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1. 发明授权

US5824451A Positive photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US5824451A
公开(公告)日：1998-10-20
申请号：US497795
申请日：1995-07-03
申请人： Toshiaki Aoai , Tsukasa Yamanaka
发明人： Toshiaki Aoai , Tsukasa Yamanaka
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , Y10S430/106
摘要： A positive photosensitive composition comprising (a)a resin soluble in an aqueous alkali solution containing a specific structure unit; (b) a compound which generates an acid with irradiation of an active ray or radiation; and (c) a low molecular weight acid-decomposable dissolution inhibitor having a molecular weight of not more than 3000, which possesses a tertiary alkyl ester group and whose solubility in an aqueous alkali solution is increased by the action of an acid; wherein compound (c) is a compound having at least two tertiary alkyl ester groups, in which the longest distance with respect to the distance between two tertiary ester groups selected arbitrarily comprises at least 10 bonding atoms except for the atoms contained in the ester groups or a compound having at least three tertiary alkyl ester groups, in which the longest distance with respect to the distance between two tertiary ester groups selected arbitrarily comprises at least 9 bonding atoms except for the atoms contained in the ester groups. The positive photosensitive composition has a high sensitivity, high resolution and good profile and excels in storage stability and heat resistance of the resist solution.
摘要翻译：一种正型感光性组合物，其包含（a）可溶于含有特定结构单元的碱性水溶液中的树脂; （b）通过活性射线或辐射的照射产生酸的化合物; 和（c）分子量不大于3000的低分子量可酸分解溶解抑制剂，其具有叔烷基酯基，并且其在碱性水溶液中的溶解度通过酸的作用而增加; 其中化合物（c）是具有至少两个叔烷基酯基团的化合物，其中相对于任选地选择的两个叔酯基团之间的距离最长的距离包含至少10个键合原子，除了酯基团中包含的原子，或具有至少三个叔烷基酯基的化合物，其中相对于任意选择的两个叔酯基团之间的距离最长的距离包含除了酯基中包含的原子以外的至少9个键合原子。正型感光性组合物具有高灵敏度，高分辨率和良好的轮廓，并且抗蚀剂溶液的储存稳定性和耐热性优异。

2. 发明授权

US06200729B1 Positive photosensitive composition 有权
标题翻译：正光敏组合物
公开(公告)号：US06200729B1
公开(公告)日：2001-03-13
申请号：US09422344
申请日：1999-10-21
申请人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
发明人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
IPC分类号： G03F7004
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/115 , Y10S430/122
摘要： Provided is a positive photosensitive composition which has high photosensitivity, is capable of giving an excellent resist pattern, and changes little with time after exposure. The positive photosensitive composition comprises (1) a resin having group(s) capable of decomposing by the action of an acid to enhance solubility of the resin in an alkaline developing solution and (2) a compound represented by formula (I), (II) or (III) which is capable of generating a sulfonic acid upon irradiation with actinic rays or a radiation: wherein R1 to R5 and R7 to R10 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or a group represented by —S—R6, where R6 represents an alkyl group or an aryl group; X− represents the anion of a benzenesulfonic, naphthalenesulfonic, or anthracenesulfonic acid as deifined in the specification; and m, n, p and q each represents an integer of 1 to 3.
摘要翻译：提供了具有高光敏性的正光敏组合物，能够赋予优异的抗蚀剂图案，并且在曝光后随时间变化很小。正型感光性组合物包含（1）具有能够通过酸分解的基团的树脂，以提高树脂在碱性显影液中的溶解度，（2）由式（I）表示的化合物，（II ）或（III），其能够在用光化射线或辐射照射时产生磺酸：其中R 1至R 5和R 7至R 10各自表示氢原子，烷基，环烷基，烷氧基，羟基基团，卤素原子或-S-R6表示的基团，其中R6表示烷基或芳基; X-表示说明书中所述的苯磺酸，萘磺酸或蒽磺酸的阴离子; m，n，p和q各自表示1〜3的整数。

