information reproducing method, and optical information reproducing device 有权
标题翻译：光学记录介质，信息再现方法和光学信息再现设备
公开(公告)号：JP2007095213A
公开(公告)日：2007-04-12
申请号：JP2005285589
申请日：2005-09-29
申请人： Toshiba Corp , 株式会社東芝
发明人： SATO SUKEHIRO , ASHIDA SUMIO , HIRONO MASATOSHI
IPC分类号： G11B7/24 , G11B7/005
CPC分类号： G11B7/252 , G11B7/2403 , G11B7/24038 , G11B7/246 , G11B7/2533 , G11B7/2534 , G11B7/2535 , G11B7/259 , G11B2007/24312 , G11B2007/24314 , G11B2007/24316 , G11B2007/25706 , G11B2007/25708 , G11B2007/2571 , G11B2007/25711 , G11B2007/25713 , G11B2007/25715 , G11B2007/25716
摘要： PROBLEM TO BE SOLVED: To prevent the generation of a noise and the deterioration of the SN ratio of signal caused by reflected light components from a layer to be reproduced in an optical recording medium provided with a plurality of information layers. SOLUTION: A first substrate 10, a first information layer 11a, an absorption change layer 12, an intermediate layer 13, a second information layer 11b and a second substrate 14 are laminated in this order from a light incidence side. Further, in the first information layer 11a, a protective layer 15a, a recording layer 16, a protective layer 15b and a reflection layer 16 are laminated in this order respectively from the light incidence side. Also, in the second information layer 11b, a protective layer 15a, a recording layer 16, a protective layer 15b, a reflection layer 17 and a protective layer 15c are laminated in this order respectively from the light incidence side. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了防止在设置有多个信息层的光记录介质中产生噪声和由来自要再现的层的反射光分量引起的信号的SN比的劣化。解决方案：从光入射侧依次层叠第一基板10，第一信息层11a，吸收变化层12，中间层13，第二信息层11b和第二基板14。此外，在第一信息层11a中，分别从光入射侧依次层叠保护层15a，记录层16，保护层15b和反射层16。此外，在第二信息层11b中，分别从光入射侧依次层叠保护层15a，记录层16，保护层15b，反射层17和保护层15c。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2005182951A Recording method for recording information on recording medium and recorder using the recording method 有权
标题翻译：使用记录方法记录记录介质和记录仪的信息的记录方法
公开(公告)号：JP2005182951A
公开(公告)日：2005-07-07
申请号：JP2003425119
申请日：2003-12-22
申请人： Toshiba Corp , 株式会社東芝
发明人： TATSUTA SHINICHI , HIRONO MASATOSHI , ITO HIDEKI
IPC分类号： G11B7/0045 , G11B7/125
摘要： PROBLEM TO BE SOLVED: To provide a recording method capable of enlarging a power margin to reduction or temporary fluctuations of laser power when recording information in a recording layer and a recorder using the recording method. SOLUTION: In the method by which recording marks are formed in the recording layer, a pulse train having combination of a first level, a second level which is larger than the first level and a third level which is larger than the second level is generated according to the length nT (n is an integer and T is a reference timing period) and in the recorder, a laser beam is generated according to the pulse train. Moreover, in the recorder, the recording layer is rotated at a linear velocity having magnifications (m) to a defined linear velocity and in a recording mark whose length is nT in which (n÷m) becomes 5 or more, at least first two pulses having the third levels in a pulse train are generated so as to have first pulse width wider than the pulse width of other pulses having the third levels which follow these two pulses. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种记录方法，当使用记录方法在记录层和记录器中记录信息时，能够扩大功率余量以减少或临时波动激光功率。解决方案：在记录层中形成记录标记的方法中，具有第一电平，大于第一电平的第二电平和大于第二电平的第三电平的组合的脉冲串根据长度nT（n是整数，T是参考定时周期）生成，并且在记录器中，根据脉冲序列产生激光束。此外，在记录器中，记录层以具有放大倍率（m）的线速度旋转到规定的线速度，并且在长度为nT（n÷m）变为5以上的记录标记中，至少前两个产生具有脉冲序列中的第三电平的脉冲，使得具有比具有跟随这两个脉冲的第三电平的其它脉冲的脉冲宽度宽的第一脉冲宽度。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2014020950A Pattern inspection device 审中-公开
标题翻译：图案检查装置
公开(公告)号：JP2014020950A
公开(公告)日：2014-02-03
申请号：JP2012160488
申请日：2012-07-19
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー , Toshiba Corp , 株式会社東芝
发明人： OGAWA TSUTOMU , HIRONO MASATOSHI
IPC分类号： G01N21/956 , G01B11/30 , G06T1/00
摘要： PROBLEM TO BE SOLVED: To allow continuous magnification adjustment without increasing the number of lenses and to suppress the occurrence of an inspection error due to a change in magnification.SOLUTION: A pattern inspection device for inspecting defects of a pattern of a target sample to be inspected includes: an imaging optical system 15 including a plurality of lens groups for forming an image of light transmitted through or reflected by the target sample 11; an image capture sensor 16 which captures the image formed by the imaging optical system 15; moving mechanisms 31 and 32 which move a part of the plurality of lens groups and the image capture sensor 16 in an optical axis direction; a magnification control circuit 25 which controls movement positions by the moving mechanisms 31 and 32 to change an image magnification; an image correction circuit 26 which corrects one of an inspection image and a reference image obtained from design data, in accordance with the changed magnification; and an inspection unit 24 which compares the corrected image with the other of the inspection image and the reference image to perform defect inspection of the pattern.
摘要翻译：要解决的问题：允许在不增加透镜数量的情况下进行连续的倍率调整，并且抑制由于放大倍率的变化引起的检查误差的发生。解决方案：用于检查目标样品的图案的缺陷的图案检查装置检查包括：成像光学系统15，包括用于形成通过目标样品11透射或反射的光的图像的多个透镜组; 捕获由成像光学系统15形成的图像的图像捕获传感器16; 使多个透镜组的一部分和图像拍摄传感器16沿光轴方向移动的移动机构31,32; 放大控制电路25，其通过移动机构31和32控制移动位置以改变图像放大率; 图像校正电路26，其根据改变的倍率校正从设计数据获得的检查图像和参考图像中的一个; 以及检查单元24，其将校正图像与检查图像和参考图像中的另一个进行比较，以对图案进行缺陷检查。

