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    • 4. 发明申请
    • PROCESS FOR PRODUCING DISPERSION OF COPPER ION-MODIFIED TUNGSTEN OXIDE PHOTOCATALYST
    • 生产铜离子改性钨氧化物光催化剂分散体的方法
    • US20130178361A1
    • 2013-07-11
    • US13809105
    • 2011-07-08
    • Yasuhiro Hosogi
    • Yasuhiro Hosogi
    • B01J23/885
    • B01J23/885B01J23/888B01J35/002B01J35/004B01J35/1009B01J35/1014B01J37/0036B01J37/14
    • The present invention relates to a process for producing a dispersion of a copper ion-modified tungsten oxide photocatalyst, including the steps of subjecting copper ion-modified tungsten oxide particles to mechanical pulverization treatment in a solvent and then contacting the resulting dispersion of the pulverized particles with an oxygen gas or ozone; and a copper ion-modified tungsten oxide photocatalyst which is produced by subjecting copper ion-modified tungsten oxide particles to mechanical pulverization treatment in a solvent and then contacting the resulting dispersion of the pulverized particles with an oxidative gas, wherein a photocatalyst powder obtained by drying the dispersion after being contacted with the oxidative gas exhibits a diffuse reflectance of 75% or more as measured at a wavelength of 700 nm.
    • 本发明涉及一种制备铜离子改性钨氧化物光催化剂分散体的方法,包括以下步骤:在溶剂中对铜离子改性的氧化钨颗粒进行机械粉碎处理,然后使所得的粉碎颗粒分散体 用氧气或臭氧; 和铜离子改性的氧化钨光催化剂,其通过将铜离子改性的氧化钨颗粒在溶剂中进行机械粉碎处理,然后使得到的粉碎颗粒的分散体与氧化性气体接触而制备,其中通过干燥获得的光催化剂粉末 与氧化气体接触后的分散体在700nm波长下测得的漫反射率为75%以上。
    • 7. 发明授权
    • Tungsten oxide photocatalyst and method for producing the same
    • 氧化钨光催化剂及其制造方法
    • US08652991B2
    • 2014-02-18
    • US13704267
    • 2012-05-23
    • Yasuhiro HosogiYasushi Kuroda
    • Yasuhiro HosogiYasushi Kuroda
    • B01J23/00
    • B01J23/888B01J21/063B01J35/0013B01J35/002B01J35/004B01J37/00B01J37/033B82Y40/00Y10S977/779Y10S977/811Y10S977/892
    • The present invention relates to a method for producing a tungsten oxide photocatalyst having titanium oxide and copper ion supported thereon, comprising dissolving urea in a solution in which copper-ion supporting tungsten oxide particles are uniformly dispersed in a titanium oxide sol, thermally decomposing the urea to thereby allow the titanium oxide to precipitate on the surface of copper ion-supporting tungsten oxide and to be supported thereon; and a tungsten oxide photocatalyst modified by both titanium oxide and copper ion obtained by the method, wherein the rate of change of diffuse reflectivity (at wavelength of 700 nm) is less than 3% before and after the irradiation of ultraviolet and the titanium oxide is supported on the tungsten oxide in an island shape of 1 to 100 nm in size.The tungsten oxide photocatalyst having titanium oxide and copper ion supported thereon of the present invention exhibits high catalyst activity under visible light irradiation.
    • 本发明涉及一种其上负载有氧化钛和铜离子的氧化钨光催化剂的制造方法,其特征在于,将尿素溶解在氧化钛溶胶中均匀分散有铜离子的氧化钨粒子的溶液中, 从而允许氧化钛在负载有铜离子的氧化钨的表面上沉淀并负载在其上; 以及通过该方法获得的氧化钛和铜离子改性的氧化钨光催化剂,其中在紫外线照射前后的漫反射率(波长700nm)的变化率小于3%,氧化钛为 负载在尺寸为1〜100nm的岛状的氧化钨上。 本发明的负载有氧化钛和铜离子的氧化钨光催化剂在可见光照射下显示出高的催化剂活性。
    • 9. 发明授权
    • Tungsten oxide photocatalyst modified with copper ion, and process for production thereof
    • 用铜离子改性的氧化钨光催化剂及其制备方法
    • US09061272B2
    • 2015-06-23
    • US13579224
    • 2011-02-15
    • Yasuhiro Hosogi
    • Yasuhiro Hosogi
    • B01J35/00B01J23/888B01J37/06B01J35/10B01D53/86
    • B01J35/004B01D53/8668B01D2255/20761B01D2255/20776B01D2255/802B01J23/888B01J35/1009B01J37/06
    • The present invention relates to a copper ion-modified tungsten oxide photocatalyst subjected to chemical etching treatment with a basic aqueous solution in which a rate of change in diffuse reflectance of the photocatalyst as measured at a wavelength of 700 nm between before and after irradiated with an ultraviolet light in atmospheric air is less than 10%; and a process for producing a copper ion-modified tungsten oxide photocatalyst which includes a copper ion modifying step of modifying a tungsten oxide powder with a copper ion; a chemical etching step of subjecting the tungsten oxide powder to chemical etching treatment with a basic aqueous solution, the chemical etching treatment being carried out either before or after the copper ion modifying step; and a drying step of drying the product obtained after the above steps at a temperature of 200° C. or lower.
    • 本发明涉及一种用碱性水溶液进行化学蚀刻处理的铜离子改性的氧化钨光催化剂,其中,在照射前后的700nm波长下测定的光催化剂的漫反射率的变化率 大气中的紫外线小于10%; 以及制造铜离子改性的氧化钨光催化剂的方法,其包括用铜离子改性氧化钨粉末的铜离子改性工序; 化学蚀刻步骤,用碱性水溶液对氧化钨粉末进行化学蚀刻处理,化学蚀刻处理在铜离子修饰步骤之前或之后进行; 以及干燥步骤,在200℃以下的温度下干燥上述步骤后得到的产物。