3. 发明授权

US6010820A Positive photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US6010820A
公开(公告)日：2000-01-04
申请号：US814826
申请日：1997-03-11
申请人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
发明人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
IPC分类号： G03F7/004 , G03F7/039 , G03C1/73
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/115 , Y10S430/122
摘要： Provided is a positive photosensitive composition which has high photosensitivity, is capable of giving an excellent resist pattern, and changes little with time after exposure. The positive photosensitive composition comprises (1) a resin having group(s) capable of decomposing by the action of an acid to enhance solubility of the resin in an alkaline developing solution and (2) a compound represented by formula (I), (II) or (III) which is capable of generating a sulfonic acid upon irradiation with actinic rays or a radiation: ##STR1## wherein R.sub.1 to R.sub.5 and R.sub.7 to R.sub.10 each represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, a hydroxy group, a halogen atom, or a group represented by --S--R.sub.6, where R.sub.6 represents an alkyl group or an aryl group; X.sup.- represents the anion of a benzenesulfonic, naphthalenesulfonic, or anthracenesulfonic acid as defined in the specification; and m, n, p and q each represents an integer of 1 to 3.
摘要翻译：提供了具有高光敏性的正光敏组合物，能够赋予优异的抗蚀剂图案，并且在曝光后随时间变化很小。正型感光性组合物包含（1）具有能够通过酸分解的基团的树脂，以提高树脂在碱性显影液中的溶解度，（2）由式（I）表示的化合物，（II ）或（III），其能够在用光化射线或辐射照射时产生磺酸：其中R 1至R 5和R 7至R 10各自表示氢原子，烷基，环烷基，烷氧基，羟基基团，卤素原子或-S-R6表示的基团，其中R6表示烷基或芳基; X-表示说明书中定义的苯磺酸，萘磺酸或蒽磺酸的阴离子; m，n，p和q各自表示1〜3的整数。

4. 发明授权

US6013411A Positive working photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US6013411A
公开(公告)日：2000-01-11
申请号：US794890
申请日：1997-02-05
申请人： Toshiaki Aoai , Toru Fujimori , Tsukasa Yamanaka , Kazuya Uenishi
发明人： Toshiaki Aoai , Toru Fujimori , Tsukasa Yamanaka , Kazuya Uenishi
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/121 , Y10S430/122
摘要： A positive working photosensitive composition comprising a resin having repeating units represented by the following formulae (I), (II) and (III), respectively and a compound which generates an acid with irradiation of an active ray or radiation: ##STR1## wherein R.sub.1 represents a hydrogen atom or a methyl group; R.sub.2 represents --C(.dbd.O)--O--C(R.sub.6) (R.sub.7) (R.sub.8) or --O--R.sub.5 --C(.dbd.O)--O--(R.sub.6) (R.sub.7) (R.sub.8); R.sub.3 represents --O--C(R.sub.6)(R.sub.7) (R.sub.8), --O--Si(R.sub.6)(R.sub.7)(Rs) or --O--C(R.sub.9)(R.sub.10)--OR.sub.11 ; R.sub.4 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxy group, an acyl group or an acyloxy group; R.sub.5 represents an alkylene group; R.sub.6, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkenyl group, provided that at least two among R.sub.6, R.sub.7 and R.sub.8 are groups other than a hydrogen atom; R.sub.11 represents an alkyl group or an aryl group; two groups selected from R.sub.6, R.sub.7 and R.sub.8 and two groups selected from R.sub.9, R.sub.10 and R.sub.11, each two groups may be combined to form a ring; and n is an integer from 1 to 3.
摘要翻译：一种正性感光性组合物，其特征在于，具有分别具有下述式（I），（II）和（III）所示的重复单元的树脂和通过活性射线或辐射照射产生酸的化合物，其中R1表示氢原子或甲基; R2表示-C（= O）-O-C（R6）（R7）（R8）或-O-R5-C（= O）-O-（R6）（R7）（R8） R3表示-O-C（R6）（R7）（R8），-O-Si（R6）（R7）（Rs）或-O-C（R9）（R10）-OR11; R4表示氢原子，卤素原子，烷基，芳基，烷氧基，酰基或酰氧基; R5表示亚烷基; R6，R7，R8，R9和R10各自独立地表示氢原子，烷基，环烷基或烯基，条件是R6，R7和R8中的至少两个是除氢原子以外的基团; R11表示烷基或芳基; 选自R6，R7和R8的两个基团和选自R9，R10和R11的两个基团，可以将两个基团组合形成环; n为1〜3的整数。

5. 发明授权

US5837420A Positive working photosensitive composition 失效
标题翻译：正光敏组合物
公开(公告)号：US5837420A
公开(公告)日：1998-11-17
申请号：US812165
申请日：1997-03-06
申请人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
发明人： Toshiaki Aoai , Kunihiko Kodama , Kazuya Uenishi , Tsukasa Yamanaka
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03C1/492
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/122
摘要： A positive working photosensitive composition is disclosed, which comprises (a) a resin having groups capable of increasing solubility of the resin in an alkali developer through their decomposition due to the action of an acid and (b) a compound represented by formula (I) or (II) generating sulfonic acid by irradiation with active rays or radiant rays: ##STR1##
摘要翻译：公开了一种正性感光性组合物，其包含（a）具有能够通过酸的作用使树脂在碱性显影剂中分解的溶解性的基团的树脂和（b）由式（I）表示的化合物，或（II）通过用活性射线或辐射线照射产生磺酸：<图像（I）<图像>（II）