6. 发明专利

JP2011002528A Photomask inspection method 有权
标题翻译：光电检测方法
公开(公告)号：JP2011002528A
公开(公告)日：2011-01-06
申请号：JP2009143817
申请日：2009-06-17
申请人： Nec Corp , Toshiba Corp , 日本電気株式会社 , 株式会社東芝
发明人： HIRONO MASATOSHI
IPC分类号： G01N21/956 , G03F1/24 , G03F1/84 , G06T1/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a photomask inspection method for detecting foreign substances, such as, dust on a photomask with high sensitivity.SOLUTION: The inspection method for a photomask, having a first region and a second region, having a higher reflectance to inspection light than in the first region, on the surface comprises: acquiring a reflection image of the photomask; creating an undershoot image of the reflection image through a process of rewriting the pixel value of a pixel, having a pixel value equal to or higher than the reflection intensity in the first region into a pixel value in the first region; creating an SSD (sum of squared differences) image including the sum of the squared difference between the undershoot image and a raised concave kernel; creating a local dark portion enhanced image through a smoothing process on the SSD image; and detecting a foreign substance by comparing the local dark portion enhanced image with a predetermined threshold.
摘要翻译：要解决的问题：提供一种用于以高灵敏度检测光掩模上的异物等异物的光掩模检查方法。解决方案：具有第一区域和第二区域的光掩模的检查方法具有较高的反射率检查光比第一区域中的表面包括：获取光掩模的反射图像; 通过将具有等于或高于第一区域中的反射强度的像素值重写为第一区域中的像素值的像素的像素值的处理来产生反射图像的下冲图像; 创建包括下冲图像和凸起的凹核之间的平方差的和的SSD（平方差的和）图像; 通过SSD图像上的平滑处理创建局部暗部分增强图像; 以及通过将局部暗部分增强图像与预定阈值进行比较来检测异物。

