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    • 3. 发明申请
    • DEVELOPING APPARATUS
    • 开发设备
    • US20080149543A1
    • 2008-06-26
    • US11963806
    • 2007-12-22
    • Kazuhide UEMURAHiroshi Noma
    • Kazuhide UEMURAHiroshi Noma
    • B01D43/00
    • B01D43/00
    • There is described a developing apparatus having function to remove scum occurring in a development process from a developer. The developing apparatus comprises a developing tank and the developing tank includes a developer inflow unit, a bubble accumulation unit, a scum removal unit, and a developer evacuation unit. The bubble accumulation unit makes a production speed of bubbles (including scum) included in a developer after development process inflowed from the developer inflow unit larger than a dissipation speed of the bubbles, thereby accumulating the bubbles. The scum removal unit takes in the bubbles including scum accumulated in the accumulation unit when the bubbles pour over the developing tank and removes the scum from the bubbles. The developer evacuation unit evacuates the scum-free developer from the developing tank for using the same in a development process.
    • 描述了一种具有去除显影剂显影过程中浮渣的功能的显影装置。 显影装置包括显影槽,显影槽包括显影剂流入单元,气泡聚积单元,浮渣单元和显影剂排出单元。 气泡积聚单元使从显影剂流入单元流出的显影处理之后包含在显影剂中的气泡(包括浮渣)的生成速度大于气泡的耗散速度,从而积聚气泡。 当气泡倾倒在显影槽上并从气泡中除去浮渣时,浮渣除去单元吸收积聚在积聚单元中的浮渣的浮渣。 显影剂排出单元在开发过程中将不起泡的显影剂从显影槽中排出以用于其。
    • 4. 发明授权
    • Vacuum evaporating apparatus
    • 真空蒸发装置
    • US4854264A
    • 1989-08-08
    • US131009
    • 1987-12-10
    • Hiroshi NomaHiroshi Fujiyasu
    • Hiroshi NomaHiroshi Fujiyasu
    • C23C14/56C30B23/06
    • C23C14/56C30B23/066
    • An vacuum evaporating apparatus for depositing thin films on a substrate comprises a vacuum tank, a hot-wall furnace for heating and evaporating a material to be evaporated, an auxiliary vacuuming means connected to the vacuum tank through a gate valve, a substrate exchanging mechanism for an evaporated substrate with a new substrate through the auxiliary vacuuming device, and a substrate transferring unit generally of a turn table located to be rotatable above the hot-wall furnace. The hot-wall furnaces are disposed in standing state in the vacuum tank, each of hot-wall furnaces being provided with a plurality of crucibles coaxial in a vertical direction in which the evaporation source materials are accommodated, heaters independently provided for the respective crucibles, and thermocouples connected to the respective heaters to independently control the temperatures of the respective crucibles. The thermocouples are operatively connected to socket pins, at the bottom of the hot-wall furnace, and are made of the same materials as those constituting metal portions of the respective thermocouples.
    • 用于在基板上沉积薄膜的真空蒸发装置包括:真空槽,用于加热和蒸发待蒸发的材料的热壁炉,通过闸阀连接到真空罐的辅助抽真空装置,用于 具有通过辅助抽吸装置的新基板的蒸发的基板,以及通常位于可在热壁炉上方旋转的转台的基板传送单元。 所述热壁炉在所述真空槽中处于静止状态,每个所述热壁炉均设置有多个坩埚,所述坩埚沿垂直方向与所述蒸发源材料相容,所述坩埚独立地设置于所述坩埚中, 以及连接到相应加热器的热电偶以独立地控制相应坩埚的温度。 热电偶在热壁炉的底部可操作地连接到插座销,并且由与各个热电偶的金属部分相同的材料制成。