6. 发明授权

US5707776A Positive resin composition sensitive to ultraviolet rays 失效
标题翻译：对紫外线敏感的正性树脂组合物
公开(公告)号：US5707776A
公开(公告)日：1998-01-13
申请号：US438481
申请日：1995-05-10
申请人： Yasumasa Kawabe , Tsukasa Yamanaka , Toshiaki Aoai
发明人： Yasumasa Kawabe , Tsukasa Yamanaka , Toshiaki Aoai
IPC分类号： G03F7/004 , G03F7/023 , G03F7/039 , H01L21/027 , G03C1/73
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/121 , Y10S430/122
摘要： Disclosed is a positive radiation-sensitive resist composition comprising polymer(s) of the following general formula (1) and a radiation-sensitive agent. ##STR1## Ra, Rb, Rc and Rd each are independently a hydrogen atom, a hydroxyl group, a halogen atom, an alkyl group, an alkoxy group, an alkenyl group, an aryl group, an aralkyl group, an alkoxycarbonyl group, an arylcarbonyl group, an acyloxy group, an acyl group, or a cycloalkyl group; k is an integer of from 1 to 30; (1+n) is an integer of from 1 to 100; m is an integer of from 1 to 50; p1, p2 and p3 each are an integer of from 1 to 3; q1 is an integer of from 1 to 4. The resist composition has high resolution to give resist patterns with good profiles and has high heat resistance and good storage stability.
摘要翻译：公开了包含以下通式（1）的聚合物和辐射敏感剂的正辐射敏感抗蚀剂组合物。（1）<图像> Ra，Rb，Rc和Rd分别独立地为氢原子，羟基，卤素原子，烷基，烷氧基，烯基，芳基，芳烷基烷氧基羰基，芳基羰基，酰氧基，酰基或环烷基; k为1〜30的整数，（1 + n）为1〜100的整数， m为1〜50的整数， p1，p2和p3各自为1〜3的整数; q1为1〜4的整数。抗蚀剂组合物具有高分辨率，得到具有良好外形的抗蚀剂图案，并且具有高耐热性和良好的储存稳定性。

7. 发明授权

US5939234A Chemically amplified positive resist composition 失效
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US5939234A
公开(公告)日：1999-08-17
申请号：US655233
申请日：1996-06-05
申请人： Tsukasa Yamanaka , Toshiaki Aoai , Toru Fujimori
发明人： Tsukasa Yamanaka , Toshiaki Aoai , Toru Fujimori
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/121
摘要： Disclosed is a chemically amplified positive resist composition which comprises (A) a compound which contains at least one group selected among tert-alkyl ester groups and tert-alkyl carbonate groups and is capable of increasing solubility of the compound in an alkali aqueous solution by the action of an acid, (B) a compound which contains at least one group selected among acetal groups and silyl ether groups and is capable of increasing solubility of the compound in an alkali aqueous solution by the action of an acid, (C) a compound which is capable of generating an acid by irradiation with an active ray or radiation, and (D) an organic basic compound. The resist composition has high resolving power and forms a satisfactory pattern free from undergoing sensitivity decrease, T-top formation, and change in line width which are caused from exposure to post exposure bake.
摘要翻译：公开了一种化学放大型正性抗蚀剂组合物，其包含（A）含有至少一个选自叔烷基酯基和碳酸叔烷基酯基的基团的化合物，并且能够增加化合物在碱性水溶液中的溶解度酸的作用，（B）含有至少一个选自缩醛基团和甲硅烷基醚基团的基团并且能够通过酸的作用增加化合物在碱性水溶液中的溶解度的化合物，（C）化合物其能够通过用活性射线或辐射照射产生酸，和（D）有机碱性化合物。抗蚀剂组合物具有高分辨能力，并且形成了不受曝光曝光烘烤引起的敏感性降低，T顶形成和线宽变化的令人满意的图案。