7. 发明专利

JP2007018647A Optical disk device and optical disk rotation method 审中-公开
标题翻译：光盘设备和光盘旋转方法
公开(公告)号：JP2007018647A
公开(公告)日：2007-01-25
申请号：JP2005201432
申请日：2005-07-11
申请人： Toshiba Corp , 株式会社東芝
发明人： HIRONO MASATOSHI , YAOITA AKIKO
IPC分类号： G11B17/028
摘要： PROBLEM TO BE SOLVED: To provide a stable optical disk device wherein fluttering is difficult even in a thin optical disk.
SOLUTION: The optical disk device for rotating an optical disk 1 around a shaft is provided with a center push part 2 for pushing the vicinity of the center of the first surface of the optical disk 1 in a shaft direction, a periphery push part 3 for pushing the peripheral part of the second surface of the optical disk 1 in the shaft direction, a rotation mechanism 2 for rotating the optical disk 1 in the conically deformed state of the optical disk 1 by the center and periphery push parts 2 and 3, an optical pickup 4 for converging a laser beam in the optical disk 1, and a pick up moving mechanism 6 for moving the optical pickup 5 in the radial direction of the optical disk 1.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种稳定的光盘装置，即使在薄的光盘中也难以进行颤动。解决方案：用于使光盘1围绕轴旋转的光盘装置设置有用于沿轴向推动光盘1的第一表面的中心附近的中心推动部分2，周边推动用于沿轴向推动光盘1的第二表面的周边部分的部分3，用于通过中心和周边推动部分2将光盘1以锥形变形状态旋转的旋转机构2和 3，用于使光盘1中的激光束会聚的光学拾取器4以及用于沿光盘1的径向移动光学拾取器5的拾取移动机构6.（C） JPO＆INPIT

8. 发明专利

JP2014041015A Pattern inspection device 有权
标题翻译：图案检查装置
公开(公告)号：JP2014041015A
公开(公告)日：2014-03-06
申请号：JP2012182228
申请日：2012-08-21
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー , Toshiba Corp , 株式会社東芝
发明人： OGAWA TSUTOMU , HIRONO MASATOSHI
IPC分类号： G01N21/956
CPC分类号： G01N21/95607 , G01N21/956 , G01N2021/95676 , G01N2201/06113 , G01N2201/0636
摘要： PROBLEM TO BE SOLVED: To improve inspection accuracy by allowing prevention of the reduction in amount of light due to an influence of a structural birefringence even in the case that a pattern of an inspection object sample has a periodic structure with a period shorter than a wavelength of inspection light.SOLUTION: A pattern inspection device inspects pattern defects by using a pattern image obtained by irradiating an inspection object sample with light and includes a light source 13 which irradiates an inspection object sample 10 with inspection light at a prescribed wavelength, a PBS 14 which reflects or transmits the light from the light source 13 to guide the light onto the inspection object sample 10, an imaging element 15 which receives light reflected by the inspection object sample 10 and transmitted through or reflected by the PBS 14, an optical system 20 which forms a Fourier transform plane of the inspection object sample 10 between the inspection object sample 10 and the PBS 14, and a polarization control element 30 which is installed in the Fourier transform plane. In the polarization control element 30, a first region 31 which the inspection light passes and a second region 32 having a larger area than the region 31, which the reflected light passes, are different in amount of retardation.
摘要翻译：要解决的问题：即使在检查对象样品的图案具有比波长短的周期结构的情况下，通过允许防止由于结构双折射的影响而引起的光量的减少来提高检查精度检查灯。图案检查装置通过使用通过用光照射检查对象样品获得的图案图像来检查图案缺陷，并且包括用检测对象样品10以规定波长照射检查光的光源13，PBS 14，其反射或透射来自光源13的光以将光引导到检查对象样本10上;成像元件15，其接收由检查对象样品10反射并透过PBS 14反射的光;光学系统 20，其形成检查对象样本10与检查对象样本10之间的傅立叶变换平面 PBS 14和安装在傅里叶变换平面中的偏振控制元件30。在偏光控制元件30中，检查光通过的第一区域31和具有比反射光通过的区域31的面积大的第二区域32的延迟量不同。