8. 发明授权

US5683856A Positive-working photosensitive composition 失效
标题翻译：正性感光组合物
公开(公告)号：US5683856A
公开(公告)日：1997-11-04
申请号：US634529
申请日：1996-04-18
申请人： Toshiaki Aoai , Tsukasa Yamanaka , Kazuya Uenishi
发明人： Toshiaki Aoai , Tsukasa Yamanaka , Kazuya Uenishi
IPC分类号： G03F7/004 , G03C1/492
CPC分类号： G03F7/0045
摘要： A positive working photosensitive composition is disclosed, which comprises: (a) a resin which is insoluble in water but soluble in an alkaline aqueous solution; (b) a compound which generates an acid upon irradiation with active light or radiation; (c) a low molecular acid-decomposable dissolution-inhibitive compound having a molecular weight of 3,000 or less and containing a group decomposable with an acid, and which increases its solubility in an alkaline developer by the action of an acid; and (d) a resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more. A further positive working photosensitive composition is disclosed, which comprises: (1) a compound which generates an acid upon irradiation with active light or radiation; (2) a resin having a group which undergoes decomposition by an acid whereby increasing its solubility in an alkaline developer; and (3) a resin containing a basic nitrogen atom and having a weight-average molecular weight of 2,000 or more. The positive-working photosensitive composition of the present invention can easily and properly inhibit acid diffusion and acid deactivation on the surface thereof with time between the exposure and the heat treatment, keep the dissolution inhibiting effect exerted by the dissolution-inhibitive compound and exhibit a good profile, a high sensitivity and a high resolving power.
摘要翻译：公开了一种正性感光性组合物，其包括：（a）不溶于水但可溶于碱性水溶液的树脂; （b）在用活性光或辐射照射时产生酸的化合物; （c）分子量为3000以下且含有可与酸分解的基团的低分子酸分解性溶解抑制性化合物，其通过酸的作用增加其在碱性显影剂中的溶解度; 和（d）含有碱性氮原子，重均分子量为2,000以上的树脂。公开了另一种正性光敏组合物，其包括：（1）在用活性光或辐射照射时产生酸的化合物; （2）具有通过酸分解的基团的树脂，从而增加其在碱性显影剂中的溶解度; 和（3）含有碱性氮原子，重均分子量为2,000以上的树脂。本发明的正性感光性组合物可以在曝光和热处理之间的时间内容易且适当地抑制其在表面上的酸扩散和酸失活，保持由溶解抑制性化合物发挥的溶解抑制作用，轮廓，高灵敏度和高分辨力。

9. 发明申请

US20130101812A1 METHOD OF FORMING PATTERN 审中-公开
标题翻译：形成图案的方法
公开(公告)号：US20130101812A1
公开(公告)日：2013-04-25
申请号：US13807498
申请日：2011-09-16
申请人： Sou Kamimura , Tsukasa Yamanaka , Yuichiro Enomoto , Keita Kato
发明人： Sou Kamimura , Tsukasa Yamanaka , Yuichiro Enomoto , Keita Kato
IPC分类号： G03F7/32 , G03F7/20
CPC分类号： G03F7/32 , G03F7/0382 , G03F7/0397 , G03F7/20 , G03F7/2041 , G03F7/325 , G03F7/405 , Y10T428/24802
摘要： Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing an organic solvent, wherein the developer contains an ester and a ketone having 7 or more carbon atoms.
摘要翻译：提供一种形成图案的方法，包括（a）将化学放大的抗蚀剂组合物形成为膜，（b）将膜曝光，和（c）用含有机溶剂的显影剂显影曝光的膜，其中显影剂含有酯和具有7个或更多个碳原子的酮。

10. 发明授权

US08287709B2 Method and device for immersion treatment of vehicle 有权
标题翻译：车辆浸渍处理方法及装置
公开(公告)号：US08287709B2
公开(公告)日：2012-10-16
申请号：US12530213
申请日：2008-03-06
申请人： Yusuke Hagihara , Masaki Takahashi , Makoto Takayanagi , Hideki Ikeda , Naoya Kanke , Tsukasa Yamanaka , Takayuki Tahara
发明人： Yusuke Hagihara , Masaki Takahashi , Makoto Takayanagi , Hideki Ikeda , Naoya Kanke , Tsukasa Yamanaka , Takayuki Tahara
IPC分类号： C25D13/12 , B65G49/04
CPC分类号： B05D7/14 , B05C3/09 , B05C3/10 , B05D1/18 , B65G49/045 , C25D13/22
摘要： An immersion treatment method with which a vehicle body horizontally immersed in liquid is taken out in a tilted position. The vehicle body is taken out of the liquid at high speed in a tilted position. Foreign matter is separated from the vehicle body and removed together with the liquid.
摘要翻译：将水平浸没在液体中的车体倾斜地取出的浸渍处理方法。车体在倾斜的位置被高速地从液体中取出。异物与车身分离并与液体一起除去。

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