9. 发明专利

JP2007318171A Method and device for heat treatment of semiconductor substrate 审中-公开
标题翻译：用于半导体基板的热处理的方法和装置
公开(公告)号：JP2007318171A
公开(公告)日：2007-12-06
申请号：JP2007204537
申请日：2007-08-06
申请人： Toshiba Corp , 株式会社東芝
发明人： TATSUTA SHINICHI , NISHIOKA TAKESHI , HIRONO MASATOSHI , SUGURO KYOICHI , ITO TAKAYUKI
IPC分类号： H01L21/26 , H01L21/265
摘要： PROBLEM TO BE SOLVED: To provide a method and device for heat treatment which sufficiently activate an impurity diffusion layer without causing temperature irregularity or hot spots on a semiconductor substrate, and give the impurity diffusion layer a desired profile. SOLUTION: The method performs the heat treatment of the semiconductor substrate 205 using a light source 100 to activate an impurity injected into the semiconductor substrate 205. The method includes a light-absorbing film formation step of forming a light-absorbing film 250 on the surface of the semiconductor substrate 205, which light-absorbing film 250 is made of a material having a refraction factor n-ik with a real part n of 0.5 to 2.2 and an imaginary part k of 1.0 or less and absorbs light energy from the light source 100 to turn the light energy into heat energy, and a heat treatment step of emitting light energy from the light source 100 onto the light-absorbing film 250 to activate the impurity. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种热处理方法和装置，其充分激活杂质扩散层而不引起半导体衬底上的温度不均匀或热点，并且给予杂质扩散层所需的特性。解决方案：该方法使用光源100对半导体衬底205进行热处理，以激活注入到半导体衬底205中的杂质。该方法包括形成光吸收膜250的光吸收膜形成步骤在半导体基板205的表面上，该光吸收膜250由具有折射系数n-ik的材料制成，实部n为0.5至2.2，虚部k为1.0或更小，并且吸收来自光源100将光能转换成热能;以及热光处理步骤，其将光能从光源100发射到光吸收膜250上以激活杂质。版权所有（C）2008，JPO＆INPIT

10. 发明专利

JP2004178487A Fingerprint input device 审中-公开
公开(公告)号：JP2004178487A
公开(公告)日：2004-06-24
申请号：JP2002346916
申请日：2002-11-29
申请人： Toshiba Corp , 株式会社東芝
发明人： HIRONO MASATOSHI , SUDO HAJIME
IPC分类号： A61B5/117 , G06T1/00
摘要： PROBLEM TO BE SOLVED: To provide a fingerprint input device with an imaging optical system that is manufacturable in relatively thin and low-cost design. SOLUTION: The fingerprint input device, which comprises a transparent plate 2 with the top of which a finger 1 is brought into contact, lighting means 6 for illuminating the fingerprint, and an image sensor 5, has a plurality of spherical lenses 3 arranged between the transparent plate 2 and the image sensor 5 to focus light from the fingerprint on the image sensor 5. COPYRIGHT: (C)2004,JPO

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